DE68918630D1 - Ventilation einer Vakuumbehandlungsvorrichtung. - Google Patents

Ventilation einer Vakuumbehandlungsvorrichtung.

Info

Publication number: DE68918630D1
Authority: DE; Germany
Prior art keywords: ventilation; treatment device; vacuum treatment; vacuum; treatment
Prior art date: 1988-06-06
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

DE68918630T

Other languages

English (en)

Other versions

DE68918630T2 (de

Inventor

Robert W Milgate Iii

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Varian Medical Systems Inc

Original Assignee

Varian Associates Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1988-06-06

Filing date

1989-06-02

Publication date

1994-11-10

1989-06-02 Application filed by Varian Associates Inc filed Critical Varian Associates Inc

1994-11-10 Publication of DE68918630D1 publication Critical patent/DE68918630D1/de

1995-02-09 Application granted granted Critical

1995-02-09 Publication of DE68918630T2 publication Critical patent/DE68918630T2/de

2009-06-03 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Links

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/935—Gas flow control
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/0318—Processes
- Y10T137/0396—Involving pressure control
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/7722—Line condition change responsive valves
- Y10T137/7758—Pilot or servo controlled
- Y10T137/7759—Responsive to change in rate of fluid flow

DE68918630T 1988-06-06 1989-06-02 Ventilation einer Vakuumbehandlungsvorrichtung. Expired - Fee Related DE68918630T2 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US07/203,009 US4836233A (en)	1988-06-06	1988-06-06	Method and apparatus for venting vacuum processing equipment

Publications (2)

Publication Number	Publication Date
DE68918630D1 true DE68918630D1 (de)	1994-11-10
DE68918630T2 DE68918630T2 (de)	1995-02-09

Family

ID=22752081

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE68918630T Expired - Fee Related DE68918630T2 (de)	1988-06-06	1989-06-02	Ventilation einer Vakuumbehandlungsvorrichtung.

Country Status (6)

Country	Link
US (1)	US4836233A (de)
EP (1)	EP0346018B1 (de)
JP (1)	JP2747603B2 (de)
KR (1)	KR0158874B1 (de)
CA (1)	CA1301958C (de)
DE (1)	DE68918630T2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5031674A (en) *	1989-03-03	1991-07-16	Eaton Corporation	Fluid flow control method and apparatus for minimizing particle contamination
US5240046A (en) *	1989-03-03	1993-08-31	Eaton Corporation	Fluid flow control method and apparatus for minimizing particle contamination
US4987933A (en) *	1989-03-03	1991-01-29	Eaton Corporation	Fluid flow control method and apparatus for minimizing particle contamination
JP3042127B2 (ja) *	1991-09-02	2000-05-15	富士電機株式会社	酸化シリコン膜の製造方法および製造装置
US5308989A (en) *	1992-12-22	1994-05-03	Eaton Corporation	Fluid flow control method and apparatus for an ion implanter
US5465765A (en) *	1994-04-15	1995-11-14	Martindale; Jack E.	Vacuum apparatus for developing fingerprints
JP2837112B2 (ja) *	1995-06-09	1998-12-14	株式会社平井	音速ノズルを用いた質量流量制御方法および装置
JP3291161B2 (ja) *	1995-06-12	2002-06-10	株式会社フジキン	圧力式流量制御装置
JP3580645B2 (ja) *	1996-08-12	2004-10-27	忠弘大見	圧力式流量制御装置
JPH10268942A (ja) *	1997-03-27	1998-10-09	Nippon Aera Kk	音速ノズルを用いた流量制御弁
US6074691A (en) *	1997-06-24	2000-06-13	Balzers Aktiengesellschaft	Method for monitoring the flow of a gas into a vacuum reactor
JPH11212653A (ja) *	1998-01-21	1999-08-06	Fujikin Inc	流体供給装置
US5997589A (en) *	1998-07-09	1999-12-07	Winbond Electronics Corp.	Adjustment pumping plate design for the chamber of semiconductor equipment
US20070269297A1 (en)	2003-11-10	2007-11-22	Meulen Peter V D	Semiconductor wafer handling and transport
US10086511B2 (en)	2003-11-10	2018-10-02	Brooks Automation, Inc.	Semiconductor manufacturing systems

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3665945A (en) *	1971-02-03	1972-05-30	M & J Valve Co	Valve control system and method
JPS5183473A (en) *	1975-01-20	1976-07-22	Hitachi Ltd	Fujunbutsuno doopinguhoho
DE2734323A1 (de) *	1977-07-29	1979-02-08	Agfa Gevaert Ag	Verfahren zum erzeugen bzw. ablassen von gasdruck in bzw. aus der bildkammer eines elektronenradiografischen abbildungssystems
US4739787A (en) *	1986-11-10	1988-04-26	Stoltenberg Kevin J	Method and apparatus for improving the yield of integrated circuit devices

1988
- 1988-06-06 US US07/203,009 patent/US4836233A/en not_active Expired - Lifetime
1989
- 1989-06-02 DE DE68918630T patent/DE68918630T2/de not_active Expired - Fee Related
- 1989-06-02 EP EP89305588A patent/EP0346018B1/de not_active Expired - Lifetime
- 1989-06-03 KR KR1019890007654A patent/KR0158874B1/ko not_active IP Right Cessation
- 1989-06-05 CA CA000601822A patent/CA1301958C/en not_active Expired - Fee Related
- 1989-06-06 JP JP1142309A patent/JP2747603B2/ja not_active Expired - Lifetime

Also Published As

Publication number	Publication date
EP0346018A2 (de)	1989-12-13
EP0346018A3 (de)	1991-03-13
KR0158874B1 (ko)	1999-02-01
JPH0252035A (ja)	1990-02-21
EP0346018B1 (de)	1994-10-05
DE68918630T2 (de)	1995-02-09
US4836233A (en)	1989-06-06
KR900000975A (ko)	1990-01-31
CA1301958C (en)	1992-05-26
JP2747603B2 (ja)	1998-05-06

Legal Events

Date	Code	Title	Description
1995-11-02	8364	No opposition during term of opposition
2007-04-19	8339	Ceased/non-payment of the annual fee

Publication	Publication Date	Title
DE3750007D1 (de)	1994-07-14	Vakuum-Vorrichtungen.
DE3783877T2 (de)	1993-08-12	Iontophorese-pflaster.
DE68920690T2 (de)	1995-08-24	Sauggerät.
DK156028C (da)	1989-11-06	Aspirator
DE3788160D1 (de)	1993-12-23	Plasmabehandlungsvorrichtung.
DE68918630D1 (de)	1994-11-10	Ventilation einer Vakuumbehandlungsvorrichtung.
DE58900733D1 (de)	1992-02-27	Belueftungseinrichtung.
DE3781128D1 (de)	1992-09-17	Steueranordnung einer keilkupplungsvorrichtung.
DE3678824D1 (de)	1991-05-23	Regeleinrichtung.
NO883976L (no)	1989-03-09	Medisinsk plaster.
DE58904896D1 (de)	1993-08-19	Entlueftungsschlauch.
DE3762776D1 (de)	1990-06-21	Freibrennsteuervorrichtung.
DE68905853D1 (de)	1993-05-13	Lueftungsvorrichtung.
FI895078A0 (fi)	1989-10-25	Foer plaster aegnad limkomposition.
DE3782066D1 (de)	1992-11-05	Geraetesteuereinrichtung.
DE3785188D1 (de)	1993-05-06	Lueftungsvorrichtung.
DE3776840D1 (de)	1992-04-02	Lueftungsvorrichtung.
DE3785305D1 (de)	1993-05-13	Medizinisches geraet.
NO871878D0 (no)	1987-05-06	Kontrollanordning.
DE3764066D1 (de)	1990-09-06	Kartonbehandlungsvorrichtung.
NO171474C (no)	1993-03-17	Ventilasjonsanordning
NL194200B (nl)	2001-05-01	Vacu³mvorminrichting.
KR870016949U (ko)	1987-11-30	흡출기
KR900012546U (ko)	1990-07-04	흡출기
ATE71559T1 (de)	1992-02-15	Belueftungseinrichtung.