DE60236360D1 - Echtzeitanalyse periodischer strukturen auf halbleitern - Google Patents

Echtzeitanalyse periodischer strukturen auf halbleitern

Info

Publication number
DE60236360D1
DE60236360D1 DE60236360T DE60236360T DE60236360D1 DE 60236360 D1 DE60236360 D1 DE 60236360D1 DE 60236360 T DE60236360 T DE 60236360T DE 60236360 T DE60236360 T DE 60236360T DE 60236360 D1 DE60236360 D1 DE 60236360D1
Authority
DE
Germany
Prior art keywords
optical response
model
processor
incidence
wavelength
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60236360T
Other languages
English (en)
Inventor
Jon Opsal
Hanyou Chu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KLA Corp
Original Assignee
Therma Wave Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=25422205&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE60236360(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Therma Wave Inc filed Critical Therma Wave Inc
Application granted granted Critical
Publication of DE60236360D1 publication Critical patent/DE60236360D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
DE60236360T 2001-07-16 2002-06-17 Echtzeitanalyse periodischer strukturen auf halbleitern Expired - Lifetime DE60236360D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/906,290 US6704661B1 (en) 2001-07-16 2001-07-16 Real time analysis of periodic structures on semiconductors
PCT/US2002/018994 WO2003009063A2 (en) 2001-07-16 2002-06-17 Real time analysis of periodic structures on semiconductors

Publications (1)

Publication Number Publication Date
DE60236360D1 true DE60236360D1 (de) 2010-06-24

Family

ID=25422205

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60236360T Expired - Lifetime DE60236360D1 (de) 2001-07-16 2002-06-17 Echtzeitanalyse periodischer strukturen auf halbleitern

Country Status (6)

Country Link
US (5) US6704661B1 (de)
EP (1) EP1410110B1 (de)
JP (3) JP2004536314A (de)
AT (1) ATE467859T1 (de)
DE (1) DE60236360D1 (de)
WO (1) WO2003009063A2 (de)

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US20030204326A1 (en) 2003-10-30
US6778911B2 (en) 2004-08-17
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US6931361B2 (en) 2005-08-16
JP5991960B2 (ja) 2016-09-14
ATE467859T1 (de) 2010-05-15
US6704661B1 (en) 2004-03-09
EP1410110B1 (de) 2010-05-12
US7031848B2 (en) 2006-04-18
EP1410110A2 (de) 2004-04-21
WO2003009063A2 (en) 2003-01-30
US20040233462A1 (en) 2004-11-25
JP2004536314A (ja) 2004-12-02
US6947850B2 (en) 2005-09-20
JP2011123082A (ja) 2011-06-23
US20040122599A1 (en) 2004-06-24
US20050251350A1 (en) 2005-11-10

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