DE602004008880D1 - Polierartikel für elektro-chemisches-mechanisches polieren - Google Patents

Polierartikel für elektro-chemisches-mechanisches polieren

Info

Publication number
DE602004008880D1
DE602004008880D1 DE602004008880T DE602004008880T DE602004008880D1 DE 602004008880 D1 DE602004008880 D1 DE 602004008880D1 DE 602004008880 T DE602004008880 T DE 602004008880T DE 602004008880 T DE602004008880 T DE 602004008880T DE 602004008880 D1 DE602004008880 D1 DE 602004008880D1
Authority
DE
Germany
Prior art keywords
polishing
electro
chemical
products
mechanical polishing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE602004008880T
Other languages
English (en)
Other versions
DE602004008880T2 (de
Inventor
Michael H Bunyan
Thomas A Clement
John J Hannafin
Marc E Larosse
Kent M Young
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Parker Hannifin Corp
Original Assignee
Parker Hannifin Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Parker Hannifin Corp filed Critical Parker Hannifin Corp
Publication of DE602004008880D1 publication Critical patent/DE602004008880D1/de
Application granted granted Critical
Publication of DE602004008880T2 publication Critical patent/DE602004008880T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
    • B23H5/00—Combined machining
    • B23H5/06—Electrochemical machining combined with mechanical working, e.g. grinding or honing
    • B23H5/08—Electrolytic grinding
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/046—Lapping machines or devices; Accessories designed for working plane surfaces using electric current
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
DE602004008880T 2003-02-18 2004-01-21 Polierartikel für elektro-chemisches-mechanisches polieren Expired - Lifetime DE602004008880T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US44819903P 2003-02-18 2003-02-18
US448199P 2003-02-18
PCT/US2004/001440 WO2004073926A1 (en) 2003-02-18 2004-01-21 Polishing article for electro-chemical mechanical polishing

Publications (2)

Publication Number Publication Date
DE602004008880D1 true DE602004008880D1 (de) 2007-10-25
DE602004008880T2 DE602004008880T2 (de) 2008-06-26

Family

ID=32908556

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004008880T Expired - Lifetime DE602004008880T2 (de) 2003-02-18 2004-01-21 Polierartikel für elektro-chemisches-mechanisches polieren

Country Status (4)

Country Link
US (1) US7141155B2 (de)
EP (1) EP1594656B1 (de)
DE (1) DE602004008880T2 (de)
WO (1) WO2004073926A1 (de)

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US8012000B2 (en) 2007-04-02 2011-09-06 Applied Materials, Inc. Extended pad life for ECMP and barrier removal
JP2009117653A (ja) * 2007-11-07 2009-05-28 Elpida Memory Inc 半導体装置及びその製造方法
TWI465315B (zh) * 2008-11-12 2014-12-21 Bestac Advanced Material Co Ltd 可導電之拋光墊及其製造方法
WO2011074691A1 (en) * 2009-12-15 2011-06-23 Osaka University Polishing method, polishing apparatus and polishing tool
US20110287698A1 (en) * 2010-05-18 2011-11-24 Hitachi Global Storage Technologies Netherlands B.V. System, method and apparatus for elastomer pad for fabricating magnetic recording disks
CN104668677A (zh) * 2013-12-02 2015-06-03 天津大学 用于钛合金电解加工的非水基电解液及其制备方法
CN104742007B (zh) * 2013-12-30 2017-08-25 中芯国际集成电路制造(北京)有限公司 化学机械研磨装置和化学机械研磨方法
CN114654380A (zh) * 2022-04-07 2022-06-24 大连理工大学 一种碳化硅晶片电化学机械抛光方法

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Also Published As

Publication number Publication date
US20040159558A1 (en) 2004-08-19
EP1594656B1 (de) 2007-09-12
WO2004073926A1 (en) 2004-09-02
EP1594656A1 (de) 2005-11-16
US7141155B2 (en) 2006-11-28
DE602004008880T2 (de) 2008-06-26

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