DE69012874T2 - Gerät zur Projektion eines Maskenmusters auf ein Substrat. - Google Patents
Gerät zur Projektion eines Maskenmusters auf ein Substrat.Info
- Publication number
- DE69012874T2 DE69012874T2 DE69012874T DE69012874T DE69012874T2 DE 69012874 T2 DE69012874 T2 DE 69012874T2 DE 69012874 T DE69012874 T DE 69012874T DE 69012874 T DE69012874 T DE 69012874T DE 69012874 T2 DE69012874 T2 DE 69012874T2
- Authority
- DE
- Germany
- Prior art keywords
- projecting
- substrate
- mask pattern
- pattern onto
- onto
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL8900991A NL8900991A (nl) | 1989-04-20 | 1989-04-20 | Apparaat voor het afbeelden van een maskerpatroon op een substraat. |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69012874D1 DE69012874D1 (de) | 1994-11-03 |
DE69012874T2 true DE69012874T2 (de) | 1995-04-20 |
Family
ID=19854515
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69012874T Expired - Fee Related DE69012874T2 (de) | 1989-04-20 | 1990-04-13 | Gerät zur Projektion eines Maskenmusters auf ein Substrat. |
Country Status (6)
Country | Link |
---|---|
US (1) | US5100237A (de) |
EP (1) | EP0393775B1 (de) |
JP (1) | JP2963722B2 (de) |
KR (1) | KR0158681B1 (de) |
DE (1) | DE69012874T2 (de) |
NL (1) | NL8900991A (de) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102012208514A1 (de) * | 2012-05-22 | 2013-11-28 | Carl Zeiss Smt Gmbh | Justagevorrichtung sowie Masken-Inspektionsvorrichtung mit einer derartigen Justagevorrichtung |
DE102017105697A1 (de) * | 2017-03-16 | 2018-09-20 | Ev Group E. Thallner Gmbh | Verfahren und Vorrichtung zur Ausrichtung zweier optischer Teilsysteme |
Families Citing this family (55)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3335657A1 (de) | 1982-10-01 | 1984-04-05 | Canon K.K., Tokyo | Bildverarbeitungssystem |
NL9001611A (nl) * | 1990-07-16 | 1992-02-17 | Asm Lithography Bv | Apparaat voor het afbeelden van een maskerpatroon op een substraat. |
US5343292A (en) * | 1990-10-19 | 1994-08-30 | University Of New Mexico | Method and apparatus for alignment of submicron lithographic features |
JP3200894B2 (ja) * | 1991-03-05 | 2001-08-20 | 株式会社日立製作所 | 露光方法及びその装置 |
US5204535A (en) * | 1991-05-31 | 1993-04-20 | Nikon Corporation | Alignment device having irradiation and detection light correcting optical elements |
JP3216240B2 (ja) * | 1992-06-04 | 2001-10-09 | キヤノン株式会社 | 位置合わせ方法及びそれを用いた投影露光装置 |
US6404482B1 (en) | 1992-10-01 | 2002-06-11 | Nikon Corporation | Projection exposure method and apparatus |
US5621813A (en) * | 1993-01-14 | 1997-04-15 | Ultratech Stepper, Inc. | Pattern recognition alignment system |
US6153886A (en) * | 1993-02-19 | 2000-11-28 | Nikon Corporation | Alignment apparatus in projection exposure apparatus |
BE1007851A3 (nl) * | 1993-12-03 | 1995-11-07 | Asml Lithography B V | Belichtingseenheid met een voorziening tegen vervuiling van optische componenten en een fotolithografisch apparaat voorzien van een dergelijke belichtingseenheid. |
BE1007876A4 (nl) * | 1993-12-17 | 1995-11-07 | Philips Electronics Nv | Stralingsbron-eenheid voor het opwekken van een bundel met twee polarisatierichtingen en twee frequenties. |
BE1007907A3 (nl) * | 1993-12-24 | 1995-11-14 | Asm Lithography Bv | Lenzenstelsel met in gasgevulde houder aangebrachte lenselementen en fotolithografisch apparaat voorzien van een dergelijk stelsel. |
US5959286A (en) * | 1994-05-18 | 1999-09-28 | Symbol Technologies, Inc. | Method and apparatus for raster scanning of images |
US6005255A (en) * | 1994-05-18 | 1999-12-21 | Symbol Technologies, Inc. | Timing synchronization for image scanning |
DE69508228T2 (de) * | 1994-06-02 | 1999-09-23 | Koninkl Philips Electronics Nv | Verfahren zur wiederholten abbildung eines maskenmusters auf einem substrat und vorrichtung zur durchführung des verfahrens |
JP3824639B2 (ja) * | 1994-08-02 | 2006-09-20 | エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ | 基板上にマスクパターンを繰り返し写像する方法 |
US5483345A (en) * | 1994-09-06 | 1996-01-09 | Mrs Technology, Inc. | Alignment system for use in lithography utilizing a spherical reflector having a centered etched-on projection object |
JP3555208B2 (ja) * | 1994-12-14 | 2004-08-18 | 株式会社ニコン | 露光方法 |
US6034378A (en) | 1995-02-01 | 2000-03-07 | Nikon Corporation | Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus |
US5995198A (en) * | 1995-06-01 | 1999-11-30 | Nikon Corporation | Exposure apparatus |
DE69704998T2 (de) * | 1996-03-15 | 2001-09-27 | Asm Lithography Bv | Ausrichtungsvorrichtung und lithographischer apparat mit einer solchen vorrichtung |
KR100390818B1 (ko) * | 1996-06-28 | 2003-08-30 | 주식회사 하이닉스반도체 | 반도체균일패턴형성방법 |
US5943089A (en) * | 1996-08-23 | 1999-08-24 | Speedline Technologies, Inc. | Method and apparatus for viewing an object and for viewing a device that acts upon the object |
KR100525067B1 (ko) * | 1997-01-20 | 2005-12-21 | 가부시키가이샤 니콘 | 노광 장치의 광학 특성 측정 방법, 노광 장치의 동작 방법 및 투영 노광 장치 |
TW367407B (en) * | 1997-12-22 | 1999-08-21 | Asml Netherlands Bv | Interferometer system with two wavelengths, and lithographic apparatus provided with such a system |
US6417922B1 (en) | 1997-12-29 | 2002-07-09 | Asml Netherlands B.V. | Alignment device and lithographic apparatus comprising such a device |
US6160622A (en) * | 1997-12-29 | 2000-12-12 | Asm Lithography, B.V. | Alignment device and lithographic apparatus comprising such a device |
US6061606A (en) * | 1998-08-25 | 2000-05-09 | International Business Machines Corporation | Geometric phase analysis for mask alignment |
TW559688B (en) * | 1999-04-19 | 2003-11-01 | Asml Netherlands Bv | Lithographic projection apparatus, vacuum apparatus, low-stiffness seal for sealing between vacuum chamber wall and elongate rod, device manufacturing method and integrated circuit manufactured thereof |
TWI231405B (en) * | 1999-12-22 | 2005-04-21 | Asml Netherlands Bv | Lithographic projection apparatus, position detection device, and method of manufacturing a device using a lithographic projection apparatus |
US7541201B2 (en) | 2000-08-30 | 2009-06-02 | Kla-Tencor Technologies Corporation | Apparatus and methods for determining overlay of structures having rotational or mirror symmetry |
JP5180419B2 (ja) * | 2000-08-30 | 2013-04-10 | ケーエルエー−テンカー・コーポレーション | 重ね合わせマーク、重ね合わせマークの設計方法および重ね合わせ測定の方法 |
US7317531B2 (en) * | 2002-12-05 | 2008-01-08 | Kla-Tencor Technologies Corporation | Apparatus and methods for detecting overlay errors using scatterometry |
US7068833B1 (en) | 2000-08-30 | 2006-06-27 | Kla-Tencor Corporation | Overlay marks, methods of overlay mark design and methods of overlay measurements |
TW556296B (en) * | 2000-12-27 | 2003-10-01 | Koninkl Philips Electronics Nv | Method of measuring alignment of a substrate with respect to a reference alignment mark |
US6819426B2 (en) * | 2001-02-12 | 2004-11-16 | Therma-Wave, Inc. | Overlay alignment metrology using diffraction gratings |
JP3970106B2 (ja) | 2001-05-23 | 2007-09-05 | エーエスエムエル ネザーランズ ビー.ブイ. | 実質的に透過性のプロセス層に整列マークを備える基板、上記マークを露出するためのマスク、およびデバイス製造方法 |
JP3639807B2 (ja) * | 2001-06-27 | 2005-04-20 | キヤノン株式会社 | 光学素子及び製造方法 |
US7804994B2 (en) * | 2002-02-15 | 2010-09-28 | Kla-Tencor Technologies Corporation | Overlay metrology and control method |
TWI229243B (en) * | 2002-09-20 | 2005-03-11 | Asml Netherlands Bv | Lithographic marker structure, lithographic projection apparatus comprising such a lithographic marker structure and method for substrate alignment using such a lithographic marker structure |
DE10258715B4 (de) | 2002-12-10 | 2006-12-21 | Carl Zeiss Smt Ag | Verfahren zur Herstellung eines optischen Abbildungssystems |
US7075639B2 (en) | 2003-04-25 | 2006-07-11 | Kla-Tencor Technologies Corporation | Method and mark for metrology of phase errors on phase shift masks |
US7608468B1 (en) * | 2003-07-02 | 2009-10-27 | Kla-Tencor Technologies, Corp. | Apparatus and methods for determining overlay and uses of same |
US7346878B1 (en) | 2003-07-02 | 2008-03-18 | Kla-Tencor Technologies Corporation | Apparatus and methods for providing in-chip microtargets for metrology or inspection |
US7629697B2 (en) * | 2004-11-12 | 2009-12-08 | Asml Netherlands B.V. | Marker structure and method for controlling alignment of layers of a multi-layered substrate |
US7557921B1 (en) | 2005-01-14 | 2009-07-07 | Kla-Tencor Technologies Corporation | Apparatus and methods for optically monitoring the fidelity of patterns produced by photolitographic tools |
US7433018B2 (en) * | 2005-12-27 | 2008-10-07 | Asml Netherlands B.V. | Pattern alignment method and lithographic apparatus |
KR100807119B1 (ko) * | 2006-08-11 | 2008-02-28 | 세크론 주식회사 | 프로빙 검사장치용 광학 시스템 및 이를 이용하는 프로빙검사 방법 |
DE102008017645A1 (de) * | 2008-04-04 | 2009-10-08 | Carl Zeiss Smt Ag | Vorrichtung zur mikrolithographischen Projektionsbelichtung sowie Vorrichtung zur Inspektion einer Oberfläche eines Substrats |
KR101573463B1 (ko) | 2009-02-26 | 2015-12-01 | 삼성전자주식회사 | 정렬부를 포함하는 반도체 장비 |
US8033666B2 (en) * | 2009-05-28 | 2011-10-11 | Eastman Kodak Company | Beam alignment system using arrayed light sources |
CN101930904B (zh) * | 2009-06-22 | 2012-11-21 | 由田新技股份有限公司 | 晶片顶出装置与取像装置的组合 |
US9927718B2 (en) | 2010-08-03 | 2018-03-27 | Kla-Tencor Corporation | Multi-layer overlay metrology target and complimentary overlay metrology measurement systems |
US10890436B2 (en) | 2011-07-19 | 2021-01-12 | Kla Corporation | Overlay targets with orthogonal underlayer dummyfill |
US10451412B2 (en) | 2016-04-22 | 2019-10-22 | Kla-Tencor Corporation | Apparatus and methods for detecting overlay errors using scatterometry |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3558222A (en) * | 1968-02-06 | 1971-01-26 | Bell Telephone Labor Inc | Photolithography apparatus and method |
DE2608176A1 (de) * | 1976-02-27 | 1977-09-01 | Inst Zemnogo Magnetizma Ionosf | Einrichtung zur kohaerenten beleuchtung von objekten |
US4795244A (en) * | 1985-09-20 | 1989-01-03 | Nikon Corporation | Projection type exposure apparatus |
NL8600639A (nl) * | 1986-03-12 | 1987-10-01 | Asm Lithography Bv | Werkwijze voor het ten opzichte van elkaar uitrichten van een masker en een substraat en inrichting voor het uitvoeren van de werkwijze. |
-
1989
- 1989-04-20 NL NL8900991A patent/NL8900991A/nl not_active Application Discontinuation
-
1990
- 1990-04-13 EP EP90200925A patent/EP0393775B1/de not_active Expired - Lifetime
- 1990-04-13 DE DE69012874T patent/DE69012874T2/de not_active Expired - Fee Related
- 1990-04-19 KR KR1019900005457A patent/KR0158681B1/ko not_active IP Right Cessation
- 1990-04-20 JP JP2103272A patent/JP2963722B2/ja not_active Expired - Fee Related
- 1990-05-25 US US07/529,046 patent/US5100237A/en not_active Expired - Lifetime
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102012208514A1 (de) * | 2012-05-22 | 2013-11-28 | Carl Zeiss Smt Gmbh | Justagevorrichtung sowie Masken-Inspektionsvorrichtung mit einer derartigen Justagevorrichtung |
WO2013174680A2 (en) | 2012-05-22 | 2013-11-28 | Carl Zeiss Smt Gmbh | Adjustment device and mask inspection device with such an adjustment device |
DE102017105697A1 (de) * | 2017-03-16 | 2018-09-20 | Ev Group E. Thallner Gmbh | Verfahren und Vorrichtung zur Ausrichtung zweier optischer Teilsysteme |
US11209739B2 (en) | 2017-03-16 | 2021-12-28 | Ev Group E. Thallner Gmbh | Method and apparatus for aligning two optical subsystems |
Also Published As
Publication number | Publication date |
---|---|
EP0393775A1 (de) | 1990-10-24 |
JPH033224A (ja) | 1991-01-09 |
KR900016813A (ko) | 1990-11-14 |
JP2963722B2 (ja) | 1999-10-18 |
EP0393775B1 (de) | 1994-09-28 |
US5100237A (en) | 1992-03-31 |
DE69012874D1 (de) | 1994-11-03 |
KR0158681B1 (ko) | 1998-12-15 |
NL8900991A (nl) | 1990-11-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |