DE602004030058D1 - Zur Verwendung in Dampfphasenabscheidungsprozessen geeignete, metallorganische Germanium-Verbindungen - Google Patents

Zur Verwendung in Dampfphasenabscheidungsprozessen geeignete, metallorganische Germanium-Verbindungen

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Publication number
DE602004030058D1
DE602004030058D1 DE602004030058T DE602004030058T DE602004030058D1 DE 602004030058 D1 DE602004030058 D1 DE 602004030058D1 DE 602004030058 T DE602004030058 T DE 602004030058T DE 602004030058 T DE602004030058 T DE 602004030058T DE 602004030058 D1 DE602004030058 D1 DE 602004030058D1
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Germany
Prior art keywords
vapor deposition
deposition processes
germanium compounds
suitable organometallic
organometallic germanium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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DE602004030058T
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English (en)
Inventor
Deodatta Vinayak Shenai-Khatkhate
Michael Brendan Power
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm and Haas Electronic Materials LLC
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Rohm and Haas Electronic Materials LLC
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Application filed by Rohm and Haas Electronic Materials LLC filed Critical Rohm and Haas Electronic Materials LLC
Publication of DE602004030058D1 publication Critical patent/DE602004030058D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06QINFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q10/00Administration; Management
    • G06Q10/10Office automation; Time management
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    • G06Q10/1091Recording time for administrative or management purposes
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/28Deposition of only one other non-metal element
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61BDIAGNOSIS; SURGERY; IDENTIFICATION
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C391/00Compounds containing selenium
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C395/00Compounds containing tellurium
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/0803Compounds with Si-C or Si-Si linkages
    • C07F7/0805Compounds with Si-C or Si-Si linkages comprising only Si, C or H atoms
    • C07F7/0807Compounds with Si-C or Si-Si linkages comprising only Si, C or H atoms comprising Si as a ring atom
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/0803Compounds with Si-C or Si-Si linkages
    • C07F7/0825Preparations of compounds not comprising Si-Si or Si-cyano linkages
    • C07F7/0827Syntheses with formation of a Si-C bond
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/30Germanium compounds
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06QINFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q10/00Administration; Management
    • G06Q10/06Resources, workflows, human or project management; Enterprise or organisation planning; Enterprise or organisation modelling
    • G06Q10/063Operations research, analysis or management
    • G06Q10/0631Resource planning, allocation, distributing or scheduling for enterprises or organisations
    • G06Q10/06311Scheduling, planning or task assignment for a person or group
    • G06Q10/063116Schedule adjustment for a person or group
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06VIMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V20/00Scenes; Scene-specific elements
    • G06V20/80Recognising image objects characterised by unique random patterns
    • GPHYSICS
    • G07CHECKING-DEVICES
    • G07CTIME OR ATTENDANCE REGISTERS; REGISTERING OR INDICATING THE WORKING OF MACHINES; GENERATING RANDOM NUMBERS; VOTING OR LOTTERY APPARATUS; ARRANGEMENTS, SYSTEMS OR APPARATUS FOR CHECKING NOT PROVIDED FOR ELSEWHERE
    • G07C1/00Registering, indicating or recording the time of events or elapsed time, e.g. time-recorders for work people

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
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  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Strategic Management (AREA)
  • Materials Engineering (AREA)
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  • Theoretical Computer Science (AREA)
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  • Inorganic Chemistry (AREA)
  • General Business, Economics & Management (AREA)
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  • Biophysics (AREA)
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DE602004030058T 2003-04-05 2004-04-01 Zur Verwendung in Dampfphasenabscheidungsprozessen geeignete, metallorganische Germanium-Verbindungen Expired - Lifetime DE602004030058D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US46079103P 2003-04-05 2003-04-05
US51347603P 2003-10-22 2003-10-22

Publications (1)

Publication Number Publication Date
DE602004030058D1 true DE602004030058D1 (de) 2010-12-23

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DE602004018219T Expired - Lifetime DE602004018219D1 (de) 2003-04-05 2004-04-01 Metallorganische Germanium-Verbindungen, geeignet zur Verwendung in Dampfphasenabscheidungsprozessen
DE602004030058T Expired - Lifetime DE602004030058D1 (de) 2003-04-05 2004-04-01 Zur Verwendung in Dampfphasenabscheidungsprozessen geeignete, metallorganische Germanium-Verbindungen

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Country Status (8)

Country Link
US (2) US7413776B2 (de)
EP (2) EP1990345B1 (de)
JP (2) JP4954448B2 (de)
KR (2) KR101200524B1 (de)
CN (1) CN100516289C (de)
DE (2) DE602004018219D1 (de)
SG (1) SG126757A1 (de)
TW (1) TWI318222B (de)

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CN100516289C (zh) 2009-07-22
KR20040086811A (ko) 2004-10-12
EP1990345B1 (de) 2010-11-10
TWI318222B (en) 2009-12-11
JP5460501B2 (ja) 2014-04-02
JP2004308007A (ja) 2004-11-04
EP1464724B1 (de) 2008-12-10
EP1464724A3 (de) 2007-01-10
US20090156852A1 (en) 2009-06-18
SG126757A1 (en) 2006-11-29
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CN1584108A (zh) 2005-02-23
KR101059732B1 (ko) 2011-08-26
US7767840B2 (en) 2010-08-03
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TW200424243A (en) 2004-11-16
US20040194703A1 (en) 2004-10-07
US7413776B2 (en) 2008-08-19
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KR20110091491A (ko) 2011-08-11
EP1990345A1 (de) 2008-11-12

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