DE50013163D1 - Anlage zur bearbeitung von wafern - Google Patents

Anlage zur bearbeitung von wafern

Info

Publication number
DE50013163D1
DE50013163D1 DE50013163T DE50013163T DE50013163D1 DE 50013163 D1 DE50013163 D1 DE 50013163D1 DE 50013163 T DE50013163 T DE 50013163T DE 50013163 T DE50013163 T DE 50013163T DE 50013163 D1 DE50013163 D1 DE 50013163D1
Authority
DE
Germany
Prior art keywords
wafern
appendix
machining
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE50013163T
Other languages
English (en)
Inventor
Michael Goetzke
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Infineon Technologies AG
Original Assignee
Infineon Technologies AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Infineon Technologies AG filed Critical Infineon Technologies AG
Priority to DE50013163T priority Critical patent/DE50013163D1/de
Application granted granted Critical
Publication of DE50013163D1 publication Critical patent/DE50013163D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67271Sorting devices
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00Material or article handling
    • Y10S414/135Associated with semiconductor wafer handling
    • Y10S414/14Wafer cassette transporting
DE50013163T 1999-05-07 2000-05-05 Anlage zur bearbeitung von wafern Expired - Fee Related DE50013163D1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE50013163T DE50013163D1 (de) 1999-05-07 2000-05-05 Anlage zur bearbeitung von wafern

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19921243A DE19921243C2 (de) 1999-05-07 1999-05-07 Anlage zur Bearbeitung von Wafern
PCT/DE2000/001450 WO2000068971A2 (de) 1999-05-07 2000-05-05 Anlage zur bearbeitung von wafern
DE50013163T DE50013163D1 (de) 1999-05-07 2000-05-05 Anlage zur bearbeitung von wafern

Publications (1)

Publication Number Publication Date
DE50013163D1 true DE50013163D1 (de) 2006-08-24

Family

ID=7907409

Family Applications (2)

Application Number Title Priority Date Filing Date
DE19921243A Expired - Fee Related DE19921243C2 (de) 1999-05-07 1999-05-07 Anlage zur Bearbeitung von Wafern
DE50013163T Expired - Fee Related DE50013163D1 (de) 1999-05-07 2000-05-05 Anlage zur bearbeitung von wafern

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE19921243A Expired - Fee Related DE19921243C2 (de) 1999-05-07 1999-05-07 Anlage zur Bearbeitung von Wafern

Country Status (7)

Country Link
US (1) US6670568B2 (de)
EP (1) EP1177572B1 (de)
JP (1) JP2002544661A (de)
KR (1) KR100444741B1 (de)
DE (2) DE19921243C2 (de)
TW (1) TW513371B (de)
WO (1) WO2000068971A2 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002289671A (ja) * 2001-03-28 2002-10-04 Toshiba Corp 半導体製造装置及び半導体装置の製造システム
DE10128665A1 (de) * 2001-06-15 2003-01-02 Infineon Technologies Ag Verfahren und Vorrichtung zur Bearbeitung von Waferlosen in der Halbleiterfertigung
KR20030017933A (ko) * 2001-08-25 2003-03-04 엘지.필립스 엘시디 주식회사 액정디스플레이의 선 분류 장비
US20050139525A1 (en) * 2003-11-28 2005-06-30 Tung-Hung Tsai Chip sorting apparatus and method for fabricating the same
US7101138B2 (en) * 2003-12-03 2006-09-05 Brooks Automation, Inc. Extractor/buffer
CN1954275B (zh) * 2004-08-06 2010-05-05 平田机工株式会社 生产系统
TWI275814B (en) * 2005-07-22 2007-03-11 King Yuan Electronics Co Ltd Electronic component testing apparatus
US7501809B2 (en) * 2005-09-22 2009-03-10 King Yuan Electronics Co., Ltd. Electronic component handling and testing apparatus and method for electronic component handling and testing
JP4765899B2 (ja) * 2006-11-07 2011-09-07 凸版印刷株式会社 ガラス基板の移載装置
JP4670808B2 (ja) * 2006-12-22 2011-04-13 ムラテックオートメーション株式会社 コンテナの搬送システム及び測定用コンテナ
KR100830838B1 (ko) * 2006-12-27 2008-05-20 주식회사 케이씨텍 반도체 기판의 습식세정장치
JP4877075B2 (ja) * 2007-05-29 2012-02-15 東京エレクトロン株式会社 塗布、現像装置及び塗布、現像装置の運転方法並びに記憶媒体
DE102007025339A1 (de) * 2007-05-31 2008-12-04 Advanced Micro Devices, Inc., Sunnyvale Verfahren und System zum Entfernen leerer Trägerbehälter von Prozessanlagen durch Steuern einer Zuordnung zwischen Steuerungsaufgaben und Trägerbehälter
KR100836070B1 (ko) * 2007-07-27 2008-06-09 세메스 주식회사 반도체 제조에서의 공정 표시 방법
JP5115501B2 (ja) * 2009-03-12 2013-01-09 株式会社Ihi 基板仕分け装置及び基板仕分け方法
ITUD20090156A1 (it) * 2009-09-03 2011-03-04 Applied Materials Inc Apparato di lavorazione substrati comprendente un dispositivo per la manipolazione di substrati danneggiati
JP5748452B2 (ja) * 2010-11-15 2015-07-15 キヤノン株式会社 部品組立システム
DE102016125278A1 (de) * 2016-12-14 2018-06-14 Schneider Gmbh & Co. Kg Vorrichtung, Verfahren und Verwendung zur Beschichtung von Linsen
CN114671232B (zh) * 2022-04-08 2023-07-07 珠海格力电器股份有限公司 隧道式自动进出箱检漏系统及其工作方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2210996A (en) * 1987-10-09 1989-06-21 Plessey Co Plc Contents verification apparatus
DE3735449A1 (de) * 1987-10-20 1989-05-03 Convac Gmbh Fertigungssystem fuer halbleitersubstrate
GB2249868B (en) * 1990-11-15 1994-11-30 Sgs Thompson Microelectronics Improvements in or relating to a testing and finishing system for integrated circuit package units
JP3189326B2 (ja) * 1990-11-21 2001-07-16 セイコーエプソン株式会社 生産管理装置および該装置を用いた生産管理方法
TW287235B (de) * 1994-06-30 1996-10-01 Zenshin Test Co
JP3185595B2 (ja) * 1995-04-03 2001-07-11 株式会社ダイフク 基板仕分け装置を備えた荷保管設備
DE19514037C2 (de) * 1995-04-13 1997-09-04 Leybold Ag Transportvorrichtung
DE19652254C1 (de) * 1996-12-16 1998-03-05 Herbert Amrhein Markierungsmittel zur Kennzeichnung der Anschlüsse integrierter elektronischer Bausteine
US5972727A (en) * 1998-06-30 1999-10-26 Advanced Micro Devices Reticle sorter
NL1010317C2 (nl) * 1998-10-14 2000-05-01 Asm Int Sorteer/opslaginrichting voor wafers en werkwijze voor het hanteren daarvan.
US6137303A (en) * 1998-12-14 2000-10-24 Sony Corporation Integrated testing method and apparatus for semiconductor test operations processing
US6300584B1 (en) * 1998-12-23 2001-10-09 Mirae Corporation Loading/unloading control apparatus of semiconductor device and control method thereof
DE19900804C2 (de) * 1999-01-12 2000-10-19 Siemens Ag Fördersystem
US6403905B1 (en) * 2000-02-02 2002-06-11 Advanced Micro Devices, Inc. Reticle stocking and sorting management system

Also Published As

Publication number Publication date
TW513371B (en) 2002-12-11
WO2000068971A2 (de) 2000-11-16
EP1177572A2 (de) 2002-02-06
DE19921243A1 (de) 2000-11-16
US6670568B2 (en) 2003-12-30
DE19921243C2 (de) 2002-12-05
EP1177572B1 (de) 2006-07-12
WO2000068971A3 (de) 2001-04-26
KR20020010636A (ko) 2002-02-04
JP2002544661A (ja) 2002-12-24
KR100444741B1 (ko) 2004-08-16
US20020060172A1 (en) 2002-05-23

Similar Documents

Publication Publication Date Title
DE50010774D1 (de) Anlage zur bearbeitung von wafern
DE50013866D1 (de) Anlage zur bearbeitung von wafern
CY2006003I1 (el) Χρηση δαπτομυκινης
PT1181017E (pt) Inibidores de metaloproteases
AR028253A1 (es) Inhibidores de la glucogeno fosforilasa
ATE307112T1 (de) N-substituierte 2-cyanopyrrolidine
DE50013163D1 (de) Anlage zur bearbeitung von wafern
NO990113D0 (no) Flerskrog-fart°y
PT1194404E (pt) Inibidores de aspartil-protease
DE50009640D1 (de) Drehmaschine
PT1218096E (pt) Microcapsulas de libertacao variavel
PT1163256E (pt) Hemi-hidrato de 16-alfa-bromoepiandrosterona
PT1235566E (pt) Formulacao injectavel de valnemulina
ID28032A (id) TRISIKLIK PIPERIDIN-Δ3-SEBAGAI ANTAGONIS-α2
DE50012862D1 (de) Anlage zur bearbeitung von wafern
FI982378A0 (fi) Järjestely kohteen tutkimiseen
DE50001057D1 (de) Werkzeug zur zerspanenden bearbeitung
DE69930017D1 (de) Glaskeramischer körper
DE59910200D1 (de) Kühlbares Bauteil
DE50012861D1 (de) Anlage zur fertigung von halbleiterprodukten
PT1077945E (pt) Isoquinolinas como inibidores de uroquinase
FI980856A0 (fi) Andningsskydd utrustad med en identifierare
PT1232141E (pt) Eteres de o-desmetil-venlafaxina
DE29817746U1 (de) Halteteil
DE29811713U1 (de) Bauelement

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee