DE50014657D1 - Vorrichtung zum behandeln von substraten - Google Patents

Vorrichtung zum behandeln von substraten

Info

Publication number
DE50014657D1
DE50014657D1 DE50014657T DE50014657T DE50014657D1 DE 50014657 D1 DE50014657 D1 DE 50014657D1 DE 50014657 T DE50014657 T DE 50014657T DE 50014657 T DE50014657 T DE 50014657T DE 50014657 D1 DE50014657 D1 DE 50014657D1
Authority
DE
Germany
Prior art keywords
substrates
treatment fluid
treating substrates
process container
treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE50014657T
Other languages
English (en)
Inventor
Ulrich Speh
Jens Schneider
Marc Meuris
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Interuniversitair Microelektronica Centrum vzw IMEC
Original Assignee
Interuniversitair Microelektronica Centrum vzw IMEC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Interuniversitair Microelektronica Centrum vzw IMEC filed Critical Interuniversitair Microelektronica Centrum vzw IMEC
Application granted granted Critical
Publication of DE50014657D1 publication Critical patent/DE50014657D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer
DE50014657T 1999-07-21 2000-07-14 Vorrichtung zum behandeln von substraten Expired - Lifetime DE50014657D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19934300A DE19934300C2 (de) 1999-07-21 1999-07-21 Vorrichtung zum Behandeln von Substraten
PCT/EP2000/006716 WO2001008200A1 (de) 1999-07-21 2000-07-14 Vorrichtung zum behandeln von substraten

Publications (1)

Publication Number Publication Date
DE50014657D1 true DE50014657D1 (de) 2007-10-25

Family

ID=7915611

Family Applications (2)

Application Number Title Priority Date Filing Date
DE19934300A Expired - Fee Related DE19934300C2 (de) 1999-07-21 1999-07-21 Vorrichtung zum Behandeln von Substraten
DE50014657T Expired - Lifetime DE50014657D1 (de) 1999-07-21 2000-07-14 Vorrichtung zum behandeln von substraten

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE19934300A Expired - Fee Related DE19934300C2 (de) 1999-07-21 1999-07-21 Vorrichtung zum Behandeln von Substraten

Country Status (8)

Country Link
US (1) US6799588B1 (de)
EP (1) EP1208586B1 (de)
JP (1) JP4651252B2 (de)
KR (1) KR20020063157A (de)
AT (1) ATE373316T1 (de)
DE (2) DE19934300C2 (de)
TW (1) TW487960B (de)
WO (1) WO2001008200A1 (de)

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US20010013355A1 (en) * 1998-10-14 2001-08-16 Busnaina Ahmed A. Fast single-article megasonic cleaning process for single-sided or dual-sided cleaning
DE10103111A1 (de) * 2001-01-24 2002-08-01 Mattson Wet Products Gmbh Vorrichtung zum Behandeln von Substraten
US20040031167A1 (en) * 2002-06-13 2004-02-19 Stein Nathan D. Single wafer method and apparatus for drying semiconductor substrates using an inert gas air-knife
US8813764B2 (en) * 2009-05-29 2014-08-26 Lam Research Corporation Method and apparatus for physical confinement of a liquid meniscus over a semiconductor wafer
US8317934B2 (en) * 2009-05-13 2012-11-27 Lam Research Corporation Multi-stage substrate cleaning method and apparatus
DE102009029945A1 (de) 2009-06-19 2010-12-23 Rena Gmbh Prozessmodul zur Inline-Behandlung von Substraten
NL1037065C2 (nl) * 2009-06-23 2010-12-27 Edward Bok Stripvormige transducer-opstelling, welke is opgenomen in een stripvormig gedeelte van een tunnelblok van een semiconductor substraat transfer/behandelings-tunnelopstelling ten behoeve van het daarmede tenminste mede plaatsvinden van een semiconductor behandeling van de opvolgende semiconductor substraat-gedeeltes, welke gedurende de werking ervan ononderbroken erlangs verplaatsen.
TWI460305B (zh) * 2010-11-30 2014-11-11 Ind Tech Res Inst 化學水浴法鍍膜設備
US20120160264A1 (en) * 2010-12-23 2012-06-28 Richard Endo Wet Processing Tool with Site Isolation
JP2012161781A (ja) * 2011-02-08 2012-08-30 Shigeo Matsueda 超音波薬液反応装置
JP6659368B2 (ja) * 2016-01-15 2020-03-04 株式会社荏原製作所 洗浄装置、基板処理装置、および基板処理方法

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US4282825A (en) * 1978-08-02 1981-08-11 Hitachi, Ltd. Surface treatment device
JPS6054263B2 (ja) * 1981-03-25 1985-11-29 日本電気株式会社 高誘電率磁器組成物
JPS6115238Y2 (de) * 1981-04-06 1986-05-12
JPS60798B2 (ja) * 1981-06-09 1985-01-10 株式会社石井表記 超音波洗滌装置
JPS587830A (ja) * 1981-07-08 1983-01-17 Hitachi Ltd 薄片状物品の洗浄方法及び装置
SE440719B (sv) * 1983-06-17 1985-08-12 Holmstrands Plaatindustri Ab Sett och anordning vid rengoring av kretskort, som tidigare underkastats en lodningsoperation med flussmedel
JPS609129A (ja) * 1983-06-29 1985-01-18 Fujitsu Ltd ウエツト処理装置
US4722355A (en) * 1985-08-19 1988-02-02 Rolf Moe Machine and method for stripping photoresist from wafers
US4724856A (en) * 1986-03-17 1988-02-16 Pender Don P Dynamic flood conveyor
JPH0320031A (ja) * 1989-06-16 1991-01-29 Matsushita Electron Corp 超音波洗浄装置
JPH0394428A (ja) * 1989-09-06 1991-04-19 Mitsubishi Electric Corp 半導体ウエハの洗浄方法
US5007445A (en) * 1990-02-26 1991-04-16 Advanced Systems Incorporated Dynamic flood conveyor with weir
JPH0430521A (ja) * 1990-05-28 1992-02-03 Dainippon Screen Mfg Co Ltd 基板用回転式表面処理装置
JPH0459086A (ja) * 1990-06-25 1992-02-25 Hitachi Ltd 洗浄装置
JP3249551B2 (ja) * 1990-08-31 2002-01-21 沖電気工業株式会社 洗浄方法
DE4121032A1 (de) * 1991-06-26 1993-01-07 Schmid Gmbh & Co Geb Vorrichtung zum behandeln von plattenfoermigen gegenstaenden, insbesondere leiterplatten
JP2594577Y2 (ja) * 1991-09-11 1999-04-26 芝浦メカトロニクス株式会社 基板のディップ処理装置
JPH05182945A (ja) * 1991-12-27 1993-07-23 Hitachi Ltd 洗浄装置
JP3030313B2 (ja) * 1992-02-12 2000-04-10 住特フェライト株式会社 連続超音波洗浄装置
JP2897537B2 (ja) * 1992-06-16 1999-05-31 日本電気株式会社 基板洗浄装置
US5503171A (en) * 1992-12-26 1996-04-02 Tokyo Electron Limited Substrates-washing apparatus
JP3248654B2 (ja) * 1994-08-08 2002-01-21 東京エレクトロン株式会社 洗浄装置
US5553700A (en) * 1995-04-10 1996-09-10 Atotech Usa, Inc. Treatment method and apparatus for printed circuit boards and the like
JPH0919665A (ja) * 1995-07-04 1997-01-21 Shibaura Eng Works Co Ltd 超音波洗浄装置
DE19524523A1 (de) * 1995-07-05 1997-01-09 Atotech Deutschland Gmbh Anwendung eines Verfahrens und einer Vorrichtung zum Behandeln von Fluiden in der Leiterplattentechnik
CN1114779C (zh) * 1995-10-19 2003-07-16 C阀有限公司 管路控制阀
JP3232442B2 (ja) * 1996-07-18 2001-11-26 東京エレクトロン株式会社 洗浄処理方法、洗浄・乾燥処理方法及びその装置
JPH09186125A (ja) * 1995-12-28 1997-07-15 Sony Corp ウエハ洗浄用コンテナおよびウエハ洗浄装置
US5836325A (en) * 1996-02-20 1998-11-17 Speedfam Clean System Co., Ltd. Running water type washing machine
JP3453022B2 (ja) * 1996-02-26 2003-10-06 大日本スクリーン製造株式会社 現像装置
DE19616400C2 (de) * 1996-04-24 2001-08-30 Steag Micro Tech Gmbh Vorrichtung zum Behandeln von Substraten in einem Fluid-Behälter
JP4421686B2 (ja) * 1996-06-24 2010-02-24 インテルウニフェルシテール ミクロエレクトロニカ セントルム フェライニジンク ゾンダ ウィンストベヤーク 平坦な基材を湿式でクリーニングまたはエッチングするための装置および方法
EP0817246B1 (de) * 1996-06-24 2005-02-02 Interuniversitair Microelektronica Centrum Vzw Vorrichtung und Verfahren zur Nassreinigung oder zum Ätzen eines flachen Substrats
JPH1027770A (ja) * 1996-07-09 1998-01-27 Dainippon Screen Mfg Co Ltd 基板処理装置
JP3511442B2 (ja) * 1996-12-18 2004-03-29 忠弘 大見 洗浄やエッチング、現像、剥離等を含むウエット処理に用いる省液型の液体供給ノズル、省液型の液体供給ノズル装置及びウエット処理装置
JPH10163158A (ja) * 1996-12-03 1998-06-19 Dan Kagaku:Kk 板状体洗浄装置
JPH10223585A (ja) * 1997-02-04 1998-08-21 Canon Inc ウェハ処理装置及びその方法並びにｓｏｉウェハの製造方法
JPH10261609A (ja) * 1997-03-21 1998-09-29 Sony Corp 薬液処理装置及び薬液処理方法
JPH10270318A (ja) * 1997-03-25 1998-10-09 Dainippon Screen Mfg Co Ltd 飛散防止カップの洗浄方法及び塗布装置
JPH1144877A (ja) * 1997-07-24 1999-02-16 Nec Kagoshima Ltd 基板洗浄装置
JPH1176956A (ja) * 1997-09-02 1999-03-23 Supiide Fuamu Clean Syst Kk 流水式洗浄装置における加圧式給液・整流機構
JP3986139B2 (ja) * 1997-11-27 2007-10-03 大日本スクリーン製造株式会社 基板処理装置
JPH11186211A (ja) * 1997-12-24 1999-07-09 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2922194B1 (ja) * 1998-04-14 1999-07-19 株式会社カイジョー 洗浄物の乾燥装置
DE19901162C2 (de) * 1999-01-14 2002-03-14 Wacker Siltronic Halbleitermat Vorrichtung und Verfahren zum Reinigen von Halbleiterscheiben
AU772539B2 (en) * 1999-07-29 2004-04-29 Kaneka Corporation Method for cleaning photovoltaic module and cleaning apparatus
US6423149B1 (en) * 2000-03-22 2002-07-23 Agere Systems Guardian Corp. Apparatus and method for gradient cleaning of semiconductor wafers
EP1281210B1 (de) * 2000-05-02 2004-07-14 Paratek Microwave, Inc. Mikrostreifenleiter-phasenschieber

Also Published As

Publication number Publication date
TW487960B (en) 2002-05-21
ATE373316T1 (de) 2007-09-15
US6799588B1 (en) 2004-10-05
EP1208586B1 (de) 2007-09-12
WO2001008200A1 (de) 2001-02-01
DE19934300C2 (de) 2002-02-07
DE19934300A1 (de) 2001-04-05
JP4651252B2 (ja) 2011-03-16
KR20020063157A (ko) 2002-08-01
EP1208586A1 (de) 2002-05-29
JP2003505881A (ja) 2003-02-12

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Legal Events

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8364 No opposition during term of opposition