DE602005019500D1 - Lithographischer Apparat und Verfahren zum Kalibrieren desselben - Google Patents
Lithographischer Apparat und Verfahren zum Kalibrieren desselbenInfo
- Publication number
- DE602005019500D1 DE602005019500D1 DE602005019500T DE602005019500T DE602005019500D1 DE 602005019500 D1 DE602005019500 D1 DE 602005019500D1 DE 602005019500 T DE602005019500 T DE 602005019500T DE 602005019500 T DE602005019500 T DE 602005019500T DE 602005019500 D1 DE602005019500 D1 DE 602005019500D1
- Authority
- DE
- Germany
- Prior art keywords
- calibrating
- same
- lithographic apparatus
- lithographic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70458—Mix-and-match, i.e. multiple exposures of the same area using a similar type of exposure apparatus, e.g. multiple exposures using a UV apparatus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70516—Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7007—Alignment other than original with workpiece
- G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7019—Calibration
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/899,295 US7256871B2 (en) | 2004-07-27 | 2004-07-27 | Lithographic apparatus and method for calibrating the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE602005019500D1 true DE602005019500D1 (de) | 2010-04-08 |
Family
ID=35311589
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE602005019500T Active DE602005019500D1 (de) | 2004-07-27 | 2005-07-19 | Lithographischer Apparat und Verfahren zum Kalibrieren desselben |
Country Status (8)
| Country | Link |
|---|---|
| US (7) | US7256871B2 (de) |
| EP (2) | EP2204696A3 (de) |
| JP (1) | JP4326508B2 (de) |
| KR (1) | KR100632877B1 (de) |
| CN (2) | CN100580563C (de) |
| DE (1) | DE602005019500D1 (de) |
| SG (3) | SG119326A1 (de) |
| TW (1) | TWI278019B (de) |
Families Citing this family (104)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5992770A (ja) * | 1982-11-17 | 1984-05-29 | Mitsubishi Electric Corp | 電力変換装置 |
| US7561270B2 (en) * | 2000-08-24 | 2009-07-14 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufactured thereby |
| TW527526B (en) * | 2000-08-24 | 2003-04-11 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| KR101475634B1 (ko) * | 2003-06-19 | 2014-12-22 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조방법 |
| US7256871B2 (en) * | 2004-07-27 | 2007-08-14 | Asml Netherlands B.V. | Lithographic apparatus and method for calibrating the same |
| US7408617B2 (en) * | 2005-06-24 | 2008-08-05 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing a large area FPD chuck equipped with encoders an encoder scale calibration method |
| US7362446B2 (en) * | 2005-09-15 | 2008-04-22 | Asml Netherlands B.V. | Position measurement unit, measurement system and lithographic apparatus comprising such position measurement unit |
| US7557903B2 (en) * | 2005-12-08 | 2009-07-07 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| CN101356623B (zh) * | 2006-01-19 | 2012-05-09 | 株式会社尼康 | 移动体驱动方法及移动体驱动系统、图案形成方法及图案形成装置、曝光方法及曝光装置、以及元件制造方法 |
| US7480050B2 (en) * | 2006-02-09 | 2009-01-20 | Asml Netherlands B.V. | Lithographic system, sensor, and method of measuring properties of a substrate |
| US8908145B2 (en) * | 2006-02-21 | 2014-12-09 | Nikon Corporation | Pattern forming apparatus and pattern forming method, movable body drive system and movable body drive method, exposure apparatus and exposure method, and device manufacturing method |
| SG178791A1 (en) | 2006-02-21 | 2012-03-29 | Nikon Corp | Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method and device manufacturing method |
| EP3267259A1 (de) | 2006-02-21 | 2018-01-10 | Nikon Corporation | Belichtungsvorrichtung, belichtungsverfahren und verfahren zur herstellung einer vorrichtung |
| US7602489B2 (en) * | 2006-02-22 | 2009-10-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7889314B2 (en) * | 2006-03-23 | 2011-02-15 | Asml Netherlands B.V. | Calibration methods, lithographic apparatus and patterning device for such lithographic apparatus |
| US20070281149A1 (en) * | 2006-06-06 | 2007-12-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US8013982B2 (en) | 2006-08-31 | 2011-09-06 | Nikon Corporation | Movable body drive method and system, pattern formation method and apparatus, exposure method and apparatus for driving movable body based on measurement value of encoder and information on flatness of scale, and device manufacturing method |
| CN104460241B (zh) | 2006-08-31 | 2017-04-05 | 株式会社尼康 | 移动体驱动系统及方法、图案形成装置及方法、曝光装置及方法、组件制造方法 |
| TWI653511B (zh) | 2006-08-31 | 2019-03-11 | 日商尼康股份有限公司 | Exposure apparatus, exposure method, and component manufacturing method |
| KR101452524B1 (ko) * | 2006-09-01 | 2014-10-21 | 가부시키가이샤 니콘 | 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법 |
| TWI596656B (zh) | 2006-09-01 | 2017-08-21 | 尼康股份有限公司 | Moving body driving method and moving body driving system, pattern forming method and apparatus, exposure method and apparatus, element manufacturing method, and correction method |
| JP5108267B2 (ja) * | 2006-09-13 | 2012-12-26 | 株式会社ミツトヨ | 位置検出用治具、位置検出装置、そのシステム、および、その方法 |
| KR101391025B1 (ko) * | 2006-09-29 | 2014-04-30 | 가부시키가이샤 니콘 | 이동체 시스템, 패턴 형성 장치, 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법 |
| US7714981B2 (en) * | 2006-10-30 | 2010-05-11 | Asml Netherlands B.V. | Lithographic apparatus and method |
| US7684011B2 (en) * | 2007-03-02 | 2010-03-23 | Asml Netherlands B.V. | Calibration method for a lithographic apparatus |
| US7999912B2 (en) | 2007-05-08 | 2011-08-16 | Asml Netherlands B.V. | Lithographic apparatus and sensor calibration method |
| US8687166B2 (en) * | 2007-05-24 | 2014-04-01 | Asml Netherlands B.V. | Lithographic apparatus having an encoder position sensor system |
| US8760615B2 (en) * | 2007-05-24 | 2014-06-24 | Asml Netherlands B.V. | Lithographic apparatus having encoder type position sensor system |
| KR101843699B1 (ko) * | 2007-07-18 | 2018-03-29 | 가부시키가이샤 니콘 | 계측 방법, 스테이지 장치, 및 노광 장치 |
| US8243257B2 (en) * | 2007-07-24 | 2012-08-14 | Nikon Corporation | Position measurement system, exposure apparatus, position measuring method, exposure method and device manufacturing method, and tool and measuring method |
| TWI526794B (zh) | 2007-07-24 | 2016-03-21 | 尼康股份有限公司 | Exposure method and apparatus, and component manufacturing method |
| US8023106B2 (en) | 2007-08-24 | 2011-09-20 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method |
| WO2009028157A1 (ja) | 2007-08-24 | 2009-03-05 | Nikon Corporation | 移動体駆動方法及び移動体駆動システム、並びにパターン形成方法及びパターン形成装置 |
| US8237919B2 (en) * | 2007-08-24 | 2012-08-07 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads |
| DE102007046927A1 (de) * | 2007-09-28 | 2009-04-02 | Carl Zeiss Smt Ag | Kalibrierung einer Positionsmesseinrichtung einer optischen Einrichtung |
| US9013681B2 (en) * | 2007-11-06 | 2015-04-21 | Nikon Corporation | Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method |
| US9256140B2 (en) * | 2007-11-07 | 2016-02-09 | Nikon Corporation | Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method with measurement device to measure movable body in Z direction |
| US8665455B2 (en) * | 2007-11-08 | 2014-03-04 | Nikon Corporation | Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method |
| US8422015B2 (en) * | 2007-11-09 | 2013-04-16 | Nikon Corporation | Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method |
| NL1036180A1 (nl) * | 2007-11-20 | 2009-05-25 | Asml Netherlands Bv | Stage system, lithographic apparatus including such stage system, and correction method. |
| SG185261A1 (en) * | 2007-12-11 | 2012-11-29 | Nikon Corp | Movable body apparatus, exposure apparatus and pattern formation apparatus, and device manufacturing method |
| US8711327B2 (en) * | 2007-12-14 | 2014-04-29 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
| US8115906B2 (en) * | 2007-12-14 | 2012-02-14 | Nikon Corporation | Movable body system, pattern formation apparatus, exposure apparatus and measurement device, and device manufacturing method |
| JP5211690B2 (ja) * | 2007-12-28 | 2013-06-12 | 株式会社ニコン | 較正方法、移動体駆動方法及び装置、露光方法及び装置、パターン形成方法及び装置、並びにデバイス製造方法 |
| US8269945B2 (en) * | 2007-12-28 | 2012-09-18 | Nikon Corporation | Movable body drive method and apparatus, exposure method and apparatus, pattern formation method and apparatus, and device manufacturing method |
| US8111377B2 (en) * | 2008-01-10 | 2012-02-07 | Asml Netherlands B.V. | Lithographic apparatus with an encoder arranged for defining a zero level |
| JP5344180B2 (ja) * | 2008-02-08 | 2013-11-20 | 株式会社ニコン | 位置計測システム及び位置計測方法、移動体装置、移動体駆動方法、露光装置及び露光方法、パターン形成装置、並びにデバイス製造方法 |
| NL1036474A1 (nl) * | 2008-02-08 | 2009-08-11 | Asml Netherlands Bv | Lithographic apparatus and calibration method. |
| NL1036618A1 (nl) * | 2008-03-24 | 2009-09-25 | Asml Netherlands Bv | Encoder-type measurement system, lithograpic apparatus and method to detect an error on or in a grid or grating of an encoder-type measurement system. |
| NL1036742A1 (nl) * | 2008-04-18 | 2009-10-20 | Asml Netherlands Bv | Stage system calibration method, stage system and lithographic apparatus comprising such stage system. |
| KR101670624B1 (ko) | 2008-04-30 | 2016-11-09 | 가부시키가이샤 니콘 | 스테이지 장치, 패턴 형성 장치, 노광 장치, 스테이지 구동 방법, 노광 방법, 그리고 디바이스 제조 방법 |
| US8228482B2 (en) * | 2008-05-13 | 2012-07-24 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
| US8786829B2 (en) * | 2008-05-13 | 2014-07-22 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
| US8817236B2 (en) | 2008-05-13 | 2014-08-26 | Nikon Corporation | Movable body system, movable body drive method, pattern formation apparatus, pattern formation method, exposure apparatus, exposure method, and device manufacturing method |
| EP2131243B1 (de) | 2008-06-02 | 2015-07-01 | ASML Netherlands B.V. | Lithografische Vorrichtung und Verfahren zur Positionskalibrierung eines Trägertisches |
| US8149420B2 (en) | 2008-07-25 | 2012-04-03 | Agilent Technologies, Inc. | Interferometer calibration system and method |
| US8994923B2 (en) * | 2008-09-22 | 2015-03-31 | Nikon Corporation | Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method |
| US8325325B2 (en) * | 2008-09-22 | 2012-12-04 | Nikon Corporation | Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method |
| US8599359B2 (en) | 2008-12-19 | 2013-12-03 | Nikon Corporation | Exposure apparatus, exposure method, device manufacturing method, and carrier method |
| US8760629B2 (en) | 2008-12-19 | 2014-06-24 | Nikon Corporation | Exposure apparatus including positional measurement system of movable body, exposure method of exposing object including measuring positional information of movable body, and device manufacturing method that includes exposure method of exposing object, including measuring positional information of movable body |
| US8902402B2 (en) * | 2008-12-19 | 2014-12-02 | Nikon Corporation | Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method |
| US8773635B2 (en) * | 2008-12-19 | 2014-07-08 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
| DE102009019140B4 (de) | 2009-04-29 | 2017-03-02 | Carl Zeiss Smt Gmbh | Verfahren zum Kalibrieren einer Positionsmessvorrichtung und Verfahren zum Vermessen einer Maske |
| US8334983B2 (en) * | 2009-05-22 | 2012-12-18 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| EP2264409B1 (de) * | 2009-06-19 | 2015-10-07 | ASML Netherlands B.V. | Lithografische Vorrichtung und Vorrichtungsherstellungsverfahren |
| NL2005013A (en) * | 2009-07-31 | 2011-02-02 | Asml Netherlands Bv | Positioning system, lithographic apparatus and method. |
| US8514395B2 (en) | 2009-08-25 | 2013-08-20 | Nikon Corporation | Exposure method, exposure apparatus, and device manufacturing method |
| US8488109B2 (en) | 2009-08-25 | 2013-07-16 | Nikon Corporation | Exposure method, exposure apparatus, and device manufacturing method |
| US8493547B2 (en) | 2009-08-25 | 2013-07-23 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
| US20110096318A1 (en) * | 2009-09-28 | 2011-04-28 | Nikon Corporation | Exposure apparatus and device fabricating method |
| US20110096306A1 (en) * | 2009-09-28 | 2011-04-28 | Nikon Corporation | Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method |
| US20110102761A1 (en) * | 2009-09-28 | 2011-05-05 | Nikon Corporation | Stage apparatus, exposure apparatus, and device fabricating method |
| US20110096312A1 (en) * | 2009-09-28 | 2011-04-28 | Nikon Corporation | Exposure apparatus and device fabricating method |
| NL2005545A (en) * | 2009-11-17 | 2011-05-18 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
| US20110123913A1 (en) * | 2009-11-19 | 2011-05-26 | Nikon Corporation | Exposure apparatus, exposing method, and device fabricating method |
| US20110128523A1 (en) * | 2009-11-19 | 2011-06-02 | Nikon Corporation | Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method |
| US8488106B2 (en) * | 2009-12-28 | 2013-07-16 | Nikon Corporation | Movable body drive method, movable body apparatus, exposure method, exposure apparatus, and device manufacturing method |
| NL2006078A (en) * | 2010-02-19 | 2011-08-22 | Asml Netherlands Bv | Calibration of lithographic apparatus. |
| EP2365390A3 (de) | 2010-03-12 | 2017-10-04 | ASML Netherlands B.V. | Lithographische Vorrichtung und Verfahren |
| NL2006743A (en) * | 2010-06-09 | 2011-12-12 | Asml Netherlands Bv | Position sensor and lithographic apparatus. |
| JP5566203B2 (ja) * | 2010-06-21 | 2014-08-06 | Ｄｍｇ森精機株式会社 | 変位検出装置 |
| NL2006913A (en) | 2010-07-16 | 2012-01-17 | Asml Netherlands Bv | Lithographic apparatus and method. |
| CN102095379B (zh) * | 2010-08-27 | 2012-11-07 | 中国科学院长春光学精密机械与物理研究所 | 绝对式光栅尺 |
| NL2007818A (en) | 2010-12-20 | 2012-06-21 | Asml Netherlands Bv | Method of updating calibration data and a device manufacturing method. |
| JP6156147B2 (ja) * | 2011-11-17 | 2017-07-05 | 株式会社ニコン | エンコーダ装置、光学装置、露光装置、及びデバイス製造方法 |
| US9207549B2 (en) | 2011-12-29 | 2015-12-08 | Nikon Corporation | Exposure apparatus and exposure method, and device manufacturing method with encoder of higher reliability for position measurement |
| US9760028B2 (en) * | 2012-03-08 | 2017-09-12 | Mapper Lithography Ip B.V. | Lithography system and method for processing a target, such as a wafer |
| KR101609652B1 (ko) * | 2012-07-10 | 2016-04-06 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치의 위치 설정기를 교정하기 위한 리소그래피 클러스터 시스템, 방법 |
| EP2904453B1 (de) * | 2012-10-01 | 2022-11-02 | ASML Netherlands B.V. | Verfahren zur kalibrierung einer codierskala und lithografische vorrichtung |
| WO2014060149A1 (en) * | 2012-10-17 | 2014-04-24 | Asml Netherlands B.V. | Sensor system for lithography |
| NL2011683A (en) * | 2012-12-13 | 2014-06-16 | Asml Netherlands Bv | Method of calibrating a lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product. |
| CN112068406A (zh) | 2015-02-23 | 2020-12-11 | 株式会社尼康 | 测量装置、光刻系统、以及组件制造方法 |
| KR20240010551A (ko) | 2015-02-23 | 2024-01-23 | 가부시키가이샤 니콘 | 기판 처리 시스템 및 기판 처리 방법, 그리고 디바이스 제조 방법 |
| EP3264179B1 (de) | 2015-02-23 | 2023-12-27 | Nikon Corporation | Messvorrichtung, lithografiesystem, belichtungsapparat, verfahren zur herstellung einer vorrichtung, steuerungsverfahren sowie überlagerungsmessverfahren |
| CN107533956A (zh) * | 2015-04-17 | 2018-01-02 | 株式会社尼康 | 曝光系统 |
| CN113267964B (zh) | 2015-09-30 | 2023-05-23 | 株式会社尼康 | 曝光装置及曝光方法、以及平面显示器制造方法 |
| CN106647175B (zh) * | 2015-10-30 | 2018-08-14 | 上海微电子装备（集团）股份有限公司 | 一种运动体的测量和初始化装置 |
| CN106225685B (zh) * | 2016-08-26 | 2018-11-30 | 清华大学 | 一种硅片台大行程三自由度位移测量系统 |
| DE102018103869B3 (de) | 2018-02-21 | 2019-05-09 | Physik Instrumente (Pi) Gmbh & Co. Kg | Maßelement für eine optische Messvorrichtung |
| JP2019158848A (ja) * | 2018-03-16 | 2019-09-19 | 富士電機株式会社 | 絶対位置情報検出装置、及び、絶対位置情報検出装置の制御方法 |
| CN111427237B (zh) * | 2019-01-10 | 2021-07-23 | 苏州苏大维格科技集团股份有限公司 | 大面积纳米光刻系统及其方法 |
| CN110360973B (zh) * | 2019-08-28 | 2021-02-05 | 合肥工业大学 | 一种面向微型工件测量的自动引导方法 |
| US11874144B2 (en) * | 2020-07-28 | 2024-01-16 | Li Lin | Displacement measurement system |
| CN113247298B (zh) * | 2021-06-30 | 2021-11-19 | 成都飞机工业（集团）有限责任公司 | 一种多数控定位器物理空间任意轴线的坐标变换方法 |
Family Cites Families (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US41380A (en) * | 1864-01-26 | Improved method of securing tubes in steam-boilers | ||
| US3957378A (en) * | 1974-11-25 | 1976-05-18 | The Bendix Corporation | Two-axis moire fringe displacement transducer |
| US4203064A (en) * | 1977-04-05 | 1980-05-13 | Tokyo Shibaura Electric Co., Ltd. | Method for automatically controlling the position of small objects |
| US4215938A (en) * | 1978-09-28 | 1980-08-05 | Farrand Industries, Inc. | Method and apparatus for correcting the error of a position measuring interferometer |
| US5124927A (en) * | 1990-03-02 | 1992-06-23 | International Business Machines Corp. | Latent-image control of lithography tools |
| BE1007876A4 (nl) * | 1993-12-17 | 1995-11-07 | Philips Electronics Nv | Stralingsbron-eenheid voor het opwekken van een bundel met twee polarisatierichtingen en twee frequenties. |
| US5596413A (en) * | 1995-08-17 | 1997-01-21 | Lucent Technologies Inc. | Sub-micron through-the-lens positioning utilizing out of phase segmented gratings |
| CN1244021C (zh) * | 1996-11-28 | 2006-03-01 | 株式会社尼康 | 光刻装置和曝光方法 |
| JP3413122B2 (ja) * | 1998-05-21 | 2003-06-03 | キヤノン株式会社 | 位置決め装置及びこれを用いた露光装置並びにデバイス製造方法 |
| JP2000049066A (ja) * | 1998-07-27 | 2000-02-18 | Canon Inc | 露光装置およびデバイス製造方法 |
| US6144118A (en) * | 1998-09-18 | 2000-11-07 | General Scanning, Inc. | High-speed precision positioning apparatus |
| TW490598B (en) * | 1999-11-30 | 2002-06-11 | Asm Lithography Bv | Lithographic projection apparatus and method of manufacturing a device using a lithographic projection apparatus |
| DE10011733A1 (de) * | 2000-03-10 | 2001-09-13 | Biotronik Mess & Therapieg | Signalauswerteverfahren zur Detektion von QRS-Komplexen in Elektrokardiogramm-Signalen |
| US6704090B2 (en) * | 2000-05-11 | 2004-03-09 | Nikon Corporation | Exposure method and exposure apparatus |
| JP4905617B2 (ja) * | 2001-05-28 | 2012-03-28 | 株式会社ニコン | 露光方法及びデバイス製造方法 |
| TW527526B (en) | 2000-08-24 | 2003-04-11 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| EP1182509B1 (de) | 2000-08-24 | 2009-04-08 | ASML Netherlands B.V. | Lithographischer Apparat, Verfahren zu dessen Kalibrierung und Verfahren zur Herstellung einer Vorrichtung |
| US7289212B2 (en) * | 2000-08-24 | 2007-10-30 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufacturing thereby |
| TW497013B (en) * | 2000-09-07 | 2002-08-01 | Asm Lithography Bv | Method for calibrating a lithographic projection apparatus and apparatus capable of applying such a method |
| US6863791B1 (en) | 2000-09-11 | 2005-03-08 | Spectrumedix Llc | Method for in-situ calibration of electrophoretic analysis systems |
| DE10144659A1 (de) | 2000-09-14 | 2002-05-02 | Heidenhain Gmbh Dr Johannes | Positionsmesseinrichtung |
| US7157038B2 (en) * | 2000-09-20 | 2007-01-02 | Electro Scientific Industries, Inc. | Ultraviolet laser ablative patterning of microstructures in semiconductors |
| US6686991B1 (en) | 2000-11-06 | 2004-02-03 | Nikon Corporation | Wafer stage assembly, servo control system, and method for operating the same |
| EP1345082A1 (de) * | 2002-03-15 | 2003-09-17 | ASML Netherlands BV | Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung |
| EP1400855A3 (de) | 2002-09-20 | 2009-04-08 | ASML Netherlands B.V. | Inspektion eines Artikels |
| US6858354B1 (en) * | 2002-09-26 | 2005-02-22 | Taiwan Semiconductor Manufacturing Company | Method to prevent side lobe on seal ring |
| TWI236562B (en) * | 2002-11-21 | 2005-07-21 | Hitachi Int Electric Inc | A method of detecting a pattern and an apparatus thereof |
| US7102729B2 (en) * | 2004-02-03 | 2006-09-05 | Asml Netherlands B.V. | Lithographic apparatus, measurement system, and device manufacturing method |
| US7256871B2 (en) * | 2004-07-27 | 2007-08-14 | Asml Netherlands B.V. | Lithographic apparatus and method for calibrating the same |
-
2004
- 2004-07-27 US US10/899,295 patent/US7256871B2/en active Active
-
2005
- 2005-07-13 US US11/179,665 patent/US7292312B2/en active Active
- 2005-07-19 DE DE602005019500T patent/DE602005019500D1/de active Active
- 2005-07-19 EP EP09178886A patent/EP2204696A3/de not_active Withdrawn
- 2005-07-19 EP EP05076665A patent/EP1621933B1/de not_active Not-in-force
- 2005-07-20 SG SG200504546A patent/SG119326A1/en unknown
- 2005-07-20 SG SG201004215-8A patent/SG163509A1/en unknown
- 2005-07-20 SG SG200800775-9A patent/SG139762A1/en unknown
- 2005-07-21 TW TW094124708A patent/TWI278019B/zh active
- 2005-07-26 JP JP2005215936A patent/JP4326508B2/ja active Active
- 2005-07-27 CN CN200510087651A patent/CN100580563C/zh active Active
- 2005-07-27 KR KR1020050068267A patent/KR100632877B1/ko active IP Right Grant
- 2005-07-27 CN CN200910226433A patent/CN101702078A/zh active Pending
-
2007
- 2007-07-09 US US11/822,633 patent/US7408655B2/en active Active
- 2007-09-25 US US11/902,786 patent/US7528965B2/en active Active
-
2009
- 2009-04-20 US US12/426,713 patent/US7859686B2/en active Active
-
2010
- 2010-05-17 US US12/781,202 patent/US7880901B2/en active Active
- 2010-12-09 US US12/964,483 patent/US8368902B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| US20060023194A1 (en) | 2006-02-02 |
| US7528965B2 (en) | 2009-05-05 |
| US20060023178A1 (en) | 2006-02-02 |
| US7859686B2 (en) | 2010-12-28 |
| US7880901B2 (en) | 2011-02-01 |
| US20090207422A1 (en) | 2009-08-20 |
| EP2204696A2 (de) | 2010-07-07 |
| SG163509A1 (en) | 2010-08-30 |
| US20080074681A1 (en) | 2008-03-27 |
| TWI278019B (en) | 2007-04-01 |
| CN1728002A (zh) | 2006-02-01 |
| US7292312B2 (en) | 2007-11-06 |
| EP1621933A3 (de) | 2006-06-28 |
| US20110075154A1 (en) | 2011-03-31 |
| CN101702078A (zh) | 2010-05-05 |
| SG139762A1 (en) | 2008-02-29 |
| SG119326A1 (en) | 2006-02-28 |
| KR100632877B1 (ko) | 2006-10-13 |
| JP2006054452A (ja) | 2006-02-23 |
| CN100580563C (zh) | 2010-01-13 |
| EP1621933B1 (de) | 2010-02-24 |
| US7256871B2 (en) | 2007-08-14 |
| EP1621933A2 (de) | 2006-02-01 |
| KR20060048801A (ko) | 2006-05-18 |
| EP2204696A3 (de) | 2010-10-06 |
| US7408655B2 (en) | 2008-08-05 |
| US20100220335A1 (en) | 2010-09-02 |
| US8368902B2 (en) | 2013-02-05 |
| TW200619858A (en) | 2006-06-16 |
| JP4326508B2 (ja) | 2009-09-09 |
| US20070256471A1 (en) | 2007-11-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE602005019500D1 (de) | Lithographischer Apparat und Verfahren zum Kalibrieren desselben | |
| DE602005012917D1 (de) | Verfahren und Vorrichtung zum Umformen | |
| DE60330292D1 (de) | Verfahren und Apparat zur Kalibrierung der Punktvergrösserung | |
| DE602006017954D1 (de) | Verbesserte stereolithographische Vorrichtung und Verfahren | |
| DE602005010658D1 (de) | Lithografische Vorrichtung und Herstellungsverfahren | |
| NO20054600D0 (no) | Apparat og fremgangsmate for formasjonsevaluering | |
| DE602005012251D1 (de) | Reifen-gewichtsanlegevorrichtung und verfahren | |
| DE602006020653D1 (de) | Verfahren und Vorrichtung zum Preßformen | |
| DE602006012746D1 (de) | Lithografische Vorrichtung und Herstellungsverfahren | |
| DE602004010961D1 (de) | Lithographischer Apparat | |
| DE602006004532D1 (de) | Vorrichtung und Verfahren zum Trockenreinigen | |
| DE602006014341D1 (de) | Vorrichtung und Verfahren zur Immersionslithographie | |
| DE602006012823D1 (de) | Vorrichtung und verfahren zum neusynthetisieren von signalen | |
| DE602004018436D1 (de) | Vorrichtung und Verfahren zum Herstellen dünner Schichten | |
| DE602004029253D1 (de) | Verfahren und vorrichtung zum erhöhen der inertialeicherter schwerkraftsgradiente | |
| DE602005009246D1 (de) | Lithografische Vorrichtung und Herstellungsverfahren dafür | |
| DE602005017318D1 (de) | Verfahren und Vorrichtung zum Bereitstellen von Entwurfsdaten | |
| DE602005025957D1 (de) | Gerät und Verfahren zum Abschließen von Dienstemulationsinstanzen | |
| DE602007012633D1 (de) | Lithographische Vorrichtung und Verfahren | |
| DE602005026229D1 (de) | Bilderzeugungsgerät und Verfahren zur Funktioneinstellung dafür | |
| DE102004047325A8 (de) | Einrichtung und Verfahren zum Herstellen einer Bildkorrespondenz | |
| EP1922588A4 (de) | Strukturbelichtungsverfahren und strukturbelichtungsvorrichtung | |
| SG121947A1 (en) | Lithographic apparatus and position measuring method | |
| DE602004032100D1 (de) | Lithographischer Apparat und Vorrichtungs-Halteverfahren | |
| DE602004008009D1 (de) | Lithographischer Apparat |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition |