DE69032682T2 - Photopolymerisierbare Zusammensetzungen und Grundstoffe für die holographische Aufzeichnung von Beugungsbildern - Google Patents
Photopolymerisierbare Zusammensetzungen und Grundstoffe für die holographische Aufzeichnung von BeugungsbildernInfo
- Publication number
- DE69032682T2 DE69032682T2 DE69032682T DE69032682T DE69032682T2 DE 69032682 T2 DE69032682 T2 DE 69032682T2 DE 69032682 T DE69032682 T DE 69032682T DE 69032682 T DE69032682 T DE 69032682T DE 69032682 T2 DE69032682 T2 DE 69032682T2
- Authority
- DE
- Germany
- Prior art keywords
- bases
- holographic recording
- photopolymerizable compositions
- diffraction images
- diffraction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000203 mixture Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H2001/026—Recording materials or recording processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/0402—Recording geometries or arrangements
- G03H2001/0415—Recording geometries or arrangements for recording reflection holograms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2260/00—Recording materials or recording processes
- G03H2260/12—Photopolymer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/108—Polyolefin or halogen containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/116—Redox or dye sensitizer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/117—Free radical
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Holo Graphy (AREA)
- Paints Or Removers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polymerisation Methods In General (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/380,840 US4963471A (en) | 1989-07-14 | 1989-07-14 | Holographic photopolymer compositions and elements for refractive index imaging |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69032682D1 DE69032682D1 (de) | 1998-11-05 |
DE69032682T2 true DE69032682T2 (de) | 1999-03-25 |
Family
ID=23502647
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69032682T Expired - Lifetime DE69032682T2 (de) | 1989-07-14 | 1990-06-20 | Photopolymerisierbare Zusammensetzungen und Grundstoffe für die holographische Aufzeichnung von Beugungsbildern |
Country Status (8)
Country | Link |
---|---|
US (1) | US4963471A (de) |
EP (1) | EP0407771B1 (de) |
JP (1) | JP2625028B2 (de) |
KR (1) | KR940007966B1 (de) |
CN (1) | CN1048755A (de) |
AU (1) | AU613559B2 (de) |
CA (1) | CA2020943A1 (de) |
DE (1) | DE69032682T2 (de) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102018116661A1 (de) * | 2018-07-10 | 2020-01-16 | Carl Zeiss Jena Gmbh | Lichtquelle für holographisches Anzeigesystem |
DE102022103301A1 (de) | 2021-02-11 | 2022-08-11 | Xetos Ag | 2k-system |
EP4043963A1 (de) | 2021-02-11 | 2022-08-17 | Xetos AG | Verbessertes ausbleichen |
EP4043502A1 (de) | 2021-02-11 | 2022-08-17 | Xetos AG | Photopolymerisierbare hoe-zusammensetzung |
EP4043962A1 (de) | 2021-02-11 | 2022-08-17 | Xetos AG | Photopolymerisierbare zusammensetzung |
Families Citing this family (71)
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US4942112A (en) * | 1988-01-15 | 1990-07-17 | E. I. Du Pont De Nemours And Company | Photopolymerizable compositions and elements for refractive index imaging |
US5096790A (en) * | 1988-07-28 | 1992-03-17 | E. I. Du Pont De Nemours And Company | Process of forming hologram and polymeric holographic recording medium with sensitizer |
US5135837A (en) * | 1990-09-05 | 1992-08-04 | E. I. Du Pont De Nemours And Company | Photosensitive elastomeric element having improved solvent resistance |
US5360501A (en) * | 1990-12-13 | 1994-11-01 | Hughes Aircraft Company | Holographic transfer lamination materials and process |
CA2067297C (en) * | 1991-05-31 | 1998-07-21 | Kevin Yu | Protected photosensitive recording films |
US5282066A (en) * | 1991-05-31 | 1994-01-25 | Hughes Aircraft Company | Multiple layer holograms |
US6479193B1 (en) * | 1992-06-30 | 2002-11-12 | Nippon Sheet Glass Co., Ltd. | Optical recording film and process for production thereof |
KR0126247B1 (en) * | 1992-11-09 | 1997-12-26 | Fujitsu Ltd | Method of coupling optical parts and refractive index imaging material |
US6017681A (en) * | 1992-11-09 | 2000-01-25 | Fujitsu Limited | Method of coupling optical parts and method of forming a mirror |
US5481385A (en) * | 1993-07-01 | 1996-01-02 | Alliedsignal Inc. | Direct view display device with array of tapered waveguide on viewer side |
US5413863A (en) * | 1993-11-04 | 1995-05-09 | E. I. Du Pont De Nemours And Company | Recording medium with inproved adhesion to glass |
JP3370762B2 (ja) * | 1993-11-04 | 2003-01-27 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | フィルム組成物およびその組成物を含む積層構造 |
US5415950A (en) * | 1993-11-08 | 1995-05-16 | E. I. Du Pont De Nemours And Company | Holographic flake pigment |
US5725970A (en) * | 1994-11-07 | 1998-03-10 | E. I. Du Pont De Nemours And Company | Broad band reflection holograms and a dry process for making same |
US5874187A (en) * | 1996-08-15 | 1999-02-23 | Lucent Technologies Incorporated | Photo recording medium |
JP3650985B2 (ja) * | 1997-05-22 | 2005-05-25 | Jsr株式会社 | ネガ型感放射線性樹脂組成物およびパターン製造法 |
DE19824546A1 (de) * | 1998-06-03 | 1999-12-09 | Basf Drucksysteme Gmbh | Herstellung vernetzbarer wasserlöslicher oder wasserdispergierbarer Zusammensetzungen und daraus erhältlicher strahlungsempfindlicher Gemische |
US6849377B2 (en) | 1998-09-23 | 2005-02-01 | E. I. Du Pont De Nemours And Company | Photoresists, polymers and processes for microlithography |
US6790587B1 (en) * | 1999-05-04 | 2004-09-14 | E. I. Du Pont De Nemours And Company | Fluorinated polymers, photoresists and processes for microlithography |
US7005229B2 (en) * | 2002-10-02 | 2006-02-28 | 3M Innovative Properties Company | Multiphoton photosensitization method |
US7381516B2 (en) * | 2002-10-02 | 2008-06-03 | 3M Innovative Properties Company | Multiphoton photosensitization system |
JP4786858B2 (ja) * | 2000-06-15 | 2011-10-05 | スリーエム イノベイティブ プロパティズ カンパニー | 封入光学素子を提供するための多光子硬化 |
US7118845B2 (en) * | 2000-06-15 | 2006-10-10 | 3M Innovative Properties Company | Multiphoton photochemical process and articles preparable thereby |
DE60139620D1 (de) * | 2000-06-15 | 2009-10-01 | 3M Innovative Properties Co | Methode und gerät zur erzielung wiederholter multiphotonabsorption |
EP1292852B1 (de) * | 2000-06-15 | 2005-11-09 | 3M Innovative Properties Company | Mikroherstellungsverfahren für organische optische bauteile |
US7265161B2 (en) * | 2002-10-02 | 2007-09-04 | 3M Innovative Properties Company | Multi-photon reactive compositions with inorganic particles and method for fabricating structures |
WO2001096952A2 (en) * | 2000-06-15 | 2001-12-20 | 3M Innovative Properties Company | Multicolor imaging using multiphoton photochemical processes |
US6852766B1 (en) * | 2000-06-15 | 2005-02-08 | 3M Innovative Properties Company | Multiphoton photosensitization system |
KR100811017B1 (ko) | 2000-06-15 | 2008-03-11 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | 다중방향성 광반응성 흡수 방법 |
AU2001269837A1 (en) * | 2000-06-15 | 2001-12-24 | 3M Innovative Properties Company | Process for producing microfluidic articles |
US6849383B2 (en) * | 2000-07-26 | 2005-02-01 | Toyo Boseki Kabushiki Kaisha | Photosensitive resin laminate, and signboard plate and signboard made of the laminate |
US6974657B2 (en) * | 2000-10-18 | 2005-12-13 | E. I. Du Pont De Nemours And Company | Compositions for microlithography |
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US20040012872A1 (en) * | 2001-06-14 | 2004-01-22 | Fleming Patrick R | Multiphoton absorption method using patterned light |
US20040013971A1 (en) * | 2001-11-21 | 2004-01-22 | Berger Larry L | Antireflective layer for use in microlithography |
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US7232650B2 (en) * | 2002-10-02 | 2007-06-19 | 3M Innovative Properties Company | Planar inorganic device |
GB0305590D0 (en) * | 2003-03-11 | 2003-04-16 | Smart Holograms Ltd | Sensors and their production |
JP2004287138A (ja) * | 2003-03-24 | 2004-10-14 | Konica Minolta Holdings Inc | ホログラフィック記録用組成物、ホログラフィック記録メディア及びその記録方法 |
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JP2005309359A (ja) | 2004-03-25 | 2005-11-04 | Fuji Photo Film Co Ltd | ホログラム記録材料、ホログラム記録方法、光記録媒体、3次元ディスプレイホログラムおよびホログラフィック光学素子。 |
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-
1989
- 1989-07-14 US US07/380,840 patent/US4963471A/en not_active Expired - Lifetime
-
1990
- 1990-05-31 AU AU56130/90A patent/AU613559B2/en not_active Ceased
- 1990-06-20 DE DE69032682T patent/DE69032682T2/de not_active Expired - Lifetime
- 1990-06-20 EP EP90111628A patent/EP0407771B1/de not_active Expired - Lifetime
- 1990-06-21 JP JP2161498A patent/JP2625028B2/ja not_active Expired - Lifetime
- 1990-06-21 KR KR1019900009205A patent/KR940007966B1/ko not_active IP Right Cessation
- 1990-07-11 CA CA002020943A patent/CA2020943A1/en not_active Abandoned
- 1990-07-14 CN CN90104622A patent/CN1048755A/zh active Pending
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102018116661A1 (de) * | 2018-07-10 | 2020-01-16 | Carl Zeiss Jena Gmbh | Lichtquelle für holographisches Anzeigesystem |
DE102022103301A1 (de) | 2021-02-11 | 2022-08-11 | Xetos Ag | 2k-system |
EP4043963A1 (de) | 2021-02-11 | 2022-08-17 | Xetos AG | Verbessertes ausbleichen |
EP4043502A1 (de) | 2021-02-11 | 2022-08-17 | Xetos AG | Photopolymerisierbare hoe-zusammensetzung |
EP4043961A1 (de) | 2021-02-11 | 2022-08-17 | Xetos AG | 2k-system |
EP4043962A1 (de) | 2021-02-11 | 2022-08-17 | Xetos AG | Photopolymerisierbare zusammensetzung |
WO2022171814A1 (de) | 2021-02-11 | 2022-08-18 | Xetos Ag | 2k-system |
WO2022171821A1 (de) | 2021-02-11 | 2022-08-18 | Xetos Ag | Photopolymerisierbare hoe-zusammensetzung |
WO2022171820A1 (de) | 2021-02-11 | 2022-08-18 | Xetos Ag | Verbessertes ausbleichen |
WO2022171823A1 (de) | 2021-02-11 | 2022-08-18 | Xetos Ag | Photopolymerisierbare zusammensetzung |
Also Published As
Publication number | Publication date |
---|---|
DE69032682D1 (de) | 1998-11-05 |
AU613559B2 (en) | 1991-08-01 |
AU5613090A (en) | 1991-04-18 |
EP0407771A3 (en) | 1992-04-08 |
KR910003464A (ko) | 1991-02-27 |
JP2625028B2 (ja) | 1997-06-25 |
CA2020943A1 (en) | 1991-01-15 |
EP0407771B1 (de) | 1998-09-30 |
EP0407771A2 (de) | 1991-01-16 |
KR940007966B1 (ko) | 1994-08-31 |
CN1048755A (zh) | 1991-01-23 |
JPH0350588A (ja) | 1991-03-05 |
US4963471A (en) | 1990-10-16 |
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