DE602005001835D1 - Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung - Google Patents

Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung

Info

Publication number
DE602005001835D1
DE602005001835D1 DE200560001835 DE602005001835T DE602005001835D1 DE 602005001835 D1 DE602005001835 D1 DE 602005001835D1 DE 200560001835 DE200560001835 DE 200560001835 DE 602005001835 T DE602005001835 T DE 602005001835T DE 602005001835 D1 DE602005001835 D1 DE 602005001835D1
Authority
DE
Germany
Prior art keywords
making
lithographic apparatus
lithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE200560001835
Other languages
English (en)
Other versions
DE602005001835T2 (de
Inventor
Pieter Renaat Maria Hennus
Jeroen Johannes Sophia Mertens
Patrick Johannes Corn Smulders
Peter Smits
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE602005001835D1 publication Critical patent/DE602005001835D1/de
Application granted granted Critical
Publication of DE602005001835T2 publication Critical patent/DE602005001835T2/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
DE200560001835 2004-12-08 2005-12-01 Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung Active DE602005001835T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US6550 2004-12-08
US11/006,550 US7365827B2 (en) 2004-12-08 2004-12-08 Lithographic apparatus and device manufacturing method

Publications (2)

Publication Number Publication Date
DE602005001835D1 true DE602005001835D1 (de) 2007-09-13
DE602005001835T2 DE602005001835T2 (de) 2008-04-17

Family

ID=36084289

Family Applications (2)

Application Number Title Priority Date Filing Date
DE200560009246 Active DE602005009246D1 (de) 2004-12-08 2005-12-01 Lithografische Vorrichtung und Herstellungsverfahren dafür
DE200560001835 Active DE602005001835T2 (de) 2004-12-08 2005-12-01 Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE200560009246 Active DE602005009246D1 (de) 2004-12-08 2005-12-01 Lithografische Vorrichtung und Herstellungsverfahren dafür

Country Status (8)

Country Link
US (3) US7365827B2 (de)
EP (3) EP1821150B1 (de)
JP (4) JP4322865B2 (de)
KR (1) KR100760316B1 (de)
CN (3) CN1786832B (de)
DE (2) DE602005009246D1 (de)
SG (2) SG123683A1 (de)
TW (1) TWI320876B (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7365827B2 (en) * 2004-12-08 2008-04-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7352440B2 (en) * 2004-12-10 2008-04-01 Asml Netherlands B.V. Substrate placement in immersion lithography
US7684010B2 (en) * 2005-03-09 2010-03-23 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing
US7633073B2 (en) * 2005-11-23 2009-12-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7830498B2 (en) * 2006-10-10 2010-11-09 Hewlett-Packard Development Company, L.P. Hydraulic-facilitated contact lithography apparatus, system and method
US7791709B2 (en) 2006-12-08 2010-09-07 Asml Netherlands B.V. Substrate support and lithographic process
US20080137055A1 (en) * 2006-12-08 2008-06-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL2004807A (en) 2009-06-30 2011-01-04 Asml Netherlands Bv Substrate table for a lithographic apparatus, litographic apparatus, method of using a substrate table and device manufacturing method.
NL2005120A (en) * 2009-09-21 2011-03-22 Asml Netherlands Bv Lithographic apparatus, coverplate and device manufacturing method.
NL2005126A (en) * 2009-09-21 2011-03-22 Asml Netherlands Bv Lithographic apparatus, coverplate and device manufacturing method.
NL2005478A (en) * 2009-11-17 2011-05-18 Asml Netherlands Bv Lithographic apparatus, removable member and device manufacturing method.
NL2005479A (en) * 2009-11-17 2011-05-18 Asml Netherlands Bv Lithographic apparatus, removable member and device manufacturing method.
NL2006203A (en) * 2010-03-16 2011-09-19 Asml Netherlands Bv Cover for a substrate table, substrate table for a lithographic apparatus, lithographic apparatus, and device manufacturing method.
NL2006244A (en) 2010-03-16 2011-09-19 Asml Netherlands Bv Lithographic apparatus, cover for use in a lithographic apparatus and method for designing a cover for use in a lithographic apparatus.
NL2006536A (en) * 2010-05-13 2011-11-15 Asml Netherlands Bv A substrate table, a lithographic apparatus, a method of flattening an edge of a substrate and a device manufacturing method.
JP5313293B2 (ja) 2010-05-19 2013-10-09 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、リソグラフィ装置で使用する流体ハンドリング構造およびデバイス製造方法
CN104412164B (zh) 2012-05-29 2017-09-12 Asml荷兰有限公司 支撑装置、光刻装置和器件制造方法

Family Cites Families (141)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE224448C (de)
DE206607C (de)
DE221563C (de)
DE242880C (de)
US2759254A (en) * 1953-08-17 1956-08-21 Robert M Soehnlen Method of connecting fluid pipes
GB1242527A (en) 1967-10-20 1971-08-11 Kodak Ltd Optical instruments
US3573975A (en) 1968-07-10 1971-04-06 Ibm Photochemical fabrication process
ATE1462T1 (de) 1979-07-27 1982-08-15 Werner W. Dr. Tabarelli Optisches lithographieverfahren und einrichtung zum kopieren eines musters auf eine halbleiterscheibe.
FR2474708B1 (fr) 1980-01-24 1987-02-20 Dme Procede de microphotolithographie a haute resolution de traits
US4574697A (en) 1980-08-11 1986-03-11 Norwood Industries, Inc. Sheet material for mounting printing plates
JPS5754317A (en) 1980-09-19 1982-03-31 Hitachi Ltd Method and device for forming pattern
US4346164A (en) 1980-10-06 1982-08-24 Werner Tabarelli Photolithographic method for the manufacture of integrated circuits
US4509852A (en) 1980-10-06 1985-04-09 Werner Tabarelli Apparatus for the photolithographic manufacture of integrated circuit elements
US4390273A (en) 1981-02-17 1983-06-28 Censor Patent-Und Versuchsanstalt Projection mask as well as a method and apparatus for the embedding thereof and projection printing system
JPS57153433A (en) 1981-03-18 1982-09-22 Hitachi Ltd Manufacturing device for semiconductor
JPS58202448A (ja) 1982-05-21 1983-11-25 Hitachi Ltd 露光装置
DD206607A1 (de) 1982-06-16 1984-02-01 Mikroelektronik Zt Forsch Tech Verfahren und vorrichtung zur beseitigung von interferenzeffekten
DD242880A1 (de) 1983-01-31 1987-02-11 Kuch Karl Heinz Einrichtung zur fotolithografischen strukturuebertragung
DD221563A1 (de) 1983-09-14 1985-04-24 Mikroelektronik Zt Forsch Tech Immersionsobjektiv fuer die schrittweise projektionsabbildung einer maskenstruktur
DD224448A1 (de) 1984-03-01 1985-07-03 Zeiss Jena Veb Carl Einrichtung zur fotolithografischen strukturuebertragung
JPS6265326A (ja) 1985-09-18 1987-03-24 Hitachi Ltd 露光装置
JPS62121417A (ja) 1985-11-22 1987-06-02 Hitachi Ltd 液浸対物レンズ装置
US4744634A (en) * 1986-04-28 1988-05-17 Hughes Aircraft Company Method and apparatus for reducing the effects of vibrational disturbances on the frequency stability of a laser
JPS63157419A (ja) 1986-12-22 1988-06-30 Toshiba Corp 微細パタ−ン転写装置
US5040020A (en) 1988-03-31 1991-08-13 Cornell Research Foundation, Inc. Self-aligned, high resolution resonant dielectric lithography
JPH03209479A (ja) 1989-09-06 1991-09-12 Sanee Giken Kk 露光方法
US5121256A (en) 1991-03-14 1992-06-09 The Board Of Trustees Of The Leland Stanford Junior University Lithography system employing a solid immersion lens
JPH04305915A (ja) 1991-04-02 1992-10-28 Nikon Corp 密着型露光装置
JPH04305917A (ja) 1991-04-02 1992-10-28 Nikon Corp 密着型露光装置
JP3110044B2 (ja) 1991-10-04 2000-11-20 アルキャン・インターナショナル・リミテッド 剥離可能な積層構造物とその製造方法
JP3151927B2 (ja) * 1992-04-10 2001-04-03 株式会社村田製作所 加速度センサ
JPH06124873A (ja) 1992-10-09 1994-05-06 Canon Inc 液浸式投影露光装置
JP2753930B2 (ja) 1992-11-27 1998-05-20 キヤノン株式会社 液浸式投影露光装置
JP2520833B2 (ja) 1992-12-21 1996-07-31 東京エレクトロン株式会社 浸漬式の液処理装置
US5354614A (en) 1993-03-01 1994-10-11 Minnesota Mining And Manufacturing Company Masking tape with stiffened edge and method of gasket masking
JPH07220990A (ja) 1994-01-28 1995-08-18 Hitachi Ltd パターン形成方法及びその露光装置
US5476712A (en) 1994-05-31 1995-12-19 Avery Dennison Corporation Flexographic plate mounting tape
JPH08316124A (ja) 1995-05-19 1996-11-29 Hitachi Ltd 投影露光方法及び露光装置
US20050025609A1 (en) 1996-01-03 2005-02-03 Oxford J. Craig Surface mount ring assembly for loudspeaker
WO1998009278A1 (en) 1996-08-26 1998-03-05 Digital Papyrus Technologies Method and apparatus for coupling an optical lens to a disk through a coupling medium having a relatively high index of refraction
US5825043A (en) 1996-10-07 1998-10-20 Nikon Precision Inc. Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
JP3612920B2 (ja) 1997-02-14 2005-01-26 ソニー株式会社 光学記録媒体の原盤作製用露光装置
US5870271A (en) 1997-02-19 1999-02-09 Applied Materials, Inc. Pressure actuated sealing diaphragm for chucks
JPH10255319A (ja) 1997-03-12 1998-09-25 Hitachi Maxell Ltd 原盤露光装置及び方法
JP3747566B2 (ja) 1997-04-23 2006-02-22 株式会社ニコン 液浸型露光装置
JP3817836B2 (ja) 1997-06-10 2006-09-06 株式会社ニコン 露光装置及びその製造方法並びに露光方法及びデバイス製造方法
US5900354A (en) 1997-07-03 1999-05-04 Batchelder; John Samuel Method for optical inspection and lithography
JPH11176727A (ja) 1997-12-11 1999-07-02 Nikon Corp 投影露光装置
EP1039511A4 (de) 1997-12-12 2005-03-02 Nikon Corp Verfahren zur projektionsbelichtung und projektionsausrichteinrichtung
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
JP2000058436A (ja) 1998-08-11 2000-02-25 Nikon Corp 投影露光装置及び露光方法
TWI242112B (en) * 1999-04-19 2005-10-21 Asml Netherlands Bv Lithographic projection apparatus and method of operating a lithographic projection apparatus
TWI242111B (en) 1999-04-19 2005-10-21 Asml Netherlands Bv Gas bearings for use in vacuum chambers and their application in lithographic projection apparatus
JP4504479B2 (ja) 1999-09-21 2010-07-14 オリンパス株式会社 顕微鏡用液浸対物レンズ
TW504605B (en) * 1999-12-03 2002-10-01 Asm Lithography Bv Lithographic projection apparatus, method of manufacturing a device using the same, the device and mask
JP2001272604A (ja) 2000-03-27 2001-10-05 Olympus Optical Co Ltd 液浸対物レンズおよびそれを用いた光学装置
TW591653B (en) 2000-08-08 2004-06-11 Koninkl Philips Electronics Nv Method of manufacturing an optically scannable information carrier
KR100866818B1 (ko) 2000-12-11 2008-11-04 가부시키가이샤 니콘 투영광학계 및 이 투영광학계를 구비한 노광장치
CN1423831A (zh) 2000-12-22 2003-06-11 株式会社尼康 波像差测定装置,波像差测定方法,曝光装置及微型器件的制造方法
US6736406B1 (en) * 2001-05-04 2004-05-18 Brian G. Provencher Self-adhesive gasket
US20020163629A1 (en) 2001-05-07 2002-11-07 Michael Switkes Methods and apparatus employing an index matching medium
US6600547B2 (en) 2001-09-24 2003-07-29 Nikon Corporation Sliding seal
US6897941B2 (en) 2001-11-07 2005-05-24 Applied Materials, Inc. Optical spot grid array printer
US20030089552A1 (en) 2001-11-13 2003-05-15 Sahawneh Nader F. Flexible, water-proof flashing tape
DE10210899A1 (de) 2002-03-08 2003-09-18 Zeiss Carl Smt Ag Refraktives Projektionsobjektiv für Immersions-Lithographie
DE10229818A1 (de) 2002-06-28 2004-01-15 Carl Zeiss Smt Ag Verfahren zur Fokusdetektion und Abbildungssystem mit Fokusdetektionssystem
JP3613470B2 (ja) 2002-03-12 2005-01-26 船井電機株式会社 光ヘッド
WO2004019128A2 (en) 2002-08-23 2004-03-04 Nikon Corporation Projection optical system and method for photolithography and exposure apparatus and method using same
US6788477B2 (en) 2002-10-22 2004-09-07 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus for method for immersion lithography
SG121822A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
KR100588124B1 (ko) 2002-11-12 2006-06-09 에이에스엠엘 네델란즈 비.브이. 리소그래피장치 및 디바이스제조방법
EP1420300B1 (de) 2002-11-12 2015-07-29 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
CN101382738B (zh) 2002-11-12 2011-01-12 Asml荷兰有限公司 光刻投射装置
DE60335595D1 (de) 2002-11-12 2011-02-17 Asml Netherlands Bv Lithographischer Apparat mit Immersion und Verfahren zur Herstellung einer Vorrichtung
EP1429188B1 (de) 2002-11-12 2013-06-19 ASML Netherlands B.V. Lithographischer Projektionsapparat
JP3977324B2 (ja) 2002-11-12 2007-09-19 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置
SG131766A1 (en) 2002-11-18 2007-05-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
SG121829A1 (en) 2002-11-29 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
DE10258718A1 (de) 2002-12-09 2004-06-24 Carl Zeiss Smt Ag Projektionsobjektiv, insbesondere für die Mikrolithographie, sowie Verfahren zur Abstimmung eines Projektionsobjektives
EP1571697A4 (de) 2002-12-10 2007-07-04 Nikon Corp Belichtungssystem und bauelementeherstellungsverfahren
DE10257766A1 (de) 2002-12-10 2004-07-15 Carl Zeiss Smt Ag Verfahren zur Einstellung einer gewünschten optischen Eigenschaft eines Projektionsobjektivs sowie mikrolithografische Projektionsbelichtungsanlage
EP1429190B1 (de) 2002-12-10 2012-05-09 Canon Kabushiki Kaisha Belichtungsapparat und -verfahren
AU2003302831A1 (en) 2002-12-10 2004-06-30 Nikon Corporation Exposure method, exposure apparatus and method for manufacturing device
KR20050085236A (ko) 2002-12-10 2005-08-29 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
JP4232449B2 (ja) 2002-12-10 2009-03-04 株式会社ニコン 露光方法、露光装置、及びデバイス製造方法
KR101085372B1 (ko) 2002-12-10 2011-11-21 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
JP4352874B2 (ja) 2002-12-10 2009-10-28 株式会社ニコン 露光装置及びデバイス製造方法
CN1717776A (zh) 2002-12-10 2006-01-04 株式会社尼康 光学元件及使用该光学元件的投影曝光装置
AU2003289272A1 (en) 2002-12-10 2004-06-30 Nikon Corporation Surface position detection apparatus, exposure method, and device porducing method
WO2004053953A1 (ja) 2002-12-10 2004-06-24 Nikon Corporation 露光装置及びデバイス製造方法
KR101157002B1 (ko) 2002-12-10 2012-06-21 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
AU2003289271A1 (en) 2002-12-10 2004-06-30 Nikon Corporation Exposure apparatus, exposure method and method for manufacturing device
US7242455B2 (en) 2002-12-10 2007-07-10 Nikon Corporation Exposure apparatus and method for producing device
JP2004193957A (ja) * 2002-12-11 2004-07-08 Konica Minolta Holdings Inc 画像処理装置、画像処理方法、画像処理プログラムおよび画像記録装置
WO2004055803A1 (en) 2002-12-13 2004-07-01 Koninklijke Philips Electronics N.V. Liquid removal in a method and device for irradiating spots on a layer
JP4364805B2 (ja) 2002-12-19 2009-11-18 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 層上にスポットを照射する方法及び装置
EP1732075A3 (de) 2002-12-19 2007-02-21 Koninklijke Philips Electronics N.V. Verfahren und Vorrichtung zur Punktbestrahlung auf einer Schicht
US6781670B2 (en) 2002-12-30 2004-08-24 Intel Corporation Immersion lithography
KR101177331B1 (ko) 2003-04-09 2012-08-30 가부시키가이샤 니콘 액침 리소그래피 유체 제어 시스템
JP4656057B2 (ja) 2003-04-10 2011-03-23 株式会社ニコン 液浸リソグラフィ装置用電気浸透素子
SG2012050829A (en) 2003-04-10 2015-07-30 Nippon Kogaku Kk Environmental system including vacuum scavange for an immersion lithography apparatus
JP4650413B2 (ja) 2003-04-10 2011-03-16 株式会社ニコン 液浸リソグフラフィ装置用の移送領域を含む環境システム
EP2921905B1 (de) 2003-04-10 2017-12-27 Nikon Corporation Ablaufweg zum sammeln von flüssigkeiten für eine immersionslithografievorrichtung
KR101225884B1 (ko) 2003-04-11 2013-01-28 가부시키가이샤 니콘 액침 리소그래피 머신에서 웨이퍼 교환동안 투영 렌즈 아래의 갭에서 액침 액체를 유지하는 장치 및 방법
WO2004092830A2 (en) 2003-04-11 2004-10-28 Nikon Corporation Liquid jet and recovery system for immersion lithography
SG185136A1 (en) 2003-04-11 2012-11-29 Nikon Corp Cleanup method for optics in immersion lithography
WO2004095135A2 (en) 2003-04-17 2004-11-04 Nikon Corporation Optical arrangement of autofocus elements for use with immersion lithography
TWI295414B (en) 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7274472B2 (en) 2003-05-28 2007-09-25 Timbre Technologies, Inc. Resolution enhanced optical metrology
EP1486828B1 (de) 2003-06-09 2013-10-09 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
EP2261741A3 (de) * 2003-06-11 2011-05-25 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
JP4343597B2 (ja) 2003-06-25 2009-10-14 キヤノン株式会社 露光装置及びデバイス製造方法
JP2005019616A (ja) 2003-06-25 2005-01-20 Canon Inc 液浸式露光装置
JP3862678B2 (ja) 2003-06-27 2006-12-27 キヤノン株式会社 露光装置及びデバイス製造方法
EP1498778A1 (de) 2003-06-27 2005-01-19 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
EP2853943B1 (de) 2003-07-08 2016-11-16 Nikon Corporation Waferplatte für die Immersionslithografie
SG109000A1 (en) 2003-07-16 2005-02-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7070915B2 (en) 2003-08-29 2006-07-04 Tokyo Electron Limited Method and system for drying a substrate
US6954256B2 (en) 2003-08-29 2005-10-11 Asml Netherlands B.V. Gradient immersion lithography
KR20170070264A (ko) 2003-09-03 2017-06-21 가부시키가이샤 니콘 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
JP4378136B2 (ja) 2003-09-04 2009-12-02 キヤノン株式会社 露光装置及びデバイス製造方法
JP3870182B2 (ja) 2003-09-09 2007-01-17 キヤノン株式会社 露光装置及びデバイス製造方法
JP4513299B2 (ja) 2003-10-02 2010-07-28 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
JP2005159322A (ja) 2003-10-31 2005-06-16 Nikon Corp 定盤、ステージ装置及び露光装置並びに露光方法
US7545481B2 (en) 2003-11-24 2009-06-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4513534B2 (ja) 2003-12-03 2010-07-28 株式会社ニコン 露光装置及び露光方法、デバイス製造方法
US7085080B2 (en) * 2003-12-06 2006-08-01 Carl Zeiss Smt Ag Low-deformation support device of an optical element
JP2005175016A (ja) 2003-12-08 2005-06-30 Canon Inc 基板保持装置およびそれを用いた露光装置ならびにデバイス製造方法
JP2005175034A (ja) 2003-12-09 2005-06-30 Canon Inc 露光装置
US7394521B2 (en) 2003-12-23 2008-07-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7589818B2 (en) 2003-12-23 2009-09-15 Asml Netherlands B.V. Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus
JP2005191381A (ja) 2003-12-26 2005-07-14 Canon Inc 露光方法及び装置
JP2005191393A (ja) 2003-12-26 2005-07-14 Canon Inc 露光方法及び装置
JP4429023B2 (ja) 2004-01-07 2010-03-10 キヤノン株式会社 露光装置及びデバイス製造方法
JP4018647B2 (ja) 2004-02-09 2007-12-05 キヤノン株式会社 投影露光装置およびデバイス製造方法
JP2005259870A (ja) 2004-03-10 2005-09-22 Nikon Corp 基板保持装置、ステージ装置及び露光装置並びに露光方法
JP4510494B2 (ja) 2004-03-29 2010-07-21 キヤノン株式会社 露光装置
JP2005286068A (ja) 2004-03-29 2005-10-13 Canon Inc 露光装置及び方法
US7898642B2 (en) 2004-04-14 2011-03-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7365827B2 (en) * 2004-12-08 2008-04-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7684010B2 (en) * 2005-03-09 2010-03-23 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing

Also Published As

Publication number Publication date
JP4598133B2 (ja) 2010-12-15
JP2010212711A (ja) 2010-09-24
CN101900951B (zh) 2013-07-10
KR20060064539A (ko) 2006-06-13
CN101900951A (zh) 2010-12-01
EP1970763A3 (de) 2013-10-09
EP1669807A1 (de) 2006-06-14
EP1821150A1 (de) 2007-08-22
US8115905B2 (en) 2012-02-14
TW200625021A (en) 2006-07-16
SG123683A1 (en) 2006-07-26
KR100760316B1 (ko) 2007-09-20
US20120008114A1 (en) 2012-01-12
JP2006165572A (ja) 2006-06-22
US8860926B2 (en) 2014-10-14
JP2009152625A (ja) 2009-07-09
CN1786832B (zh) 2010-08-11
SG145772A1 (en) 2008-09-29
JP4505042B2 (ja) 2010-07-14
DE602005009246D1 (de) 2008-10-02
JP4790076B2 (ja) 2011-10-12
EP1669807B1 (de) 2007-08-01
US20080174752A1 (en) 2008-07-24
EP1970763A2 (de) 2008-09-17
JP2010103549A (ja) 2010-05-06
US20060119817A1 (en) 2006-06-08
DE602005001835T2 (de) 2008-04-17
EP1821150B1 (de) 2008-08-20
TWI320876B (en) 2010-02-21
CN101916041A (zh) 2010-12-15
JP4322865B2 (ja) 2009-09-02
US7365827B2 (en) 2008-04-29
CN1786832A (zh) 2006-06-14

Similar Documents

Publication Publication Date Title
DE602005020720D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005002155D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005000696D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005000147D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005021180D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005004856D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005020893D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005018150D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005020891D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE60302897D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005001835D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602006001507D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005007563D1 (de) Lithografische Vorrichtung und Verfahren zur Herstellung einer Vorrichtung
DE602007012636D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602004025893D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE60319658D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE60323927D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005010014D1 (de) Lithographischer Apparat und Methode zur Herstellung einer Vorrichtung
DE602005004949D1 (de) Lithographischer Apparat und Methode zur Herstellung einer Vorrichtung
DE602007012032D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602006018552D1 (de) Lithografischer Apparat mit zwei Trägerplatten und Verfahren zur Herstellung einer Vorrichtung
DE60335595D1 (de) Lithographischer Apparat mit Immersion und Verfahren zur Herstellung einer Vorrichtung
DE602005013038D1 (de) Lithographischer Apparat, Verfahren zur Herstellung einer Vorrichtung
DE60229680D1 (de) Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE602005011239D1 (de) Lithografischer Apparat und Verfahren zur Herstellung einer Vorrichtung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition