DE60044790D1 - Aerogelsubstrat und seine Herstellung - Google Patents

Aerogelsubstrat und seine Herstellung

Info

Publication number
DE60044790D1
DE60044790D1 DE60044790T DE60044790T DE60044790D1 DE 60044790 D1 DE60044790 D1 DE 60044790D1 DE 60044790 T DE60044790 T DE 60044790T DE 60044790 T DE60044790 T DE 60044790T DE 60044790 D1 DE60044790 D1 DE 60044790D1
Authority
DE
Germany
Prior art keywords
aerogelsubstrat
production
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60044790T
Other languages
English (en)
Inventor
Hiroshi Yokogawa
Masaru Yokoyama
Kenji Tsubaki
Kenji Kawano
Kenji Sonoda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Panasonic Electric Works Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Electric Works Co Ltd filed Critical Panasonic Electric Works Co Ltd
Application granted granted Critical
Publication of DE60044790D1 publication Critical patent/DE60044790D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04Coating on selected surface areas, e.g. using masks
    • C23C16/045Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3417Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/42Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating of an organic material and at least one non-metal coating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/046Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02Optical fibres with cladding with or without a coating
    • G02B6/02042Multicore optical fibres
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122Basic optical elements, e.g. light-guiding paths
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0306Inorganic insulating substrates, e.g. ceramic, glass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/85Arrangements for extracting light from the devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/18Processes for applying liquids or other fluent materials performed by dipping
    • B05D1/20Processes for applying liquids or other fluent materials performed by dipping substances to be applied floating on a fluid
    • B05D1/202Langmuir Blodgett films (LB films)
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/70Properties of coatings
    • C03C2217/75Hydrophilic and oleophilic coatings
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/70Properties of coatings
    • C03C2217/76Hydrophobic and oleophobic coatings
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/30Aspects of methods for coating glass not covered above
    • C03C2218/32After-treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/005Processes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/005Processes
    • H01L33/0062Processes for devices with an active region comprising only III-V compounds
    • H01L33/0066Processes for devices with an active region comprising only III-V compounds with a substrate not being a III-V compound
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/005Processes
    • H01L33/0093Wafer bonding; Removal of the growth substrate
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00Stock material or miscellaneous articles
    • Y10S428/913Material designed to be responsive to temperature, light, moisture
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
DE60044790T 1999-11-10 2000-11-09 Aerogelsubstrat und seine Herstellung Expired - Lifetime DE60044790D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31985899 1999-11-10

Publications (1)

Publication Number Publication Date
DE60044790D1 true DE60044790D1 (de) 2010-09-16

Family

ID=18115030

Family Applications (2)

Application Number Title Priority Date Filing Date
DE60044790T Expired - Lifetime DE60044790D1 (de) 1999-11-10 2000-11-09 Aerogelsubstrat und seine Herstellung
DE60039103T Expired - Lifetime DE60039103D1 (de) 1999-11-10 2000-11-09 Aerogelsubstrat und seine herstellung

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE60039103T Expired - Lifetime DE60039103D1 (de) 1999-11-10 2000-11-09 Aerogelsubstrat und seine herstellung

Country Status (7)

Country Link
US (1) US6740416B1 (de)
EP (2) EP1153739B1 (de)
JP (1) JP3674585B2 (de)
KR (1) KR100437526B1 (de)
CN (1) CN1197702C (de)
DE (2) DE60044790D1 (de)
WO (1) WO2001034382A1 (de)

Families Citing this family (103)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003133070A (ja) * 2001-10-30 2003-05-09 Seiko Epson Corp 積層膜の製造方法、電気光学装置、電気光学装置の製造方法、有機エレクトロルミネッセンス装置の製造方法、及び電子機器
JP4182467B2 (ja) * 2001-12-27 2008-11-19 セイコーエプソン株式会社 回路基板、電気光学装置及び電子機器
JP4369239B2 (ja) * 2002-01-29 2009-11-18 キャボット コーポレイション 耐熱性エーロゲル絶縁複合材料およびその製造方法、エーロゲルバインダー組成物およびその製造方法
JP4479161B2 (ja) * 2002-03-25 2010-06-09 住友金属鉱山株式会社 透明導電膜とこの透明導電膜形成用塗布液および透明導電性積層構造体と表示装置
DE10228938A1 (de) * 2002-06-28 2004-01-15 Philips Intellectual Property & Standards Gmbh Elektrolumineszierende Vorrichtung mit Farbfilter
KR100483622B1 (ko) * 2002-08-16 2005-04-19 삼성전기주식회사 광도파로 소자를 인쇄회로기판에 부착하는 방법
DE10252903A1 (de) * 2002-11-12 2004-05-19 Philips Intellectual Property & Standards Gmbh Organische elektrolumineszente Lichtquelle mit Antireflexionsschicht
US7488540B2 (en) 2003-02-26 2009-02-10 Dai Nippon Printing Co., Ltd. Thin film laminate and luminescent element
DE102004005300A1 (de) * 2004-01-29 2005-09-08 Atotech Deutschland Gmbh Verfahren zum Behandeln von Trägermaterial zur Herstellung von Schltungsträgern und Anwendung des Verfahrens
US7144828B2 (en) * 2004-01-30 2006-12-05 Chartered Semiconductor Manufacturing Ltd. He treatment to improve low-k adhesion property
JP5005164B2 (ja) 2004-03-03 2012-08-22 株式会社ジャパンディスプレイイースト 発光素子,発光型表示装置及び照明装置
JP4470627B2 (ja) * 2004-07-15 2010-06-02 日本電気株式会社 光学基板、発光素子および表示装置
WO2007086819A2 (en) * 2004-11-24 2007-08-02 Aspen Aerogels, Inc. High strength aerogel panels
FR2879188B1 (fr) * 2004-12-13 2007-06-22 Saint Gobain Procede et installation pour le traitement d'un substrat verrier incorporant une ligne magnetron et un dispositif generant un plasma a pression atmospherique.
JPWO2006068200A1 (ja) * 2004-12-24 2008-06-12 松下電工株式会社 液晶表示装置用光学積層フィルム
WO2006074449A2 (en) * 2005-01-07 2006-07-13 Aspen Aerogels, Inc. A thermal management system for high temperature events
US20060216219A1 (en) * 2005-03-22 2006-09-28 Defriend Kimberly A Aerogel monolith with improved strength
KR100726241B1 (ko) * 2005-05-02 2007-06-11 삼성전기주식회사 금-구리 층을 포함하는 도전성 기판, 모터, 진동모터 및전기 접점용 금속 단자
US8029871B2 (en) * 2005-06-09 2011-10-04 Hoya Corporation Method for producing silica aerogel coating
US7390078B2 (en) * 2005-06-30 2008-06-24 Lexmark International, Inc. Reduction of heat loss in micro-fluid ejection devices
US7618608B1 (en) 2005-12-13 2009-11-17 Keller Companies, Inc. Aerogel and method of manufacturing same
EP1919829A4 (de) * 2005-08-25 2011-03-23 Keller Companies Inc Aerogel und herstellungsverfahren
US20070069615A1 (en) * 2005-09-26 2007-03-29 Samsung Corning Co., Ltd. Surface light source device
KR20140022440A (ko) * 2005-10-21 2014-02-24 캐보트 코포레이션 에어로겔 기재 복합체
US7750056B1 (en) 2006-10-03 2010-07-06 Sami Daoud Low-density, high r-value translucent nanocrystallites
KR20080047150A (ko) * 2006-11-24 2008-05-28 한국생산기술연구원 에어로겔 단열시트가 내장된 휴대용 정보기기
KR100948578B1 (ko) 2006-12-12 2010-03-18 한국생산기술연구원 에어로겔 단열시트를 구비하는 단열관
JP4656074B2 (ja) * 2007-03-12 2011-03-23 セイコーエプソン株式会社 電気光学装置及び電気光学装置の製造方法
KR100926981B1 (ko) * 2008-01-09 2009-11-17 한국생산기술연구원 플라즈마 표면처리를 이용한 에어로겔 파우더 성형방법 및장치
US8851442B2 (en) * 2008-01-22 2014-10-07 Honeywell International Inc. Aerogel-bases mold for MEMS fabrication and formation thereof
EP2109163A1 (de) * 2008-04-08 2009-10-14 Alcan Technology & Management Ltd. Substrat mit aufgedruckter Struktur
JP5532550B2 (ja) * 2008-05-29 2014-06-25 パナソニック株式会社 プラズマディスプレイの誘電体膜用ケイ素化合物
CH699118A1 (de) 2008-07-15 2010-01-15 Tex A Tec Ag Multifunktionelle, responsive Funktionsschichten auf festen Oberflächen und Verfahren zur Herstellung dazu.
US8236118B2 (en) * 2009-08-07 2012-08-07 Guardian Industries Corp. Debonding and transfer techniques for hetero-epitaxially grown graphene, and products including the same
DE102009053782A1 (de) * 2009-11-19 2011-06-01 BSH Bosch und Siemens Hausgeräte GmbH Poröses SiO2-Xerogel mit charakteristischer Porengröße, dessen trocknungsstabile Vorstufen und dessen Anwendung
JP4893816B2 (ja) * 2009-12-15 2012-03-07 日本電気株式会社 光学基板、発光素子、表示装置およびそれらの製造方法
US10060180B2 (en) 2010-01-16 2018-08-28 Cardinal Cg Company Flash-treated indium tin oxide coatings, production methods, and insulating glass unit transparent conductive coating technology
US10000965B2 (en) 2010-01-16 2018-06-19 Cardinal Cg Company Insulating glass unit transparent conductive coating technology
US10000411B2 (en) 2010-01-16 2018-06-19 Cardinal Cg Company Insulating glass unit transparent conductivity and low emissivity coating technology
JP2011165804A (ja) * 2010-02-08 2011-08-25 Fujifilm Corp 半導体装置および半導体素子用基板の製造方法
WO2011119745A2 (en) * 2010-03-23 2011-09-29 Aeonclad Coatings, Llc. Methods and manufactures related to encapsulation of silica aerogel powder
US8283800B2 (en) 2010-05-27 2012-10-09 Ford Global Technologies, Llc Vehicle control system with proximity switch and method thereof
CA2990464A1 (en) * 2010-07-22 2012-01-26 Dynamic Adsorbents, Inc. Organic compound adsorbing material and process for making the same
US8975903B2 (en) 2011-06-09 2015-03-10 Ford Global Technologies, Llc Proximity switch having learned sensitivity and method therefor
US8928336B2 (en) 2011-06-09 2015-01-06 Ford Global Technologies, Llc Proximity switch having sensitivity control and method therefor
KR101247271B1 (ko) 2011-07-06 2013-03-25 지오스 에어로겔 리미티드 표면처리가 된 실리카 에어로겔 분말의 제조방법 및 제조시스템
US10004286B2 (en) 2011-08-08 2018-06-26 Ford Global Technologies, Llc Glove having conductive ink and method of interacting with proximity sensor
US9143126B2 (en) 2011-09-22 2015-09-22 Ford Global Technologies, Llc Proximity switch having lockout control for controlling movable panel
CN102531520B (zh) * 2011-10-31 2013-09-25 深圳光启高等理工研究院 一种介质基板的制备方法及超材料
US8994228B2 (en) 2011-11-03 2015-03-31 Ford Global Technologies, Llc Proximity switch having wrong touch feedback
US10112556B2 (en) 2011-11-03 2018-10-30 Ford Global Technologies, Llc Proximity switch having wrong touch adaptive learning and method
US8878438B2 (en) 2011-11-04 2014-11-04 Ford Global Technologies, Llc Lamp and proximity switch assembly and method
CN103171177B (zh) * 2011-12-26 2015-07-22 比亚迪股份有限公司 一种复合气凝胶及其制备方法
US9065447B2 (en) 2012-04-11 2015-06-23 Ford Global Technologies, Llc Proximity switch assembly and method having adaptive time delay
US9197206B2 (en) 2012-04-11 2015-11-24 Ford Global Technologies, Llc Proximity switch having differential contact surface
US9219472B2 (en) 2012-04-11 2015-12-22 Ford Global Technologies, Llc Proximity switch assembly and activation method using rate monitoring
US9944237B2 (en) 2012-04-11 2018-04-17 Ford Global Technologies, Llc Proximity switch assembly with signal drift rejection and method
US9568527B2 (en) 2012-04-11 2017-02-14 Ford Global Technologies, Llc Proximity switch assembly and activation method having virtual button mode
US9660644B2 (en) 2012-04-11 2017-05-23 Ford Global Technologies, Llc Proximity switch assembly and activation method
US9559688B2 (en) 2012-04-11 2017-01-31 Ford Global Technologies, Llc Proximity switch assembly having pliable surface and depression
US9831870B2 (en) 2012-04-11 2017-11-28 Ford Global Technologies, Llc Proximity switch assembly and method of tuning same
US9287864B2 (en) 2012-04-11 2016-03-15 Ford Global Technologies, Llc Proximity switch assembly and calibration method therefor
US9531379B2 (en) 2012-04-11 2016-12-27 Ford Global Technologies, Llc Proximity switch assembly having groove between adjacent proximity sensors
US8933708B2 (en) 2012-04-11 2015-01-13 Ford Global Technologies, Llc Proximity switch assembly and activation method with exploration mode
US9520875B2 (en) 2012-04-11 2016-12-13 Ford Global Technologies, Llc Pliable proximity switch assembly and activation method
US9184745B2 (en) 2012-04-11 2015-11-10 Ford Global Technologies, Llc Proximity switch assembly and method of sensing user input based on signal rate of change
US9136840B2 (en) 2012-05-17 2015-09-15 Ford Global Technologies, Llc Proximity switch assembly having dynamic tuned threshold
US8981602B2 (en) 2012-05-29 2015-03-17 Ford Global Technologies, Llc Proximity switch assembly having non-switch contact and method
US9337832B2 (en) 2012-06-06 2016-05-10 Ford Global Technologies, Llc Proximity switch and method of adjusting sensitivity therefor
US9641172B2 (en) 2012-06-27 2017-05-02 Ford Global Technologies, Llc Proximity switch assembly having varying size electrode fingers
US8922340B2 (en) 2012-09-11 2014-12-30 Ford Global Technologies, Llc Proximity switch based door latch release
US10446920B1 (en) 2012-10-16 2019-10-15 United States Of America As Represented By The Administrator Of National Aeronautics And Space Administration Aerogel-based antennas for aerospace and terrestrial applications
US9356341B1 (en) * 2012-10-16 2016-05-31 The United States Of America As Represented By The Administrator Of National Aeronautics And Space Administration Aerogel-based antennas for aerospace and terrestrial applications
US8796575B2 (en) 2012-10-31 2014-08-05 Ford Global Technologies, Llc Proximity switch assembly having ground layer
US9311204B2 (en) 2013-03-13 2016-04-12 Ford Global Technologies, Llc Proximity interface development system having replicator and method
KR102114314B1 (ko) * 2013-06-26 2020-05-25 삼성디스플레이 주식회사 유기발광 디스플레이 장치 및 그 제조방법
JP6361022B2 (ja) * 2013-09-17 2018-07-25 パナソニックIpマネジメント株式会社 複合シート
TWI565681B (zh) 2013-10-15 2017-01-11 中原大學 多孔二氧化矽氣凝膠複合薄膜及其製造方法以及二氧化碳吸收裝置
CN104276851A (zh) * 2014-09-10 2015-01-14 吴建坤 二氧化硅气凝胶隔热膜制作工艺
US10038443B2 (en) 2014-10-20 2018-07-31 Ford Global Technologies, Llc Directional proximity switch assembly
KR20170109565A (ko) * 2015-01-27 2017-09-29 히타치가세이가부시끼가이샤 에어로겔 적층체 및 단열재
WO2016137748A1 (en) * 2015-02-26 2016-09-01 The Regents Of The University Of California Multi-stage thermoelectric generator monolithically integrated on a light absorber
US9654103B2 (en) 2015-03-18 2017-05-16 Ford Global Technologies, Llc Proximity switch assembly having haptic feedback and method
US10473621B2 (en) 2015-05-11 2019-11-12 Carrier Corporation Methods of creation and use of a non-radioactive detection methodology
US9548733B2 (en) 2015-05-20 2017-01-17 Ford Global Technologies, Llc Proximity sensor assembly having interleaved electrode configuration
US20180245205A1 (en) * 2015-08-24 2018-08-30 Bar-Ilan University Nanoporous metal-based film supported on aerogel substrate and methods for the preparation thereof
CN108475748B (zh) * 2015-12-15 2021-08-20 苹果公司 微孔绝缘体
CN105582866B (zh) * 2016-03-08 2022-12-09 浙江圣润纳米科技有限公司 一种射频辐射快速制备气凝胶的方法及生产线
CN107268912A (zh) * 2016-04-08 2017-10-20 南京唯才新能源科技有限公司 一种带装饰面的气凝胶保温防火板及其制备方法
CN107265468A (zh) * 2016-04-08 2017-10-20 南京唯才新能源科技有限公司 一种气凝胶材料及其表面改性方法
TWI752199B (zh) * 2017-03-28 2022-01-11 美商康寧公司 具有保留製品強度與抗刮性之硬膜及裂紋減輕複合結構的玻璃基底製品
US10724132B2 (en) 2017-04-04 2020-07-28 General Electric Company Method of preparing aerogel particles and aerogel coated component
CN109135723A (zh) * 2017-06-15 2019-01-04 湖南尚成新材料科技有限责任公司 一种具有热致变色功能的气凝胶复合材料及其制备方法
CN109133991A (zh) * 2017-06-15 2019-01-04 湖南尚成新材料科技有限责任公司 一种具有红外反射功能的气凝胶复合材料及其制备方法
US10818903B1 (en) 2017-08-15 2020-10-27 Apple Inc. Polypropylene carbonate and catalysts
US11028012B2 (en) 2018-10-31 2021-06-08 Cardinal Cg Company Low solar heat gain coatings, laminated glass assemblies, and methods of producing same
CN113056510A (zh) * 2018-11-08 2021-06-29 维肯检测公司 涂覆的气凝胶
CN109693422B (zh) * 2019-02-25 2024-02-09 深圳德宝天成科技有限公司 一种超薄隔热膜
CN112071796B (zh) * 2020-09-03 2023-06-02 深圳市华星光电半导体显示技术有限公司 柔性基板及其制作方法、柔性显示装置
CN112924906B (zh) * 2021-01-26 2022-04-05 西安交通大学 基于磁热效应的无线柔性磁传感器及制备方法和检测方法
WO2022191815A1 (en) * 2021-03-08 2022-09-15 Hewlett-Packard Development Company, L.P. Multi-layered thermal insulating films for electronic devices
WO2023173029A1 (en) * 2022-03-09 2023-09-14 Cardinal Cg Company Silica wet gel and aerogel
CN114804818B (zh) * 2022-05-24 2023-04-11 巩义市泛锐熠辉复合材料有限公司 一种低成本气凝胶复合材料及其制备方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4402927A (en) 1980-04-22 1983-09-06 Dardel Guy Von Silica aerogel
FR2507171A1 (fr) 1981-06-04 1982-12-10 Zarzycki Jerzy Aerogels de silice monolithiques, leur preparation et leur utilisation pour la preparation d'articles en verre de silice et de materiaux thermiquement isolants
US4610863A (en) 1985-09-04 1986-09-09 The United States Of America As Represented By The United States Department Of Energy Process for forming transparent aerogel insulating arrays
DE4038784A1 (de) 1990-12-05 1992-06-11 Basf Ag Verbundschaumstoffe mit niedriger waermeleitfaehigkeit
US5086085A (en) 1991-04-11 1992-02-04 The United States Of America As Represented By The Department Of Energy Melamine-formaldehyde aerogels
US5358776A (en) * 1992-01-31 1994-10-25 The United States Of America As Represented By The Secretary Of The Air Force Lightweight aerogel reflector
JP2659155B2 (ja) * 1992-02-03 1997-09-30 松下電工株式会社 疎水性エアロゲルの製造方法
WO1993016125A1 (en) * 1992-02-18 1993-08-19 Matsushita Electric Works, Ltd. Process for producing hydrophobic aerogel
US5221364A (en) * 1992-02-20 1993-06-22 The United States Of America As Represented By The Secretary Of The Air Force Lightweight solar cell
US5565142A (en) 1992-04-01 1996-10-15 Deshpande; Ravindra Preparation of high porosity xerogels by chemical surface modification.
JPH0733248B2 (ja) * 1993-01-29 1995-04-12 工業技術院長 シリカエアロゲル表面への金属酸化物被覆方法及びその方法により得られた金属酸化物で被覆されたシリカエアロゲル
US5420168A (en) 1993-04-01 1995-05-30 The Regents Of The University Of California Method of low pressure and/or evaporative drying of aerogel
JP2725573B2 (ja) 1993-11-12 1998-03-11 松下電工株式会社 疎水性エアロゲルの製法
JP2642860B2 (ja) * 1994-02-04 1997-08-20 工業技術院長 無機キセロゲル膜およびその製造方法ならびに無機キセロゲル膜からなる気体分離膜
US5525857A (en) * 1994-08-19 1996-06-11 Texas Instruments Inc. Low density, high porosity material as gate dielectric for field emission device
DE4439217A1 (de) 1994-11-03 1996-05-09 Hoechst Ag Verfahren zur Herstellung von Aerogelen
US5638599A (en) * 1995-03-29 1997-06-17 Texas Instruments Incorporated Method of fabricating hybrid uncooled infrared detectors
JPH10324585A (ja) * 1997-05-22 1998-12-08 Kobe Steel Ltd 断熱用透明多孔体とその製造方法
JPH10324579A (ja) * 1997-05-22 1998-12-08 Kobe Steel Ltd 断熱用透明多孔体とその製造方法及び製造装置

Also Published As

Publication number Publication date
EP1719614A3 (de) 2007-08-15
EP1719614A2 (de) 2006-11-08
JP3674585B2 (ja) 2005-07-20
WO2001034382A1 (en) 2001-05-17
CN1335805A (zh) 2002-02-13
DE60039103D1 (de) 2008-07-17
KR100437526B1 (ko) 2004-06-30
US6740416B1 (en) 2004-05-25
KR20010090862A (ko) 2001-10-19
EP1719614B1 (de) 2010-08-04
EP1153739B1 (de) 2008-06-04
CN1197702C (zh) 2005-04-20
EP1153739A1 (de) 2001-11-14
EP1153739A4 (de) 2004-11-03

Similar Documents

Publication Publication Date Title
DE60044790D1 (de) Aerogelsubstrat und seine Herstellung
DE60038200D1 (de) ren Herstellung und Verwendung
DE60041916D1 (de) Elektonikbauteil-träger und seine herstellung
DE60004899D1 (de) SiC-C/C Verbundwerkstoff und seine Verwendungen
DE60019578D1 (de) Polyolefin und die herstellung davon
DE69924155D1 (de) Fluoren-copolymere und daraus hergestellte vorrichtungen
DE60032247D1 (de) Fluorchemisches oligomer und seine verwendung
DE69838849D1 (de) Mehrchipmodulstruktur und seine herstellung
DE69926404D1 (de) Mikrofasern und herstellungsverfahren
DE69929456D1 (de) Nahfeldabtastkopf und herstellungsverfahren
DE60132998D1 (de) Speiseeisprodukt und dessen herstellung
EE200200286A (et) Uued aminopropüülfosfiinhapped ning nende kasutamine
DE60017012D1 (de) Orginalitätsverschluss und Herstellungverfahren
DE60239896D1 (de) Velourskunstleder und seine herstellung
DE60017477D1 (de) Modifiziertes Dienelastomer und seine Herstellung
DE60002526D1 (de) Herstellung von Tricyclodecandicarbaldehyd, Pentacyclopentadecandicarbaldehyd und der entsprechenden Dimethanole
DE60033457D1 (de) Kleinstmotor und sein Herstellungsverfahren
DE60015004D1 (de) Russ, seine Herstellung und Verwendungen
DE60032829D1 (de) Toner und Tonerherstellungsverfahren
DE69904731D1 (de) Feinzerkleinerer und feinzerkleinerungsverfahren
DE60128647D1 (de) Sigec halbleiterkristall und seine herstellung
DE60028486D1 (de) Videocoder und -decoder
DE50115516D1 (de) Alkalimetallfluorzinkat und seine herstellung
DE60033353D1 (de) Elektronisches gerät und herstellung
DE60032898D1 (de) Arylthiazolidindion- und aryloxazolidinderivate