DE602005014179D1 - Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung - Google Patents

Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung

Info

Publication number
DE602005014179D1
DE602005014179D1 DE602005014179T DE602005014179T DE602005014179D1 DE 602005014179 D1 DE602005014179 D1 DE 602005014179D1 DE 602005014179 T DE602005014179 T DE 602005014179T DE 602005014179 T DE602005014179 T DE 602005014179T DE 602005014179 D1 DE602005014179 D1 DE 602005014179D1
Authority
DE
Germany
Prior art keywords
making
lithographic apparatus
lithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005014179T
Other languages
English (en)
Inventor
Johannes Jacobus Matheus Baselmans
Arno Jan Bleeker
Jager Pieter Willem Herman De
Kars Zeger Troost
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE602005014179D1 publication Critical patent/DE602005014179D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
DE602005014179T 2004-08-17 2005-08-05 Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung Active DE602005014179D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/919,530 US7304718B2 (en) 2004-08-17 2004-08-17 Lithographic apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
DE602005014179D1 true DE602005014179D1 (de) 2009-06-10

Family

ID=35241224

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005014179T Active DE602005014179D1 (de) 2004-08-17 2005-08-05 Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung

Country Status (8)

Country Link
US (1) US7304718B2 (de)
EP (1) EP1628162B1 (de)
JP (1) JP4342488B2 (de)
KR (1) KR100734596B1 (de)
CN (1) CN1737688A (de)
DE (1) DE602005014179D1 (de)
SG (1) SG120265A1 (de)
TW (1) TWI277838B (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7330239B2 (en) * 2005-04-08 2008-02-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing a blazing portion of a contrast device
US7468779B2 (en) 2005-06-28 2008-12-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7528933B2 (en) * 2006-04-06 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing a MEMS mirror with large deflection using a non-linear spring arrangement
EP2232334B1 (de) * 2007-12-21 2013-02-20 Carl Zeiss SMT GmbH Beleuchtungssystem für eine mikrolithographische projektionsbelichtungsvorrichtung
NL2004102A (en) * 2009-02-25 2010-08-26 Asml Holding Nv A fluid handling device, an immersion lithographic apparatus and a device manufacturing method.
DE102009029673A1 (de) 2009-09-22 2010-11-25 Carl Zeiss Smt Ag Manipulator zur Positionierung eines optischen Elementes in mehreren räumlichen Freiheitsgraden
US8743165B2 (en) 2010-03-05 2014-06-03 Micronic Laser Systems Ab Methods and device for laser processing
JP1527428S (de) * 2014-11-21 2015-06-29
CN109799607A (zh) * 2019-04-02 2019-05-24 华域视觉科技(上海)有限公司 背开透射式mems芯片、mems照明系统及汽车
WO2023205172A1 (en) * 2022-04-19 2023-10-26 Nielson Scientific, Llc Systems and methods for laser ablation

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5523193A (en) * 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
WO1991017483A1 (de) * 1990-05-02 1991-11-14 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Belichtungsvorrichtung
US5229872A (en) * 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
US6219015B1 (en) * 1992-04-28 2001-04-17 The Board Of Directors Of The Leland Stanford, Junior University Method and apparatus for using an array of grating light valves to produce multicolor optical images
US5311360A (en) * 1992-04-28 1994-05-10 The Board Of Trustees Of The Leland Stanford, Junior University Method and apparatus for modulating a light beam
JP3224041B2 (ja) * 1992-07-29 2001-10-29 株式会社ニコン 露光方法及び装置
US5729331A (en) * 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
CA2137059C (en) * 1993-12-03 2004-11-23 Texas Instruments Incorporated Dmd architecture to improve horizontal resolution
JP3339149B2 (ja) * 1993-12-08 2002-10-28 株式会社ニコン 走査型露光装置ならびに露光方法
US5677703A (en) * 1995-01-06 1997-10-14 Texas Instruments Incorporated Data loading circuit for digital micro-mirror device
US5530482A (en) * 1995-03-21 1996-06-25 Texas Instruments Incorporated Pixel data processing for spatial light modulator having staggered pixels
US5841579A (en) * 1995-06-07 1998-11-24 Silicon Light Machines Flat diffraction grating light valve
WO1997034171A2 (en) * 1996-02-28 1997-09-18 Johnson Kenneth C Microlens scanner for microlithography and wide-field confocal microscopy
DE69711929T2 (de) 1997-01-29 2002-09-05 Micronic Laser Systems Ab Taeb Verfahren und gerät zur erzeugung eines musters auf einem mit fotoresist beschichteten substrat mittels fokusiertem laserstrahl
US6177980B1 (en) * 1997-02-20 2001-01-23 Kenneth C. Johnson High-throughput, maskless lithography system
SE509062C2 (sv) 1997-02-28 1998-11-30 Micronic Laser Systems Ab Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster
US5982553A (en) * 1997-03-20 1999-11-09 Silicon Light Machines Display device incorporating one-dimensional grating light-valve array
SE9800665D0 (sv) * 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
TW520526B (en) * 2000-05-22 2003-02-11 Nikon Corp Exposure apparatus, method for manufacturing thereof, method for exposing and method for manufacturing micro-device
US20020122237A1 (en) * 2001-03-01 2002-09-05 Torbjorn Sandstrom Method and apparatus for spatial light modulation
US6737662B2 (en) * 2001-06-01 2004-05-18 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, device manufactured thereby, control system, computer program, and computer program product
JP3563384B2 (ja) * 2001-11-08 2004-09-08 大日本スクリーン製造株式会社 画像記録装置
CN1332267C (zh) * 2002-06-12 2007-08-15 Asml荷兰有限公司 光刻装置和器件的制造方法
KR100737759B1 (ko) * 2002-12-20 2007-07-10 에이에스엠엘 네델란즈 비.브이. 리소그래피 투영장치의 구성요소의 표면을 세정하는 방법, 리소그래피 투영장치, 디바이스 제조방법, 및 세정장치
US6870554B2 (en) * 2003-01-07 2005-03-22 Anvik Corporation Maskless lithography with multiplexed spatial light modulators
EP1482373A1 (de) * 2003-05-30 2004-12-01 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
US6833854B1 (en) * 2003-06-12 2004-12-21 Micronic Laser Systems Ab Method for high precision printing of patterns
US7270942B2 (en) * 2003-10-22 2007-09-18 Lsi Corporation Optimized mirror design for optical direct write

Also Published As

Publication number Publication date
SG120265A1 (en) 2006-03-28
EP1628162B1 (de) 2009-04-29
JP4342488B2 (ja) 2009-10-14
TWI277838B (en) 2007-04-01
EP1628162A3 (de) 2006-03-15
EP1628162A2 (de) 2006-02-22
JP2006060215A (ja) 2006-03-02
US20060038969A1 (en) 2006-02-23
TW200619861A (en) 2006-06-16
US7304718B2 (en) 2007-12-04
KR100734596B1 (ko) 2007-07-02
KR20060050526A (ko) 2006-05-19
CN1737688A (zh) 2006-02-22

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