DE60137081D1 - Verfahren zum plattieren von polymerformmassen, schaltungsbildende komponente und verfahren zur herstellung der schaltungsbildenden komponente - Google Patents

Verfahren zum plattieren von polymerformmassen, schaltungsbildende komponente und verfahren zur herstellung der schaltungsbildenden komponente

Info

Publication number
DE60137081D1
DE60137081D1 DE60137081T DE60137081T DE60137081D1 DE 60137081 D1 DE60137081 D1 DE 60137081D1 DE 60137081 T DE60137081 T DE 60137081T DE 60137081 T DE60137081 T DE 60137081T DE 60137081 D1 DE60137081 D1 DE 60137081D1
Authority
DE
Germany
Prior art keywords
circuit
forming component
producing
polymer molding
plating polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60137081T
Other languages
English (en)
Inventor
Hirokazu Tanaka
Satoshi Hirono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Omron Corp
Original Assignee
Omron Corp
Omron Tateisi Electronics Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Omron Corp, Omron Tateisi Electronics Co filed Critical Omron Corp
Application granted granted Critical
Publication of DE60137081D1 publication Critical patent/DE60137081D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4644Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4661Adding a circuit layer by direct wet plating, e.g. electroless plating; insulating materials adapted therefor
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1603Process or apparatus coating on selected surface areas
    • C23C18/1607Process or apparatus coating on selected surface areas by direct patterning
    • C23C18/1608Process or apparatus coating on selected surface areas by direct patterning from pretreatment step, i.e. selective pre-treatment
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/2006Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
    • C23C18/2026Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by radiant energy
    • C23C18/204Radiation, e.g. UV, laser
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating
    • C23C18/30Activating or accelerating or sensitising with palladium or other noble metal
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02Electroplating of selected surface areas
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/54Electroplating of non-metallic surfaces
    • C25D5/56Electroplating of non-metallic surfaces of plastics
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/188Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by direct electroplating
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/02Fillers; Particles; Fibers; Reinforcement materials
    • H05K2201/0203Fillers and particles
    • H05K2201/0206Materials
    • H05K2201/0209Inorganic, non-metallic particles
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03Conductive materials
    • H05K2201/032Materials
    • H05K2201/0323Carbon
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0756Uses of liquids, e.g. rinsing, coating, dissolving
    • H05K2203/0759Forming a polymer layer by liquid coating, e.g. a non-metallic protective coating or an organic bonding layer
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/10Using electric, magnetic and electromagnetic fields; Using laser light
    • H05K2203/107Using laser light
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/11Treatments characterised by their effect, e.g. heating, cooling, roughening
    • H05K2203/1136Conversion of insulating material into conductive material, e.g. by pyrolysis
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0011Working of insulating substrates or insulating layers
    • H05K3/0017Etching of the substrate by chemical or physical means
    • H05K3/0026Etching of the substrate by chemical or physical means by laser ablation
    • H05K3/0032Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
    • H05K3/0035Etching of the substrate by chemical or physical means by laser ablation of organic insulating material of blind holes, i.e. having a metal layer at the bottom
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155Manufacturing circuit on or in base
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155Manufacturing circuit on or in base
    • Y10T29/49165Manufacturing circuit on or in base by forming conductive walled aperture in base
DE60137081T 2001-03-02 2001-03-02 Verfahren zum plattieren von polymerformmassen, schaltungsbildende komponente und verfahren zur herstellung der schaltungsbildenden komponente Expired - Lifetime DE60137081D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2001/001637 WO2002070780A1 (fr) 2001-03-02 2001-03-02 Procede servant a plaquer un materiau de moulage polymere, element constituant un circuit et procede servant a fabriquer cet element

Publications (1)

Publication Number Publication Date
DE60137081D1 true DE60137081D1 (de) 2009-01-29

Family

ID=29561068

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60137081T Expired - Lifetime DE60137081D1 (de) 2001-03-02 2001-03-02 Verfahren zum plattieren von polymerformmassen, schaltungsbildende komponente und verfahren zur herstellung der schaltungsbildenden komponente

Country Status (6)

Country Link
US (1) US7288287B2 (de)
EP (1) EP1371754B1 (de)
JP (1) JP3399434B2 (de)
CN (1) CN1217030C (de)
DE (1) DE60137081D1 (de)
WO (1) WO2002070780A1 (de)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4649557B2 (ja) * 2003-10-10 2011-03-09 財団法人21あおもり産業総合支援センター 配線製造方法
JP2005347424A (ja) * 2004-06-01 2005-12-15 Fuji Photo Film Co Ltd 多層配線板及びその製造方法
WO2007058975A2 (en) * 2005-11-10 2007-05-24 Second Sight Medical Products, Inc. Polymer layer comprising silicone and at least one metal trace and a process of manufacturing the same
JP4903479B2 (ja) * 2006-04-18 2012-03-28 富士フイルム株式会社 金属パターン形成方法、金属パターン、及びプリント配線板
JP2007324236A (ja) * 2006-05-30 2007-12-13 Nof Corp プリント配線板用フィルムに用いる樹脂組成物及びその用途
US7750076B2 (en) 2006-06-07 2010-07-06 Second Sight Medical Products, Inc. Polymer comprising silicone and at least one metal trace
US8533942B2 (en) * 2007-11-22 2013-09-17 Ajinomoto Co., Inc. Production method of multilayer printed wiring board and multilayer printed wiring board
TWI394506B (zh) * 2008-10-13 2013-04-21 Unimicron Technology Corp 多層立體線路的結構及其製作方法
US8278214B2 (en) * 2009-12-23 2012-10-02 Intel Corporation Through mold via polymer block package
JP2012241149A (ja) 2011-05-23 2012-12-10 Panasonic Corp 樹脂組成物及び回路基板の製造方法
US9842665B2 (en) 2013-02-21 2017-12-12 Nlight, Inc. Optimization of high resolution digitally encoded laser scanners for fine feature marking
US10464172B2 (en) 2013-02-21 2019-11-05 Nlight, Inc. Patterning conductive films using variable focal plane to control feature size
WO2014130895A1 (en) 2013-02-21 2014-08-28 Nlight Photonics Corporation Laser patterning multi-layer structures
WO2014130089A1 (en) * 2013-02-21 2014-08-28 Nlight Photonics Corporation Non-ablative laser patterning
FR3014012A1 (fr) * 2013-12-04 2015-06-05 Valeo Vision Materiau composite a base de polymere(s) et d'un metal
US10069271B2 (en) 2014-06-02 2018-09-04 Nlight, Inc. Scalable high power fiber laser
US10618131B2 (en) 2014-06-05 2020-04-14 Nlight, Inc. Laser patterning skew correction
CN105720463B (zh) 2014-08-01 2021-05-14 恩耐公司 光纤和光纤传输的激光器中的背向反射保护与监控
US9837783B2 (en) 2015-01-26 2017-12-05 Nlight, Inc. High-power, single-mode fiber sources
US10050404B2 (en) 2015-03-26 2018-08-14 Nlight, Inc. Fiber source with cascaded gain stages and/or multimode delivery fiber with low splice loss
US10520671B2 (en) 2015-07-08 2019-12-31 Nlight, Inc. Fiber with depressed central index for increased beam parameter product
CN108367389B (zh) 2015-11-23 2020-07-28 恩耐公司 激光加工方法和装置
WO2017091606A1 (en) 2015-11-23 2017-06-01 Nlight, Inc. Predictive modification of laser diode drive current waveform in high power laser systems
US11179807B2 (en) 2015-11-23 2021-11-23 Nlight, Inc. Fine-scale temporal control for laser material processing
EP3389915B1 (de) 2016-01-19 2021-05-05 NLIGHT, Inc. Verfahren zur verarbeitung von kalibrierungsdaten in 3d-laserabtastsystemen
WO2018063452A1 (en) 2016-09-29 2018-04-05 Nlight, Inc. Adjustable beam characteristics
US10732439B2 (en) 2016-09-29 2020-08-04 Nlight, Inc. Fiber-coupled device for varying beam characteristics
US10730785B2 (en) 2016-09-29 2020-08-04 Nlight, Inc. Optical fiber bending mechanisms
US11173548B2 (en) 2017-04-04 2021-11-16 Nlight, Inc. Optical fiducial generation for galvanometric scanner calibration

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4080513A (en) * 1975-11-03 1978-03-21 Metropolitan Circuits Incorporated Of California Molded circuit board substrate
US4615907A (en) * 1984-11-23 1986-10-07 Phillips Petroleum Company Plating poly(arylene sulfide) surfaces
DE3770896D1 (de) 1986-09-15 1991-07-25 Gen Electric Verfahren zur photoselektiven metallisierung.
JP2559717B2 (ja) * 1986-11-28 1996-12-04 呉羽化学工業株式会社 選択的化学メツキ法
JPS63186877A (ja) * 1987-01-28 1988-08-02 Nitto Electric Ind Co Ltd レ−ザ−メツキ法
JP2769833B2 (ja) * 1989-02-06 1998-06-25 富士写真フイルム株式会社 金属材料パターンの形成方法
US4981715A (en) * 1989-08-10 1991-01-01 Microelectronics And Computer Technology Corporation Method of patterning electroless plated metal on a polymer substrate
US4959119A (en) * 1989-11-29 1990-09-25 E. I. Du Pont De Nemours And Company Method for forming through holes in a polyimide substrate
JPH0480374A (ja) * 1990-07-23 1992-03-13 Nippondenso Co Ltd プリント配線板の製造方法
JP2740764B2 (ja) * 1990-11-19 1998-04-15 工業技術院長 高分子成形品表面の選択的無電解めっき方法
US5509557A (en) * 1994-01-24 1996-04-23 International Business Machines Corporation Depositing a conductive metal onto a substrate
JPH07240568A (ja) * 1994-02-28 1995-09-12 Mitsubishi Electric Corp 回路基板およびその製造方法
JP3206310B2 (ja) * 1994-07-01 2001-09-10 ダイキン工業株式会社 表面改質されたフッ素樹脂成形品
JP3311899B2 (ja) * 1995-01-20 2002-08-05 松下電器産業株式会社 回路基板及びその製造方法
JP2699920B2 (ja) * 1995-03-23 1998-01-19 日本電気株式会社 多層印刷配線板の製造方法
JPH0936522A (ja) 1995-07-14 1997-02-07 Fuji Kiko Denshi Kk プリント配線板における回路形成方法
JPH0964544A (ja) * 1995-08-24 1997-03-07 Dainippon Printing Co Ltd 多層プリント配線板およびその製造方法
JPH093653A (ja) * 1996-06-03 1997-01-07 Fuji Photo Film Co Ltd 導電材料の製造方法
JP3161407B2 (ja) * 1997-02-26 2001-04-25 株式会社村田製作所 無電解めっきのための活性化触媒液、および無電解めっき方法
JP3398713B2 (ja) * 1999-01-20 2003-04-21 独立行政法人産業技術総合研究所 無電解めっきの前処理方法
JP3498134B2 (ja) * 1999-01-20 2004-02-16 独立行政法人産業技術総合研究所 電解めっきの前処理方法
JP3598317B2 (ja) * 1999-01-20 2004-12-08 独立行政法人産業技術総合研究所 無電解めっきの前処理方法
JP2000212756A (ja) * 1999-01-20 2000-08-02 Agency Of Ind Science & Technol 無電解めっきの前処理方法
JP2001192847A (ja) * 2000-01-13 2001-07-17 Omron Corp 高分子成形材のメッキ形成方法
JP2001200370A (ja) * 2000-01-19 2001-07-24 Omron Corp 高分子成形材のメッキ形成方法
US6518514B2 (en) * 2000-08-21 2003-02-11 Matsushita Electric Industrial Co., Ltd. Circuit board and production of the same
US6730857B2 (en) * 2001-03-13 2004-05-04 International Business Machines Corporation Structure having laser ablated features and method of fabricating
US6797345B2 (en) * 2001-04-27 2004-09-28 Sumitomo Chemical Company, Limited Aromatic liquid-crystalline polyester metal laminate

Also Published As

Publication number Publication date
JP3399434B2 (ja) 2003-04-21
US7288287B2 (en) 2007-10-30
EP1371754A4 (de) 2007-07-11
JP2001226777A (ja) 2001-08-21
EP1371754B1 (de) 2008-12-17
WO2002070780A1 (fr) 2002-09-12
US20040112634A1 (en) 2004-06-17
CN1217030C (zh) 2005-08-31
EP1371754A1 (de) 2003-12-17
CN1492944A (zh) 2004-04-28

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