DE69014593T2 - Gastrennung mit semipermeablen membranen. - Google Patents

Gastrennung mit semipermeablen membranen.

Info

Publication number
DE69014593T2
DE69014593T2 DE69014593T DE69014593T DE69014593T2 DE 69014593 T2 DE69014593 T2 DE 69014593T2 DE 69014593 T DE69014593 T DE 69014593T DE 69014593 T DE69014593 T DE 69014593T DE 69014593 T2 DE69014593 T2 DE 69014593T2
Authority
DE
Germany
Prior art keywords
semipermeabled
membranes
gas separation
separation
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69014593T
Other languages
English (en)
Other versions
DE69014593D1 (de
Inventor
Shan-Tao Hsieh
George Keller
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Silicon Materials LLC
Original Assignee
Advanced Silicon Materials LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Silicon Materials LLC filed Critical Advanced Silicon Materials LLC
Publication of DE69014593D1 publication Critical patent/DE69014593D1/de
Application granted granted Critical
Publication of DE69014593T2 publication Critical patent/DE69014593T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
    • C01B3/50—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/06—Silicon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/22—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/22—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion
    • B01D53/228—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion characterised by specific membranes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
    • B01D69/12—Composite membranes; Ultra-thin membranes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
    • B01D69/12—Composite membranes; Ultra-thin membranes
    • B01D69/1213—Laminated layers
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
    • C01B3/50—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
    • C01B3/501—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by diffusion
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
    • C01B3/50—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
    • C01B3/501—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by diffusion
    • C01B3/503—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by diffusion characterised by the membrane
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/029—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of monosilane
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/03—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of silicon halides or halosilanes or reduction thereof with hydrogen as the only reducing agent
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/04—Hydrides of silicon
    • C01B33/043—Monosilane
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
    • C01B33/10757—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane
    • C01B33/10763—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane from silicon
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2203/00—Integrated processes for the production of hydrogen or synthesis gas
    • C01B2203/04—Integrated processes for the production of hydrogen or synthesis gas containing a purification step for the hydrogen or the synthesis gas
    • C01B2203/0405—Purification by membrane separation
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2203/00—Integrated processes for the production of hydrogen or synthesis gas
    • C01B2203/04—Integrated processes for the production of hydrogen or synthesis gas containing a purification step for the hydrogen or the synthesis gas
    • C01B2203/0465—Composition of the impurity
DE69014593T 1989-09-19 1990-09-19 Gastrennung mit semipermeablen membranen. Expired - Fee Related DE69014593T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07409059 US4941893B1 (en) 1989-09-19 1989-09-19 Gas separation by semi-permeable membranes
PCT/US1990/005221 WO1991004223A1 (en) 1989-09-19 1990-09-19 Gas separation by semi-permeable membranes

Publications (2)

Publication Number Publication Date
DE69014593D1 DE69014593D1 (de) 1995-01-12
DE69014593T2 true DE69014593T2 (de) 1995-04-13

Family

ID=23618886

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69014593T Expired - Fee Related DE69014593T2 (de) 1989-09-19 1990-09-19 Gastrennung mit semipermeablen membranen.

Country Status (7)

Country Link
US (1) US4941893B1 (de)
EP (1) EP0444190B1 (de)
JP (1) JP2615265B2 (de)
KR (1) KR0148232B1 (de)
CA (1) CA2025612C (de)
DE (1) DE69014593T2 (de)
WO (1) WO1991004223A1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008043422B3 (de) * 2008-11-03 2010-01-07 Evonik Degussa Gmbh Verfahren zur Aufreinigung niedermolekularer Hydridosilane

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5069686A (en) * 1990-08-07 1991-12-03 Membrane Technology & Research, Inc. Process for reducing emissions from industrial sterilizers
US5131927A (en) * 1991-04-22 1992-07-21 Union Carbide Industrial Gases Technology Corporation Reactive treatment of composite gas separation membranes
FR2695568B1 (fr) * 1992-09-14 1994-10-21 Air Liquide Procédé et installation de séparation de gaz par perméation.
FR2710044B1 (fr) * 1993-09-17 1995-10-13 Air Liquide Procédé de séparation d'un hydrure gazeux ou d'un mélange d'hydrures gazeux à l'aide d'une membrane.
US5858065A (en) * 1995-07-17 1999-01-12 American Air Liquide Process and system for separation and recovery of perfluorocompound gases
US5785741A (en) 1995-07-17 1998-07-28 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges, Claude Process and system for separation and recovery of perfluorocompound gases
US5858066A (en) * 1995-09-22 1999-01-12 E. I. Du Pont De Nemours And Company Process for separating and recovering fluorocarbons and HCI from gaseous mixtures thereof
JPH09122463A (ja) * 1995-10-31 1997-05-13 Nitto Denko Corp ポリスルホン系半透膜及びその製造方法
IE80909B1 (en) * 1996-06-14 1999-06-16 Air Liquide An improved process and system for separation and recovery of perfluorocompound gases
US5919364A (en) * 1996-06-24 1999-07-06 Regents Of The University Of California Microfabricated filter and shell constructed with a permeable membrane
US6174349B1 (en) 1999-04-06 2001-01-16 Seh America, Inc. Continuous effluent gas scrubber system and method
WO2001027552A1 (en) * 1999-10-08 2001-04-19 Carrier Corporation A plate-type heat exchanger
US6365108B1 (en) * 1999-10-12 2002-04-02 Caterpillar Inc. Siloxane filter for O2 sensor for bio-gas engine
WO2001083091A2 (en) * 2000-05-02 2001-11-08 Bernd Schindler Sulfonated aryl sulfonate matrices and method of production
US6605140B2 (en) * 2000-08-09 2003-08-12 National Research Council Of Canada Composite gas separation membranes
US6596112B1 (en) * 2000-10-20 2003-07-22 Pall Corporation Laminates of asymmetric membranes
US7282148B2 (en) * 2003-10-30 2007-10-16 International Business Machines Corporation Porous silicon composite structure as large filtration array
US7815864B2 (en) * 2003-11-20 2010-10-19 Sigma-Aldrich Co. Polysilazane thermosetting polymers for use in chromatographic systems and applications
SI1694599T1 (sl) * 2003-11-21 2009-02-28 Statoilhydro Asa Postopek za pretvorbo ogljikovodikov
US7790129B2 (en) * 2005-07-29 2010-09-07 Lord Ltd., Lp Set of processes for removing impurities from a silcon production facility
US7365220B2 (en) * 2005-09-29 2008-04-29 Momentive Performance Materials Inc. Process for the recovery of alkoxysilanes obtained from the direct reaction of silicon with alkanols
US7641055B2 (en) * 2005-11-10 2010-01-05 Donaldson Company, Inc. Polysulfone and poly(N-vinyl lactam) polymer alloy and fiber and filter materials made of the alloy
GB0618016D0 (en) * 2006-09-13 2006-10-18 Boc Group Plc Method of recycling hydrogen
DE102007043156A1 (de) * 2007-09-11 2009-03-12 Näbauer, Anton, Dr. Verringerung des Verbrauchs von Prozessgasen bei der chemischen Gasphasenabscheidung von siliziumhaltigen Schichten bei der als Reaktionsprodukt neben der abzuscheidenden Schicht Wasserstoff entsteht
JP5516951B2 (ja) 2007-10-12 2014-06-11 大陽日酸株式会社 ガス精製方法
US20090166173A1 (en) * 2007-12-31 2009-07-02 Sarang Gadre Effluent gas recovery process for silicon production
US20090165647A1 (en) * 2007-12-31 2009-07-02 Sarang Gadre Effluent gas recovery process for silicon production
US20090165646A1 (en) * 2007-12-31 2009-07-02 Sarang Gadre Effluent gas recovery process for silicon production
US20100237013A1 (en) * 2009-02-13 2010-09-23 Millipore Corporation Autonomous filter element
EP2233195A1 (de) * 2009-03-27 2010-09-29 Meridionale Impianti S.p.A. System und Verfahren zur Rückgewinnung von Wasserstoff aus Abgas von Epitaxieverfahren und anderen industriellen Verfahren
US8187361B2 (en) 2009-07-02 2012-05-29 America Air Liquide, Inc. Effluent gas recovery system in polysilicon and silane plants
US8298490B2 (en) * 2009-11-06 2012-10-30 Gtat Corporation Systems and methods of producing trichlorosilane
JP2011189230A (ja) * 2010-03-12 2011-09-29 Jx Nippon Oil & Energy Corp 排ガス処理システム
JP2011189229A (ja) * 2010-03-12 2011-09-29 Jx Nippon Oil & Energy Corp 排ガス処理システム
WO2011111403A1 (ja) * 2010-03-12 2011-09-15 Ｊｘ日鉱日石エネルギー株式会社 排ガス処理システム
JP2011189228A (ja) * 2010-03-12 2011-09-29 Jx Nippon Oil & Energy Corp 排ガス処理システム
NO334627B1 (no) * 2010-03-30 2014-04-28 Polysilane As Prosess for produksjon av disilan
EP2599537A4 (de) * 2010-07-30 2014-09-17 Jx Nippon Oil & Energy Corp Abgasverarbeitungssystem
DE102013207443A1 (de) * 2013-04-24 2014-10-30 Evonik Degussa Gmbh Verfahren und Vorrichtung zur Herstellung von Polysilanen
DE102015213252A1 (de) 2015-07-15 2017-01-19 Wacker Chemie Ag Kontinuierliches Verfahren zur Reinigung von bei der Produktion von Siliconen anfallender Prozessabluft
JP2021159784A (ja) * 2020-03-30 2021-10-11 東洋紡株式会社 ポリフェニレン系半透膜およびその製造方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1667444C2 (de) * 1967-01-18 1975-03-13 Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler, 6000 Frankfurt Verfahren zur Abtrennung von SiCI tief 4 und SiHCI tief 3 aus einem Gasgemisch dieser Halogensilane mit Wasserstoff
US4230463A (en) * 1977-09-13 1980-10-28 Monsanto Company Multicomponent membranes for gas separations
US4214020A (en) * 1977-11-17 1980-07-22 Monsanto Company Processes for coating bundles of hollow fiber membranes
US4676967A (en) * 1978-08-23 1987-06-30 Union Carbide Corporation High purity silane and silicon production
DE2918066A1 (de) * 1979-05-04 1980-11-13 Siemens Ag Verfahren zur siliciumherstellung durch gasphasenabscheidung unter wiederverwendung der restgase
US4243701A (en) * 1979-11-08 1981-01-06 Uop Inc. Preparation of gas separation membranes
US4519999A (en) * 1980-03-31 1985-05-28 Union Carbide Corporation Waste treatment in silicon production operations
US4313013A (en) * 1980-08-01 1982-01-26 Phillips Petroleum Company Palladium or a palladium alloy hydrogen diffusion membrane treated with a volatile compound of silicon is used to separate hydrogen from a mixture of it with a hydrocarbon
JPS57175719A (en) * 1981-04-21 1982-10-28 Fuji Electric Corp Res & Dev Ltd Apparatus for forming silicon film
JPS57200216A (en) * 1981-06-03 1982-12-08 Fuji Electric Corp Res & Dev Ltd Method for depositing amorphous silicon layer
EP0075431A1 (de) * 1981-09-17 1983-03-30 Monsanto Company Verfahren zum Abtrennen eines Gases aus einer Mischung von Gasen
DE3203743A1 (de) * 1982-02-04 1983-08-04 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Verfahren zur aufbereitung von bei der siliciumherstellung anfallenden abgasen
US4398926A (en) * 1982-04-23 1983-08-16 Union Carbide Corporation Enhanced hydrogen recovery from low purity gas streams
US4484935A (en) * 1983-06-30 1984-11-27 Monsanto Company Permeation modified membrane
US4654047A (en) * 1985-08-23 1987-03-31 Air Products And Chemicals, Inc. Hybrid membrane/cryogenic process for hydrogen purification
US4772296A (en) * 1987-05-12 1988-09-20 Eagle-Picher Industries, Inc. Method of purifying and depositing group IIIa and group Va compounds to produce epitaxial films
US4826599A (en) * 1987-07-10 1989-05-02 Union Carbide Corporation Composite membranes and their manufacture and use
US4881954A (en) * 1987-07-31 1989-11-21 Union Carbide Corporation Permeable membranes for enhanced gas separation
DE3731385A1 (de) * 1987-09-18 1989-04-06 Kernforschungsz Karlsruhe Verfahren zur dekontamination des abgases eines fusionsreaktors

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008043422B3 (de) * 2008-11-03 2010-01-07 Evonik Degussa Gmbh Verfahren zur Aufreinigung niedermolekularer Hydridosilane

Also Published As

Publication number Publication date
EP0444190B1 (de) 1994-11-30
CA2025612A1 (en) 1991-03-20
CA2025612C (en) 1995-12-19
WO1991004223A1 (en) 1991-04-04
EP0444190A1 (de) 1991-09-04
JP2615265B2 (ja) 1997-05-28
DE69014593D1 (de) 1995-01-12
JPH04505280A (ja) 1992-09-17
KR0148232B1 (ko) 1998-08-17
KR920701040A (ko) 1992-08-11
US4941893A (en) 1990-07-17
US4941893B1 (en) 1996-07-30

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: ADVANCED SILICON MATERIALS LLC,(N.D.GES.D.STAATES

8339 Ceased/non-payment of the annual fee