DE69108079D1 - Sputteranlage. - Google Patents

Sputteranlage.

Info

Publication number
DE69108079D1
DE69108079D1 DE69108079T DE69108079T DE69108079D1 DE 69108079 D1 DE69108079 D1 DE 69108079D1 DE 69108079 T DE69108079 T DE 69108079T DE 69108079 T DE69108079 T DE 69108079T DE 69108079 D1 DE69108079 D1 DE 69108079D1
Authority
DE
Germany
Prior art keywords
vacuum chamber
disc
opening
tray
exit opening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69108079T
Other languages
English (en)
Other versions
DE69108079T2 (de
Inventor
Jiro Ikeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2083795A external-priority patent/JP3044735B2/ja
Application filed by Sony Corp filed Critical Sony Corp
Application granted granted Critical
Publication of DE69108079D1 publication Critical patent/DE69108079D1/de
Publication of DE69108079T2 publication Critical patent/DE69108079T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
DE69108079T 1990-03-30 1991-03-26 Sputteranlage. Expired - Fee Related DE69108079T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2083795A JP3044735B2 (ja) 1990-03-30 1990-03-30 スパッタリング装置
JP8379390 1990-03-30

Publications (2)

Publication Number Publication Date
DE69108079D1 true DE69108079D1 (de) 1995-04-20
DE69108079T2 DE69108079T2 (de) 1995-11-02

Family

ID=26424832

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69108079T Expired - Fee Related DE69108079T2 (de) 1990-03-30 1991-03-26 Sputteranlage.

Country Status (5)

Country Link
US (1) US5135635A (de)
EP (1) EP0449227B1 (de)
KR (1) KR100192985B1 (de)
AT (1) ATE119948T1 (de)
DE (1) DE69108079T2 (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0639697B2 (ja) * 1990-11-30 1994-05-25 株式会社芝浦製作所 基板のローディング装置
DE4232959C2 (de) * 1992-10-01 2001-05-10 Leybold Ag Vorrichtung zum Ein- und Ausschleusen scheibenförmiger Substrate
GB2272225B (en) * 1992-10-06 1996-07-17 Balzers Hochvakuum A method for masking a workpiece and a vacuum treatment facility
US5421893A (en) * 1993-02-26 1995-06-06 Applied Materials, Inc. Susceptor drive and wafer displacement mechanism
US5730847A (en) * 1993-03-15 1998-03-24 Kabushiki Kaisha Kobeseikosho Arc ion plating device and arc ion plating system
JPH08273207A (ja) * 1995-01-31 1996-10-18 Canon Inc 光情報記録媒体搬送用キヤリア、該キヤリアを用いた光情報記録媒体の製造方法及び製造装置
NL1002878C2 (nl) * 1996-04-16 1997-10-17 Robi Omp Mastering Dev Gmbh Sputterinrichting.
US5772773A (en) * 1996-05-20 1998-06-30 Applied Materials, Inc. Co-axial motorized wafer lift
DE59805566D1 (de) * 1997-04-11 2002-10-24 Leybold Systems Gmbh Verfahren und Vorrichtung zum Be- und Entladen einer evakuierbaren Behandlungskammer
DE19742923A1 (de) * 1997-09-29 1999-04-01 Leybold Systems Gmbh Vorrichtung zum Beschichten eines im wesentlichen flachen, scheibenförmigen Substrats
US6105435A (en) 1997-10-24 2000-08-22 Cypress Semiconductor Corp. Circuit and apparatus for verifying a chamber seal, and method of depositing a material onto a substrate using the same
US6293749B1 (en) 1997-11-21 2001-09-25 Asm America, Inc. Substrate transfer system for semiconductor processing equipment
DE19806282C1 (de) * 1998-02-16 1999-03-25 Singulus Technologies Ag Vorrichtung und Verfahren von zum Belüften einer Vakuum-Bearbeitungskammer mit einer Transportkammer
DE19812670A1 (de) * 1998-03-23 1999-10-07 Singulus Technologies Ag Vorrichtung zum Transport von Substraten
EP1250471A1 (de) * 2000-01-18 2002-10-23 Unaxis Balzers Aktiengesellschaft Sputterkammer sowie vakuumtransportkammer und vakuumbehandlungsanlagen mit solchen kammern
US6899795B1 (en) 2000-01-18 2005-05-31 Unaxis Balzers Aktiengesellschaft Sputter chamber as well as vacuum transport chamber and vacuum handling apparatus with such chambers
DE10100427A1 (de) * 2001-01-08 2002-07-18 Steag Hamatech Ag Verfahren und Vorrichtung zum Zusammenfügen von Substraten
DE10146838A1 (de) 2001-09-24 2003-04-10 Ptr Praez Stechnik Gmbh Werkstückzufuhrvorrichtung für eine Elektronenstrahlbearbeitungsvorrichtung
DE10247002B3 (de) * 2002-10-09 2004-02-26 Applied Films Gmbh & Co. Kg Durchlauf-Beschichtungsanlage
DE10355682B4 (de) * 2003-11-28 2008-10-30 Singulus Technologies Ag Trägeranordnung
DE10355678B4 (de) * 2003-11-28 2009-03-26 Singulus Technologies Ag Vakuumsystem, Verfahren zum Transport eines Objekts im Vakuum mittels des Vakuumsystems und Verwendung des Vakuumsystems
TWI274978B (en) * 2004-02-25 2007-03-01 Advanced Display Proc Eng Co Apparatus for manufacturing flat-panel display
CN100334634C (zh) * 2004-08-13 2007-08-29 精碟科技股份有限公司 盘片溅镀遮罩
TW200641880A (en) * 2005-04-26 2006-12-01 Steag Hamatech Ag Process and device for coating disk-shaped substrates for optical data carriers
EP1905063A1 (de) * 2005-07-21 2008-04-02 Lpe Spa System zum unterstützen und drehen eines suszeptors in einer behandlungskammer einer wasserbehandlungsvorrichtung
US7581916B2 (en) * 2006-07-14 2009-09-01 Ulvac-Phi, Inc. Sample introduction and transfer system and method
DE102011114593B4 (de) * 2011-09-30 2016-11-03 Manz Ag Transporteinrichtung zum Transportieren mehrerer Substrate in den Bereich einer Substrat-Behandlungseinrichtung sowie eine derart ausgestaltete Vakuumbehandlungseinrichtung

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH573985A5 (de) * 1973-11-22 1976-03-31 Balzers Patent Beteilig Ag
DE3716498C2 (de) * 1987-05-16 1994-08-04 Leybold Ag Vorrichtung zum Ein- und Ausschleusen von Werkstücken in eine Beschichtungskammer
DE3827343A1 (de) * 1988-08-12 1990-02-15 Leybold Ag Vorrichtung nach dem karussel-prinzip zum beschichten von substraten
DE3735284A1 (de) * 1987-10-17 1989-04-27 Leybold Ag Vorrichtung nach dem karussell-prinzip zum beschichten von substraten
JPH01237493A (ja) * 1988-03-17 1989-09-21 Ishikawajima Harima Heavy Ind Co Ltd コンクリート製原子炉格納容器とその構築方法
JPH0280569A (ja) * 1988-09-16 1990-03-20 Hitachi Ltd ロードロック機構を備えたミリング装置
JP3466607B2 (ja) * 1989-09-13 2003-11-17 ソニー株式会社 スパッタリング装置

Also Published As

Publication number Publication date
KR100192985B1 (ko) 1999-06-15
EP0449227A3 (en) 1991-12-11
US5135635A (en) 1992-08-04
EP0449227A2 (de) 1991-10-02
EP0449227B1 (de) 1995-03-15
ATE119948T1 (de) 1995-04-15
DE69108079T2 (de) 1995-11-02
KR910017381A (ko) 1991-11-05

Similar Documents

Publication Publication Date Title
DE69108079T2 (de) Sputteranlage.
GB2294267B (en) Anti-TNFalpha Fab fragments derived from polyclonal IgG antibodies
EP0174877A3 (en) X-ray application system
GB2249145A (en) Clean transfer method and system therefor
ES2090250T3 (es) Cartucho de disco con obturador.
US6136168A (en) Clean transfer method and apparatus therefor
ES8102394A1 (es) Un dispositivo de enfoque optico
WO2001079580A3 (en) Apparatus and method for handling and masking a substrate
WO1991013695A3 (fr) Recepteur-enregistreur d'emissions de television
ATE151256T1 (de) Verpacken von polymerisierbaren materialien
CA2106281A1 (en) Apparatus for Curing Coatings on Drawn Optical Fiber
JP2007141925A (ja) マスク収容容器、露光装置
JPS53123905A (en) Original disc of video disc by optical recording system
JPS5778647A (en) Optical recording and reproducing device
JPS56151912A (en) Optical microscope
JPS62252128A (ja) 半導体製造装置の基板導入装置
US5858456A (en) Method for metal coating discrete objects by vapor deposition
JPH04302454A (ja) 半導体製造装置
JPS6482626A (en) Photo electron transfer system
JPS53129603A (en) Intermusic detector for players
EP0604424B1 (de) Dampfbeschichtung
JPS56118252A (en) Photographing device for electron microscope
JPS6193542A (ja) 真空装置
ATE102265T1 (de) Kathodenzerstaeubungsanlage.
JPH051038Y2 (de)

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Free format text: PATENTANWAELTE MUELLER & HOFFMANN, 81667 MUENCHEN

8339 Ceased/non-payment of the annual fee