DE602004003125D1 - Verfahren zur erkennung eines defekten pixels - Google Patents

Verfahren zur erkennung eines defekten pixels

Info

Publication number
DE602004003125D1
DE602004003125D1 DE602004003125T DE602004003125T DE602004003125D1 DE 602004003125 D1 DE602004003125 D1 DE 602004003125D1 DE 602004003125 T DE602004003125 T DE 602004003125T DE 602004003125 T DE602004003125 T DE 602004003125T DE 602004003125 D1 DE602004003125 D1 DE 602004003125D1
Authority
DE
Germany
Prior art keywords
detecting
defective pixel
defective
pixel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE602004003125T
Other languages
English (en)
Other versions
DE602004003125T2 (de
Inventor
Peter Duerr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Micronic Laser Systems AB
Original Assignee
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Micronic Laser Systems AB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV, Micronic Laser Systems AB filed Critical Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Publication of DE602004003125D1 publication Critical patent/DE602004003125D1/de
Application granted granted Critical
Publication of DE602004003125T2 publication Critical patent/DE602004003125T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
    • G09G3/006—Electronic inspection or testing of displays and display drivers, e.g. of LED or LCD displays
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70653—Metrology techniques
    • G03F7/70666—Aerial image, i.e. measuring the image of the patterned exposure light at the image plane of the projection system
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N17/00—Diagnosis, testing or measuring for television systems or their details
    • H04N17/002—Diagnosis, testing or measuring for television systems or their details for television cameras
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
    • G09G3/20—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
    • G09G3/34—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source
DE602004003125T 2003-01-15 2004-01-14 Verfahren zur erkennung eines defekten pixels Expired - Fee Related DE602004003125T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US44014503P 2003-01-15 2003-01-15
US440145P 2003-01-15
PCT/SE2004/000025 WO2004063695A1 (en) 2003-01-15 2004-01-14 A method to detect a defective pixel

Publications (2)

Publication Number Publication Date
DE602004003125D1 true DE602004003125D1 (de) 2006-12-21
DE602004003125T2 DE602004003125T2 (de) 2007-08-23

Family

ID=32713533

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004003125T Expired - Fee Related DE602004003125T2 (de) 2003-01-15 2004-01-14 Verfahren zur erkennung eines defekten pixels

Country Status (7)

Country Link
US (1) US7061226B2 (de)
EP (1) EP1583946B1 (de)
JP (1) JP2006516724A (de)
KR (1) KR20050086953A (de)
CN (1) CN1723384A (de)
DE (1) DE602004003125T2 (de)
WO (1) WO2004063695A1 (de)

Families Citing this family (58)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI289708B (en) 2002-12-25 2007-11-11 Qualcomm Mems Technologies Inc Optical interference type color display
EP2270597B1 (de) 2003-04-09 2017-11-01 Nikon Corporation Belichtungsmethode und -apparat sowie Methode zur Herstellung einer Vorrichtung
TWI569308B (zh) 2003-10-28 2017-02-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
TWI385414B (zh) 2003-11-20 2013-02-11 尼康股份有限公司 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
US7342705B2 (en) 2004-02-03 2008-03-11 Idc, Llc Spatial light modulator with integrated optical compensation structure
TWI609410B (zh) 2004-02-06 2017-12-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
US7706050B2 (en) 2004-03-05 2010-04-27 Qualcomm Mems Technologies, Inc. Integrated modulator illumination
US7750886B2 (en) * 2004-09-27 2010-07-06 Qualcomm Mems Technologies, Inc. Methods and devices for lighting displays
US7457547B2 (en) * 2004-11-08 2008-11-25 Optium Australia Pty Limited Optical calibration system and method
KR20070104444A (ko) * 2005-01-28 2007-10-25 에이에스엠엘 홀딩 엔.브이. 전체적 최적화에 기초한 무마스크 리소그래피래스터라이제이션 기술을 위한 방법 및 시스템
US7630085B2 (en) * 2005-04-19 2009-12-08 Texas Instruments Incorporated Interferometers of high resolutions
US20060232784A1 (en) * 2005-04-19 2006-10-19 Regis Grasser Interferometers of high resolutions
US7557932B2 (en) * 2005-04-19 2009-07-07 Texas Instruments Incorporated Characterization of micromirror array devices using interferometers
EP1739751B1 (de) * 2005-06-30 2008-07-02 CSEM Centre Suisse d'Electronique et de Microtechnique SA Farbbildaufnahmesensor
US20070081739A1 (en) * 2005-10-11 2007-04-12 International Business Machines Corporation Modifying text or images when defect pixels are found on a display
US7936445B2 (en) * 2006-06-19 2011-05-03 Asml Netherlands B.V. Altering pattern data based on measured optical element characteristics
US7766498B2 (en) 2006-06-21 2010-08-03 Qualcomm Mems Technologies, Inc. Linear solid state illuminator
US7845841B2 (en) 2006-08-28 2010-12-07 Qualcomm Mems Technologies, Inc. Angle sweeping holographic illuminator
WO2008045311A2 (en) 2006-10-06 2008-04-17 Qualcomm Mems Technologies, Inc. Illumination device with built-in light coupler
US8107155B2 (en) * 2006-10-06 2012-01-31 Qualcomm Mems Technologies, Inc. System and method for reducing visual artifacts in displays
US7855827B2 (en) 2006-10-06 2010-12-21 Qualcomm Mems Technologies, Inc. Internal optical isolation structure for integrated front or back lighting
EP2366945A1 (de) 2006-10-06 2011-09-21 Qualcomm Mems Technologies, Inc. Beleuchtungseinrichtung einer Anzeigevorrichtung mit darin integrierter Struktur zur Erzeugung optischer Verluste
KR20090094241A (ko) * 2006-10-06 2009-09-04 퀄컴 엠이엠스 테크놀로지스, 인크. 박형 라이트 바 및 그 제조방법
US7864395B2 (en) 2006-10-27 2011-01-04 Qualcomm Mems Technologies, Inc. Light guide including optical scattering elements and a method of manufacture
US20080117231A1 (en) * 2006-11-19 2008-05-22 Tom Kimpe Display assemblies and computer programs and methods for defect compensation
US7777954B2 (en) 2007-01-30 2010-08-17 Qualcomm Mems Technologies, Inc. Systems and methods of providing a light guiding layer
KR101440762B1 (ko) * 2007-02-06 2014-09-17 칼 짜이스 에스엠테 게엠베하 마이크로리소그래피 투영 노광 장치의 조명 시스템 내의 다수의 미러 어레이들을 감시하는 방법 및 장치
CN100573315C (zh) 2007-04-04 2009-12-23 鸿富锦精密工业（深圳）有限公司 相机模块污点测试系统及方法
US7733439B2 (en) 2007-04-30 2010-06-08 Qualcomm Mems Technologies, Inc. Dual film light guide for illuminating displays
US7759620B2 (en) * 2007-07-03 2010-07-20 Micronic Laser Systems Ab Fourier plane analysis and refinement of SLM calibration
DE102008040742A1 (de) * 2007-08-02 2009-02-05 Carl Zeiss Smt Ag Verfahren und Vorrichtung zur Überwachung von Mehrfachspiegelanordnungen, optische Anordnung mit einer derartigen Vorrichtung sowie mit einer zweiten Mehrfachspiegelanordnung zum Ein- und Ausschalten einer ersten Mehrfachspiegelanordnung sowie Beleuchtungsoptik für eine Projektionsbelichtungsanlage mit einer derartigen Vorrichtung
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
JP5267029B2 (ja) * 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
WO2009050976A1 (en) 2007-10-16 2009-04-23 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
CN101681125B (zh) * 2007-10-16 2013-08-21 株式会社尼康 照明光学系统、曝光装置以及元件制造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) * 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US8654061B2 (en) 2008-02-12 2014-02-18 Qualcomm Mems Technologies, Inc. Integrated front light solution
WO2009102731A2 (en) 2008-02-12 2009-08-20 Qualcomm Mems Technologies, Inc. Devices and methods for enhancing brightness of displays using angle conversion layers
US8049951B2 (en) 2008-04-15 2011-11-01 Qualcomm Mems Technologies, Inc. Light with bi-directional propagation
US8118468B2 (en) * 2008-05-16 2012-02-21 Qualcomm Mems Technologies, Inc. Illumination apparatus and methods
CN101910817B (zh) * 2008-05-28 2016-03-09 株式会社尼康 照明光学系统、曝光装置以及器件制造方法
JP2011526053A (ja) * 2008-06-04 2011-09-29 クォルコム・メムズ・テクノロジーズ・インコーポレーテッド プリズム前方光に対するエッジシャドウの減少方法
DE102009009372A1 (de) * 2009-02-18 2010-08-19 Carl Zeiss Smt Ag Monitoring von kippbaren Spiegeln
KR20120030460A (ko) 2009-05-29 2012-03-28 퀄컴 엠이엠스 테크놀로지스, 인크. 조명장치 및 그의 제조방법
JP5481400B2 (ja) * 2010-01-15 2014-04-23 株式会社日立ハイテクノロジーズ マイクロミラーデバイスの選別方法、マイクロミラーデバイス選別装置およびマスクレス露光装置
US8902484B2 (en) 2010-12-15 2014-12-02 Qualcomm Mems Technologies, Inc. Holographic brightness enhancement film
US10317346B2 (en) 2011-09-02 2019-06-11 Nikon Corporation Method and device for inspecting spatial light modulator, and exposure method and device
KR101338362B1 (ko) * 2012-03-09 2013-12-06 삼성전기주식회사 디지털 마이크로 미러 장치용 미러 불량 검출장치
DE102013222935A1 (de) * 2013-11-11 2015-05-13 Carl Zeiss Smt Gmbh Vorrichtung zum Ermitteln eines Kippwinkels wenigstens eines Spiegels einer Lithographieanlage sowie Verfahren
CN104978747A (zh) * 2015-06-26 2015-10-14 清华大学 空间光调制器显微缺陷检测的目标提取方法及装置
CN104977154B (zh) * 2015-06-26 2017-10-24 清华大学 具有子像素结构的空间光调制器缺陷分类方法
WO2017099719A1 (en) * 2015-12-08 2017-06-15 Carestream Health, Inc. 3-d scanner calibration with active display target device
JP6702602B2 (ja) * 2016-08-25 2020-06-03 Ｎｅｃディスプレイソリューションズ株式会社 自己画像診断方法、自己画像診断プログラム、ディスプレイ装置、及び自己画像診断システム
JP6879841B2 (ja) * 2017-06-28 2021-06-02 株式会社 東京ウエルズ 画像処理方法および欠陥検査方法
JP2020067387A (ja) * 2018-10-25 2020-04-30 株式会社エスケーエレクトロニクス 欠陥画素検出装置及び欠陥画素検出方法
JP7193353B2 (ja) * 2019-01-10 2022-12-20 株式会社エスケーエレクトロニクス 空間光変調素子の検査装置及び検査方法
DE102022117536A1 (de) 2022-07-13 2024-01-18 Precitec Optronik Gmbh Vorrichtung zur chromatisch konfokalen Messung von Abständen

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4476465A (en) * 1982-08-30 1984-10-09 Litton Systems, Inc. Magneto-optic display generator
US4945351A (en) 1988-05-23 1990-07-31 Hewlett-Packard Company Technique for optimizing grayscale character displays
US4908780A (en) * 1988-10-14 1990-03-13 Sun Microsystems, Inc. Anti-aliasing raster operations utilizing sub-pixel crossing information to control pixel shading
US5123085A (en) * 1990-03-19 1992-06-16 Sun Microsystems, Inc. Method and apparatus for rendering anti-aliased polygons
WO1991017483A1 (de) * 1990-05-02 1991-11-14 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Belichtungsvorrichtung
US5042950A (en) * 1990-05-22 1991-08-27 The United States Of America As Represented By The United States Department Of Energy Apparatus and method for laser beam diagnosis
US5278949A (en) * 1991-03-12 1994-01-11 Hewlett-Packard Company Polygon renderer which determines the coordinates of polygon edges to sub-pixel resolution in the X,Y and Z coordinates directions
EP0562424B1 (de) * 1992-03-25 1997-05-28 Texas Instruments Incorporated Eingebautes optisches Eichsystem
US5673376A (en) * 1992-05-19 1997-09-30 Eastman Kodak Company Method and apparatus for graphically generating images of arbitrary size
WO1994010633A1 (en) * 1992-11-02 1994-05-11 Etec Systems, Inc. Rasterizer for a pattern generation apparatus
GB2278524B (en) * 1993-05-28 1997-12-10 Nihon Unisys Ltd Method and apparatus for rendering visual images employing area calculation and blending of fractional pixel lists for anti-aliasing and transparency
US5684939A (en) * 1993-07-09 1997-11-04 Silicon Graphics, Inc. Antialiased imaging with improved pixel supersampling
US5673106A (en) * 1994-06-17 1997-09-30 Texas Instruments Incorporated Printing system with self-monitoring and adjustment
US5504504A (en) * 1994-07-13 1996-04-02 Texas Instruments Incorporated Method of reducing the visual impact of defects present in a spatial light modulator display
US5684510A (en) * 1994-07-19 1997-11-04 Microsoft Corporation Method of font rendering employing grayscale processing of grid fitted fonts
US5594854A (en) * 1995-03-24 1997-01-14 3Dlabs Inc. Ltd. Graphics subsystem with coarse subpixel correction
JPH09258339A (ja) * 1996-03-26 1997-10-03 Fuji Photo Film Co Ltd 画像形成装置
US5754286A (en) * 1996-05-30 1998-05-19 Fuji Photo Film Co., Ltd. Method of identifying defective picture element in image-wise exposure apparatus
US5701365A (en) 1996-06-21 1997-12-23 Xerox Corporation Subpixel character positioning with antialiasing with grey masking techniques
US6312134B1 (en) 1996-07-25 2001-11-06 Anvik Corporation Seamless, maskless lithography system using spatial light modulator
US6148117A (en) 1996-12-27 2000-11-14 Hewlett-Packard Company Image processing system with alterable local convolution kernel
US6188427B1 (en) * 1997-04-23 2001-02-13 Texas Instruments Incorporated Illumination system having an intensity calibration system
US6201545B1 (en) * 1997-09-23 2001-03-13 Ati Technologies, Inc. Method and apparatus for generating sub pixel masks in a three dimensional graphic processing system
JP3397101B2 (ja) * 1997-10-29 2003-04-14 株式会社日立製作所 欠陥検査方法および装置
US6496187B1 (en) 1998-02-17 2002-12-17 Sun Microsystems, Inc. Graphics system configured to perform parallel sample to pixel calculation
SE9800665D0 (sv) * 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
US6261728B1 (en) * 1998-10-19 2001-07-17 Vanguard International Semiconductor Corporation Mask image scanning exposure method
US6356340B1 (en) * 1998-11-20 2002-03-12 Advanced Micro Devices, Inc. Piezo programmable reticle for EUV lithography
US6859275B2 (en) * 1999-04-09 2005-02-22 Plain Sight Systems, Inc. System and method for encoded spatio-spectral information processing
US20020122237A1 (en) * 2001-03-01 2002-09-05 Torbjorn Sandstrom Method and apparatus for spatial light modulation
US6618185B2 (en) * 2001-11-28 2003-09-09 Micronic Laser Systems Ab Defective pixel compensation method
US6788416B2 (en) * 2002-05-22 2004-09-07 Texas Instruments Incorporated Method and apparatus for dynamic DMD testing
US6751005B1 (en) * 2002-12-20 2004-06-15 Eastman Kodak Company Compensating for pixel defects by spatial translation of scene content

Also Published As

Publication number Publication date
DE602004003125T2 (de) 2007-08-23
KR20050086953A (ko) 2005-08-30
EP1583946A1 (de) 2005-10-12
JP2006516724A (ja) 2006-07-06
EP1583946B1 (de) 2006-11-08
WO2004063695A1 (en) 2004-07-29
US20040207386A1 (en) 2004-10-21
US7061226B2 (en) 2006-06-13
CN1723384A (zh) 2006-01-18

Similar Documents

Publication Publication Date Title
DE602004003125D1 (de) Verfahren zur erkennung eines defekten pixels
DE60304785D1 (de) Verfahren zum Detektieren von defekten Bildpunkten in einem digitalen Bildsensor
DE602004027098D1 (de) Verfahren zur Detektion eines bevorstehenden Sensordefekts
DE602005015060D1 (de) Verfahren zur Abdichtung eines Anschlusses
DE502004009312D1 (de) Verfahren zum montieren eines endoskopes
DE50307227D1 (de) Verfahren zur Abtastung eines Bettungsprofiles
DE602005009452D1 (de) Verfahren zum Erstellung eines "Data-processing-Objects" zur Geräteüberwachung
DE50308639D1 (de) Verfahren zum Betreiben eines optischen Sensors
DE602005011374D1 (de) Verfahren zur Ansteuerung eines Bildspeichers
DE50205041D1 (de) Verfahren zur Erfassung eines Differenzdruckes
DE60230371D1 (de) Verfahren zur Reparatur eines Gegenstandes
ATE410764T1 (de) Verfahren zur authentifizierung eines produkts
DE502005009828D1 (de) Ortungsgerät sowie verfahren zur kalibrierung eines ortungsgeräts
DE102004010312B8 (de) Verfahren zum Einmessen eines Arbeitspunktes
DE50312488D1 (de) Verfahren zum berechnen eines individuellen progressivglases
DE60330524D1 (de) Verfahren zur Korrektur von satellitenerfassten Bildern
DE60323401D1 (de) Verfahren zur anzeige eines digital erfassten bildes
DE50301175D1 (de) Verfahren zur Beladung eines Verladezuges
DE602005015277D1 (de) Verfahren zur Kalibrierung eines DC-Bus -Offsets
DE602004000876D1 (de) Verfahren und Gerät zur Bildung eines dreidimensionalen Bildes
DE602004019219D1 (de) Verfahren zum Durchführen von Messungen auf digitalen Bildern
DE602004016209D1 (de) Verfahren zur bildung eines elastomeren artikels
DE602006015119D1 (de) Vorrichtung und Verfahren zum Drucken von Bildern außerhalb eines normalen Farbbereichs
DE502004009755D1 (de) Verfahren zum Betreiben eines Radarsensors
DE602004003639D1 (de) Verfahren und Vorrichtung zur Detektion eines Fernsehkinosignals

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee