DE50012452D1 - Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen - Google Patents
Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächenInfo
- Publication number
- DE50012452D1 DE50012452D1 DE50012452T DE50012452T DE50012452D1 DE 50012452 D1 DE50012452 D1 DE 50012452D1 DE 50012452 T DE50012452 T DE 50012452T DE 50012452 T DE50012452 T DE 50012452T DE 50012452 D1 DE50012452 D1 DE 50012452D1
- Authority
- DE
- Germany
- Prior art keywords
- lens
- aspharic
- adjustable
- projection lens
- projection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
- G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/18—Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/12—Fluid-filled or evacuated lenses
- G02B3/14—Fluid-filled or evacuated lenses of variable focal length
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
- G03F7/70966—Birefringence
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE50012452T DE50012452D1 (de) | 1999-12-29 | 2000-12-22 | Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen |
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US17352399P | 1999-12-29 | 1999-12-29 | |
DE2000102626 DE10002626A1 (de) | 2000-01-22 | 2000-01-22 | Katadioptrisches Objektiv mit Asphären |
DE10021739 | 2000-05-04 | ||
DE50012452T DE50012452D1 (de) | 1999-12-29 | 2000-12-22 | Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen |
PCT/EP2000/013148 WO2001050171A1 (de) | 1999-12-29 | 2000-12-22 | Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen |
Publications (1)
Publication Number | Publication Date |
---|---|
DE50012452D1 true DE50012452D1 (de) | 2006-05-11 |
Family
ID=27213593
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE50012452T Expired - Fee Related DE50012452D1 (de) | 1999-12-29 | 2000-12-22 | Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen |
Country Status (6)
Country | Link |
---|---|
US (3) | US6646718B2 (de) |
EP (1) | EP1242843B1 (de) |
JP (1) | JP2003535356A (de) |
KR (1) | KR100854052B1 (de) |
DE (1) | DE50012452D1 (de) |
WO (1) | WO2001050171A1 (de) |
Families Citing this family (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19939088A1 (de) * | 1998-08-18 | 2000-02-24 | Nikon Corp | Belichtungsvorrichtung und -verfahren |
EP1094350A3 (de) | 1999-10-21 | 2001-08-16 | Carl Zeiss | Optisches Projektionslinsensystem |
EP1242843B1 (de) * | 1999-12-29 | 2006-03-22 | Carl Zeiss SMT AG | Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen |
EP1344112A2 (de) * | 2000-12-22 | 2003-09-17 | Carl Zeiss SMT AG | Projektionsobjektiv |
JP2004516526A (ja) * | 2000-12-22 | 2004-06-03 | カール ツァイス エスエムテー アクチエンゲゼルシャフト | 少なくとも1つの非球面レンズを有するレンズ系 |
JP2002244034A (ja) | 2001-02-21 | 2002-08-28 | Nikon Corp | 投影光学系および該投影光学系を備えた露光装置 |
JP2002323652A (ja) | 2001-02-23 | 2002-11-08 | Nikon Corp | 投影光学系,該投影光学系を備えた投影露光装置および投影露光方法 |
US7239447B2 (en) * | 2001-05-15 | 2007-07-03 | Carl Zeiss Smt Ag | Objective with crystal lenses |
EP1390783A2 (de) * | 2001-05-15 | 2004-02-25 | Carl Zeiss | Objektiv mit fluorid-kristall-linsen |
DE10123725A1 (de) | 2001-05-15 | 2002-11-21 | Zeiss Carl | Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren |
DE10151309A1 (de) * | 2001-10-17 | 2003-05-08 | Carl Zeiss Semiconductor Mfg S | Projektionsbelichtungsanlage der Mikrolithographie für Lambda <200 nm |
DE10162796B4 (de) * | 2001-12-20 | 2007-10-31 | Carl Zeiss Smt Ag | Verfahren zur Optimierung der Abbildungseigenschaften von mindestens zwei optischen Elementen sowie photolithographisches Fertigungsverfahren |
AU2003210214A1 (en) * | 2002-03-01 | 2003-09-16 | Carl Zeiss Smt Ag | Refractive projection lens |
US7190527B2 (en) | 2002-03-01 | 2007-03-13 | Carl Zeiss Smt Ag | Refractive projection objective |
US20050094268A1 (en) * | 2002-03-14 | 2005-05-05 | Carl Zeiss Smt Ag | Optical system with birefringent optical elements |
US7292388B2 (en) | 2002-05-08 | 2007-11-06 | Carl Zeiss Smt Ag | Lens made of a crystalline material |
AU2003258519A1 (en) * | 2002-07-18 | 2004-02-09 | Carl Zeiss Smt Ag | Catadioptric projection objective |
WO2004023184A1 (en) * | 2002-09-03 | 2004-03-18 | Carl Zeiss Smt Ag | Objective with birefringent lenses |
WO2004023172A1 (de) | 2002-09-03 | 2004-03-18 | Carl Zeiss Smt Ag | Optimierverfahren für ein objektiv mit fluorid-kristall-linsen sowie objektiv mit fluorid-kristall-linsen |
EP1537449A1 (de) * | 2002-09-09 | 2005-06-08 | Carl Zeiss SMT AG | Katadioptrisches projektionsobjektiv sowie verfahren zur kompensation der intrinsischen doppelbrechung in einem solchen |
TWI305872B (en) * | 2003-03-17 | 2009-02-01 | Nikon Corp | Optical projection system, light-exposure apparatus and light-exposure method |
JP2005017734A (ja) * | 2003-06-26 | 2005-01-20 | Nikon Corp | 投影光学系、露光装置、およびデバイス製造方法 |
US7085075B2 (en) * | 2003-08-12 | 2006-08-01 | Carl Zeiss Smt Ag | Projection objectives including a plurality of mirrors with lenses ahead of mirror M3 |
US7551361B2 (en) | 2003-09-09 | 2009-06-23 | Carl Zeiss Smt Ag | Lithography lens system and projection exposure system provided with at least one lithography lens system of this type |
US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
US7177087B2 (en) * | 2003-10-28 | 2007-02-13 | Leupold & Stevens, Inc. | Compound asperic ocular for riflescope |
US7385764B2 (en) | 2003-12-15 | 2008-06-10 | Carl Zeiss Smt Ag | Objectives as a microlithography projection objective with at least one liquid lens |
US20080151365A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
CN100592210C (zh) | 2004-02-13 | 2010-02-24 | 卡尔蔡司Smt股份公司 | 微平版印刷投影曝光装置的投影物镜 |
KR20170028451A (ko) | 2004-05-17 | 2017-03-13 | 칼 짜이스 에스엠티 게엠베하 | 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 |
US7511798B2 (en) | 2004-07-30 | 2009-03-31 | Asml Holding N.V. | Off-axis catadioptric projection optical system for lithography |
US7301707B2 (en) * | 2004-09-03 | 2007-11-27 | Carl Zeiss Smt Ag | Projection optical system and method |
TW200616043A (en) * | 2004-11-10 | 2006-05-16 | Nikon Corp | Optical projection system, exposure apparatus, exposure method and method of fabricating devices |
TWI454731B (zh) * | 2005-05-27 | 2014-10-01 | Zeiss Carl Smt Gmbh | 用於改進投影物鏡的成像性質之方法以及該投影物鏡 |
EP1746463A2 (de) * | 2005-07-01 | 2007-01-24 | Carl Zeiss SMT AG | Verfahren zum Korrigieren eines lithographischen Projektionsobjektivs und derartiges Projektionsobjektiv |
TWI305107B (en) * | 2005-09-29 | 2009-01-01 | Young Optics Inc | Optical projection apparatus |
DE102008015775A1 (de) | 2007-04-16 | 2008-12-18 | Carl Zeiss Smt Ag | Chromatisch korrigiertes Lithographieobjektiv |
US7929115B2 (en) * | 2007-06-01 | 2011-04-19 | Carl Zeiss Smt Gmbh | Projection objective and projection exposure apparatus for microlithography |
JP5661172B2 (ja) * | 2010-04-23 | 2015-01-28 | カール・ツァイス・エスエムティー・ゲーエムベーハー | リソグラフィ系の光学要素の操作を含むリソグラフィ系を作動させる方法 |
Family Cites Families (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4871237A (en) * | 1983-07-27 | 1989-10-03 | Nikon Corporation | Method and apparatus for adjusting imaging performance of projection optical apparatus |
EP0237041B1 (de) * | 1986-03-12 | 1993-08-18 | Matsushita Electric Industrial Co., Ltd. | Optisches Projektionssystem für Präzisionskopien |
US4757354A (en) * | 1986-05-02 | 1988-07-12 | Matsushita Electrical Industrial Co., Ltd. | Projection optical system |
EP0332201B1 (de) * | 1988-03-11 | 1994-06-29 | Matsushita Electric Industrial Co., Ltd. | Optisches Projektionssystem |
SU1587461A1 (ru) | 1988-08-03 | 1990-08-23 | Предприятие П/Я Р-6495 | Проекционный объектив с увеличением -1/5 @ |
JP2548359B2 (ja) * | 1989-03-01 | 1996-10-30 | 松下電器産業株式会社 | 投影レンズとそれを用いたプロジェクションテレビ |
US4963007A (en) * | 1989-09-05 | 1990-10-16 | U.S. Precision Lens, Inc. | Color corrected projection lens |
JP3041939B2 (ja) * | 1990-10-22 | 2000-05-15 | 株式会社ニコン | 投影レンズ系 |
JP3454390B2 (ja) * | 1995-01-06 | 2003-10-06 | 株式会社ニコン | 投影光学系、投影露光装置及び投影露光方法 |
US5724121A (en) * | 1995-05-12 | 1998-03-03 | Hughes Danbury Optical Systems, Inc. | Mounting member method and apparatus with variable length supports |
JPH103039A (ja) * | 1996-06-14 | 1998-01-06 | Nikon Corp | 反射屈折光学系 |
DE69728126T2 (de) * | 1996-12-28 | 2005-01-20 | Canon K.K. | Projektionsbelichtungsapparat und Verfahren zur Herstellung einer Vorrichtung |
US5999331A (en) * | 1997-02-07 | 1999-12-07 | Minolta Co., Ltd. | Zoom lens system |
DE19818444A1 (de) * | 1997-04-25 | 1998-10-29 | Nikon Corp | Abbildungsoptik, Projektionsoptikvorrichtung und Projektionsbelichtungsverfahren |
JPH10325922A (ja) * | 1997-05-26 | 1998-12-08 | Nikon Corp | 投影光学系 |
US5990926A (en) * | 1997-07-16 | 1999-11-23 | Nikon Corporation | Projection lens systems for excimer laser exposure lithography |
JPH1195098A (ja) | 1997-09-16 | 1999-04-09 | Nitto Kogaku Kk | 投写用ズームレンズおよびプロジェクタ装置 |
JP4083856B2 (ja) * | 1998-02-18 | 2008-04-30 | リコー光学株式会社 | 投射用ズームレンズ |
US6166864A (en) * | 1998-03-10 | 2000-12-26 | Canon Kabushiki Kaisha | Zoom lens and optical apparatus using the same |
JP2000195772A (ja) * | 1998-12-25 | 2000-07-14 | Nikon Corp | 投影露光装置 |
EP1079253A4 (de) * | 1998-04-07 | 2004-09-01 | Nikon Corp | Vorrichtung und verfahren zur projektionsbelichtung, und optisches system mit reflektion und brechung |
DE19939088A1 (de) | 1998-08-18 | 2000-02-24 | Nikon Corp | Belichtungsvorrichtung und -verfahren |
JP4345232B2 (ja) * | 1998-12-25 | 2009-10-14 | 株式会社ニコン | 反射屈折結像光学系および該光学系を備えた投影露光装置 |
US6867922B1 (en) * | 1999-06-14 | 2005-03-15 | Canon Kabushiki Kaisha | Projection optical system and projection exposure apparatus using the same |
JP3423644B2 (ja) * | 1999-06-14 | 2003-07-07 | キヤノン株式会社 | 投影光学系及びそれを用いた投影露光装置 |
JP3359302B2 (ja) * | 1999-06-14 | 2002-12-24 | キヤノン株式会社 | 投影露光装置 |
JP4717974B2 (ja) * | 1999-07-13 | 2011-07-06 | 株式会社ニコン | 反射屈折光学系及び該光学系を備える投影露光装置 |
EP1094350A3 (de) * | 1999-10-21 | 2001-08-16 | Carl Zeiss | Optisches Projektionslinsensystem |
EP1242843B1 (de) * | 1999-12-29 | 2006-03-22 | Carl Zeiss SMT AG | Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen |
US6542723B1 (en) * | 2000-02-11 | 2003-04-01 | Lucent Technologies Inc. | Optoelectronic phase locked loop with balanced photodetection for clock recovery in high-speed optical time division multiplexed systems |
-
2000
- 2000-12-22 EP EP00985239A patent/EP1242843B1/de not_active Expired - Lifetime
- 2000-12-22 DE DE50012452T patent/DE50012452D1/de not_active Expired - Fee Related
- 2000-12-22 KR KR1020027008352A patent/KR100854052B1/ko not_active IP Right Cessation
- 2000-12-22 JP JP2001550065A patent/JP2003535356A/ja active Pending
- 2000-12-22 WO PCT/EP2000/013148 patent/WO2001050171A1/de active Search and Examination
-
2002
- 2002-06-24 US US10/177,580 patent/US6646718B2/en not_active Expired - Lifetime
-
2003
- 2003-11-07 US US10/702,501 patent/US6903802B2/en not_active Expired - Fee Related
-
2005
- 2005-03-15 US US11/079,225 patent/US7154678B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US20050157400A1 (en) | 2005-07-21 |
EP1242843A1 (de) | 2002-09-25 |
WO2001050171A1 (de) | 2001-07-12 |
US20030179356A1 (en) | 2003-09-25 |
US6646718B2 (en) | 2003-11-11 |
US7154678B2 (en) | 2006-12-26 |
KR100854052B1 (ko) | 2008-08-26 |
US20040233409A1 (en) | 2004-11-25 |
JP2003535356A (ja) | 2003-11-25 |
EP1242843B1 (de) | 2006-03-22 |
KR20020064364A (ko) | 2002-08-07 |
US6903802B2 (en) | 2005-06-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |