DE60138252D1 - Lithographischer Apparat, Verfahren zu dessen Kalibrierung und Verfahren zur Herstellung einer Vorrichtung - Google Patents
Lithographischer Apparat, Verfahren zu dessen Kalibrierung und Verfahren zur Herstellung einer VorrichtungInfo
- Publication number
- DE60138252D1 DE60138252D1 DE60138252T DE60138252T DE60138252D1 DE 60138252 D1 DE60138252 D1 DE 60138252D1 DE 60138252 T DE60138252 T DE 60138252T DE 60138252 T DE60138252 T DE 60138252T DE 60138252 D1 DE60138252 D1 DE 60138252D1
- Authority
- DE
- Germany
- Prior art keywords
- calibration
- making
- lithographic apparatus
- lithographic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
- G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Transmission And Conversion Of Sensor Element Output (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
- Optical Transform (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP00307306 | 2000-08-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE60138252D1 true DE60138252D1 (de) | 2009-05-20 |
Family
ID=8173221
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE60138252T Expired - Lifetime DE60138252D1 (de) | 2000-08-24 | 2001-08-22 | Lithographischer Apparat, Verfahren zu dessen Kalibrierung und Verfahren zur Herstellung einer Vorrichtung |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US6819425B2 (de) |
| JP (3) | JP4276801B2 (de) |
| KR (1) | KR100592569B1 (de) |
| DE (1) | DE60138252D1 (de) |
| TW (1) | TW527526B (de) |
Families Citing this family (96)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7561270B2 (en) * | 2000-08-24 | 2009-07-14 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufactured thereby |
| US7289212B2 (en) * | 2000-08-24 | 2007-10-30 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufacturing thereby |
| TW527526B (en) * | 2000-08-24 | 2003-04-11 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| US6986211B2 (en) * | 2003-03-14 | 2006-01-17 | Applied Precision, Llc | System and method of planar positioning |
| JP4289961B2 (ja) * | 2003-09-26 | 2009-07-01 | キヤノン株式会社 | 位置決め装置 |
| US7102729B2 (en) * | 2004-02-03 | 2006-09-05 | Asml Netherlands B.V. | Lithographic apparatus, measurement system, and device manufacturing method |
| JP4464166B2 (ja) * | 2004-02-27 | 2010-05-19 | キヤノン株式会社 | 測定装置を搭載した露光装置 |
| US7256871B2 (en) * | 2004-07-27 | 2007-08-14 | Asml Netherlands B.V. | Lithographic apparatus and method for calibrating the same |
| US7349069B2 (en) * | 2005-04-20 | 2008-03-25 | Asml Netherlands B.V. | Lithographic apparatus and positioning apparatus |
| CN100342211C (zh) * | 2005-08-26 | 2007-10-10 | 哈尔滨工业大学 | 双光栅位移传感器计数方式的位置检测装置及其检测方法 |
| KR100869306B1 (ko) * | 2005-09-13 | 2008-11-18 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치 및 디바이스 제조 방법 |
| US7417710B2 (en) * | 2005-09-26 | 2008-08-26 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7440113B2 (en) | 2005-12-23 | 2008-10-21 | Agilent Technologies, Inc. | Littrow interferometer |
| EP2801864B8 (de) * | 2006-01-19 | 2015-11-04 | Nikon Corporation | Belichtungsvorrichtung, Belichtungsverfahren und Verfahren zur Herstellung einer Vorrichtung |
| US8908145B2 (en) * | 2006-02-21 | 2014-12-09 | Nikon Corporation | Pattern forming apparatus and pattern forming method, movable body drive system and movable body drive method, exposure apparatus and exposure method, and device manufacturing method |
| JP5177674B2 (ja) | 2006-02-21 | 2013-04-03 | 株式会社ニコン | 測定装置及び方法、パターン形成装置及び方法、並びにデバイス製造方法 |
| CN101980085B (zh) * | 2006-02-21 | 2012-11-07 | 株式会社尼康 | 曝光装置、曝光方法及组件制造方法 |
| KR101529845B1 (ko) | 2006-08-31 | 2015-06-17 | 가부시키가이샤 니콘 | 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법 |
| TWI442191B (zh) | 2006-08-31 | 2014-06-21 | 尼康股份有限公司 | Mobile body drive system and moving body driving method, pattern forming apparatus and method, exposure apparatus and method, component manufacturing method, and method of determining |
| SG174737A1 (en) | 2006-08-31 | 2011-10-28 | Nikon Corp | Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method |
| TW201809913A (zh) * | 2006-09-01 | 2018-03-16 | 日商尼康股份有限公司 | 曝光裝置、曝光方法、以及元件製造方法 |
| TWI622084B (zh) | 2006-09-01 | 2018-04-21 | Nikon Corp | Mobile body driving method, moving body driving system, pattern forming method and device, exposure method and device, component manufacturing method, and correction method |
| US7999918B2 (en) * | 2006-09-29 | 2011-08-16 | Nikon Corporation | Movable body system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method |
| US7714981B2 (en) * | 2006-10-30 | 2010-05-11 | Asml Netherlands B.V. | Lithographic apparatus and method |
| US7903866B2 (en) * | 2007-03-29 | 2011-03-08 | Asml Netherlands B.V. | Measurement system, lithographic apparatus and method for measuring a position dependent signal of a movable object |
| US7999912B2 (en) * | 2007-05-08 | 2011-08-16 | Asml Netherlands B.V. | Lithographic apparatus and sensor calibration method |
| US8687166B2 (en) * | 2007-05-24 | 2014-04-01 | Asml Netherlands B.V. | Lithographic apparatus having an encoder position sensor system |
| US8760615B2 (en) * | 2007-05-24 | 2014-06-24 | Asml Netherlands B.V. | Lithographic apparatus having encoder type position sensor system |
| US20080297740A1 (en) * | 2007-05-29 | 2008-12-04 | Phong Huynh | Projection system and method of use thereof |
| US7804579B2 (en) * | 2007-06-21 | 2010-09-28 | Asml Netherlands B.V. | Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product |
| US8174671B2 (en) * | 2007-06-21 | 2012-05-08 | Asml Netherlands B.V. | Lithographic projection apparatus and method for controlling a support structure |
| TWI534408B (zh) | 2007-07-24 | 2016-05-21 | 尼康股份有限公司 | Position measuring system, exposure apparatus, position measuring method, exposure method and component manufacturing method, and measuring tool and measuring method |
| US8547527B2 (en) | 2007-07-24 | 2013-10-01 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and pattern formation apparatus, and device manufacturing method |
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| US9304412B2 (en) * | 2007-08-24 | 2016-04-05 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and measuring method |
| DE102007046927A1 (de) * | 2007-09-28 | 2009-04-02 | Carl Zeiss Smt Ag | Kalibrierung einer Positionsmesseinrichtung einer optischen Einrichtung |
| US8715909B2 (en) * | 2007-10-05 | 2014-05-06 | Infineon Technologies Ag | Lithography systems and methods of manufacturing using thereof |
| NL1036028A1 (nl) * | 2007-10-09 | 2009-04-15 | Asml Netherlands Bv | Servo control system, lithographic apparatus and control method. |
| US9013681B2 (en) * | 2007-11-06 | 2015-04-21 | Nikon Corporation | Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method |
| US9256140B2 (en) * | 2007-11-07 | 2016-02-09 | Nikon Corporation | Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method with measurement device to measure movable body in Z direction |
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| US8422015B2 (en) * | 2007-11-09 | 2013-04-16 | Nikon Corporation | Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method |
| NL1036180A1 (nl) * | 2007-11-20 | 2009-05-25 | Asml Netherlands Bv | Stage system, lithographic apparatus including such stage system, and correction method. |
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| US8711327B2 (en) * | 2007-12-14 | 2014-04-29 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
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| NL1036404A1 (nl) * | 2008-01-10 | 2009-07-13 | Asml Netherlands Bv | Lithographic apparatus with an encoder arranged for defining a zero level. |
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| KR101670624B1 (ko) | 2008-04-30 | 2016-11-09 | 가부시키가이샤 니콘 | 스테이지 장치, 패턴 형성 장치, 노광 장치, 스테이지 구동 방법, 노광 방법, 그리고 디바이스 제조 방법 |
| US8228482B2 (en) * | 2008-05-13 | 2012-07-24 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
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-
2001
- 2001-08-16 TW TW090120118A patent/TW527526B/zh not_active IP Right Cessation
- 2001-08-22 JP JP2001251788A patent/JP4276801B2/ja not_active Expired - Fee Related
- 2001-08-22 DE DE60138252T patent/DE60138252D1/de not_active Expired - Lifetime
- 2001-08-22 US US09/928,462 patent/US6819425B2/en not_active Expired - Lifetime
- 2001-08-22 KR KR1020010050656A patent/KR100592569B1/ko active IP Right Grant
-
2006
- 2006-12-25 JP JP2006347587A patent/JP4854499B2/ja not_active Expired - Fee Related
-
2008
- 2008-08-20 US US12/194,789 patent/US7633619B2/en not_active Expired - Lifetime
-
2009
- 2009-01-28 JP JP2009016792A patent/JP4966986B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP4854499B2 (ja) | 2012-01-18 |
| US6819425B2 (en) | 2004-11-16 |
| JP2007180553A (ja) | 2007-07-12 |
| TW527526B (en) | 2003-04-11 |
| JP2002151405A (ja) | 2002-05-24 |
| US20020041380A1 (en) | 2002-04-11 |
| JP2009164618A (ja) | 2009-07-23 |
| KR20020016531A (ko) | 2002-03-04 |
| US20080309950A1 (en) | 2008-12-18 |
| JP4276801B2 (ja) | 2009-06-10 |
| US7633619B2 (en) | 2009-12-15 |
| KR100592569B1 (ko) | 2006-06-26 |
| JP4966986B2 (ja) | 2012-07-04 |
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