DE60116143D1 - Mikroreplicationsharz mit hohem brechungsindex - Google Patents
Mikroreplicationsharz mit hohem brechungsindexInfo
- Publication number
- DE60116143D1 DE60116143D1 DE60116143T DE60116143T DE60116143D1 DE 60116143 D1 DE60116143 D1 DE 60116143D1 DE 60116143 T DE60116143 T DE 60116143T DE 60116143 T DE60116143 T DE 60116143T DE 60116143 D1 DE60116143 D1 DE 60116143D1
- Authority
- DE
- Germany
- Prior art keywords
- sup
- methyl
- sub
- hydrogen
- microreplication
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F128/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur
- C08F128/02—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur by a bond to sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F228/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur
- C08F228/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur by a bond to sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
- C08F220/301—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one oxygen in the alcohol moiety
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31507—Of polycarbonate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31573—Next to addition polymer of ethylenically unsaturated monomer
- Y10T428/31576—Ester monomer type [polyvinylacetate, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31645—Next to addition polymer from unsaturated monomers
- Y10T428/31649—Ester, halide or nitrile of addition polymer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31786—Of polyester [e.g., alkyd, etc.]
- Y10T428/31797—Next to addition polymer from unsaturated monomers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31855—Of addition polymer from unsaturated monomers
- Y10T428/3188—Next to cellulosic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31855—Of addition polymer from unsaturated monomers
- Y10T428/31909—Next to second addition polymer from unsaturated monomers
- Y10T428/31913—Monoolefin polymer
- Y10T428/31917—Next to polyene polymer
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Laminated Bodies (AREA)
- Dental Preparations (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Pens And Brushes (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US746613 | 2000-12-21 | ||
US09/746,613 US6541591B2 (en) | 2000-12-21 | 2000-12-21 | High refractive index microreplication resin from naphthyloxyalkylmethacrylates or naphthyloxyacrylates polymers |
PCT/US2001/014040 WO2002051892A1 (en) | 2000-12-21 | 2001-05-01 | High refractive index microreplication resin |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60116143D1 true DE60116143D1 (de) | 2006-01-26 |
DE60116143T2 DE60116143T2 (de) | 2006-08-03 |
Family
ID=25001587
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60116143T Expired - Fee Related DE60116143T2 (de) | 2000-12-21 | 2001-05-01 | Mikroreplicationsharz mit hohem brechungsindex |
Country Status (8)
Country | Link |
---|---|
US (2) | US6541591B2 (de) |
EP (1) | EP1352000B1 (de) |
JP (1) | JP2004516367A (de) |
KR (1) | KR100727501B1 (de) |
CN (1) | CN1226321C (de) |
AT (1) | ATE313572T1 (de) |
DE (1) | DE60116143T2 (de) |
WO (1) | WO2002051892A1 (de) |
Families Citing this family (88)
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US6663978B1 (en) * | 2000-06-28 | 2003-12-16 | 3M Innovative Properties Company | High refractive index pressure-sensitive adhesives |
WO2001096915A2 (en) * | 2000-06-15 | 2001-12-20 | 3M Innovative Properties Company | Microfabrication of organic optical elements |
US7060419B2 (en) * | 2000-06-15 | 2006-06-13 | 3M Innovative Properties Company | Process for producing microfluidic articles |
JP2004503831A (ja) * | 2000-06-15 | 2004-02-05 | スリーエム イノベイティブ プロパティズ カンパニー | マルチパス多光子吸収方法および装置 |
WO2001096917A2 (en) * | 2000-06-15 | 2001-12-20 | 3M Innovative Properties Company | Multiphoton curing to provide encapsulated optical elements |
JP4472922B2 (ja) * | 2000-06-15 | 2010-06-02 | スリーエム イノベイティブ プロパティズ カンパニー | 多光子光化学プロセスを使用したマルチカラー画像化 |
EP1292861B1 (de) * | 2000-06-15 | 2014-11-19 | 3M Innovative Properties Company | Mehrstrahliges fotolithographisches absorptionsverfahren |
US6852766B1 (en) * | 2000-06-15 | 2005-02-08 | 3M Innovative Properties Company | Multiphoton photosensitization system |
US7166686B2 (en) * | 2000-06-28 | 2007-01-23 | 3M Innovative Properties Company | High refractive index pressure-sensitive adhesives |
TWI245034B (en) * | 2000-07-24 | 2005-12-11 | Matsushita Electric Ind Co Ltd | Capacitor |
US7404825B2 (en) * | 2001-06-11 | 2008-07-29 | Herrick Ii Robert S | Implant capable of forming a differential image in an eye |
US20040012872A1 (en) * | 2001-06-14 | 2004-01-22 | Fleming Patrick R | Multiphoton absorption method using patterned light |
US6692201B2 (en) * | 2002-01-28 | 2004-02-17 | Richard Soderman | Portable drill press |
US7125131B2 (en) * | 2002-12-06 | 2006-10-24 | General Electric Company | Brightness enhancement film with improved view angle |
US20030155667A1 (en) * | 2002-12-12 | 2003-08-21 | Devoe Robert J | Method for making or adding structures to an article |
GB0304011D0 (en) * | 2003-02-21 | 2003-03-26 | Microsharp Corp Ltd | High refractive index material |
US20060056031A1 (en) * | 2004-09-10 | 2006-03-16 | Capaldo Kevin P | Brightness enhancement film, and methods of making and using the same |
US20050037240A1 (en) * | 2003-03-31 | 2005-02-17 | Daisaku Haoto | Protective coat and method for manufacturing thereof |
US7046439B2 (en) * | 2003-05-22 | 2006-05-16 | Eastman Kodak Company | Optical element with nanoparticles |
US6833391B1 (en) * | 2003-05-27 | 2004-12-21 | General Electric Company | Curable (meth)acrylate compositions |
WO2004106396A1 (en) * | 2003-05-27 | 2004-12-09 | General Electric Company | Curable (meth)acrylate compositions |
US7271283B2 (en) * | 2003-08-29 | 2007-09-18 | General Electric Company | High refractive index, UV-curable monomers and coating compositions prepared therefrom |
US7045558B2 (en) | 2003-08-29 | 2006-05-16 | General Electric Company | Method of making a high refractive index optical management coating and the coating |
US7289202B2 (en) * | 2004-09-10 | 2007-10-30 | 3M Innovative Properties Company | Methods for testing durable optical elements |
US7074463B2 (en) * | 2003-09-12 | 2006-07-11 | 3M Innovative Properties Company | Durable optical element |
US7282272B2 (en) * | 2003-09-12 | 2007-10-16 | 3M Innovative Properties Company | Polymerizable compositions comprising nanoparticles |
US6844417B1 (en) * | 2003-09-19 | 2005-01-18 | General Electric Company | Brominated polycarbonate films |
TWI388876B (zh) * | 2003-12-26 | 2013-03-11 | Fujifilm Corp | 抗反射膜、偏光板,其製造方法,液晶顯示元件,液晶顯示裝置,及影像顯示裝置 |
US20050148735A1 (en) * | 2003-12-30 | 2005-07-07 | Olson David B. | Polymerizable composition for optical articles |
US20050147838A1 (en) * | 2003-12-30 | 2005-07-07 | 3M Innovative Properties Company | Polymerizable compositions for optical articles |
CN100549052C (zh) * | 2004-02-17 | 2009-10-14 | 东亚合成株式会社 | 活性能量线固化型光学材料用组合物 |
KR101245946B1 (ko) * | 2004-06-17 | 2013-03-21 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 광학 필름, 어셈블리 및 디스플레이 장치 |
TWI317444B (en) * | 2004-09-03 | 2009-11-21 | Eternal Chemical Co Ltd | Optical film having high hardness and use thereof |
CN100476534C (zh) * | 2004-09-08 | 2009-04-08 | 长兴化学工业股份有限公司 | 高硬度光学膜及其用途 |
US7341784B2 (en) * | 2004-09-10 | 2008-03-11 | General Electric Company | Light management film and its preparation and use |
CN101142499A (zh) * | 2004-09-28 | 2008-03-12 | 布鲁尔科技公司 | 用于光电子用途的可固化的高折射率树脂 |
US20060105483A1 (en) * | 2004-11-18 | 2006-05-18 | Leatherdale Catherine A | Encapsulated light emitting diodes and methods of making |
GB0427607D0 (en) * | 2004-12-16 | 2005-01-19 | Microsharp Corp Ltd | Structured optical film |
US7195360B2 (en) * | 2004-12-28 | 2007-03-27 | 3M Innovative Properties Company | Prismatic retroreflective article and method |
CN100526917C (zh) * | 2004-12-28 | 2009-08-12 | 3M创新有限公司 | 具有含氟或含硅的棱镜的棱镜式逆向反射制品 |
US7264872B2 (en) * | 2004-12-30 | 2007-09-04 | 3M Innovative Properties Company | Durable high index nanocomposites for AR coatings |
US7491441B2 (en) * | 2004-12-30 | 2009-02-17 | 3M Innovative Properties Company | High refractive index, durable hard coats |
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JP2010519599A (ja) | 2007-02-27 | 2010-06-03 | スリーエム イノベイティブ プロパティズ カンパニー | 耐亀裂性が改良されたナノコンポジット構造を備えた輝度向上フィルム |
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CN103038567A (zh) | 2010-04-16 | 2013-04-10 | 弗莱克斯照明第二有限责任公司 | 包括膜基光导的照明装置 |
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CA2088113C (en) | 1992-01-27 | 1999-03-30 | Tomohiro Yokota | Light adjusting sheet for a planar lighting device and a planar lighting device and a liquid crystal display using the sheet |
JP3155327B2 (ja) | 1992-03-27 | 2001-04-09 | 三菱化学株式会社 | 高屈折率光学材料およびその製造法 |
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-
2000
- 2000-12-21 US US09/746,613 patent/US6541591B2/en not_active Expired - Lifetime
-
2001
- 2001-05-01 DE DE60116143T patent/DE60116143T2/de not_active Expired - Fee Related
- 2001-05-01 WO PCT/US2001/014040 patent/WO2002051892A1/en active IP Right Grant
- 2001-05-01 JP JP2002552980A patent/JP2004516367A/ja active Pending
- 2001-05-01 AT AT01932822T patent/ATE313572T1/de not_active IP Right Cessation
- 2001-05-01 CN CNB018207715A patent/CN1226321C/zh not_active Expired - Fee Related
- 2001-05-01 KR KR1020037008351A patent/KR100727501B1/ko not_active IP Right Cessation
- 2001-05-01 EP EP01932822A patent/EP1352000B1/de not_active Expired - Lifetime
-
2002
- 2002-11-12 US US10/292,275 patent/US6953623B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US6541591B2 (en) | 2003-04-01 |
KR100727501B1 (ko) | 2007-06-12 |
JP2004516367A (ja) | 2004-06-03 |
ATE313572T1 (de) | 2006-01-15 |
WO2002051892A1 (en) | 2002-07-04 |
KR20030097797A (ko) | 2003-12-31 |
CN1481398A (zh) | 2004-03-10 |
EP1352000B1 (de) | 2005-12-21 |
DE60116143T2 (de) | 2006-08-03 |
US6953623B2 (en) | 2005-10-11 |
US20020123589A1 (en) | 2002-09-05 |
US20030100693A1 (en) | 2003-05-29 |
CN1226321C (zh) | 2005-11-09 |
EP1352000A1 (de) | 2003-10-15 |
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