DE602005017742D1 - Regeneratives verstärkersystem mit niedriger verstärkung - Google Patents

Regeneratives verstärkersystem mit niedriger verstärkung

Info

Publication number
DE602005017742D1
DE602005017742D1 DE602005017742T DE602005017742T DE602005017742D1 DE 602005017742 D1 DE602005017742 D1 DE 602005017742D1 DE 602005017742 T DE602005017742 T DE 602005017742T DE 602005017742 T DE602005017742 T DE 602005017742T DE 602005017742 D1 DE602005017742 D1 DE 602005017742D1
Authority
DE
Germany
Prior art keywords
cavity
pockels cell
gain
regenerative amplifier
low
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005017742T
Other languages
English (en)
Inventor
James D Kafka
Jianping Zhou
Kevin Holsinger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Newport Corp USA
Original Assignee
Spectra Physics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Spectra Physics Inc filed Critical Spectra Physics Inc
Publication of DE602005017742D1 publication Critical patent/DE602005017742D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
    • H01S3/235—Regenerative amplifiers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0064—Anti-reflection devices, e.g. optical isolaters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0085—Modulating the output, i.e. the laser beam is modulated outside the laser cavity
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
    • H01S3/107—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using electro-optic devices, e.g. exhibiting Pockels or Kerr effect
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16—Solid materials
    • H01S3/1601—Solid materials characterised by an active (lasing) ion
    • H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
    • H01S3/1611—Solid materials characterised by an active (lasing) ion rare earth neodymium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16—Solid materials
    • H01S3/1601—Solid materials characterised by an active (lasing) ion
    • H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
    • H01S3/1618—Solid materials characterised by an active (lasing) ion rare earth ytterbium
DE602005017742T 2004-01-20 2005-01-20 Regeneratives verstärkersystem mit niedriger verstärkung Active DE602005017742D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/762,216 US7016107B2 (en) 2004-01-20 2004-01-20 Low-gain regenerative amplifier system
PCT/US2005/002016 WO2005069963A2 (en) 2004-01-20 2005-01-20 Low-gain regenerative amplifier system

Publications (1)

Publication Number Publication Date
DE602005017742D1 true DE602005017742D1 (de) 2009-12-31

Family

ID=34750349

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005017742T Active DE602005017742D1 (de) 2004-01-20 2005-01-20 Regeneratives verstärkersystem mit niedriger verstärkung

Country Status (5)

Country Link
US (1) US7016107B2 (de)
EP (1) EP1709714B1 (de)
AT (1) ATE449442T1 (de)
DE (1) DE602005017742D1 (de)
WO (1) WO2005069963A2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7590156B1 (en) * 2004-05-17 2009-09-15 University Of Central Florida Research Foundation, Inc. High intensity MHz mode-locked laser
US7522642B2 (en) 2006-03-29 2009-04-21 Amo Development Llc Method and system for laser amplification using a dual crystal Pockels cell
US7433376B1 (en) * 2006-08-07 2008-10-07 Textron Systems Corporation Zig-zag laser with improved liquid cooling
CN101231384B (zh) * 2008-02-26 2010-09-01 上海激光等离子体研究所 用于啁啾脉冲放大的自准直平面调制光谱调制整形装置
CN101231383B (zh) * 2008-02-26 2011-03-16 上海激光等离子体研究所 用于啁啾脉冲放大的自准直凹面调制光谱调制整形装置
JP4523978B2 (ja) * 2008-03-28 2010-08-11 株式会社日立製作所 エンジンシステム
CN102074887A (zh) * 2010-01-13 2011-05-25 山东大学 一种基于掺钕硼酸钙氧钆晶体的自变频固体激光器
JP2013065804A (ja) * 2010-12-20 2013-04-11 Gigaphoton Inc レーザ装置およびそれを備える極端紫外光生成システム
WO2013008772A1 (ja) * 2011-07-11 2013-01-17 株式会社ブイ・テクノロジー パルスレーザ発振器及びパルスレーザ発振制御方法
LT6028B (lt) 2012-09-17 2014-05-26 Uždaroji Akcinė Bendrovė Mokslinė-Gamybinė Firma "Šviesos Konversija" Regeneratyvinis optinis stiprintuvas, skirtas trumpų impulsų lazeriams, lazerinis šaltinis ir lazerinė sistema
CN103022886B (zh) * 2013-01-05 2014-10-08 北京工业大学 全固态皮秒激光放大器
KR102116021B1 (ko) * 2015-02-25 2020-05-29 콴타 시스템 에스.피.에이. 서브-나노초 지속기간의 레이저 펄스들을 생성하기 위한 레이저 시스템
CN104767108B (zh) * 2015-04-27 2017-10-27 北京工业大学 一种谐振腔翻倍的再生放大器
GB2562236A (en) 2017-05-08 2018-11-14 Uab Mgf Sviesos Konversija Device and method for generation of high repetition rate laser pulse bursts
CN115347449B (zh) * 2022-10-18 2022-12-30 中国科学院长春光学精密机械与物理研究所 薄片再生放大器及放大方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4191928A (en) * 1978-01-11 1980-03-04 The United States Of America As Represented By The United States Department Of Energy Laser system using regenerative amplifier
US4896119A (en) * 1984-06-07 1990-01-23 The University Of Rochester CW pumper CW pumped variable repetition rate regenerative laser amplifier system
US5239408A (en) * 1992-01-21 1993-08-24 Regents Of The University Of California High power, high beam quality regenerative amplifier
US5720894A (en) * 1996-01-11 1998-02-24 The Regents Of The University Of California Ultrashort pulse high repetition rate laser system for biological tissue processing
US6150630A (en) * 1996-01-11 2000-11-21 The Regents Of The University Of California Laser machining of explosives
US5790303A (en) * 1997-01-23 1998-08-04 Positive Light, Inc. System for amplifying an optical pulse using a diode-pumped, Q-switched, intracavity-doubled laser to pump an optical amplifier
US6002697A (en) 1998-04-03 1999-12-14 Lambda Physik Gmbh Diode pumped laser with frequency conversion into UV and DUV range
US6197133B1 (en) * 1999-02-16 2001-03-06 General Electric Company Short-pulse high-peak laser shock peening
US7046711B2 (en) 1999-06-11 2006-05-16 High Q Laser Production Gmbh High power and high gain saturation diode pumped laser means and diode array pumping device
US6510169B2 (en) 2001-02-14 2003-01-21 Forschungsinstitut Fur Mineralische Und Metallische Werkstoffe Edelsteine/Edemetalle Gmbh Method for generating laser light and laser crystal
US6741620B2 (en) 2001-02-15 2004-05-25 Aculight Corporation Methods and devices for efficient generation of ultraviolet light
US6804287B2 (en) 2002-02-02 2004-10-12 The Regents Of The University Of Colorado, A Body Corporate Ultrashort pulse amplification in cryogenically cooled amplifiers
US6760356B2 (en) 2002-04-08 2004-07-06 The Regents Of The University Of California Application of Yb:YAG short pulse laser system
US20030193975A1 (en) * 2002-04-12 2003-10-16 Yang Pang Regenerative amplifier with frequency synthesizer

Also Published As

Publication number Publication date
EP1709714A4 (de) 2008-01-16
US20050157381A1 (en) 2005-07-21
US7016107B2 (en) 2006-03-21
WO2005069963A3 (en) 2006-04-06
EP1709714B1 (de) 2009-11-18
WO2005069963A2 (en) 2005-08-04
EP1709714A2 (de) 2006-10-11
ATE449442T1 (de) 2009-12-15

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