DE602005000147D1 - Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung - Google Patents

Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung

Info

Publication number
DE602005000147D1
DE602005000147D1 DE602005000147T DE602005000147T DE602005000147D1 DE 602005000147 D1 DE602005000147 D1 DE 602005000147D1 DE 602005000147 T DE602005000147 T DE 602005000147T DE 602005000147 T DE602005000147 T DE 602005000147T DE 602005000147 D1 DE602005000147 D1 DE 602005000147D1
Authority
DE
Germany
Prior art keywords
making
lithographic apparatus
lithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005000147T
Other languages
English (en)
Other versions
DE602005000147T2 (de
Inventor
Jacobus Zaal
Johannes Mertens
Jeroen Ottens
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE602005000147D1 publication Critical patent/DE602005000147D1/de
Application granted granted Critical
Publication of DE602005000147T2 publication Critical patent/DE602005000147T2/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
DE602005000147T 2004-04-01 2005-03-31 Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung Active DE602005000147T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US814815 2001-03-23
US10/814,815 US7227619B2 (en) 2004-04-01 2004-04-01 Lithographic apparatus and device manufacturing method

Publications (2)

Publication Number Publication Date
DE602005000147D1 true DE602005000147D1 (de) 2006-11-09
DE602005000147T2 DE602005000147T2 (de) 2007-10-25

Family

ID=34887725

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005000147T Active DE602005000147T2 (de) 2004-04-01 2005-03-31 Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung

Country Status (8)

Country Link
US (1) US7227619B2 (de)
EP (1) EP1582935B1 (de)
JP (3) JP4350056B2 (de)
KR (1) KR100622089B1 (de)
CN (1) CN100520589C (de)
DE (1) DE602005000147T2 (de)
SG (2) SG136151A1 (de)
TW (1) TWI318725B (de)

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JP4669033B2 (ja) 2011-04-13
JP2011066440A (ja) 2011-03-31
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DE602005000147T2 (de) 2007-10-25
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CN1702555A (zh) 2005-11-30
US20050219499A1 (en) 2005-10-06
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EP1582935B1 (de) 2006-09-27
KR20060045412A (ko) 2006-05-17
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US7227619B2 (en) 2007-06-05
SG136151A1 (en) 2007-10-29

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