DE60200849D1 - Zweidimensionaler photonischer Kristall und Herstellungsverfahren - Google Patents

Zweidimensionaler photonischer Kristall und Herstellungsverfahren

Info

Publication number
DE60200849D1
DE60200849D1 DE60200849T DE60200849T DE60200849D1 DE 60200849 D1 DE60200849 D1 DE 60200849D1 DE 60200849 T DE60200849 T DE 60200849T DE 60200849 T DE60200849 T DE 60200849T DE 60200849 D1 DE60200849 D1 DE 60200849D1
Authority
DE
Germany
Prior art keywords
manufacturing process
photonic crystal
dimensional photonic
dimensional
crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60200849T
Other languages
English (en)
Other versions
DE60200849T2 (de
Inventor
Mihail M Sigalas
Annette Grot
Laura W Mirkarimi
Curt Flory
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Avago Technologies International Sales Pte Ltd
Original Assignee
Agilent Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agilent Technologies Inc filed Critical Agilent Technologies Inc
Publication of DE60200849D1 publication Critical patent/DE60200849D1/de
Application granted granted Critical
Publication of DE60200849T2 publication Critical patent/DE60200849T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00Nanooptics, e.g. quantum optics or photonic crystals
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01PWAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P1/00Auxiliary devices
    • H01P1/20Frequency-selective devices, e.g. filters
    • H01P1/2005Electromagnetic photonic bandgaps [EPB], or photonic bandgaps [PBG]
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122Basic optical elements, e.g. light-guiding paths
    • G02B6/1225Basic optical elements, e.g. light-guiding paths comprising photonic band-gap structures or photonic lattices
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12035Materials
    • G02B2006/12061Silicon
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12035Materials
    • G02B2006/12078Gallium arsenide or alloys (GaAs, GaAlAs, GaAsP, GaInAs)
DE60200849T 2001-04-30 2002-02-12 Zweidimensionaler photonischer Kristall und Herstellungsverfahren Expired - Lifetime DE60200849T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US846748 2001-04-30
US09/846,748 US6560006B2 (en) 2001-04-30 2001-04-30 Two-dimensional photonic crystal slab waveguide

Publications (2)

Publication Number Publication Date
DE60200849D1 true DE60200849D1 (de) 2004-09-09
DE60200849T2 DE60200849T2 (de) 2005-08-04

Family

ID=25298831

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60200849T Expired - Lifetime DE60200849T2 (de) 2001-04-30 2002-02-12 Zweidimensionaler photonischer Kristall und Herstellungsverfahren

Country Status (4)

Country Link
US (1) US6560006B2 (de)
EP (1) EP1255135B1 (de)
JP (1) JP2002341164A (de)
DE (1) DE60200849T2 (de)

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4446591B2 (ja) * 2000-12-20 2010-04-07 京セラ株式会社 光導波路および光回路基板
US6819845B2 (en) * 2001-08-02 2004-11-16 Ultradots, Inc. Optical devices with engineered nonlinear nanocomposite materials
FR2832513B1 (fr) * 2001-11-21 2004-04-09 Centre Nat Rech Scient Structure a cristal photonique pour la conversion de mode
US7279718B2 (en) * 2002-01-28 2007-10-09 Philips Lumileds Lighting Company, Llc LED including photonic crystal structure
JP2003295143A (ja) * 2002-03-29 2003-10-15 Hitachi Ltd 光機能素子及びその製造方法
AU2003234438A1 (en) * 2002-05-02 2003-11-17 Vyoptics, Inc. Integrating element for optical fiber communication systems based on photonic multi-bandgap quasi-crystals having optimized transfer functions
US6728457B2 (en) * 2002-07-10 2004-04-27 Agilent Technologies, Inc. Waveguides in two dimensional slab photonic crystals with noncircular holes
US20040013384A1 (en) * 2002-07-17 2004-01-22 Greg Parker Optical waveguide structure
US6744804B2 (en) * 2002-07-18 2004-06-01 Finisar Corporation Edge emitting lasers using photonic crystals
US6649439B1 (en) * 2002-08-01 2003-11-18 Northrop Grumman Corporation Semiconductor-air gap grating fabrication using a sacrificial layer process
US7026640B2 (en) * 2002-08-02 2006-04-11 Ramot At Tel Aviv University Ltd. Method and systems for dynamically controlling electromagnetic wave motion through a photonic crystal
US6934441B2 (en) * 2003-09-09 2005-08-23 Battelle Memorial Institute Wavelength separation devices incorporating multi-barrier photonic heterostructures
US6940637B2 (en) * 2002-09-09 2005-09-06 Battelle Memorial Institute Multi-barrier photonic heterostructures
US6778581B1 (en) * 2002-09-24 2004-08-17 Finisar Corporation Tunable vertical cavity surface emitting laser
US20040086244A1 (en) 2002-11-05 2004-05-06 Zoorob Majd E. Optical waveguide structure
JP4236092B2 (ja) * 2003-01-31 2009-03-11 Tdk株式会社 2次元フォトニック結晶
JP4735259B2 (ja) * 2003-06-19 2011-07-27 日本電気株式会社 フォトニック結晶の構造
US7257141B2 (en) * 2003-07-23 2007-08-14 Palo Alto Research Center Incorporated Phase array oxide-confined VCSELs
US7255805B2 (en) * 2004-01-12 2007-08-14 Hewlett-Packard Development Company, L.P. Photonic structures, devices, and methods
CN100429540C (zh) * 2004-01-22 2008-10-29 松下电器产业株式会社 光学器件、及光子晶体厚片的制造方法
WO2005078512A1 (ja) * 2004-02-17 2005-08-25 The Furukawa Electric Co., Ltd. フォトニック結晶半導体デバイスおよびその製造方法
DE102004022140B4 (de) * 2004-05-05 2007-03-08 Atmel Germany Gmbh Verfahren zur Herstellung einer Photonic-Band-Gap-Struktur und Bauelement mit einer derartig hergestellten Photonic-Band-Gap-Struktur
US7447404B2 (en) * 2004-05-27 2008-11-04 Energy Conversion Devices, Inc. Photonic integrated circuit
US7418161B2 (en) * 2004-06-22 2008-08-26 Micron Technology, Inc. Photonic crystal-based optical elements for integrated circuits and methods therefor
US7054524B2 (en) * 2004-08-30 2006-05-30 Energy Conversion Devices, Inc. Asymmetric photonic crystal waveguide element having symmetric mode fields
JP2007173353A (ja) * 2005-12-20 2007-07-05 Kyoto Univ フォトニック結晶発光ダイオード及びその製造方法
US7922976B2 (en) * 2006-10-23 2011-04-12 Banpil Photonics, Inc. High sensitivity sensor device and manufacturing thereof
US7515790B2 (en) * 2006-11-09 2009-04-07 Electronics And Telecommunications Research Institute Two-dimensional planar photonic crystal superprism device and method of manufacturing the same
US7995892B2 (en) * 2007-06-01 2011-08-09 Lawrence Livermore National Security, Llc Low loss, high and low index contrast waveguides in semiconductors
JP5304035B2 (ja) * 2007-08-03 2013-10-02 株式会社村田製作所 バンドパスフィルタおよびバンドパスフィルタ用フォトニック結晶の製造方法
JP2011504616A (ja) * 2007-11-22 2011-02-10 エージェンシー フォー サイエンス,テクノロジー アンド リサーチ エッチングされ平坦化されたフォトニック結晶構造体の形成
FR2924820B1 (fr) * 2007-12-11 2010-04-02 Commissariat Energie Atomique Dispositif photonique de filtrage spatial a bande passante angulaire etroite.
JPWO2009087825A1 (ja) * 2008-01-11 2011-05-26 日本電気株式会社 フォトニック結晶体
JPWO2009107427A1 (ja) * 2008-02-28 2011-06-30 日本電気株式会社 光導波路
US8682128B2 (en) * 2008-08-21 2014-03-25 International Business Machines Corporation Optical waveguide with periodic sub-wavelength sized regions
US8367520B2 (en) 2008-09-22 2013-02-05 Soitec Methods and structures for altering strain in III-nitride materials
FR2936904B1 (fr) * 2008-10-03 2011-01-14 Soitec Silicon On Insulator Procedes et structures pour alterer la contrainte dans des materiaux nitrure iii.
US8731359B2 (en) * 2009-12-30 2014-05-20 Cornell University Extraordinary light transmission apparatus and method
KR101979944B1 (ko) * 2012-10-18 2019-05-17 엘지이노텍 주식회사 발광소자
US9888283B2 (en) 2013-03-13 2018-02-06 Nagrastar Llc Systems and methods for performing transport I/O
USD758372S1 (en) 2013-03-13 2016-06-07 Nagrastar Llc Smart card interface
USD864968S1 (en) 2015-04-30 2019-10-29 Echostar Technologies L.L.C. Smart card interface
US11244667B1 (en) * 2018-01-26 2022-02-08 Hrl Laboratories, Llc Curved phononic crystal waveguide
CN108673979A (zh) * 2018-04-09 2018-10-19 东南大学 一种周期复合结构夹芯板
US11309347B2 (en) 2020-02-11 2022-04-19 Taiwan Semiconductor Manufacturing Co., Ltd. Integrated circuit photodetector

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5335240A (en) * 1992-12-22 1994-08-02 Iowa State University Research Foundation, Inc. Periodic dielectric structure for production of photonic band gap and devices incorporating the same
US5600483A (en) * 1994-05-10 1997-02-04 Massachusetts Institute Of Technology Three-dimensional periodic dielectric structures having photonic bandgaps
US5748057A (en) * 1996-06-03 1998-05-05 Hughes Electronics Photonic bandgap crystal frequency multiplexers and a pulse blanking filter for use therewith
CA2339114A1 (en) * 1998-07-30 2000-02-10 Nicholas F. Borrelli Method of fabricating photonic structures
US6134043A (en) 1998-08-11 2000-10-17 Massachusetts Institute Of Technology Composite photonic crystals
US6175671B1 (en) * 1998-10-01 2001-01-16 Nortel Networks Limited Photonic crystal waveguide arrays
US6134369A (en) 1999-03-31 2000-10-17 Matsushita Electric Industrial Co. Compact optical waveguide
JP3407693B2 (ja) * 1999-06-09 2003-05-19 日本電気株式会社 フォトニック結晶
JP3925769B2 (ja) * 2000-03-24 2007-06-06 関西ティー・エル・オー株式会社 2次元フォトニック結晶及び合分波器

Also Published As

Publication number Publication date
JP2002341164A (ja) 2002-11-27
US6560006B2 (en) 2003-05-06
DE60200849T2 (de) 2005-08-04
EP1255135A2 (de) 2002-11-06
EP1255135B1 (de) 2004-08-04
US20020159126A1 (en) 2002-10-31
EP1255135A3 (de) 2003-02-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: AVAGO TECHNOLOGIES GENERAL IP ( SINGAPORE) PTE. LT

8328 Change in the person/name/address of the agent

Representative=s name: DILG HAEUSLER SCHINDELMANN PATENTANWALTSGESELLSCHA