DE69026353T2 - Feldemissionsvorrichtung und Verfahren zur Herstellung derselben - Google Patents

Feldemissionsvorrichtung und Verfahren zur Herstellung derselben

Info

Publication number
DE69026353T2
DE69026353T2 DE69026353T DE69026353T DE69026353T2 DE 69026353 T2 DE69026353 T2 DE 69026353T2 DE 69026353 T DE69026353 T DE 69026353T DE 69026353 T DE69026353 T DE 69026353T DE 69026353 T2 DE69026353 T2 DE 69026353T2
Authority
DE
Germany
Prior art keywords
manufacturing
same
field emission
emission device
field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69026353T
Other languages
English (en)
Other versions
DE69026353D1 (de
Inventor
Akira Kaneko
Toru Kanno
Kaoru Tomii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP33074089A external-priority patent/JPH0793097B2/ja
Priority claimed from JP2095803A external-priority patent/JPH03295130A/ja
Priority claimed from JP13339790A external-priority patent/JPH0787074B2/ja
Priority claimed from JP2177727A external-priority patent/JPH0467526A/ja
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Application granted granted Critical
Publication of DE69026353D1 publication Critical patent/DE69026353D1/de
Publication of DE69026353T2 publication Critical patent/DE69026353T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/02Electron guns
    • H01J3/021Electron guns using a field emission, photo emission, or secondary emission electron source
    • H01J3/022Electron guns using a field emission, photo emission, or secondary emission electron source with microengineered cathode, e.g. Spindt-type
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02Manufacture of electrodes or electrode systems
    • H01J9/022Manufacture of electrodes or electrode systems of cold cathodes
    • H01J9/025Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes
DE69026353T 1989-12-19 1990-12-18 Feldemissionsvorrichtung und Verfahren zur Herstellung derselben Expired - Fee Related DE69026353T2 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP33074089A JPH0793097B2 (ja) 1989-12-19 1989-12-19 電子放出素子とその製造方法
JP2095803A JPH03295130A (ja) 1990-04-11 1990-04-11 電子放出素子
JP12724290 1990-05-16
JP13339790A JPH0787074B2 (ja) 1990-05-23 1990-05-23 電子放出素子およびその製造方法
JP2177727A JPH0467526A (ja) 1990-07-05 1990-07-05 電子放出素子の製造方法

Publications (2)

Publication Number Publication Date
DE69026353D1 DE69026353D1 (de) 1996-05-09
DE69026353T2 true DE69026353T2 (de) 1996-11-14

Family

ID=27525759

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69026353T Expired - Fee Related DE69026353T2 (de) 1989-12-19 1990-12-18 Feldemissionsvorrichtung und Verfahren zur Herstellung derselben

Country Status (3)

Country Link
US (1) US5243252A (de)
EP (1) EP0434001B1 (de)
DE (1) DE69026353T2 (de)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2656851B2 (ja) * 1990-09-27 1997-09-24 工業技術院長 画像表示装置
US5469015A (en) * 1990-11-28 1995-11-21 Matsushita Electric Industrial Co., Ltd. Functional vacuum microelectronic field-emission device
US5281891A (en) * 1991-02-22 1994-01-25 Matsushita Electric Industrial Co., Ltd. Electron emission element
US5536193A (en) 1991-11-07 1996-07-16 Microelectronics And Computer Technology Corporation Method of making wide band gap field emitter
US5548185A (en) * 1992-03-16 1996-08-20 Microelectronics And Computer Technology Corporation Triode structure flat panel display employing flat field emission cathode
US5763997A (en) 1992-03-16 1998-06-09 Si Diamond Technology, Inc. Field emission display device
US5679043A (en) 1992-03-16 1997-10-21 Microelectronics And Computer Technology Corporation Method of making a field emitter
US5449970A (en) * 1992-03-16 1995-09-12 Microelectronics And Computer Technology Corporation Diode structure flat panel display
US5600200A (en) 1992-03-16 1997-02-04 Microelectronics And Computer Technology Corporation Wire-mesh cathode
US6127773A (en) 1992-03-16 2000-10-03 Si Diamond Technology, Inc. Amorphic diamond film flat field emission cathode
US5543684A (en) 1992-03-16 1996-08-06 Microelectronics And Computer Technology Corporation Flat panel display based on diamond thin films
US5675216A (en) 1992-03-16 1997-10-07 Microelectronics And Computer Technololgy Corp. Amorphic diamond film flat field emission cathode
JP2669749B2 (ja) * 1992-03-27 1997-10-29 工業技術院長 電界放出素子
JP2897520B2 (ja) * 1992-04-02 1999-05-31 日本電気株式会社 冷陰極
JPH08510588A (ja) * 1993-01-19 1996-11-05 ダニロビッチ カルポフ,レオニド 電界放出素子
AU1043895A (en) 1993-11-04 1995-05-23 Microelectronics And Computer Technology Corporation Methods for fabricating flat panel display systems and components
US6204834B1 (en) 1994-08-17 2001-03-20 Si Diamond Technology, Inc. System and method for achieving uniform screen brightness within a matrix display
US5531880A (en) * 1994-09-13 1996-07-02 Microelectronics And Computer Technology Corporation Method for producing thin, uniform powder phosphor for display screens
US5628659A (en) * 1995-04-24 1997-05-13 Microelectronics And Computer Corporation Method of making a field emission electron source with random micro-tip structures
US6296740B1 (en) 1995-04-24 2001-10-02 Si Diamond Technology, Inc. Pretreatment process for a surface texturing process
FR2748348B1 (fr) * 1996-05-06 1998-07-24 Pixtech Sa Ecran couleur a micropointes a double grille
US5801486A (en) * 1996-10-31 1998-09-01 Motorola, Inc. High frequency field emission device
US6149792A (en) * 1997-09-30 2000-11-21 Candescent Technologies Corporation Row electrode anodization
US6124670A (en) * 1998-05-29 2000-09-26 The Regents Of The University Of California Gate-and emitter array on fiber electron field emission structure
KR100300407B1 (ko) * 1998-10-14 2001-09-06 김순택 플라즈마표시장치
US6433473B1 (en) * 1998-10-29 2002-08-13 Candescent Intellectual Property Services, Inc. Row electrode anodization
US6384520B1 (en) * 1999-11-24 2002-05-07 Sony Corporation Cathode structure for planar emitter field emission displays
US6590320B1 (en) * 2000-02-23 2003-07-08 Copytale, Inc. Thin-film planar edge-emitter field emission flat panel display
BR0001211C1 (pt) * 2000-04-13 2002-03-05 Inst Nac De Tecnologia Da Info Estrutura de placa emissora para fed
US6406926B1 (en) * 2001-08-15 2002-06-18 Motorola, Inc. Method of forming a vacuum micro-electronic device
US20070278948A1 (en) * 2006-06-02 2007-12-06 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method of light-emitting material, light-emitting element, and light-emitting device and electronic device
US7966862B2 (en) * 2008-01-28 2011-06-28 Honeywell International Inc. Electrode structure for particulate matter sensor
US8163185B1 (en) * 2008-03-31 2012-04-24 Western Digital (Fremont), Llc Method and apparatus for lifting off photoresist beneath an overlayer
US10545258B2 (en) * 2016-03-24 2020-01-28 Schlumberger Technology Corporation Charged particle emitter assembly for radiation generator
EP3933881A1 (de) 2020-06-30 2022-01-05 VEC Imaging GmbH & Co. KG Röntgenquelle mit mehreren gittern

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3755704A (en) * 1970-02-06 1973-08-28 Stanford Research Inst Field emission cathode structures and devices utilizing such structures
US3665241A (en) * 1970-07-13 1972-05-23 Stanford Research Inst Field ionizer and field emission cathode structures and methods of production
JPS5154358A (de) * 1974-11-08 1976-05-13 Hitachi Ltd
US4168213A (en) * 1976-04-29 1979-09-18 U.S. Philips Corporation Field emission device and method of forming same
JPS53121454A (en) * 1977-03-31 1978-10-23 Toshiba Corp Electron source of thin film electric field emission type and its manufacture
NO145589C (no) * 1977-06-30 1982-04-21 Rosenblad Corp Fremgangsmaate for kondensasjon av damp i en varmeveksler samt en varmeveksler til bruk ved fremgangsmaaten
US4728851A (en) * 1982-01-08 1988-03-01 Ford Motor Company Field emitter device with gated memory
US4578614A (en) * 1982-07-23 1986-03-25 The United States Of America As Represented By The Secretary Of The Navy Ultra-fast field emitter array vacuum integrated circuit switching device
GB8621600D0 (en) * 1986-09-08 1987-03-18 Gen Electric Co Plc Vacuum devices
JP2609602B2 (ja) * 1987-02-23 1997-05-14 キヤノン株式会社 電子放出素子及びその製造方法
US4904895A (en) * 1987-05-06 1990-02-27 Canon Kabushiki Kaisha Electron emission device
US4828177A (en) * 1987-12-18 1989-05-09 Frans Schuitemaker Adjustable sprayer assembly
JPH02503728A (ja) * 1988-03-25 1990-11-01 トムソン‐セーエスエフ 電界放出形ソースの製造方法及びエミッタアレイの製造へのその応用
US5170092A (en) * 1989-05-19 1992-12-08 Matsushita Electric Industrial Co., Ltd. Electron-emitting device and process for making the same

Also Published As

Publication number Publication date
US5243252A (en) 1993-09-07
EP0434001A3 (en) 1991-10-23
EP0434001B1 (de) 1996-04-03
DE69026353D1 (de) 1996-05-09
EP0434001A2 (de) 1991-06-26

Similar Documents

Publication Publication Date Title
DE69026353D1 (de) Feldemissionsvorrichtung und Verfahren zur Herstellung derselben
DE69316810T2 (de) SiGe-SOI-MOSFET und Verfahren zur Herstellung
DE68926986T2 (de) Halbleiterlaser und Verfahren zur Herstellung desselben
DE69032451D1 (de) Halbleiterlaser und Verfahren zur Herstellung desselben
DE69327483D1 (de) Diode und Verfahren zur Herstellung
ATE111701T1 (de) Verfahren und vorrichtung zur herstellung von borstenwaren.
DE69120864T2 (de) Eingekapselter elektrolumineszenter Phosphor und Verfahren zur Herstellung desselben
DE68916875D1 (de) Bildanzeigegerät und Verfahren zur Herstellung desselben.
DE69027368T2 (de) Halbleiterlaser und Verfahren zur Herstellung desselben
DE69027960T2 (de) Elektronen emittierendes Element und Verfahren zur Herstellung desselben
DE69202634D1 (de) Feldemissionsvorrichtung und Verfahren zur Herstellung.
DE69014454T2 (de) Hochspannungs-Halbleiteranordnung und Verfahren zur Herstellung.
DE69229314D1 (de) Halbleiteranordnung und Verfahren zur Herstellung
DE69404348T2 (de) Kathodenvorrichtung und Verfahren zur Herstellung derselben
DE69128406D1 (de) Lateraler MOSFET und Verfahren zur Herstellung
DE69227290T2 (de) Halbleiteranordnung und Verfahren zur Herstellung
DE69528683T2 (de) Halbleiterbauteil und Verfahren zur Herstellung desselben
DE69125650T2 (de) Flache Anzeigevorrichtung und Verfahren zur Herstellung derselben
DE69016230T2 (de) Halbleiterlaser und Verfahren zur Herstellung desselben.
DE69314394D1 (de) Anzeigegerät und Verfahren zur Herstellung
DE69011989T2 (de) Magnet und Verfahren zur Herstellung.
DE69029779T2 (de) Halbleiteranordnung und verfahren zur herstellung derselben
DE69310031T2 (de) Quartzgerät und Verfahren zur Herstellung
DE69219688D1 (de) Halbleitervorrichtung und Verfahren zur Herstellung derselben
DE69123282T2 (de) Halbleiteranordnung und Verfahren zur Herstellung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee