DE3784963D1 - Optisches projektionssystem. - Google Patents

Optisches projektionssystem.

Info

Publication number: DE3784963D1
Authority: DE; Germany
Prior art keywords: projection system; optical projection; optical; projection
Prior art date: 1986-05-02
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

DE8787106243T

Other languages

English (en)

Other versions

DE3784963T2 (de

Inventor

Takeo Sato

Nobuhiro Araki

Koichi Kawata

Noboru Nomura

Atsushi Ueno

Shotaro Yoshida

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Panasonic Holdings Corp

Original Assignee

Matsushita Electric Industrial Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1986-05-02

Filing date

1987-04-29

Publication date

1993-04-29

1986-05-02 Priority claimed from JP10233686A external-priority patent/JPS62258414A/ja

1986-07-07 Priority claimed from JP61159050A external-priority patent/JPS6314112A/ja

1987-04-29 Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd

1993-04-29 Publication of DE3784963D1 publication Critical patent/DE3784963D1/de

1993-07-15 Application granted granted Critical

1993-07-15 Publication of DE3784963T2 publication Critical patent/DE3784963T2/de

2007-04-30 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Links

Classifications

- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0852—Catadioptric systems having a field corrector only
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0804—Catadioptric systems using two curved mirrors
- G02B17/0808—Catadioptric systems using two curved mirrors on-axis systems with at least one of the mirrors having a central aperture
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements

DE8787106243T 1986-05-02 1987-04-29 Optisches projektionssystem. Expired - Fee Related DE3784963T2 (de)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JP10233686A JPS62258414A (ja)	1986-05-02	1986-05-02	精密複写用投影光学系
JP61159050A JPS6314112A (ja)	1986-07-07	1986-07-07	微細パタ−ン投影光学系

Publications (2)

Publication Number	Publication Date
DE3784963D1 true DE3784963D1 (de)	1993-04-29
DE3784963T2 DE3784963T2 (de)	1993-07-15

Family

ID=26443043

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE8787106243T Expired - Fee Related DE3784963T2 (de)	1986-05-02	1987-04-29	Optisches projektionssystem.

Country Status (3)

Country	Link
US (1)	US4757354A (de)
EP (1)	EP0243950B1 (de)
DE (1)	DE3784963T2 (de)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2754570B2 (ja) *	1988-05-16	1998-05-20	ミノルタ株式会社	オートフォーカス可能な反射望遠レンズ鏡胴
US5003345A (en) *	1989-12-27	1991-03-26	General Signal Corporation	Apparatus and method for aligning and focusing an image of a reticle onto a semiconductor wafer
US5136413A (en) *	1990-11-05	1992-08-04	Litel Instruments	Imaging and illumination system with aspherization and aberration correction by phase steps
US5291339A (en) *	1990-11-30	1994-03-01	Olympus Optical Co., Ltd.	Schwarzschild optical system
US5287218A (en) *	1992-04-07	1994-02-15	Hughes Aircraft Company	Re-imaging optical system including refractive and diffractive optical elements
US5448410A (en) *	1992-07-31	1995-09-05	International Business Machines Corporation	Variable magnification laser imaging system
JPH09311278A (ja)	1996-05-20	1997-12-02	Nikon Corp	反射屈折光学系
JP3395801B2 (ja)	1994-04-28	2003-04-14	株式会社ニコン	反射屈折投影光学系、走査型投影露光装置、及び走査投影露光方法
USRE38438E1 (en)	1994-08-23	2004-02-24	Nikon Corporation	Catadioptric reduction projection optical system and exposure apparatus having the same
JPH08179204A (ja) *	1994-11-10	1996-07-12	Nikon Corp	投影光学系及び投影露光装置
JP3454390B2 (ja)	1995-01-06	2003-10-06	株式会社ニコン	投影光学系、投影露光装置及び投影露光方法
JP2000081367A (ja) *	1998-09-07	2000-03-21	Nikon Corp	光透過性光学部材、その製造方法、その評価方法、および光リソグラフィー装置
KR20000034967A (ko)	1998-11-30	2000-06-26	헨켈 카르스텐	수정-렌즈를 갖는 오브젝티브 및 투사 조명 장치
US7151592B2 (en) *	1999-02-15	2006-12-19	Carl Zeiss Smt Ag	Projection system for EUV lithography
DE50012452D1 (de)	1999-12-29	2006-05-11	Zeiss Carl Smt Ag	Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen
TW538256B (en) *	2000-01-14	2003-06-21	Zeiss Stiftung	Microlithographic reduction projection catadioptric objective
WO2002044786A2 (en) *	2000-11-28	2002-06-06	Carl Zeiss Smt Ag	Catadioptric projection system for 157 nm lithography
JP2001228401A (ja) *	2000-02-16	2001-08-24	Canon Inc	投影光学系、および該投影光学系による投影露光装置、デバイス製造方法
KR20010113527A (ko) *	2000-06-19	2001-12-28	시마무라 테루오	투영 광학계, 그 제조 방법 및 투영 노광 장치
JP2002083766A (ja)	2000-06-19	2002-03-22	Nikon Corp	投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置
KR100831706B1 (ko) *	2001-01-09	2008-05-22	칼 짜이스 에스엠티 에이지	극자외선 리소그라피를 위한 투영시스템
EP1615076A1 (de) *	2001-01-09	2006-01-11	Carl Zeiss SMT AG	Projektionssystem für die extrem-ultraviolettlithographie
US8208198B2 (en)	2004-01-14	2012-06-26	Carl Zeiss Smt Gmbh	Catadioptric projection objective
US7466489B2 (en) *	2003-12-15	2008-12-16	Susanne Beder	Projection objective having a high aperture and a planar end surface
WO2005059645A2 (en) *	2003-12-19	2005-06-30	Carl Zeiss Smt Ag	Microlithography projection objective with crystal elements
US20080151365A1 (en) *	2004-01-14	2008-06-26	Carl Zeiss Smt Ag	Catadioptric projection objective
KR101179350B1 (ko)	2004-01-14	2012-09-11	칼 짜이스 에스엠티 게엠베하	반사굴절식 투영 대물렌즈
US7463422B2 (en) *	2004-01-14	2008-12-09	Carl Zeiss Smt Ag	Projection exposure apparatus
KR20050080376A (ko) *	2004-02-09	2005-08-12	삼성전자주식회사	투사광학계 및 그것을 갖는 화상 투사 장치
US7712905B2 (en)	2004-04-08	2010-05-11	Carl Zeiss Smt Ag	Imaging system with mirror group
WO2005111689A2 (en)	2004-05-17	2005-11-24	Carl Zeiss Smt Ag	Catadioptric projection objective with intermediate images
JP2006119490A (ja) *	2004-10-25	2006-05-11	Canon Inc	反射屈折型投影光学系及び当該反射屈折型投影光学系を有する露光装置、デバイス製造方法
JP2008532273A (ja) *	2005-02-25	2008-08-14	カールツァイスエスエムテーアクチエンゲゼルシャフト	マイクロ・リソグラフィー投影露光装置のための光学システム
US20080112927A1 (en) *	2006-10-23	2008-05-15	Genegrafts Ltd.	Cells and methods utilizing same for modifying the electrophysiological function of excitable tissues
US7633689B2 (en) *	2007-07-18	2009-12-15	Asml Holding N.V.	Catadioptric optical system for scatterometry
TWI640809B (zh)	2017-05-19	2018-11-11	大立光電股份有限公司	攝影鏡片系統、取像裝置及電子裝置
CN112764196B (zh) *	2021-01-08	2022-03-11	广景视睿科技（深圳）有限公司	一种双远心投影镜头及汽车的抬头显示装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB618253A (en) *	1946-05-01	1949-02-18	Wray Optical Works Ltd	Improvements in or relating to optical objectives
US2520633A (en) *	1948-10-20	1950-08-29	Polaroid Corp	Optical system
US3748015A (en) *	1971-06-21	1973-07-24	Perkin Elmer Corp	Unit power imaging catoptric anastigmat
JPS5951229B2 (ja) *	1978-07-11	1984-12-12	マブチモ−タ−株式会社	直流電動機のブリツジ式ガバナ−起動回路
JPS5712966A (en) *	1980-06-21	1982-01-22	Tomie Numahata	Mixed cake from rice and barley
CA1171555A (en) *	1981-05-15	1984-07-24	Ronald S. Hershel	Apparatus for projecting a series of images onto dies of a semiconductor wafer
JPS5825637A (ja) *	1981-08-08	1983-02-15	Canon Inc	投影焼付装置
US4600265A (en) *	1983-01-27	1986-07-15	Pilkington P.E. Limited	Infra-red optical systems

1987
- 1987-04-28 US US07/043,620 patent/US4757354A/en not_active Expired - Fee Related
- 1987-04-29 EP EP87106243A patent/EP0243950B1/de not_active Expired - Lifetime
- 1987-04-29 DE DE8787106243T patent/DE3784963T2/de not_active Expired - Fee Related

Also Published As

Publication number	Publication date
EP0243950B1 (de)	1993-03-24
EP0243950A3 (en)	1989-02-08
US4757354A (en)	1988-07-12
EP0243950A2 (de)	1987-11-04
DE3784963T2 (de)	1993-07-15

Legal Events

Date	Code	Title
1994-04-21	8364	No opposition during term of opposition
1996-02-29	8320	Willingness to grant licences declared (paragraph 23)
2004-02-12	8339	Ceased/non-payment of the annual fee

Publication	Publication Date	Title
DE3784963T2 (de)	1993-07-15	Optisches projektionssystem.
DE3783393D1 (de)	1993-02-18	Optisches plattentellersystem.
DE68916451D1 (de)	1994-08-04	Optisches Projektionssystem.
DE3771517D1 (de)	1991-08-29	Rueckprojektionssystem.
DE69113715T2 (de)	1996-05-30	Optisches Projektionssystem.
DE69023445T2 (de)	1996-06-05	Projektionssystem.
FI875790A0 (fi)	1987-12-31	Skyddade optiska blekmedel.
DE3860235D1 (de)	1990-07-19	Optisches schaltsystem.
DE3784134T2 (de)	1993-08-19	Kompaktes optisches abtastsystem.
DE69020625D1 (de)	1995-08-10	Optisches System.
DE3774159D1 (de)	1991-12-05	Licht-abtastsystem.
FI875517A0 (fi)	1987-12-16	Optiska blekningsmedel innehaollande pappersbestrykningsmassor.
DE3782278T2 (de)	1993-03-11	Optisches kommunikationssystem.
DE3785616D1 (de)	1993-06-03	Asphaerische einzellinse.
DE68907612D1 (de)	1993-08-19	Optisches system.
DE3785938T2 (de)	1994-01-05	Optisches System.
DE3776010D1 (de)	1992-02-27	Kopiersystem.
DE3668380D1 (de)	1990-02-22	Projektionsobjektiv.
DE3785565D1 (de)	1993-05-27	Gas-zoomlinsensystem.
DE3674222D1 (de)	1990-10-25	Projektionsobjektiv.
DE3772467D1 (de)	1991-10-02	Belichtungssystem.
NO913002D0 (no)	1991-08-01	Optisk system.
FI882655A (fi)	1988-06-06	Optisk mottagare.
DK78588D0 (da)	1988-02-16	Optisk system
DE3889250D1 (de)	1994-06-01	Autofokussystem.