DE602007000251D1 - Verschiebungsmesssystem - Google Patents
VerschiebungsmesssystemInfo
- Publication number
- DE602007000251D1 DE602007000251D1 DE602007000251T DE602007000251T DE602007000251D1 DE 602007000251 D1 DE602007000251 D1 DE 602007000251D1 DE 602007000251 T DE602007000251 T DE 602007000251T DE 602007000251 T DE602007000251 T DE 602007000251T DE 602007000251 D1 DE602007000251 D1 DE 602007000251D1
- Authority
- DE
- Germany
- Prior art keywords
- measurement system
- displacement measurement
- displacement
- measurement
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000006073 displacement reaction Methods 0.000 title 1
- 238000005259 measurement Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
- G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
- G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
- G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
- G01D5/36—Forming the light into pulses
- G01D5/38—Forming the light into pulses by diffraction gratings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/384,834 US7636165B2 (en) | 2006-03-21 | 2006-03-21 | Displacement measurement systems lithographic apparatus and device manufacturing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE602007000251D1 true DE602007000251D1 (de) | 2009-01-02 |
Family
ID=38109629
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE602007000251T Active DE602007000251D1 (de) | 2006-03-21 | 2007-03-09 | Verschiebungsmesssystem |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US7636165B2 (de) |
| EP (2) | EP1865291B1 (de) |
| JP (1) | JP4948213B2 (de) |
| KR (3) | KR20070095805A (de) |
| CN (1) | CN101042542B (de) |
| DE (1) | DE602007000251D1 (de) |
| SG (1) | SG136092A1 (de) |
| TW (1) | TWI344060B (de) |
Families Citing this family (75)
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| ES2308726T3 (es) * | 2005-02-16 | 2008-12-01 | Basf Se | 5-alcoxiaquil-6-alquil-7-amino-azolopirimidinas, procedimiento para su obtencion y su empleo para la lucha contra hongos dañinos asi como agentes que las contienen. |
| EP2801864B8 (de) * | 2006-01-19 | 2015-11-04 | Nikon Corporation | Belichtungsvorrichtung, Belichtungsverfahren und Verfahren zur Herstellung einer Vorrichtung |
| CN101980085B (zh) * | 2006-02-21 | 2012-11-07 | 株式会社尼康 | 曝光装置、曝光方法及组件制造方法 |
| US8908145B2 (en) * | 2006-02-21 | 2014-12-09 | Nikon Corporation | Pattern forming apparatus and pattern forming method, movable body drive system and movable body drive method, exposure apparatus and exposure method, and device manufacturing method |
| JP5177674B2 (ja) | 2006-02-21 | 2013-04-03 | 株式会社ニコン | 測定装置及び方法、パターン形成装置及び方法、並びにデバイス製造方法 |
| US7636165B2 (en) * | 2006-03-21 | 2009-12-22 | Asml Netherlands B.V. | Displacement measurement systems lithographic apparatus and device manufacturing method |
| KR100737177B1 (ko) * | 2006-05-15 | 2007-07-10 | 경북대학교 산학협력단 | 수직 공진 표면광 레이저를 이용한 간섭계 |
| CN101479832B (zh) * | 2006-06-09 | 2011-05-11 | 株式会社尼康 | 移动体装置、曝光装置和曝光方法以及元件制造方法 |
| TWI442191B (zh) | 2006-08-31 | 2014-06-21 | 尼康股份有限公司 | Mobile body drive system and moving body driving method, pattern forming apparatus and method, exposure apparatus and method, component manufacturing method, and method of determining |
| SG174737A1 (en) | 2006-08-31 | 2011-10-28 | Nikon Corp | Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method |
| KR101529845B1 (ko) | 2006-08-31 | 2015-06-17 | 가부시키가이샤 니콘 | 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법 |
| TW201809913A (zh) | 2006-09-01 | 2018-03-16 | 日商尼康股份有限公司 | 曝光裝置、曝光方法、以及元件製造方法 |
| TWI622084B (zh) | 2006-09-01 | 2018-04-21 | Nikon Corp | Mobile body driving method, moving body driving system, pattern forming method and device, exposure method and device, component manufacturing method, and correction method |
| US7999918B2 (en) * | 2006-09-29 | 2011-08-16 | Nikon Corporation | Movable body system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method |
| DE102007023300A1 (de) * | 2007-05-16 | 2008-11-20 | Dr. Johannes Heidenhain Gmbh | Positionsmesseinrichtung und Anordnung derselben |
| WO2008143989A2 (en) * | 2007-05-18 | 2008-11-27 | Allview Research Llc | Motion measurement and synchronication using a scanning interferometer with gratings |
| US8760615B2 (en) * | 2007-05-24 | 2014-06-24 | Asml Netherlands B.V. | Lithographic apparatus having encoder type position sensor system |
| US8687166B2 (en) * | 2007-05-24 | 2014-04-01 | Asml Netherlands B.V. | Lithographic apparatus having an encoder position sensor system |
| JP5066401B2 (ja) * | 2007-07-24 | 2012-11-07 | 株式会社森精機製作所 | 定点検出装置及び変位測定装置 |
| US8237919B2 (en) * | 2007-08-24 | 2012-08-07 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads |
| WO2009075103A1 (ja) * | 2007-12-11 | 2009-06-18 | Nikon Corporation | 移動体装置、露光装置及びパターン形成装置、並びにデバイス製造方法 |
| NL1036404A1 (nl) * | 2008-01-10 | 2009-07-13 | Asml Netherlands Bv | Lithographic apparatus with an encoder arranged for defining a zero level. |
| DE102008007319A1 (de) * | 2008-02-02 | 2009-08-06 | Dr. Johannes Heidenhain Gmbh | Optische Positionsmesseinrichtung |
| DE102008010284A1 (de) * | 2008-02-21 | 2009-08-27 | Dr. Johannes Heidenhain Gmbh | XY-Tisch mit einer Messanordnung zur Positionsbestimmung |
| KR101670624B1 (ko) * | 2008-04-30 | 2016-11-09 | 가부시키가이샤 니콘 | 스테이지 장치, 패턴 형성 장치, 노광 장치, 스테이지 구동 방법, 노광 방법, 그리고 디바이스 제조 방법 |
| US8228482B2 (en) * | 2008-05-13 | 2012-07-24 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
| US8817236B2 (en) | 2008-05-13 | 2014-08-26 | Nikon Corporation | Movable body system, movable body drive method, pattern formation apparatus, pattern formation method, exposure apparatus, exposure method, and device manufacturing method |
| US8786829B2 (en) * | 2008-05-13 | 2014-07-22 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
| NL2003638A (en) * | 2008-12-03 | 2010-06-07 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
| US8599359B2 (en) | 2008-12-19 | 2013-12-03 | Nikon Corporation | Exposure apparatus, exposure method, device manufacturing method, and carrier method |
| US8760629B2 (en) | 2008-12-19 | 2014-06-24 | Nikon Corporation | Exposure apparatus including positional measurement system of movable body, exposure method of exposing object including measuring positional information of movable body, and device manufacturing method that includes exposure method of exposing object, including measuring positional information of movable body |
| US8773635B2 (en) * | 2008-12-19 | 2014-07-08 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
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| US8334983B2 (en) * | 2009-05-22 | 2012-12-18 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| EP2264528A1 (de) * | 2009-06-19 | 2010-12-22 | ASML Netherlands B.V. | Sensor und Lithografievorrichtung |
| US8514395B2 (en) | 2009-08-25 | 2013-08-20 | Nikon Corporation | Exposure method, exposure apparatus, and device manufacturing method |
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| US8493547B2 (en) * | 2009-08-25 | 2013-07-23 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
| US20110102761A1 (en) * | 2009-09-28 | 2011-05-05 | Nikon Corporation | Stage apparatus, exposure apparatus, and device fabricating method |
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| NL2005545A (en) * | 2009-11-17 | 2011-05-18 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
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| CN107250915B (zh) | 2015-02-23 | 2020-03-13 | 株式会社尼康 | 测量装置、光刻系统及曝光装置、以及管理方法、重迭测量方法及组件制造方法 |
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| CA3096129A1 (en) * | 2018-04-25 | 2019-10-31 | National Research Council Of Canada | High resolution and high throughput spectrometer |
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| CN111536883B (zh) * | 2020-06-10 | 2021-07-23 | 中北大学 | 一种基于复合式光栅的微位移传感器 |
| CN112113507B (zh) * | 2020-09-23 | 2021-10-22 | 中国科学院长春光学精密机械与物理研究所 | 一种基于光栅投影识别的二维平面位移测量装置 |
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| DE50015787D1 (de) * | 1999-09-16 | 2009-12-24 | Heidenhain Gmbh Dr Johannes | Vorrichtung zur Positionsbestimmung und Ermittlung von Führungsfehlern |
| JP4846909B2 (ja) | 2000-02-15 | 2011-12-28 | キヤノン株式会社 | 光学式エンコーダ及び回折格子の変位測定方法 |
| DE10144659A1 (de) * | 2000-09-14 | 2002-05-02 | Heidenhain Gmbh Dr Johannes | Positionsmesseinrichtung |
| FR2825150B1 (fr) | 2001-05-28 | 2003-09-26 | Univ Jean Monnet | Dispositif de caracterisation de reseaux optiques et procede de fabrication de reseaux optiques avec une frequence spatiale predefinie |
| EP1396704B1 (de) | 2002-08-07 | 2015-10-07 | Dr. Johannes Heidenhain GmbH | Interferenzielle Positionsmesseinrichtung |
| JP2004212243A (ja) * | 2003-01-06 | 2004-07-29 | Canon Inc | 格子干渉型光学式エンコーダ |
| JP2009509156A (ja) * | 2005-09-21 | 2009-03-05 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 物体の運動を検出するシステム |
| EP2801864B8 (de) * | 2006-01-19 | 2015-11-04 | Nikon Corporation | Belichtungsvorrichtung, Belichtungsverfahren und Verfahren zur Herstellung einer Vorrichtung |
| US7636165B2 (en) | 2006-03-21 | 2009-12-22 | Asml Netherlands B.V. | Displacement measurement systems lithographic apparatus and device manufacturing method |
-
2006
- 2006-03-21 US US11/384,834 patent/US7636165B2/en active Active
-
2007
- 2007-03-08 TW TW096108023A patent/TWI344060B/zh active
- 2007-03-09 EP EP07016985.9A patent/EP1865291B1/de not_active Expired - Fee Related
- 2007-03-09 EP EP07250993A patent/EP1837630B1/de active Active
- 2007-03-09 DE DE602007000251T patent/DE602007000251D1/de active Active
- 2007-03-14 JP JP2007064291A patent/JP4948213B2/ja active Active
- 2007-03-21 CN CN2007100878904A patent/CN101042542B/zh active Active
- 2007-03-21 KR KR1020070027566A patent/KR20070095805A/ko not_active Application Discontinuation
- 2007-03-21 SG SG200702071-2A patent/SG136092A1/en unknown
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2008
- 2008-08-22 KR KR1020080082259A patent/KR100950068B1/ko not_active IP Right Cessation
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2009
- 2009-06-04 KR KR1020090049512A patent/KR100983909B1/ko active IP Right Grant
- 2009-11-10 US US12/615,685 patent/US8390820B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| SG136092A1 (en) | 2007-10-29 |
| KR20070095805A (ko) | 2007-10-01 |
| US8390820B2 (en) | 2013-03-05 |
| KR100983909B1 (ko) | 2010-09-28 |
| EP1837630A1 (de) | 2007-09-26 |
| EP1865291A3 (de) | 2009-07-15 |
| CN101042542A (zh) | 2007-09-26 |
| KR20080089548A (ko) | 2008-10-07 |
| KR100950068B1 (ko) | 2010-03-26 |
| US7636165B2 (en) | 2009-12-22 |
| JP2007292735A (ja) | 2007-11-08 |
| JP4948213B2 (ja) | 2012-06-06 |
| TW200739242A (en) | 2007-10-16 |
| US20100053586A1 (en) | 2010-03-04 |
| US20070223007A1 (en) | 2007-09-27 |
| TWI344060B (en) | 2011-06-21 |
| EP1865291A2 (de) | 2007-12-12 |
| EP1837630B1 (de) | 2008-11-19 |
| EP1865291B1 (de) | 2015-08-19 |
| KR20090081351A (ko) | 2009-07-28 |
| CN101042542B (zh) | 2011-05-11 |
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