DE3750174D1 - Belichtungseinrichtung. - Google Patents

Belichtungseinrichtung.

Info

Publication number
DE3750174D1
DE3750174D1 DE3750174T DE3750174T DE3750174D1 DE 3750174 D1 DE3750174 D1 DE 3750174D1 DE 3750174 T DE3750174 T DE 3750174T DE 3750174 T DE3750174 T DE 3750174T DE 3750174 D1 DE3750174 D1 DE 3750174D1
Authority
DE
Germany
Prior art keywords
exposure device
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3750174T
Other languages
English (en)
Other versions
DE3750174T2 (de
Inventor
Masato Muraki
Masato Aketagawa
Takahisa Shiozawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP61260237A external-priority patent/JPS63114186A/ja
Priority claimed from JP61260238A external-priority patent/JPS63114187A/ja
Priority claimed from JP62025262A external-priority patent/JPS63192234A/ja
Priority claimed from JP62267890A external-priority patent/JPH01109720A/ja
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE3750174D1 publication Critical patent/DE3750174D1/de
Publication of DE3750174T2 publication Critical patent/DE3750174T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
DE3750174T 1986-10-30 1987-10-29 Belichtungseinrichtung. Expired - Fee Related DE3750174T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP61260237A JPS63114186A (ja) 1986-10-30 1986-10-30 照明装置
JP61260238A JPS63114187A (ja) 1986-10-30 1986-10-30 光束分割装置
JP62025262A JPS63192234A (ja) 1987-02-05 1987-02-05 照明装置
JP62267890A JPH01109720A (ja) 1987-10-22 1987-10-22 照明装置

Publications (2)

Publication Number Publication Date
DE3750174D1 true DE3750174D1 (de) 1994-08-11
DE3750174T2 DE3750174T2 (de) 1994-11-17

Family

ID=27458281

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3750174T Expired - Fee Related DE3750174T2 (de) 1986-10-30 1987-10-29 Belichtungseinrichtung.

Country Status (3)

Country Link
US (1) US4974919A (de)
EP (1) EP0266203B1 (de)
DE (1) DE3750174T2 (de)

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US6252647B1 (en) 1990-11-15 2001-06-26 Nikon Corporation Projection exposure apparatus
US6967710B2 (en) 1990-11-15 2005-11-22 Nikon Corporation Projection exposure apparatus and method
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JP3630807B2 (ja) * 1994-12-28 2005-03-23 キヤノン株式会社 走査露光装置及び当該走査露光装置を用いたデバイスの製造方法
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JP3787417B2 (ja) * 1997-06-11 2006-06-21 キヤノン株式会社 電子ビーム露光方法及び電子ビーム露光装置
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Also Published As

Publication number Publication date
EP0266203B1 (de) 1994-07-06
DE3750174T2 (de) 1994-11-17
US4974919A (en) 1990-12-04
EP0266203A3 (en) 1988-12-21
EP0266203A2 (de) 1988-05-04

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