DE60229935D1 - Kompensation der doppelbrechung in kubisch kristallinen projektionslinsen und optischen systemen - Google Patents
Kompensation der doppelbrechung in kubisch kristallinen projektionslinsen und optischen systemenInfo
- Publication number
- DE60229935D1 DE60229935D1 DE60229935T DE60229935T DE60229935D1 DE 60229935 D1 DE60229935 D1 DE 60229935D1 DE 60229935 T DE60229935 T DE 60229935T DE 60229935 T DE60229935 T DE 60229935T DE 60229935 D1 DE60229935 D1 DE 60229935D1
- Authority
- DE
- Germany
- Prior art keywords
- radiation
- optical axis
- crystalline
- elements
- compensation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
- G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
- G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
- G03F7/70966—Birefringence
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/942—Masking
Applications Claiming Priority (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29521201P | 2001-06-01 | 2001-06-01 | |
US29669401P | 2001-06-06 | 2001-06-06 | |
US29960301P | 2001-06-20 | 2001-06-20 | |
US29949701P | 2001-06-20 | 2001-06-20 | |
US33509301P | 2001-10-30 | 2001-10-30 | |
US33218301P | 2001-11-21 | 2001-11-21 | |
US10/071,375 US6683710B2 (en) | 2001-06-01 | 2002-02-07 | Correction of birefringence in cubic crystalline optical systems |
PCT/US2002/017071 WO2002099500A2 (en) | 2001-06-01 | 2002-05-31 | Correction of birefringence in cubic crystalline projection lenses and optical systems |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60229935D1 true DE60229935D1 (de) | 2009-01-02 |
Family
ID=27568307
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60229935T Expired - Lifetime DE60229935D1 (de) | 2001-06-01 | 2002-05-31 | Kompensation der doppelbrechung in kubisch kristallinen projektionslinsen und optischen systemen |
Country Status (8)
Country | Link |
---|---|
US (6) | US6683710B2 (de) |
EP (1) | EP1393114B1 (de) |
JP (2) | JP4347686B2 (de) |
KR (1) | KR100850324B1 (de) |
AT (1) | ATE414927T1 (de) |
AU (1) | AU2002346708A1 (de) |
DE (1) | DE60229935D1 (de) |
WO (1) | WO2002099500A2 (de) |
Families Citing this family (55)
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US5729331A (en) * | 1993-06-30 | 1998-03-17 | Nikon Corporation | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
KR100870585B1 (ko) * | 2000-10-10 | 2008-11-25 | 가부시키가이샤 니콘 | 결상성능의 평가방법 |
JP2004526331A (ja) * | 2001-05-15 | 2004-08-26 | カール・ツアイス・エスエムテイ・アーゲー | フッ化物結晶レンズを含む対物レンズ |
DE10210782A1 (de) * | 2002-03-12 | 2003-10-09 | Zeiss Carl Smt Ag | Objektiv mit Kristall-Linsen |
US7239447B2 (en) * | 2001-05-15 | 2007-07-03 | Carl Zeiss Smt Ag | Objective with crystal lenses |
DE10123725A1 (de) * | 2001-05-15 | 2002-11-21 | Zeiss Carl | Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren |
US6683710B2 (en) * | 2001-06-01 | 2004-01-27 | Optical Research Associates | Correction of birefringence in cubic crystalline optical systems |
JP3639807B2 (ja) * | 2001-06-27 | 2005-04-20 | キヤノン株式会社 | 光学素子及び製造方法 |
US6831731B2 (en) * | 2001-06-28 | 2004-12-14 | Nikon Corporation | Projection optical system and an exposure apparatus with the projection optical system |
US6788389B2 (en) * | 2001-07-10 | 2004-09-07 | Nikon Corporation | Production method of projection optical system |
US20040218271A1 (en) * | 2001-07-18 | 2004-11-04 | Carl Zeiss Smt Ag | Retardation element made from cubic crystal and an optical system therewith |
US6844915B2 (en) * | 2001-08-01 | 2005-01-18 | Nikon Corporation | Optical system and exposure apparatus provided with the optical system |
US6970232B2 (en) * | 2001-10-30 | 2005-11-29 | Asml Netherlands B.V. | Structures and methods for reducing aberration in integrated circuit fabrication systems |
US6995908B2 (en) * | 2001-10-30 | 2006-02-07 | Asml Netherlands B.V. | Methods for reducing aberration in optical systems |
US6844972B2 (en) * | 2001-10-30 | 2005-01-18 | Mcguire, Jr. James P. | Reducing aberration in optical systems comprising cubic crystalline optical elements |
US7453641B2 (en) * | 2001-10-30 | 2008-11-18 | Asml Netherlands B.V. | Structures and methods for reducing aberration in optical systems |
DE10162796B4 (de) * | 2001-12-20 | 2007-10-31 | Carl Zeiss Smt Ag | Verfahren zur Optimierung der Abbildungseigenschaften von mindestens zwei optischen Elementen sowie photolithographisches Fertigungsverfahren |
JP2003309059A (ja) * | 2002-04-17 | 2003-10-31 | Nikon Corp | 投影光学系、その製造方法、露光装置および露光方法 |
JP4333078B2 (ja) * | 2002-04-26 | 2009-09-16 | 株式会社ニコン | 投影光学系、該投影光学系を備えた露光装置および該投影光学系を用いた露光方法並びにデバイス製造方法 |
US7292388B2 (en) * | 2002-05-08 | 2007-11-06 | Carl Zeiss Smt Ag | Lens made of a crystalline material |
US6816326B2 (en) * | 2002-07-12 | 2004-11-09 | Schott Glas | Optical system with compensated spatial dispersion |
US7154669B2 (en) * | 2002-08-05 | 2006-12-26 | Asml Holding N.V. | Method and system for correction of intrinsic birefringence in UV microlithography |
US7075720B2 (en) * | 2002-08-22 | 2006-07-11 | Asml Netherlands B.V. | Structures and methods for reducing polarization aberration in optical systems |
AU2003254550A1 (en) * | 2002-09-09 | 2004-04-30 | Carl Zeiss Smt Ag | Catadioptric projection lens and method for compensating the intrinsic birefringence in a lens of this type |
AU2003229692A1 (en) | 2003-04-17 | 2004-11-04 | Carl Zeiss Smt Ag | Optical system, method of altering retardances therein and photolithography tool |
DE10329793A1 (de) * | 2003-07-01 | 2005-01-27 | Carl Zeiss Smt Ag | Projektionsobjektiv für eine mikrolithographische Projektionsbelichtungsanlage |
DE10355725A1 (de) | 2003-11-28 | 2005-06-30 | Carl Zeiss Smt Ag | Optisches System sowie Verfahren zur mikrolithographischen Herstellung mikrostrukturierter Bauteile |
US7375897B2 (en) * | 2003-12-19 | 2008-05-20 | Carl Zeiss Smt Ag | Imaging systems |
US7463422B2 (en) * | 2004-01-14 | 2008-12-09 | Carl Zeiss Smt Ag | Projection exposure apparatus |
US7239450B2 (en) | 2004-11-22 | 2007-07-03 | Carl Zeiss Smt Ag | Method of determining lens materials for a projection exposure apparatus |
EP1586946A3 (de) * | 2004-04-14 | 2007-01-17 | Carl Zeiss SMT AG | Optisches System eines Projektions-Mikrolithographie Apparats |
KR101199076B1 (ko) * | 2004-06-04 | 2012-11-07 | 칼 짜이스 에스엠티 게엠베하 | 강도 변동이 보상된 투사 시스템 및 이를 위한 보상 요소 |
WO2006008691A1 (en) * | 2004-07-16 | 2006-01-26 | Koninklijke Philips Electronics N.V. | Method and apparatus for generating radially and/or azimuthally polarized light beams. |
US7456933B2 (en) * | 2004-09-08 | 2008-11-25 | Carl Zeiss Smt Ag | Method for improving the imaging properties of a projection objective for a microlithographic projection exposure apparatus |
JP2008532273A (ja) * | 2005-02-25 | 2008-08-14 | カール ツァイス エスエムテー アクチエンゲゼルシャフト | マイクロ・リソグラフィー投影露光装置のための光学システム |
EP1701179A1 (de) * | 2005-03-08 | 2006-09-13 | Schott AG | Verfahren zur Herstellung von optischen Elementen für die Mikrolithographie, damit erhältliche Linsensysteme und deren Verwendung |
DE102006013560A1 (de) * | 2005-04-19 | 2006-10-26 | Carl Zeiss Smt Ag | Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage sowie Verfahren zu dessen Herstellung |
US20060238735A1 (en) * | 2005-04-22 | 2006-10-26 | Vladimir Kamenov | Optical system of a projection exposure apparatus |
AU2006259705B2 (en) * | 2005-06-16 | 2012-05-17 | Avery Dennison Corporation | Retroreflective sheet structure |
DE102006025044A1 (de) * | 2005-08-10 | 2007-02-15 | Carl Zeiss Smt Ag | Abbildungssystem, insbesondere Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage |
JP2007198896A (ja) * | 2006-01-26 | 2007-08-09 | Canon Inc | 計測方法 |
DE102006038398A1 (de) | 2006-08-15 | 2008-02-21 | Carl Zeiss Smt Ag | Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage |
WO2008110501A1 (de) * | 2007-03-13 | 2008-09-18 | Carl Zeiss Smt Ag | Projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage |
US8715909B2 (en) * | 2007-10-05 | 2014-05-06 | Infineon Technologies Ag | Lithography systems and methods of manufacturing using thereof |
DE102007055063A1 (de) * | 2007-11-16 | 2009-05-28 | Carl Zeiss Smt Ag | Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage |
DE102007055567A1 (de) * | 2007-11-20 | 2009-05-28 | Carl Zeiss Smt Ag | Optisches System |
US8256903B2 (en) * | 2009-09-25 | 2012-09-04 | Himax Display, Inc. | Optical system and projector |
DE102012213553A1 (de) * | 2012-08-01 | 2013-08-22 | Carl Zeiss Smt Gmbh | Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage |
DE102013108321B3 (de) * | 2013-08-02 | 2014-10-23 | Leibniz-Institut für Analytische Wissenschaften-ISAS-e.V. | Fresnelsches-Parallelepiped |
WO2017097564A1 (en) * | 2015-12-07 | 2017-06-15 | Asml Holding N.V. | Objective lens system |
US10732336B2 (en) * | 2017-02-02 | 2020-08-04 | Corning Incorporated | Method of assembling optical systems and minimizing retardance distortions in optical assemblies |
DE102018218064B4 (de) * | 2018-10-22 | 2024-01-18 | Carl Zeiss Smt Gmbh | Optisches System, insbesondere für die Mikrolithographie |
DE102018218496A1 (de) | 2018-10-29 | 2018-12-13 | Carl Zeiss Smt Gmbh | Verfahren zum Manipulieren der Systemretardierung in einem optischen System einer mikrolithographischen Projektionsbelichtungsanlage |
WO2023173006A2 (en) * | 2022-03-09 | 2023-09-14 | Arizona Board Of Regents On Behalf Of The University Of Arizona | Polarization aberration compensation for reflective surfaces |
DE102022118146B3 (de) * | 2022-07-20 | 2023-12-07 | Carl Zeiss Jena Gmbh | Verfahren zum Herstellen eines optischen Elements für eine Lithographieanlage |
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-
2002
- 2002-02-07 US US10/071,375 patent/US6683710B2/en not_active Expired - Lifetime
- 2002-05-31 AT AT02752014T patent/ATE414927T1/de not_active IP Right Cessation
- 2002-05-31 KR KR1020037015766A patent/KR100850324B1/ko not_active IP Right Cessation
- 2002-05-31 DE DE60229935T patent/DE60229935D1/de not_active Expired - Lifetime
- 2002-05-31 WO PCT/US2002/017071 patent/WO2002099500A2/en active Search and Examination
- 2002-05-31 AU AU2002346708A patent/AU2002346708A1/en not_active Abandoned
- 2002-05-31 EP EP02752014A patent/EP1393114B1/de not_active Expired - Lifetime
- 2002-05-31 JP JP2003502557A patent/JP4347686B2/ja not_active Expired - Fee Related
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2003
- 2003-02-20 US US10/371,269 patent/US6885488B2/en not_active Expired - Lifetime
- 2003-02-20 US US10/371,266 patent/US6917458B2/en not_active Expired - Lifetime
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2004
- 2004-01-19 US US10/759,699 patent/US6947192B2/en not_active Expired - Lifetime
- 2004-08-19 US US10/921,345 patent/US7009769B2/en not_active Expired - Fee Related
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2005
- 2005-10-18 US US11/251,959 patent/US7075696B2/en not_active Expired - Lifetime
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Also Published As
Publication number | Publication date |
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JP2009169431A (ja) | 2009-07-30 |
EP1393114A2 (de) | 2004-03-03 |
JP2005521227A (ja) | 2005-07-14 |
US6885488B2 (en) | 2005-04-26 |
US20030099047A1 (en) | 2003-05-29 |
US20040001244A1 (en) | 2004-01-01 |
WO2002099500A3 (en) | 2003-10-09 |
US20040145806A1 (en) | 2004-07-29 |
ATE414927T1 (de) | 2008-12-15 |
US6947192B2 (en) | 2005-09-20 |
US20050036201A1 (en) | 2005-02-17 |
US6683710B2 (en) | 2004-01-27 |
WO2002099500A2 (en) | 2002-12-12 |
KR100850324B1 (ko) | 2008-08-04 |
KR20040039199A (ko) | 2004-05-10 |
JP4347686B2 (ja) | 2009-10-21 |
US7009769B2 (en) | 2006-03-07 |
JP5086299B2 (ja) | 2012-11-28 |
AU2002346708A1 (en) | 2002-12-16 |
US20060050400A1 (en) | 2006-03-09 |
US6917458B2 (en) | 2005-07-12 |
EP1393114B1 (de) | 2008-11-19 |
US7075696B2 (en) | 2006-07-11 |
US20030234981A1 (en) | 2003-12-25 |
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