DE59914230D1 - Zerstäubungskathode nach dem Magnetronprinzip - Google Patents

Zerstäubungskathode nach dem Magnetronprinzip

Info

Publication number: DE59914230D1
Authority: DE; Germany
Prior art keywords: cathode according; sputtering cathode; magnetron principle; magnetron; principle
Prior art date: 1998-05-04
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

DE59914230T

Other languages

English (en)

Inventor

Michael Dr Liehr

Joerg Dr Krempel-Hesse

Rolf Adam

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Applied Materials GmbH and Co KG

Original Assignee

Applied Materials GmbH and Co KG

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1998-05-04

Filing date

1999-03-19

Publication date

2007-04-19

1999-03-19 Application filed by Applied Materials GmbH and Co KG filed Critical Applied Materials GmbH and Co KG

1999-03-19 Priority to DE59914230T priority Critical patent/DE59914230D1/de

2007-04-19 Application granted granted Critical

2007-04-19 Publication of DE59914230D1 publication Critical patent/DE59914230D1/de

2019-03-20 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Links

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J23/00—Details of transit-time tubes of the types covered by group H01J25/00
- H01J23/02—Electrodes; Magnetic control means; Screens
- H01J23/04—Cathodes
- H01J23/05—Cathodes having a cylindrical emissive surface, e.g. cathodes for magnetrons
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B30/00—Compositions for artificial stone, not containing binders
- C04B30/02—Compositions for artificial stone, not containing binders containing fibrous materials
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
- H01J37/3408—Planar magnetron sputtering
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2111/00—Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
- C04B2111/54—Substitutes for natural stone, artistic materials or the like

DE59914230T 1998-05-04 1999-03-19 Zerstäubungskathode nach dem Magnetronprinzip Expired - Lifetime DE59914230D1 (de)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
DE59914230T DE59914230D1 (de)	1998-05-04	1999-03-19	Zerstäubungskathode nach dem Magnetronprinzip

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
DE19819785A DE19819785A1 (de)	1998-05-04	1998-05-04	Zerstäubungskathode nach dem Magnetron-Prinzip
DE59914230T DE59914230D1 (de)	1998-05-04	1999-03-19	Zerstäubungskathode nach dem Magnetronprinzip

Publications (1)

Publication Number	Publication Date
DE59914230D1 true DE59914230D1 (de)	2007-04-19

Family

ID=7866581

Family Applications (2)

Application Number	Title	Priority Date	Filing Date
DE19819785A Withdrawn DE19819785A1 (de)	1998-05-04	1998-05-04	Zerstäubungskathode nach dem Magnetron-Prinzip
DE59914230T Expired - Lifetime DE59914230D1 (de)	1998-05-04	1999-03-19	Zerstäubungskathode nach dem Magnetronprinzip

Family Applications Before (1)

Application Number	Title	Priority Date	Filing Date
DE19819785A Withdrawn DE19819785A1 (de)	1998-05-04	1998-05-04	Zerstäubungskathode nach dem Magnetron-Prinzip

Country Status (7)

Country	Link
US (1)	US6077407A (de)
EP (1)	EP0955666B1 (de)
JP (1)	JP2000001779A (de)
KR (1)	KR100359901B1 (de)
DE (2)	DE19819785A1 (de)
ES (1)	ES2284223T3 (de)
TW (1)	TW439088B (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE19836125C2 (de)	1998-08-10	2001-12-06	Leybold Systems Gmbh	Zerstäubungsvorrichtung mit einer Kathode mit Permanentmagnetanordnung
US20020046945A1 (en) *	1999-10-28	2002-04-25	Applied Materials, Inc.	High performance magnetron for DC sputtering systems
US6887356B2 (en) *	2000-11-27	2005-05-03	Cabot Corporation	Hollow cathode target and methods of making same
DE10234858A1 (de) *	2002-07-31	2004-02-12	Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.	Einrichtung zur Erzeugung einer Magnetron-Entladung
SG11201403175PA (en) *	2011-12-27	2014-08-28	Konica Minolta Inc	Method for separating polishing material and regenerated polishing material
US10371244B2 (en)	2015-04-09	2019-08-06	United Technologies Corporation	Additive manufactured gear for a geared architecture gas turbine engine
EP3091561B1 (de)	2015-05-06	2019-09-04	safematic GmbH	Sputtereinheit
EP3091101B1 (de)	2015-05-06	2018-10-17	safematic GmbH	Beschichtungseinheit

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4265729A (en) *	1978-09-27	1981-05-05	Vac-Tec Systems, Inc.	Magnetically enhanced sputtering device
CA1141704A (en) *	1978-08-21	1983-02-22	Charles F. Morrison, Jr.	Magnetically enhanced sputtering device
US4180450A (en) *	1978-08-21	1979-12-25	Vac-Tec Systems, Inc.	Planar magnetron sputtering device
US4162954A (en) *	1978-08-21	1979-07-31	Vac-Tec Systems, Inc.	Planar magnetron sputtering device
US4239611A (en) *	1979-06-11	1980-12-16	Vac-Tec Systems, Inc.	Magnetron sputtering devices
US4461688A (en) *	1980-06-23	1984-07-24	Vac-Tec Systems, Inc.	Magnetically enhanced sputtering device having a plurality of magnetic field sources including improved plasma trapping device and method
CH648690A5 (de) *	1980-10-14	1985-03-29	Balzers Hochvakuum	Kathodenanordnung zur abstaeubung von material von einem target in einer kathodenzerstaeubungsanlage.
US4904362A (en) *	1987-07-24	1990-02-27	Miba Gleitlager Aktiengesellschaft	Bar-shaped magnetron or sputter cathode arrangement
DE3738845A1 (de) *	1987-11-16	1989-05-24	Leybold Ag	Zerstaeubungskatode nach dem magnetronprinzip
US4865708A (en) *	1988-11-14	1989-09-12	Vac-Tec Systems, Inc.	Magnetron sputtering cathode
US5162954A (en) *	1990-07-31	1992-11-10	Seagate Technology Inc.	Apparatus for generating an index pulse in a data storage system
DE4025077A1 (de) *	1990-08-08	1992-02-20	Leybold Ag	Magnetronkathode
US5262030A (en) *	1992-01-15	1993-11-16	Alum Rock Technology	Magnetron sputtering cathode with electrically variable source size and location for coating multiple substrates
US5399253A (en) *	1992-12-23	1995-03-21	Balzers Aktiengesellschaft	Plasma generating device

1998
- 1998-05-04 DE DE19819785A patent/DE19819785A1/de not_active Withdrawn
1999
- 1999-03-19 DE DE59914230T patent/DE59914230D1/de not_active Expired - Lifetime
- 1999-03-19 ES ES99105636T patent/ES2284223T3/es not_active Expired - Lifetime
- 1999-03-19 EP EP99105636A patent/EP0955666B1/de not_active Expired - Lifetime
- 1999-04-03 TW TW088105378A patent/TW439088B/zh not_active IP Right Cessation
- 1999-04-29 US US09/301,459 patent/US6077407A/en not_active Expired - Lifetime
- 1999-04-30 JP JP11125080A patent/JP2000001779A/ja active Pending
- 1999-05-03 KR KR1019990015825A patent/KR100359901B1/ko not_active IP Right Cessation

Also Published As

Publication number	Publication date
JP2000001779A (ja)	2000-01-07
ES2284223T3 (es)	2007-11-01
KR19990088019A (ko)	1999-12-27
EP0955666A1 (de)	1999-11-10
TW439088B (en)	2001-06-07
US6077407A (en)	2000-06-20
KR100359901B1 (ko)	2002-11-04
EP0955666B1 (de)	2007-03-07
DE19819785A1 (de)	1999-11-11

Legal Events

Date	Code	Title	Description
2008-03-27	8364	No opposition during term of opposition

Publication	Publication Date	Title
NL1006500A1 (nl)	1998-01-28	Met metaal beklede substraten.
DE19881914D2 (de)	2001-01-04	Magnetronsputterquelle
DE69917396D1 (de)	2004-06-24	Phasenschieber nach dem Reflektionsmodus
SG85732A1 (en)	2002-01-15	Tilted sputtering target with shield to block contaminants
DE69926634D1 (de)	2005-09-15	Profiliertes sputtertarget
DE69931583D1 (de)	2006-07-06	Vakuumschaltgerät
IL149102A0 (en)	2002-11-10	Microwave blade tracker
DE3886923D1 (de)	1994-02-17	Zerstäubungskathode nach dem Magnetron-Prinzip.
DE59909387D1 (de)	2004-06-09	Elektrokardiogramm-Anordnung
GB9725434D0 (en)	1998-01-28	Sputter deposition
DE59914230D1 (de)	2007-04-19	Zerstäubungskathode nach dem Magnetronprinzip
DE69716108D1 (de)	2002-11-07	Kathodenkonstruktion
DE59801573D1 (de)	2001-10-31	Stromsensor nach dem kompensationsprinzip
IL138642A0 (en)	2001-10-31	Extended life sputter targets
DE59809710D1 (de)	2003-10-30	Sputterkathode
AU2192199A (en)	1999-07-26	Magnetron
DE69718328T2 (de)	2004-01-15	Magnetrongerät
GB2357630B (en)	2004-06-30	Magnetron arrangemements
DE69805678T2 (de)	2003-01-23	Selbst-stabilisierende Kathode
DE19981314T1 (de)	2002-10-24	Sputtertargetmaterial
IT249163Y1 (it)	2003-03-25	Guarnitura per cassetto
ITMI991229A0 (it)	1999-06-01	Aspirapolvere
GB2346732B (en)	2004-01-07	Cathode for magnetron
DE29618882U1 (de)	1997-01-16	Kathodenzerstäubungsanlage
AU8528398A (en)	2000-02-21	The structure of the shoe