DE602005008707D1 - Catadioptrisches projektionsobjektiv - Google Patents

Catadioptrisches projektionsobjektiv

Info

Publication number
DE602005008707D1
DE602005008707D1 DE602005008707T DE602005008707T DE602005008707D1 DE 602005008707 D1 DE602005008707 D1 DE 602005008707D1 DE 602005008707 T DE602005008707 T DE 602005008707T DE 602005008707 T DE602005008707 T DE 602005008707T DE 602005008707 D1 DE602005008707 D1 DE 602005008707D1
Authority
DE
Germany
Prior art keywords
catadiopric
projection lens
lens
projection
catadiopric projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005008707T
Other languages
English (en)
Inventor
David Shafer
Wilhelm Ulrich
Aurelian Dodoc
Buenau Rudolf Von
Hans-Juergen Mann
Alexander Epple
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of DE602005008707D1 publication Critical patent/DE602005008707D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/18—Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/004—Systems comprising a plurality of reflections between two or more surfaces, e.g. cells, resonators
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
DE602005008707T 2004-01-14 2005-01-13 Catadioptrisches projektionsobjektiv Active DE602005008707D1 (de)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US53624804P 2004-01-14 2004-01-14
US58750404P 2004-07-14 2004-07-14
US59177504P 2004-07-27 2004-07-27
US61282304P 2004-09-24 2004-09-24
US61767404P 2004-10-13 2004-10-13
PCT/EP2005/000262 WO2005069055A2 (en) 2004-01-14 2005-01-13 Catadioptric projection objective

Publications (1)

Publication Number Publication Date
DE602005008707D1 true DE602005008707D1 (de) 2008-09-18

Family

ID=34799906

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005008707T Active DE602005008707D1 (de) 2004-01-14 2005-01-13 Catadioptrisches projektionsobjektiv

Country Status (8)

Country Link
US (1) US7385756B2 (de)
EP (2) EP2006739A3 (de)
JP (6) JP5420821B2 (de)
KR (7) KR101407204B1 (de)
CN (5) CN102207608B (de)
DE (1) DE602005008707D1 (de)
TW (5) TW201604583A (de)
WO (1) WO2005069055A2 (de)

Families Citing this family (206)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW538256B (en) * 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
SG121818A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US9482966B2 (en) 2002-11-12 2016-11-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7372541B2 (en) * 2002-11-12 2008-05-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10503084B2 (en) 2002-11-12 2019-12-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
SG121819A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
DE10261775A1 (de) 2002-12-20 2004-07-01 Carl Zeiss Smt Ag Vorrichtung zur optischen Vermessung eines Abbildungssystems
US7869121B2 (en) * 2003-02-21 2011-01-11 Kla-Tencor Technologies Corporation Small ultra-high NA catadioptric objective using aspheric surfaces
EP3301511A1 (de) 2003-02-26 2018-04-04 Nikon Corporation Belichtungsvorrichtung, belichtungsverfahren und verfahren zur herstellung der vorrichtung
KR20050110033A (ko) 2003-03-25 2005-11-22 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
KR101176817B1 (ko) 2003-04-07 2012-08-24 가부시키가이샤 니콘 노광장치 및 디바이스 제조방법
KR20110104084A (ko) * 2003-04-09 2011-09-21 가부시키가이샤 니콘 액침 리소그래피 유체 제어 시스템
EP3062152B1 (de) 2003-04-10 2017-12-20 Nikon Corporation Umgebungssystem mit einer transportregion für eine immersionslithografievorrichtung
SG2012050829A (en) 2003-04-10 2015-07-30 Nippon Kogaku Kk Environmental system including vacuum scavange for an immersion lithography apparatus
WO2004090633A2 (en) * 2003-04-10 2004-10-21 Nikon Corporation An electro-osmotic element for an immersion lithography apparatus
CN1771463A (zh) 2003-04-10 2006-05-10 株式会社尼康 用于沉浸光刻装置收集液体的溢出通道
KR101697896B1 (ko) 2003-04-11 2017-01-18 가부시키가이샤 니콘 액침 리소그래피 머신에서 웨이퍼 교환동안 투영 렌즈 아래의 갭에서 액침 액체를 유지하는 장치 및 방법
JP4582089B2 (ja) * 2003-04-11 2010-11-17 株式会社ニコン 液浸リソグラフィ用の液体噴射回収システム
KR101324818B1 (ko) 2003-04-11 2013-11-01 가부시키가이샤 니콘 액침 리소그래피에 의한 광학기기의 세정방법
EP1614000B1 (de) * 2003-04-17 2012-01-18 Nikon Corporation Lithographisches Immersionsgerät
KR101790914B1 (ko) 2003-05-06 2017-10-26 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
US7348575B2 (en) 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
TWI295414B (en) 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP4552853B2 (ja) * 2003-05-15 2010-09-29 株式会社ニコン 露光装置及びデバイス製造方法
TWI463533B (zh) * 2003-05-23 2014-12-01 尼康股份有限公司 An exposure method, an exposure apparatus, and an element manufacturing method
TW201806001A (zh) 2003-05-23 2018-02-16 尼康股份有限公司 曝光裝置及元件製造方法
KR20150036794A (ko) 2003-05-28 2015-04-07 가부시키가이샤 니콘 노광 방법, 노광 장치, 및 디바이스 제조 방법
DE10324477A1 (de) 2003-05-30 2004-12-30 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage
US7213963B2 (en) 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP2261741A3 (de) 2003-06-11 2011-05-25 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
TW200511388A (en) 2003-06-13 2005-03-16 Nikon Corp Exposure method, substrate stage, exposure apparatus and method for manufacturing device
KR101475634B1 (ko) 2003-06-19 2014-12-22 가부시키가이샤 니콘 노광 장치 및 디바이스 제조방법
EP1639391A4 (de) * 2003-07-01 2009-04-29 Nikon Corp Verwendung isotopisch spezifizierter fluide als optische elemente
JP4697138B2 (ja) 2003-07-08 2011-06-08 株式会社ニコン 液浸リソグラフィ装置、液浸リソグラフィ方法、デバイス製造方法
WO2005006418A1 (ja) 2003-07-09 2005-01-20 Nikon Corporation 露光装置及びデバイス製造方法
ATE489724T1 (de) 2003-07-09 2010-12-15 Nikon Corp Belichtungsvorrichtung und verfahren zur bauelementherstellung
ATE513309T1 (de) 2003-07-09 2011-07-15 Nikon Corp Belichtungsvorrichtung und verfahren zur bauelementeherstellung
WO2005010960A1 (ja) 2003-07-25 2005-02-03 Nikon Corporation 投影光学系の検査方法および検査装置、ならびに投影光学系の製造方法
EP1503244A1 (de) 2003-07-28 2005-02-02 ASML Netherlands B.V. Lithographischer Projektionsapparat und Verfahren zur Herstellung einer Vorrichtung
CN102043350B (zh) 2003-07-28 2014-01-29 株式会社尼康 曝光装置、器件制造方法、及曝光装置的控制方法
US7779781B2 (en) 2003-07-31 2010-08-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2005022616A1 (ja) 2003-08-29 2005-03-10 Nikon Corporation 露光装置及びデバイス製造方法
TWI263859B (en) 2003-08-29 2006-10-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1660925B1 (de) * 2003-09-03 2015-04-29 Nikon Corporation Vorrichtung und verfahren zur bereitstellung eines fluids für die immersionslithographie
WO2005029559A1 (ja) 2003-09-19 2005-03-31 Nikon Corporation 露光装置及びデバイス製造方法
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
KR101441840B1 (ko) 2003-09-29 2014-11-04 가부시키가이샤 니콘 노광장치, 노광방법 및 디바이스 제조방법
JP4319188B2 (ja) 2003-10-08 2009-08-26 株式会社蔵王ニコン 基板搬送装置及び基板搬送方法、露光装置及び露光方法、デバイス製造装置及びデバイス製造方法
JP2005136364A (ja) * 2003-10-08 2005-05-26 Zao Nikon Co Ltd 基板搬送装置、露光装置、並びにデバイス製造方法
KR20060126949A (ko) 2003-10-08 2006-12-11 가부시키가이샤 니콘 기판 반송 장치와 기판 반송 방법, 노광 장치와 노광 방법,및 디바이스 제조 방법
TW201738932A (zh) 2003-10-09 2017-11-01 Nippon Kogaku Kk 曝光裝置及曝光方法、元件製造方法
US7411653B2 (en) * 2003-10-28 2008-08-12 Asml Netherlands B.V. Lithographic apparatus
US7528929B2 (en) 2003-11-14 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI605315B (zh) 2003-12-03 2017-11-11 Nippon Kogaku Kk Exposure device, exposure method, and device manufacturing method
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
JP4720506B2 (ja) 2003-12-15 2011-07-13 株式会社ニコン ステージ装置、露光装置、及び露光方法
JPWO2005057635A1 (ja) * 2003-12-15 2007-07-05 株式会社ニコン 投影露光装置及びステージ装置、並びに露光方法
US20070081133A1 (en) * 2004-12-14 2007-04-12 Niikon Corporation Projection exposure apparatus and stage unit, and exposure method
KR100965330B1 (ko) 2003-12-15 2010-06-22 칼 짜이스 에스엠티 아게 적어도 한 개의 액체 렌즈를 가진 마이크로리소그래피 투사대물렌즈로서의 대물렌즈
WO2005106589A1 (en) * 2004-05-04 2005-11-10 Carl Zeiss Smt Ag Microlithographic projection exposure apparatus and immersion liquid therefore
WO2005059645A2 (en) 2003-12-19 2005-06-30 Carl Zeiss Smt Ag Microlithography projection objective with crystal elements
US7460206B2 (en) * 2003-12-19 2008-12-02 Carl Zeiss Smt Ag Projection objective for immersion lithography
US20080151365A1 (en) * 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
US7239450B2 (en) * 2004-11-22 2007-07-03 Carl Zeiss Smt Ag Method of determining lens materials for a projection exposure apparatus
US7463422B2 (en) * 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
JP5420821B2 (ja) 2004-01-14 2014-02-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 反射屈折投影対物レンズ
ATE459898T1 (de) 2004-01-20 2010-03-15 Zeiss Carl Smt Ag Belichtungsvorrichtung und messeinrichtung für eine projektionslinse
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
KR101377815B1 (ko) 2004-02-03 2014-03-26 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
CN100592210C (zh) * 2004-02-13 2010-02-24 卡尔蔡司Smt股份公司 微平版印刷投影曝光装置的投影物镜
TW201816844A (zh) 2004-03-25 2018-05-01 日商尼康股份有限公司 曝光裝置、曝光方法、及元件製造方法
WO2005098504A1 (en) 2004-04-08 2005-10-20 Carl Zeiss Smt Ag Imaging system with mirror group
EP1747499A2 (de) 2004-05-04 2007-01-31 Nikon Corporation Vorrichtung und verfahren zur bereitstellung eines fluids für die immersionslithographie
KR101639964B1 (ko) 2004-05-17 2016-07-14 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈를 포함하는 투사 노광 시스템
US7616383B2 (en) 2004-05-18 2009-11-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7796274B2 (en) 2004-06-04 2010-09-14 Carl Zeiss Smt Ag System for measuring the image quality of an optical imaging system
KR101421915B1 (ko) 2004-06-09 2014-07-22 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
JP4608253B2 (ja) * 2004-07-06 2011-01-12 オリンパス株式会社 液浸対物光学系
US7463330B2 (en) 2004-07-07 2008-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101433491B1 (ko) 2004-07-12 2014-08-22 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US7511798B2 (en) * 2004-07-30 2009-03-31 Asml Holding N.V. Off-axis catadioptric projection optical system for lithography
JP4983257B2 (ja) 2004-08-18 2012-07-25 株式会社ニコン 露光装置、デバイス製造方法、計測部材、及び計測方法
US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2006114839A (ja) 2004-10-18 2006-04-27 Nikon Corp 投影光学系、露光装置、および露光方法
DE102005045862A1 (de) * 2004-10-19 2006-04-20 Carl Zeiss Smt Ag Optisches System für Ultraviolettlicht
KR20070095275A (ko) * 2004-10-22 2007-09-28 칼 짜이스 에스엠테 아게 마이크로리소그래피를 위한 투영 노출 장치
US7397533B2 (en) 2004-12-07 2008-07-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7880860B2 (en) 2004-12-20 2011-02-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101427056B1 (ko) 2005-01-31 2014-08-05 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US8692973B2 (en) 2005-01-31 2014-04-08 Nikon Corporation Exposure apparatus and method for producing device
US7282701B2 (en) 2005-02-28 2007-10-16 Asml Netherlands B.V. Sensor for use in a lithographic apparatus
USRE43576E1 (en) 2005-04-08 2012-08-14 Asml Netherlands B.V. Dual stage lithographic apparatus and device manufacturing method
GB2425847A (en) * 2005-05-04 2006-11-08 Zeiss Carl Smt Ag Catadioptric imaging system forming at least two intermediate images
KR101954588B1 (ko) 2005-06-02 2019-03-05 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 대물 렌즈
EP1746463A2 (de) 2005-07-01 2007-01-24 Carl Zeiss SMT AG Verfahren zum Korrigieren eines lithographischen Projektionsobjektivs und derartiges Projektionsobjektiv
WO2007025643A1 (en) * 2005-08-30 2007-03-08 Carl Zeiss Smt Ag High-na projection objective with aspheric lens surfaces
US7357768B2 (en) * 2005-09-22 2008-04-15 William Marshall Recliner exerciser
US20070124987A1 (en) * 2005-12-05 2007-06-07 Brown Jeffrey K Electronic pest control apparatus
KR100768849B1 (ko) * 2005-12-06 2007-10-22 엘지전자 주식회사 계통 연계형 연료전지 시스템의 전원공급장치 및 방법
DE102006038454A1 (de) * 2005-12-23 2007-07-05 Carl Zeiss Smt Ag Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage
US7649611B2 (en) 2005-12-30 2010-01-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JPWO2007086220A1 (ja) 2006-01-30 2009-06-18 株式会社ニコン 反射屈折結像光学系、露光装置、およびデバイスの製造方法
US7893047B2 (en) * 2006-03-03 2011-02-22 Arch Chemicals, Inc. Biocide composition comprising pyrithione and pyrrole derivatives
US7920338B2 (en) * 2006-03-28 2011-04-05 Carl Zeiss Smt Gmbh Reduction projection objective and projection exposure apparatus including the same
US7738188B2 (en) * 2006-03-28 2010-06-15 Carl Zeiss Smt Ag Projection objective and projection exposure apparatus including the same
EP1852745A1 (de) * 2006-05-05 2007-11-07 Carl Zeiss SMT AG Projektionsobjektiv mit hoher NA
CN101479637B (zh) * 2006-05-05 2011-09-21 康宁股份有限公司 准远心成像透镜的畸变调谐
DE102006021797A1 (de) 2006-05-09 2007-11-15 Carl Zeiss Smt Ag Optische Abbildungseinrichtung mit thermischer Dämpfung
US8072577B2 (en) * 2006-06-05 2011-12-06 Macronix International Co., Ltd. Lithography systems and processes
KR101379096B1 (ko) 2006-06-16 2014-03-28 칼 짜이스 에스엠티 게엠베하 마이크로 리소그라피 투사 노광 장치의 투사 대물렌즈
TW200801578A (en) 2006-06-21 2008-01-01 Canon Kk Projection optical system
EP2035897B1 (de) 2006-07-03 2015-10-28 Carl Zeiss SMT GmbH Verfahren zur Revidierung bzw. Reparatur eines lithographischen Projektionsobjektivs
JP5462625B2 (ja) * 2006-08-14 2014-04-02 カール・ツァイス・エスエムティー・ゲーエムベーハー 瞳ミラーを有する反射屈折投影対物器械、投影露光装置及び方法
EP1890191A1 (de) * 2006-08-14 2008-02-20 Carl Zeiss SMT AG Katadioptrisches Projektionsobjektiv mit einem Pupillenspiegel
DE102006045075A1 (de) 2006-09-21 2008-04-03 Carl Zeiss Smt Ag Steuerbares optisches Element
EP1906251A1 (de) 2006-09-26 2008-04-02 Carl Zeiss SMT AG Projektionsbelichtungsverfahren und Projektionsbelichtungssystem
EP1927891A1 (de) * 2006-11-30 2008-06-04 Carl Zeiss SMT AG Projektionsobjektiv mit konjugierten Pupillen
KR101507622B1 (ko) 2006-12-01 2015-03-31 칼 짜이스 에스엠티 게엠베하 이미지 수차들을 감소시키기 위한, 교환가능하고 조작가능한 보정 배열을 구비하는 광학 시스템
DE102008005006A1 (de) 2007-01-17 2008-07-24 Carl Zeiss Smt Ag Projektionsoptik für die Mikrolithographie, Projektionsbelichtungsanlage mit einer derartigen Projektionsoptik, Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage sowie durch das Herstellungsverfahren gefertigtes mikrostrukturiertes Bauelement
US7929114B2 (en) * 2007-01-17 2011-04-19 Carl Zeiss Smt Gmbh Projection optics for microlithography
US8654305B2 (en) 2007-02-15 2014-02-18 Asml Holding N.V. Systems and methods for insitu lens cleaning in immersion lithography
US8817226B2 (en) 2007-02-15 2014-08-26 Asml Holding N.V. Systems and methods for insitu lens cleaning using ozone in immersion lithography
JP5165700B2 (ja) * 2007-02-28 2013-03-21 カール・ツァイス・エスエムティー・ゲーエムベーハー 瞳補正を有する反射屈折投影対物系
US8237911B2 (en) 2007-03-15 2012-08-07 Nikon Corporation Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
WO2008113605A2 (de) 2007-03-20 2008-09-25 Carl Zeiss Smt Ag Verfahren zum verbessern von abbildungseigenschaften eines optischen systems sowie derartiges optisches system
DE102008001216A1 (de) 2007-04-18 2008-10-23 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie
DE102008001800A1 (de) * 2007-05-25 2008-11-27 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie, Mikrolithographie-Projektionsbelichtungsanlage mit einem derartigen Projektionsobjektiv, mikrolithographisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement
US7929115B2 (en) 2007-06-01 2011-04-19 Carl Zeiss Smt Gmbh Projection objective and projection exposure apparatus for microlithography
WO2009013230A1 (en) 2007-07-23 2009-01-29 Carl Zeiss Smt Ag Optical system of a microlithographic projection exposure apparatus
WO2009018911A1 (en) 2007-08-03 2009-02-12 Carl Zeiss Smt Ag Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate
DE102008041144A1 (de) 2007-08-21 2009-03-05 Carl Zeiss Smt Ag Optische Anordnung und optisches Abbildungssystem damit, Verfahren zu deren Optimierung und Verfahren zum Herstellen eines optischen Elements
CN101784954B (zh) 2007-08-24 2015-03-25 卡尔蔡司Smt有限责任公司 可控光学元件以及用热致动器操作光学元件的方法和半导体光刻的投射曝光设备
US7760425B2 (en) * 2007-09-05 2010-07-20 Carl Zeiss Smt Ag Chromatically corrected catadioptric objective and projection exposure apparatus including the same
DE102007043896A1 (de) * 2007-09-14 2009-04-02 Carl Zeiss Smt Ag Mikrooptik zur Messung der Position eines Luftbildes
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
EP1936421A1 (de) * 2007-09-18 2008-06-25 Carl Zeiss SMT AG Katadioptrisches optisches System und katadioptrisches optisches Element
US20090086338A1 (en) * 2007-09-28 2009-04-02 Carl Zeiss Smt Ag High Aperture Folded Catadioptric Projection Objective
EP2048540A1 (de) 2007-10-09 2009-04-15 Carl Zeiss SMT AG Mikrolithographisches Projektionsbelichtungsgerät
DE102007051669A1 (de) * 2007-10-26 2009-04-30 Carl Zeiss Smt Ag Abbildende Optik, Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik sowie Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage
DE102007054731A1 (de) 2007-11-14 2009-05-20 Carl Zeiss Smt Ag Optisches Element zur Reflexion von UV-Strahlung, Herstellungsverfahren dafür und Projektionsbelichtungsanlage damit
DE102007055567A1 (de) 2007-11-20 2009-05-28 Carl Zeiss Smt Ag Optisches System
DE102008054779A1 (de) 2008-02-25 2009-08-27 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie
DE102008054683A1 (de) 2008-03-13 2009-09-17 Carl Zeiss Smt Ag Optisches System einer mikrolithographischen Projektionsbelichtungsanlage, sowie Verfahren zum Manipulieren der Abbildungseigenschaften eines optischen Systems
KR101448152B1 (ko) * 2008-03-26 2014-10-07 삼성전자주식회사 수직 포토게이트를 구비한 거리측정 센서 및 그를 구비한입체 컬러 이미지 센서
DE102008017645A1 (de) 2008-04-04 2009-10-08 Carl Zeiss Smt Ag Vorrichtung zur mikrolithographischen Projektionsbelichtung sowie Vorrichtung zur Inspektion einer Oberfläche eines Substrats
JP5097166B2 (ja) 2008-05-28 2012-12-12 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及び装置の動作方法
TWI434142B (zh) * 2008-07-25 2014-04-11 Nanya Technology Corp 具有光纖模組的微影裝置
DE102008042356A1 (de) * 2008-09-25 2010-04-08 Carl Zeiss Smt Ag Projektionsbelichtungsanlage mit optimierter Justagemöglichkeit
JP5253081B2 (ja) 2008-10-14 2013-07-31 キヤノン株式会社 投影光学系、露光装置及びデバイスの製造方法
EP2177934B1 (de) 2008-10-17 2011-09-07 Carl Zeiss SMT GmbH Katadioptrisches Projektionsobjektiv mit hoher Transmission und hoher Apertur sowie Projektionsbelichtungsvorrichtung
EP2196838A1 (de) 2008-12-11 2010-06-16 Carl Zeiss SMT AG Chromatisch korrigiertes katadioptrisches Objektiv und Projektionsbelichtungsvorrichtung, die dieses enthält
EP2219077A1 (de) * 2009-02-12 2010-08-18 Carl Zeiss SMT AG Projektionsbelichtungsverfahren, Projektionsbelichtungssystem und Projektionsobjektiv
DE102009011329A1 (de) 2009-03-05 2010-09-09 Carl Zeiss Smt Ag Kompaktes katadioptrisches Projektionsobjektiv für die Immersionslithographie sowie Projektionsbelichtungsverfahren
DE102009045217B3 (de) 2009-09-30 2011-04-07 Carl Zeiss Smt Gmbh Katadioptrisches Projektionsobjektiv
US20110191827A1 (en) * 2010-01-29 2011-08-04 Rajini Balay Detecting Unauthorized Router Access Points or Rogue APs in the Wired Network
JP5478773B2 (ja) 2010-03-26 2014-04-23 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学系、露光装置、及び波面補正方法
EP2381310B1 (de) 2010-04-22 2015-05-06 ASML Netherlands BV Flüssigkeitshandhabungsstruktur und lithographischer Apparat
WO2012041341A1 (en) 2010-09-30 2012-04-05 Carl Zeiss Smt Gmbh Projection exposure system and projection exposure method
CN102183834B (zh) * 2011-05-03 2013-04-03 中国人民解放军空军航空大学 短焦距镜头物像空间拉伸方法
DE102011077784A1 (de) 2011-06-20 2012-12-20 Carl Zeiss Smt Gmbh Projektionsanordnung
EP2730961B1 (de) 2011-07-05 2020-03-25 Nittoh Inc. Optische projektionsanordnung und projektorvorrichtung
CN103376539B (zh) * 2012-04-26 2016-02-03 上海微电子装备有限公司 一种折反射式投影物镜
JP5567098B2 (ja) * 2012-10-31 2014-08-06 カール・ツァイス・エスエムティー・ゲーエムベーハー 瞳補正を有する反射屈折投影対物系
US9298102B2 (en) 2013-03-13 2016-03-29 Carl Zeiss Smt Gmbh Projection lens with wavefront manipulator
US9651872B2 (en) 2013-03-13 2017-05-16 Carl Zeiss Smt Gmbh Projection lens with wavefront manipulator
DE102013204391B3 (de) * 2013-03-13 2014-05-28 Carl Zeiss Smt Gmbh Projektionsobjektiv mit Wellenfrontmanipulator
WO2015032418A1 (en) 2013-09-09 2015-03-12 Carl Zeiss Smt Gmbh Microlithographic projection exposure apparatus and method of correcting optical wavefront deformations in such an apparatus
JP5786919B2 (ja) * 2013-10-28 2015-09-30 株式会社ニコン 投影光学系、露光装置及び露光方法
DE102014204171A1 (de) 2014-03-06 2015-09-24 Carl Zeiss Smt Gmbh Optisches Element und optische Anordnung damit
CN105807410B (zh) * 2014-12-31 2018-11-09 上海微电子装备（集团）股份有限公司 一种基于高数值孔径的折反射式投影物镜
KR20160091085A (ko) * 2015-01-23 2016-08-02 삼성전자주식회사 반사 굴절 광학계 및 이미지 촬영 장치
JP2015132843A (ja) * 2015-03-02 2015-07-23 株式会社ニコン 投影光学系、露光装置、露光方法、およびデバイス製造方法
DE102015104323A1 (de) 2015-03-23 2016-09-29 Carl Zeiss Smt Gmbh Zoomsystem mit austauschbaren optischen Elementen
JP6612439B2 (ja) 2015-09-23 2019-11-27 カール・ツァイス・エスエムティー・ゲーエムベーハー 圧電装置を備える光学結像装置
JP2016136273A (ja) * 2016-03-07 2016-07-28 株式会社ニコン 投影光学系、露光装置、露光方法、およびデバイス製造方法
DE102016205618A1 (de) 2016-04-05 2017-03-30 Carl Zeiss Smt Gmbh Projektionsobjektiv mit Wellenfrontmanipulator, Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage
DE102017204619A1 (de) 2016-04-05 2017-10-05 Carl Zeiss Smt Gmbh Projektionsbelichtungsverfahren, Projektionsobjektiv und Projektionsbelichtungsanlage für die Mikrolithographie
DE102016224403A1 (de) 2016-12-07 2017-12-28 Carl Zeiss Smt Gmbh Katadioptrisches Projektionsobjektiv und Projektionsbelichtungsverfahren
DE102016224400A1 (de) 2016-12-07 2018-06-07 Carl Zeiss Smt Gmbh Katadioptrisches Projektionsobjektiv und Verfahren zu seiner Herstellung
KR102492059B1 (ko) * 2017-01-26 2023-01-26 주식회사 프라젠 초단초점 프로젝터 장치
DE102017208340A1 (de) 2017-05-17 2018-11-22 Carl Zeiss Smt Gmbh Projektionsbelichtungsverfahren und Projektionsobjektiv mit Einstellung der Pupillentransmission
JP2018010303A (ja) * 2017-08-03 2018-01-18 株式会社ニコン 露光装置およびデバイス製造方法
JP6797087B2 (ja) * 2017-08-17 2020-12-09 富士フイルム株式会社 投写用光学系及び投写型表示装置
WO2019098447A1 (ko) * 2017-11-16 2019-05-23 한남대학교 산학협력단 미러의 회전이 가능한 멀티스케일 이미징 시스템
JP2019124796A (ja) 2018-01-16 2019-07-25 キヤノン株式会社 結像光学系、画像投射装置およびカメラシステム
CN110119070B (zh) * 2018-02-05 2020-10-09 上海微电子装备（集团）股份有限公司 一种投影物镜和光刻曝光系统
CN110673321A (zh) * 2018-04-20 2020-01-10 美国奈维特公司 用于高光学扩展量模块化变焦镜头的镜头连接件
JP7124521B2 (ja) * 2018-07-30 2022-08-24 セイコーエプソン株式会社 投写光学系および投写型画像表示装置
DE102018213220A1 (de) 2018-08-07 2019-09-05 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zur Korrektur von Abbildungsfehlern einer Projektions-belichtungsanlage
DE102018216964A1 (de) 2018-10-02 2020-04-02 Carl Zeiss Smt Gmbh Aktuatoreinrichtung zur Ausrichtung eines Elements, Projektionsbelichtungsanlage für die Halbleiterlithografie und Verfahren zur Ausrichtung eines Elements
KR102133859B1 (ko) * 2018-11-23 2020-07-14 한국 천문 연구원 원형의 비축-비구면 거울 결정 방법
JP2019082711A (ja) * 2019-01-15 2019-05-30 株式会社ニコン 投影光学系、露光装置、露光方法、及びデバイス製造方法
JP2019091057A (ja) * 2019-01-15 2019-06-13 株式会社ニコン 露光装置及びデバイス製造方法
JP7259413B2 (ja) * 2019-03-01 2023-04-18 セイコーエプソン株式会社 投写光学系、投写型画像表示装置、および撮像装置
JP7259411B2 (ja) * 2019-03-01 2023-04-18 セイコーエプソン株式会社 投写光学系、投写型画像表示装置、および撮像装置
DE102019202868A1 (de) 2019-03-04 2020-09-10 Carl Zeiss Smt Gmbh Aktuatoreinrichtung und Verfahren zur Ausrichtung eines optischen Elements, optische Baugruppe sowie Projektionsbelichtungsanlage
DE102019204131A1 (de) 2019-03-26 2019-06-06 Carl Zeiss Smt Gmbh Vorrichtung zur Führung eines flüssigen oder gasförmigen Mediums, Verfahren zur Herstellung einer entsprechenden Vorrichtung, Feldfacettenmodul und Projektionsbelichtungsanlage
DE102020201264A1 (de) 2020-02-03 2021-08-05 Carl Zeiss Smt Gmbh Verfahren zur Nachverfolgung und Identifikation von Komponenten von Lithografiesystemen sowie Lithografiesystem
DE102020201935A1 (de) 2020-02-17 2021-08-19 Carl Zeiss Smt Gmbh Partikelprüfsystem, Beprobungsstreifen, Projektionsbelichtungsanlage und Verfahren zur Prüfung einer Partikelbelastung einer Oberfläche
DE102021201939A1 (de) 2020-03-27 2021-09-30 Carl Zeiss Smt Gmbh Verfahren zum Hartlöten einer Tragstruktur, Tragstruktur und Projektionsbelichtungsanlage
DE102020204160A1 (de) * 2020-03-31 2021-03-18 Carl Zeiss Smt Gmbh Verfahren zur Überarbeitung einer Kühlvorrichtung zur Kühlung wenigstens einer Komponente, Kühlvorrichtung und Projektionsbelichtungsanlage für die Halbleiterlithografie
JP2023535619A (ja) 2020-07-30 2023-08-18 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学デバイスを含む投影対物系
DE102020209590A1 (de) 2020-07-30 2021-08-05 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zum Polieren eines optischen Elements
DE102020131389A1 (de) 2020-11-26 2022-06-02 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage umfassend ein Projektionsobjektiv, aufweisend eine optische Einrichtung, optisches Element, Vorrichtung zur Korrektur von Abbildungsfehlern, Verfahren zur Beeinflussung der Oberflächenform eines optischen Elements
DE102021214363A1 (de) 2021-01-08 2022-07-14 Carl Zeiss Smt Gmbh Verfahren zur flächenhaften, ortsaufgelösten Bestimmung wenigstens eines Strukturparameters
CN114326138B (zh) * 2022-01-05 2023-06-13 中国工程物理研究院激光聚变研究中心 高精度旋转台光轴装调方法

Family Cites Families (104)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2380887A (en) 1941-05-22 1945-07-31 Taylor Taylor & Hobson Ltd Optical system
NL269391A (de) 1961-09-19
JPS6019484B2 (ja) 1975-11-07 1985-05-16 キヤノン株式会社 複写用レンズ
US4293186A (en) 1977-02-11 1981-10-06 The Perkin-Elmer Corporation Restricted off-axis field optical system
CH624776A5 (de) 1977-12-08 1981-08-14 Kern & Co Ag
US4241390A (en) 1978-02-06 1980-12-23 The Perkin-Elmer Corporation System for illuminating an annular field
CH651943A5 (de) 1980-08-16 1985-10-15 Ludvik Dr Canzek Katadioptrisches objektiv hoher oeffnung.
JPS5744115A (en) 1980-08-30 1982-03-12 Asahi Optical Co Ltd Reflex telephoto zoom lens system
US4346164A (en) 1980-10-06 1982-08-24 Werner Tabarelli Photolithographic method for the manufacture of integrated circuits
US4469414A (en) 1982-06-01 1984-09-04 The Perkin-Elmer Corporation Restrictive off-axis field optical system
JPS60184223A (ja) 1984-03-01 1985-09-19 Nippon Kogaku Kk <Nikon> 反射屈折式望遠レンズ
US4812028A (en) 1984-07-23 1989-03-14 Nikon Corporation Reflection type reduction projection optical system
US4834515A (en) 1984-11-29 1989-05-30 Lockheed Missiles & Space Company, Inc. Catadioptric imaging system with dioptric assembly of the petzval type
US4779966A (en) 1984-12-21 1988-10-25 The Perkin-Elmer Corporation Single mirror projection optical system
JPS61156737A (ja) 1984-12-27 1986-07-16 Canon Inc 回路の製造方法及び露光装置
US4711535A (en) 1985-05-10 1987-12-08 The Perkin-Elmer Corporation Ring field projection system
EP0237041B1 (de) 1986-03-12 1993-08-18 Matsushita Electric Industrial Co., Ltd. Optisches Projektionssystem für Präzisionskopien
US4757354A (en) 1986-05-02 1988-07-12 Matsushita Electrical Industrial Co., Ltd. Projection optical system
DE3752314T2 (de) 1986-07-11 2000-09-14 Canon Kk Verkleinerndes Projektionsbelichtungssystem des Reflexionstyps für Röntgenstrahlung
US4951078A (en) 1988-05-16 1990-08-21 Minolta Camera Kabushiki Kaisha Camera system including catadioptric lens and catadioptric lens system used therein
US5004331A (en) 1989-05-03 1991-04-02 Hughes Aircraft Company Catadioptric projector, catadioptric projection system and process
US5063586A (en) 1989-10-13 1991-11-05 At&T Bell Laboratories Apparatus for semiconductor lithography
US5114238A (en) 1990-06-28 1992-05-19 Lockheed Missiles & Space Company, Inc. Infrared catadioptric zoom relay telescope
US5031976A (en) 1990-09-24 1991-07-16 Kla Instruments, Corporation Catadioptric imaging system
GB9020902D0 (en) 1990-09-26 1990-11-07 Optics & Vision Ltd Optical systems,telescopes and binoculars
US5315629A (en) 1990-10-10 1994-05-24 At&T Bell Laboratories Ringfield lithography
US5734496A (en) 1991-06-03 1998-03-31 Her Majesty The Queen In Right Of New Zealand Lens system
US5121256A (en) * 1991-03-14 1992-06-09 The Board Of Trustees Of The Leland Stanford Junior University Lithography system employing a solid immersion lens
US5212588A (en) 1991-04-09 1993-05-18 The United States Of America As Represented By The United States Department Of Energy Reflective optical imaging system for extreme ultraviolet wavelengths
US5353322A (en) 1992-05-05 1994-10-04 Tropel Corporation Lens system for X-ray projection lithography camera
US5220590A (en) 1992-05-05 1993-06-15 General Signal Corporation X-ray projection lithography camera
JPH08500682A (ja) 1992-08-28 1996-01-23 オプティクス・アンド・ヴィジョン・リミテッド 双眼鏡及びその他の目視補助機器のための光学系
US5477304A (en) 1992-10-22 1995-12-19 Nikon Corporation Projection exposure apparatus
US6078381A (en) 1993-02-01 2000-06-20 Nikon Corporation Exposure method and apparatus
JP3635684B2 (ja) 1994-08-23 2005-04-06 株式会社ニコン 反射屈折縮小投影光学系、反射屈折光学系、並びに投影露光方法及び装置
US5636066A (en) 1993-03-12 1997-06-03 Nikon Corporation Optical apparatus
US5410434A (en) 1993-09-09 1995-04-25 Ultratech Stepper, Inc. Reflective projection system comprising four spherical mirrors
US5515207A (en) 1993-11-03 1996-05-07 Nikon Precision Inc. Multiple mirror catadioptric optical system
US5488229A (en) 1994-10-04 1996-01-30 Excimer Laser Systems, Inc. Deep ultraviolet microlithography system
IL113350A (en) 1995-04-12 1998-06-15 State Rafaelel Ministry Of Def Catadioptric optics working staring detector system
US6512631B2 (en) 1996-07-22 2003-01-28 Kla-Tencor Corporation Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system
US5650877A (en) 1995-08-14 1997-07-22 Tropel Corporation Imaging system for deep ultraviolet lithography
US5805365A (en) 1995-10-12 1998-09-08 Sandia Corporation Ringfield lithographic camera
JP3456323B2 (ja) 1995-11-01 2003-10-14 株式会社ニコン 顕微鏡対物レンズ
US5815310A (en) 1995-12-12 1998-09-29 Svg Lithography Systems, Inc. High numerical aperture ring field optical reduction system
JPH09251097A (ja) 1996-03-15 1997-09-22 Nikon Corp Ｘ線リソグラフィー用反射縮小結像光学系
US5686728A (en) 1996-05-01 1997-11-11 Lucent Technologies Inc Projection lithography system and method using all-reflective optical elements
US5729376A (en) 1996-07-01 1998-03-17 The United States Of America As Represented By The Secretary Of The Army Catadioptric multi-functional optical assembly
JPH1039217A (ja) * 1996-07-19 1998-02-13 Nisshin Koki Kk 反射屈折式光学系及びこれを用いた光学装置
US5999310A (en) 1996-07-22 1999-12-07 Shafer; David Ross Ultra-broadband UV microscope imaging system with wide range zoom capability
US5717518A (en) 1996-07-22 1998-02-10 Kla Instruments Corporation Broad spectrum ultraviolet catadioptric imaging system
US6631036B2 (en) 1996-09-26 2003-10-07 Carl-Zeiss-Stiftung Catadioptric objective
US6169627B1 (en) 1996-09-26 2001-01-02 Carl-Zeiss-Stiftung Catadioptric microlithographic reduction objective
US5825043A (en) * 1996-10-07 1998-10-20 Nikon Precision Inc. Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
US5956192A (en) 1997-09-18 1999-09-21 Svg Lithography Systems, Inc. Four mirror EUV projection optics
US5920380A (en) 1997-12-19 1999-07-06 Sandia Corporation Apparatus and method for generating partially coherent illumination for photolithography
US6097537A (en) 1998-04-07 2000-08-01 Nikon Corporation Catadioptric optical system
JPH11316343A (ja) 1998-05-01 1999-11-16 Nikon Corp カタディオプトリックレンズ
EP1293830A1 (de) 1998-06-08 2003-03-19 Nikon Corporation Verfahren und Vorrichtung zur Projektionsbelichtung
US6213610B1 (en) 1998-09-21 2001-04-10 Nikon Corporation Catoptric reduction projection optical system and exposure apparatus and method using same
JP2000100694A (ja) 1998-09-22 2000-04-07 Nikon Corp 反射縮小投影光学系、該光学系を備えた投影露光装置および該装置を用いた露光方法
WO2000039623A1 (fr) 1998-12-25 2000-07-06 Nikon Corporation Systeme optique de formation d'image par reflexion refraction et appareil d'exposition par projection comprenant le systeme optique
DE59914179D1 (de) 1999-02-15 2007-03-22 Zeiss Carl Smt Ag Mikrolithographie-Reduktionsobjektiveinrichtung sowie Projektionsbelichtungsanlage
US6188513B1 (en) 1999-03-15 2001-02-13 Russell Hudyma High numerical aperture ring field projection system for extreme ultraviolet lithography
US6033079A (en) 1999-03-15 2000-03-07 Hudyma; Russell High numerical aperture ring field projection system for extreme ultraviolet lithography
US6426506B1 (en) 1999-05-27 2002-07-30 The Regents Of The University Of California Compact multi-bounce projection system for extreme ultraviolet projection lithography
DE10029938A1 (de) * 1999-07-09 2001-07-05 Zeiss Carl Optisches System für das Vakuum-Ultraviolett
JP4717974B2 (ja) 1999-07-13 2011-07-06 株式会社ニコン 反射屈折光学系及び該光学系を備える投影露光装置
EP1093021A3 (de) * 1999-10-15 2004-06-30 Nikon Corporation Projektionsbelichtungssystem sowie ein solches System benutzendes Gerät und Verfahren
US6600608B1 (en) 1999-11-05 2003-07-29 Carl-Zeiss-Stiftung Catadioptric objective comprising two intermediate images
US7187503B2 (en) * 1999-12-29 2007-03-06 Carl Zeiss Smt Ag Refractive projection objective for immersion lithography
WO2002044786A2 (en) 2000-11-28 2002-06-06 Carl Zeiss Smt Ag Catadioptric projection system for 157 nm lithography
TW538256B (en) 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
US6285737B1 (en) 2000-01-21 2001-09-04 Euv Llc Condenser for extreme-UV lithography with discharge source
JP2001228401A (ja) 2000-02-16 2001-08-24 Canon Inc 投影光学系、および該投影光学系による投影露光装置、デバイス製造方法
JP2001343589A (ja) 2000-03-31 2001-12-14 Canon Inc 投影光学系、および該投影光学系による投影露光装置、デバイス製造方法
JP2002083766A (ja) 2000-06-19 2002-03-22 Nikon Corp 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置
US6842298B1 (en) 2000-09-12 2005-01-11 Kla-Tencor Technologies Corporation Broad band DUV, VUV long-working distance catadioptric imaging system
WO2002033467A1 (de) 2000-10-20 2002-04-25 Carl Zeiss 8-spiegel-mikrolithographie-projektionsobjektiv
JP4245286B2 (ja) 2000-10-23 2009-03-25 株式会社ニコン 反射屈折光学系および該光学系を備えた露光装置
JP2002217095A (ja) 2000-11-14 2002-08-02 Canon Inc 露光装置、半導体デバイス製造方法、半導体製造工場及び露光装置の保守方法並びに位置検出装置
JP2002182116A (ja) * 2000-12-18 2002-06-26 Nikon Corp 対物レンズ系
JP2002208551A (ja) 2001-01-10 2002-07-26 Nikon Corp 反射屈折光学系及び投影露光装置
DE10127227A1 (de) 2001-05-22 2002-12-05 Zeiss Carl Katadioptrisches Reduktionsobjektiv
JP4780364B2 (ja) * 2001-06-14 2011-09-28 株式会社ニコン 反射屈折光学系および該光学系を備えた露光装置
WO2003001520A1 (en) 2001-06-21 2003-01-03 Koninklijke Philips Electronics N.V. Optical scanning device
JP2003114387A (ja) 2001-10-04 2003-04-18 Nikon Corp 反射屈折光学系および該光学系を備える投影露光装置
JP2005517570A (ja) 2002-02-14 2005-06-16 コンティネンタル・テーベス・アクチエンゲゼルシヤフト・ウント・コンパニー・オッフェネ・ハンデルスゲゼルシヤフト 設定された変更可能なブレーキ圧力を調節する方法
DE10332112A1 (de) 2003-07-09 2005-01-27 Carl Zeiss Smt Ag Projektionsbelichtungsverfahren und Projektionsbelichtungssystem
US6912042B2 (en) 2002-03-28 2005-06-28 Carl Zeiss Smt Ag 6-mirror projection objective with few lenses
JP4292497B2 (ja) * 2002-04-17 2009-07-08 株式会社ニコン 投影光学系、露光装置および露光方法
US6731374B1 (en) * 2002-12-02 2004-05-04 Asml Holding N.V. Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system
US8675276B2 (en) 2003-02-21 2014-03-18 Kla-Tencor Corporation Catadioptric imaging system for broad band microscopy
JP2004317534A (ja) * 2003-04-11 2004-11-11 Nikon Corp 反射屈折型の結像光学系、露光装置、および露光方法
US7085075B2 (en) 2003-08-12 2006-08-01 Carl Zeiss Smt Ag Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
KR100965330B1 (ko) * 2003-12-15 2010-06-22 칼 짜이스 에스엠티 아게 적어도 한 개의 액체 렌즈를 가진 마이크로리소그래피 투사대물렌즈로서의 대물렌즈
WO2005106589A1 (en) * 2004-05-04 2005-11-10 Carl Zeiss Smt Ag Microlithographic projection exposure apparatus and immersion liquid therefore
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
WO2005059645A2 (en) * 2003-12-19 2005-06-30 Carl Zeiss Smt Ag Microlithography projection objective with crystal elements
US7460206B2 (en) 2003-12-19 2008-12-02 Carl Zeiss Smt Ag Projection objective for immersion lithography
JP5420821B2 (ja) 2004-01-14 2014-02-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 反射屈折投影対物レンズ
US20070165198A1 (en) * 2004-02-13 2007-07-19 Carl Zeiss Smt Ag Projection objective for a microlithographic projection exposure apparatus
EP1721201A1 (de) 2004-02-18 2006-11-15 Corning Incorporated Katadioptrisches abbildungssystem zur abbildung mit hoher numerischer apertur mit tief-ultraviolett-licht
US7224520B2 (en) 2004-09-28 2007-05-29 Wavefront Research, Inc. Compact fast catadioptric imager

Also Published As

Publication number Publication date
KR20060129379A (ko) 2006-12-15
JP2013037371A (ja) 2013-02-21
EP2006739A2 (de) 2008-12-24
JP5420821B2 (ja) 2014-02-19
KR20120099474A (ko) 2012-09-10
KR101407204B1 (ko) 2014-06-13
JP2012234214A (ja) 2012-11-29
CN102169226A (zh) 2011-08-31
CN102207609B (zh) 2013-03-20
US20050190435A1 (en) 2005-09-01
TWI376524B (en) 2012-11-11
EP2006739A3 (de) 2013-06-26
CN1910494B (zh) 2011-08-10
CN102830487A (zh) 2012-12-19
KR101204114B1 (ko) 2012-11-23
KR20110121643A (ko) 2011-11-07
KR101179350B1 (ko) 2012-09-11
TW201037349A (en) 2010-10-16
JP5705182B2 (ja) 2015-04-22
JP5420845B2 (ja) 2014-02-19
JP2007518125A (ja) 2007-07-05
KR20130030825A (ko) 2013-03-27
CN102169226B (zh) 2014-04-23
WO2005069055A3 (en) 2006-03-02
CN102207608A (zh) 2011-10-05
EP1709472A2 (de) 2006-10-11
JP2008122995A (ja) 2008-05-29
CN102207608B (zh) 2013-01-02
TW201312156A (zh) 2013-03-16
JP2008116991A (ja) 2008-05-22
TWI470269B (zh) 2015-01-21
TW201142351A (en) 2011-12-01
KR101288187B1 (ko) 2013-07-19
TW201604583A (zh) 2016-02-01
KR101150037B1 (ko) 2012-07-02
TWI345642B (en) 2011-07-21
CN102207609A (zh) 2011-10-05
KR101417706B1 (ko) 2014-07-08
JP2008152272A (ja) 2008-07-03
EP1709472B1 (de) 2008-08-06
KR20140004251A (ko) 2014-01-10
US7385756B2 (en) 2008-06-10
WO2005069055A2 (en) 2005-07-28
TW200528749A (en) 2005-09-01
KR20100012101A (ko) 2010-02-05
KR101309242B1 (ko) 2013-09-16
JP5548743B2 (ja) 2014-07-16
CN1910494A (zh) 2007-02-07
KR20120040186A (ko) 2012-04-26

Similar Documents

Publication Publication Date Title
DE602005008707D1 (de) Catadioptrisches projektionsobjektiv
DE602005018648D1 (de) Katadioptrisches projektionsobjektiv
DE602005006458D1 (de) Abbildungslinse
DE602005003665D1 (de) Katadioptrisches projektionsobjektiv mit zwischenbildern
DE602005025716D1 (de) Zusammenschiebbares Objektiv
DE502005007656D1 (de) Intraokularlinse
DE602005012531D1 (de) Optischer Schalter
DE602006007670D1 (de) Aufnahmelinse
DE602005001664D1 (de) Optischer Entfernungsmesser
DE602006019866D1 (de) Projektionsvorrichtung
NL1028966A1 (nl) Projectiebeeldscherm.
CR9080A (es) Compuestos sulfonamida
DE602004000758D1 (de) Kompaktes Objektiv
DE602005003263D1 (de) Retrofokus Zoomobjektiv
DE602006015748D1 (de) Tragbarer Projektor
NL1028962A1 (nl) Projectiebeeldscherm.
DE602005004946D1 (de) Zoomlinsensystem
DE602006007197D1 (de) Kamera
ITUD20050171A1 (it) Proiettore di veicolo
DE602005015262D1 (de) Abbildungslinse
DE602006012261D1 (de) Linsentubus
DE602005015045D1 (de) Linsenmesser
DE602005007396D1 (de) Miniaturisiertes Zoom-Objektiv
FR2871247B1 (fr) Lentille ophtalmique
DE602005019940D1 (de) Linseneinrichtung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: CARL ZEISS SMT GMBH, 73447 OBERKOCHEN, DE