DE3685941T2 - Automatische entwickelvorrichtung. - Google Patents

Automatische entwickelvorrichtung.

Info

Publication number: DE3685941T2
Authority: DE; Germany
Prior art keywords: automatic developer; developer; automatic
Prior art date: 1985-11-18
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

DE8686116012T

Other languages

English (en)

Other versions

DE3685941D1 (de

Inventor

Yasuo C O Patent Divi Matsuoka

Kinya C O Patent Divisio Usuda

Michiro Takano

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Sigma Corp

Toshiba Corp

Original Assignee

Sigma Corp

Toshiba Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1985-11-18

Filing date

1986-11-18

Publication date

1993-02-11

1985-11-18 Priority claimed from JP25795385A external-priority patent/JPS62117323A/ja

1985-11-18 Priority claimed from JP25795485A external-priority patent/JPS62117324A/ja

1986-11-18 Application filed by Sigma Corp, Toshiba Corp filed Critical Sigma Corp

1992-08-13 Publication of DE3685941D1 publication Critical patent/DE3685941D1/de

1993-02-11 Application granted granted Critical

1993-02-11 Publication of DE3685941T2 publication Critical patent/DE3685941T2/de

2006-11-19 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Links

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)

DE8686116012T 1985-11-18 1986-11-18 Automatische entwickelvorrichtung. Expired - Fee Related DE3685941T2 (de)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JP25795385A JPS62117323A (ja)	1985-11-18	1985-11-18	自動現像装置
JP25795485A JPS62117324A (ja)	1985-11-18	1985-11-18	自動現像装置

Publications (2)

Publication Number	Publication Date
DE3685941D1 DE3685941D1 (de)	1992-08-13
DE3685941T2 true DE3685941T2 (de)	1993-02-11

Family

ID=26543470

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE8686116012T Expired - Fee Related DE3685941T2 (de)	1985-11-18	1986-11-18	Automatische entwickelvorrichtung.

Country Status (3)

Country	Link
US (1)	US4745422A (de)
EP (1)	EP0223237B1 (de)
DE (1)	DE3685941T2 (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS63271931A (ja) *	1987-04-28	1988-11-09	Tokyo Electron Ltd	現像装置
US4924892A (en) *	1987-07-28	1990-05-15	Mazda Motor Corporation	Painting truck washing system
US5224504A (en) *	1988-05-25	1993-07-06	Semitool, Inc.	Single wafer processor
US5168886A (en) *	1988-05-25	1992-12-08	Semitool, Inc.	Single wafer processor
US5431421A (en) *	1988-05-25	1995-07-11	Semitool, Inc.	Semiconductor processor wafer holder
US5235995A (en) *	1989-03-27	1993-08-17	Semitool, Inc.	Semiconductor processor apparatus with dynamic wafer vapor treatment and particulate volatilization
US5168887A (en) *	1990-05-18	1992-12-08	Semitool, Inc.	Single wafer processor apparatus
US5230743A (en) *	1988-05-25	1993-07-27	Semitool, Inc.	Method for single wafer processing in which a semiconductor wafer is contacted with a fluid
JPH0264646A (ja) *	1988-08-31	1990-03-05	Toshiba Corp	レジストパターンの現像方法及びこの方法に使用する現像装置
US5357991A (en) *	1989-03-27	1994-10-25	Semitool, Inc.	Gas phase semiconductor processor with liquid phase mixing
US6375741B2 (en) *	1991-03-06	2002-04-23	Timothy J. Reardon	Semiconductor processing spray coating apparatus
US5156174A (en) *	1990-05-18	1992-10-20	Semitool, Inc.	Single wafer processor with a bowl
GB9022781D0 (en) *	1990-10-19	1990-12-05	Kodak Ltd	Photographic processing apparatus
KR0155390B1 (ko) *	1991-05-08	1998-12-01	이노우에 아키라	세정 장치
US5224503A (en) *	1992-06-15	1993-07-06	Semitool, Inc.	Centrifugal wafer carrier cleaning apparatus
US5489341A (en) *	1993-08-23	1996-02-06	Semitool, Inc.	Semiconductor processing with non-jetting fluid stream discharge array
JPH08108125A (ja) *	1994-10-13	1996-04-30	Sony Disc Technol:Kk	液供給装置
US5954911A (en) *	1995-10-12	1999-09-21	Semitool, Inc.	Semiconductor processing using vapor mixtures
TW386256B (en) *	1997-12-24	2000-04-01	United Microelectronics Corp	Method for removing photoresistor
US6125863A (en) *	1998-06-30	2000-10-03	Semitool, Inc.	Offset rotor flat media processor
US6062239A (en) *	1998-06-30	2000-05-16	Semitool, Inc.	Cross flow centrifugal processor
US6432214B2 (en)	1998-07-10	2002-08-13	Semitool, Inc.	Cleaning apparatus
KR100292075B1 (ko) *	1998-12-29	2001-07-12	윤종용	반도체소자제조용웨이퍼처리장치
US6516816B1 (en) *	1999-04-08	2003-02-11	Applied Materials, Inc.	Spin-rinse-dryer
US6725868B2 (en) *	2000-11-14	2004-04-27	Tokyo Electron Limited	Liquid processing apparatus
WO2004012242A1 (en) *	2002-07-26	2004-02-05	Applied Materials, Inc.	Hydrophilic components for a spin-rinse-dryer
US20200176278A1 (en) *	2018-12-04	2020-06-04	Nanya Technology Corporation	Wafer drying equipment and method thereof

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3401705A (en) *	1966-09-21	1968-09-17	Goldware David	Etching equipment
US3727620A (en) *	1970-03-18	1973-04-17	Fluoroware Of California Inc	Rinsing and drying device
US3769992A (en) *	1971-12-06	1973-11-06	Fluoroware Inc	Spray processing machine
US3990462A (en) *	1975-05-19	1976-11-09	Fluoroware Systems Corporation	Substrate stripping and cleaning apparatus
JPS5271871A (en) *	1975-12-11	1977-06-15	Nec Corp	Washing apparatus
US4161356A (en) *	1977-01-21	1979-07-17	Burchard John S	Apparatus for in-situ processing of photoplates
US4197000A (en) *	1978-05-23	1980-04-08	Fsi Corporation	Positive developing method and apparatus
JPS552212A (en) *	1978-06-19	1980-01-09	Toshiba Corp	Copying apparatus
JPS5655048A (en) *	1979-10-11	1981-05-15	Matsushita Electric Ind Co Ltd	Developing method and device therefor
JPS56130923A (en) *	1980-03-18	1981-10-14	Nec Corp	Developing apparatus for semiconductor substrate
JPS57166032A (en) *	1981-04-03	1982-10-13	Toshiba Corp	Spray type developing device for positive resist
US4429983A (en) *	1982-03-22	1984-02-07	International Business Machines Corporation	Developing apparatus for exposed photoresist coated wafers
US4564280A (en) *	1982-10-28	1986-01-14	Fujitsu Limited	Method and apparatus for developing resist film including a movable nozzle arm
JPS59134829A (ja) *	1983-01-22	1984-08-02	Nec Corp	半導体スプレ−現像装置
GB2154434A (en) *	1984-02-22	1985-09-11	Stohrer Doduco Gmbh & Co	Machine for washing circuit boards

1986
- 1986-11-17 US US06/930,925 patent/US4745422A/en not_active Expired - Lifetime
- 1986-11-18 DE DE8686116012T patent/DE3685941T2/de not_active Expired - Fee Related
- 1986-11-18 EP EP86116012A patent/EP0223237B1/de not_active Expired

Also Published As

Publication number	Publication date
EP0223237A3 (en)	1988-10-05
DE3685941D1 (de)	1992-08-13
EP0223237A2 (de)	1987-05-27
EP0223237B1 (de)	1992-07-08
US4745422A (en)	1988-05-17

Legal Events

Date	Code	Title	Description
1993-08-05	8364	No opposition during term of opposition
2001-01-11	8339	Ceased/non-payment of the annual fee

Publication	Publication Date	Title
DE3685941D1 (de)	1992-08-13	Automatische entwickelvorrichtung.
DE3683573D1 (de)	1992-03-05	Automatischer analysenapparat.
DE3679041D1 (de)	1991-06-06	Elektrophotographisches entwicklungsgeraet.
ATE77088T1 (de)	1992-06-15	8-phenylxanthine.
ATE55980T1 (de)	1990-09-15	2-hydroxy-3-phenoxypropylamine.
DE3668776D1 (de)	1990-03-15	Endotubus.
DE3687461D1 (de)	1993-02-18	Entwicklungsgeraet.
FI853084A0 (fi)	1985-08-12	Tvaettmedel foer automatiska diskmaskiner.
DE3668381D1 (de)	1990-02-22	Contactlinse.
DE3674812D1 (de)	1990-11-15	Photographisches setzen.
DE3669791D1 (de)	1990-04-26	Kopiereinrichtung.
FI853083A0 (fi)	1985-08-12	Tvaettmedel foer automatiska diskmaskiner.
DE3674460D1 (de)	1990-10-31	Automatisches spulenwechselverfahren.
DE3676008D1 (de)	1991-01-17	Substituierte di-t-butylphenole.
ATE50243T1 (de)	1990-02-15	Fluorbenzylester.
DE3678618D1 (de)	1991-05-16	Entwicklungsvorrichtung.
DE3577013D1 (de)	1990-05-10	Elektrophotographische einrichtung.
DE3687827T2 (de)	1993-06-09	Kopiergeraet.
DE3675418D1 (de)	1990-12-13	Entwicklungsvorrichtung.
FI871055A0 (fi)	1987-03-11	Taendroer foer projektil.
NO167425C (no)	1991-10-30	Koblingslist.
FI863783A (fi)	1987-03-24	Nytt framstaellningsfoerfarande foer vaermebestaendig transglukosidas.
DE3676586D1 (de)	1991-02-07	Substituierte di-t-butylphenole.
DE3672866D1 (de)	1990-08-30	Aufreissbares dosenteil.
DE3667938D1 (de)	1990-02-08	Raederfalzapparat.