DE60027510D1 - Halbleiterscheibe Poliervorrichtung - Google Patents
Halbleiterscheibe PoliervorrichtungInfo
- Publication number
- DE60027510D1 DE60027510D1 DE60027510T DE60027510T DE60027510D1 DE 60027510 D1 DE60027510 D1 DE 60027510D1 DE 60027510 T DE60027510 T DE 60027510T DE 60027510 T DE60027510 T DE 60027510T DE 60027510 D1 DE60027510 D1 DE 60027510D1
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor wafer
- polishing device
- wafer polishing
- semiconductor
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
- H01L21/67219—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process comprising at least one polishing chamber
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
- B24B37/013—Devices or means for detecting lapping completion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
- B24B37/345—Feeding, loading or unloading work specially adapted to lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21119899 | 1999-07-26 | ||
JP21119899A JP2001038614A (ja) | 1999-07-26 | 1999-07-26 | 研磨装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60027510D1 true DE60027510D1 (de) | 2006-06-01 |
DE60027510T2 DE60027510T2 (de) | 2007-06-06 |
Family
ID=16602004
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60027510T Expired - Fee Related DE60027510T2 (de) | 1999-07-26 | 2000-07-26 | Halbleiterscheibe Poliervorrichtung |
Country Status (4)
Country | Link |
---|---|
US (1) | US6409576B1 (de) |
EP (1) | EP1072359B1 (de) |
JP (1) | JP2001038614A (de) |
DE (1) | DE60027510T2 (de) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020023715A1 (en) * | 2000-05-26 | 2002-02-28 | Norio Kimura | Substrate polishing apparatus and substrate polishing mehod |
DE10053410C1 (de) * | 2000-10-27 | 2002-04-04 | Haertl Erwin | Schleifanlage und Verfahren zum differenzierten Schleifen einer mit einem leitfähigem Material beschichteten Platte für Leiterplatinen |
US7172497B2 (en) * | 2001-01-05 | 2007-02-06 | Asm Nutool, Inc. | Fabrication of semiconductor interconnect structures |
JP2002251079A (ja) * | 2001-02-26 | 2002-09-06 | Canon Inc | 画像形成装置及び回転体速度検出装置 |
US7204743B2 (en) * | 2001-02-27 | 2007-04-17 | Novellus Systems, Inc. | Integrated circuit interconnect fabrication systems |
TWI222154B (en) * | 2001-02-27 | 2004-10-11 | Asm Nutool Inc | Integrated system for processing semiconductor wafers |
US20040259348A1 (en) * | 2001-02-27 | 2004-12-23 | Basol Bulent M. | Method of reducing post-CMP defectivity |
JP4197103B2 (ja) * | 2002-04-15 | 2008-12-17 | 株式会社荏原製作所 | ポリッシング装置 |
US6810296B2 (en) * | 2002-09-25 | 2004-10-26 | Advanced Micro Devices, Inc. | Correlating an inline parameter to a device operation parameter |
KR100734669B1 (ko) * | 2003-08-08 | 2007-07-02 | 동부일렉트로닉스 주식회사 | 반도체 소자의 제조 방법 및 그 장치 |
US7030603B2 (en) * | 2003-08-21 | 2006-04-18 | Micron Technology, Inc. | Apparatuses and methods for monitoring rotation of a conductive microfeature workpiece |
JP4464642B2 (ja) * | 2003-09-10 | 2010-05-19 | 株式会社荏原製作所 | 研磨状態監視装置、研磨状態監視方法、研磨装置及び研磨方法 |
WO2006035624A1 (en) * | 2004-09-28 | 2006-04-06 | Ebara Corporation | Substrate cleaning apparatus and method for determining timing of replacement of cleaning member |
JP5093651B2 (ja) * | 2007-06-12 | 2012-12-12 | 株式会社ニコン | 作業情報管理システム |
JP5614326B2 (ja) * | 2010-08-20 | 2014-10-29 | 東京エレクトロン株式会社 | 基板搬送装置、基板搬送方法及びその基板搬送方法を実行させるためのプログラムを記録した記録媒体 |
CN102485424B (zh) * | 2010-12-03 | 2015-01-21 | 中芯国际集成电路制造(北京)有限公司 | 抛光装置及其异常处理方法 |
JP6265702B2 (ja) * | 2012-12-06 | 2018-01-24 | 株式会社荏原製作所 | 基板洗浄装置及び基板洗浄方法 |
JP2014130881A (ja) * | 2012-12-28 | 2014-07-10 | Ebara Corp | 研磨装置 |
JP6007889B2 (ja) * | 2013-12-03 | 2016-10-19 | 信越半導体株式会社 | 面取り加工装置及びノッチレスウェーハの製造方法 |
JP6423600B2 (ja) | 2014-03-12 | 2018-11-14 | 株式会社荏原製作所 | 膜厚測定装置、及び、研磨装置 |
JP6560572B2 (ja) * | 2015-09-14 | 2019-08-14 | 株式会社荏原製作所 | 反転機および基板研磨装置 |
JP6792512B2 (ja) * | 2017-05-16 | 2020-11-25 | 株式会社荏原製作所 | 基板洗浄装置および基板処理装置 |
CN110459497B (zh) * | 2018-05-08 | 2022-04-22 | 北京北方华创微电子装备有限公司 | 晶圆预定位方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5679060A (en) * | 1994-07-14 | 1997-10-21 | Silicon Technology Corporation | Wafer grinding machine |
US5679055A (en) * | 1996-05-31 | 1997-10-21 | Memc Electronic Materials, Inc. | Automated wafer lapping system |
JPH1076464A (ja) * | 1996-08-30 | 1998-03-24 | Canon Inc | 研磨方法及びそれを用いた研磨装置 |
US6132289A (en) * | 1998-03-31 | 2000-10-17 | Lam Research Corporation | Apparatus and method for film thickness measurement integrated into a wafer load/unload unit |
-
1999
- 1999-07-26 JP JP21119899A patent/JP2001038614A/ja active Pending
-
2000
- 2000-07-26 US US09/626,124 patent/US6409576B1/en not_active Expired - Fee Related
- 2000-07-26 DE DE60027510T patent/DE60027510T2/de not_active Expired - Fee Related
- 2000-07-26 EP EP00116023A patent/EP1072359B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP2001038614A (ja) | 2001-02-13 |
EP1072359A3 (de) | 2003-11-12 |
DE60027510T2 (de) | 2007-06-06 |
US6409576B1 (en) | 2002-06-25 |
EP1072359A2 (de) | 2001-01-31 |
EP1072359B1 (de) | 2006-04-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |