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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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(en)
|
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|
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(zh)
|
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|
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(en)
|
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|
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(en)
|
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|
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(ja)
*
|
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|
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|
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|
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(de)
|
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|
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|
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|
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(ko)
|
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|
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|
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|
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(en)
|
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|
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|
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|
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(ko)
*
|
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|
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(zh)
|
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|
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|
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|
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(de)
|
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|
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(ko)
|
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|
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(en)
|
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|
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(de)
|
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|
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|
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|
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(en)
|
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|
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(de)
|
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|
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|
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|
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(ko)
|
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|
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|
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|
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|
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|
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(ja)
*
|
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2005-02-03 |
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|
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|
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|
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|
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|
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(en)
|
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|
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(en)
|
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2007-07-30 |
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|
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(en)
|
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|
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(en)
|
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|
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|
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|
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(en)
|
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|
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(de)
|
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|
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(ja)
*
|
2003-09-25 |
2010-01-27 |
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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(en)
|
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|
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(zh)
|
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|
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(en)
|
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|
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|
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|
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(zh)
|
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|
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|
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|
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|
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|
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|
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|
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(en)
*
|
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2005-08-04 |
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|
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(en)
|
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|
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(de)
|
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|
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(en)
|
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2012-03-21 |
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|
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|
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|
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|
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|
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(en)
|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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|
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(en)
|
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|
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|
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|
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(de)
*
|
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2008-03-05 |
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|
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(en)
|
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|
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(ko)
*
|
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2013-02-07 |
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|
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|
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|
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(en)
|
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|
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|
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|
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(en)
|
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|
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(en)
|
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|
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(en)
|
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|
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(en)
|
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|
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(en)
|
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|
US7119876B2
(en)
|
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|
DE102004051357B4
(de)
*
|
2004-10-19 |
2013-08-22 |
Carl Zeiss Microscopy Gmbh |
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|
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(en)
|
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2008-08-19 |
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|
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(en)
|
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2008-09-09 |
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|
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(en)
|
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|
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(en)
|
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2007-07-31 |
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|
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(en)
|
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2008-08-12 |
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|
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(en)
|
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2010-08-24 |
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|
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(en)
|
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2006-12-05 |
Asml Netherlands B.V. |
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|
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(en)
|
2004-12-02 |
2007-01-09 |
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|
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(en)
|
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2008-11-04 |
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|
US7248334B2
(en)
|
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2007-07-24 |
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|
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(en)
|
2004-12-07 |
2007-03-27 |
Asml Netherlands B.V. |
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|
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(en)
|
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2008-07-08 |
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|
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(en)
|
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|
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(en)
|
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2008-04-01 |
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|
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(en)
|
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2008-07-22 |
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|
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(en)
|
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2009-05-05 |
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|
US7880860B2
(en)
|
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2011-02-01 |
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|
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(en)
|
2004-12-28 |
2009-02-17 |
Asml Netherlands B.V. |
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|
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(en)
|
2004-12-28 |
2008-07-29 |
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|
US20060147821A1
(en)
|
2004-12-30 |
2006-07-06 |
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|
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(en)
|
2005-01-14 |
2006-08-30 |
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|
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(en)
|
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2006-08-30 |
Asml Netherlands Bv |
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|
KR20070095272A
(ko)
*
|
2005-01-31 |
2007-09-28 |
가부시키가이샤 니콘 |
노광 방법, 노광 장치 및 디바이스 제조 방법
|
US8692973B2
(en)
|
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2014-04-08 |
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|
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(ko)
|
2005-01-31 |
2018-11-23 |
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|
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(de)
|
2005-02-10 |
2007-10-31 |
ASML Netherlands B.V. |
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|
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(en)
|
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2011-09-13 |
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|
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(en)
|
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2007-05-29 |
Asml Netherlands B.V. |
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|
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(en)
|
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2008-05-27 |
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|
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(en)
|
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|
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(en)
|
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2008-01-29 |
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|
US7684010B2
(en)
|
2005-03-09 |
2010-03-23 |
Asml Netherlands B.V. |
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|
US7330238B2
(en)
|
2005-03-28 |
2008-02-12 |
Asml Netherlands, B.V. |
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|
US7411654B2
(en)
|
2005-04-05 |
2008-08-12 |
Asml Netherlands B.V. |
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|
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(en)
|
2005-04-08 |
2007-11-06 |
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|
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(ko)
|
2005-04-18 |
2015-09-25 |
가부시키가이샤 니콘 |
노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
|
US20060232753A1
(en)
|
2005-04-19 |
2006-10-19 |
Asml Holding N.V. |
Liquid immersion lithography system with tilted liquid flow
|
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(en)
|
2005-05-03 |
2012-08-21 |
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|
US7317507B2
(en)
|
2005-05-03 |
2008-01-08 |
Asml Netherlands B.V. |
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|
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(en)
|
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2008-10-07 |
Asml Netherlands B.V. |
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|
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(ko)
|
2005-05-12 |
2015-08-12 |
가부시키가이샤 니콘 |
투영 광학계, 노광 장치 및 노광 방법
|
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(en)
|
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2010-01-26 |
Asml Netherlands B.V. |
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|
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(en)
|
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2010-07-06 |
Asml Netherlands B.V. |
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|
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(en)
|
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2009-01-06 |
Asml Netherlands B.V. |
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|
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(en)
|
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2010-11-16 |
Asml Netherlands B.V. |
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|
US7468779B2
(en)
|
2005-06-28 |
2008-12-23 |
Asml Netherlands B.V. |
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|
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(en)
|
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2009-05-19 |
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|
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(en)
|
2005-08-16 |
2011-11-08 |
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|
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(en)
|
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2008-08-12 |
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|
JP2007103841A
(ja)
*
|
2005-10-07 |
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|
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(en)
|
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|
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(en)
|
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|
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(en)
|
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|
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(en)
|
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|
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(en)
|
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|
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(en)
|
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|
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(en)
|
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|
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|
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|
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(en)
|
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|
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(en)
|
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|
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(en)
|
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|
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(de)
|
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|
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(en)
|
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|
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(de)
*
|
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|
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(de)
*
|
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|
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(en)
|
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|
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(en)
|
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|
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(en)
|
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|
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(en)
|
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|
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(en)
|
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|
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(en)
|
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|
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(en)
|
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|
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(en)
|
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|
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(en)
|
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|
US20090001403A1
(en)
*
|
2007-06-29 |
2009-01-01 |
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|
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(en)
|
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2015-05-05 |
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|
US20090054752A1
(en)
*
|
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|
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(en)
|
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|
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(ja)
|
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|
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(en)
|
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2016-05-30 |
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|
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(ko)
|
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2015-10-21 |
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|
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(en)
|
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|
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(en)
|
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|
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(en)
*
|
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2009-07-30 |
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|
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(zh)
|
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2016-03-09 |
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|
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(de)
*
|
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|
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(en)
|
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|
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(de)
|
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|
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(ja)
*
|
2012-05-01 |
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|
CN103744269B
(zh)
*
|
2014-01-03 |
2015-07-29 |
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|