DE69126719D1 - Belichtungsvorrichtung - Google Patents

Belichtungsvorrichtung

Info

Publication number
DE69126719D1
DE69126719D1 DE69126719T DE69126719T DE69126719D1 DE 69126719 D1 DE69126719 D1 DE 69126719D1 DE 69126719 T DE69126719 T DE 69126719T DE 69126719 T DE69126719 T DE 69126719T DE 69126719 D1 DE69126719 D1 DE 69126719D1
Authority
DE
Germany
Prior art keywords
exposure device
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69126719T
Other languages
English (en)
Other versions
DE69126719T2 (de
Inventor
Nobutoshi Mizusawa
Ryuichi C O Canon Kabu Ebinuma
Hiroshi Kurosawa
Koji Uda
Takao Kariya
Shunichi Uzawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2056674A external-priority patent/JP2843890B2/ja
Priority claimed from JP2059904A external-priority patent/JP2805238B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE69126719D1 publication Critical patent/DE69126719D1/de
Publication of DE69126719T2 publication Critical patent/DE69126719T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008Production of exposure light, i.e. light sources
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • G03F7/702Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
DE69126719T 1990-03-09 1991-03-08 Belichtungsvorrichtung Expired - Fee Related DE69126719T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2056674A JP2843890B2 (ja) 1990-03-09 1990-03-09 露光装置
JP2059904A JP2805238B2 (ja) 1990-03-13 1990-03-13 露光装置

Publications (2)

Publication Number Publication Date
DE69126719D1 true DE69126719D1 (de) 1997-08-14
DE69126719T2 DE69126719T2 (de) 1997-11-06

Family

ID=26397634

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69126719T Expired - Fee Related DE69126719T2 (de) 1990-03-09 1991-03-08 Belichtungsvorrichtung

Country Status (3)

Country Link
US (2) US5172402A (de)
EP (1) EP0446076B1 (de)
DE (1) DE69126719T2 (de)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3168018B2 (ja) * 1991-03-22 2001-05-21 キヤノン株式会社 基板吸着保持方法
JP3184582B2 (ja) * 1991-11-01 2001-07-09 キヤノン株式会社 X線露光装置およびx線露光方法
JP3187581B2 (ja) * 1992-02-10 2001-07-11 キヤノン株式会社 X線装置、x線露光装置及び半導体デバイス製造方法
JP2840801B2 (ja) * 1992-12-01 1998-12-24 セイコーインスツルメンツ株式会社 座標変換係数の自動設定方法
JPH0772318A (ja) * 1993-04-28 1995-03-17 Canon Inc 反射装置とこれを用いた照明装置や露光装置、並びにデバイス製造方法
JP3167074B2 (ja) * 1993-06-30 2001-05-14 キヤノン株式会社 Sor露光システム及びこれを用いて製造されたマスク
JP3091821B2 (ja) * 1993-09-06 2000-09-25 キヤノン株式会社 露光装置およびデバイス製造方法
JP3101473B2 (ja) * 1993-11-05 2000-10-23 キヤノン株式会社 露光方法及び該露光方法を用いるデバイス製造方法
US5593800A (en) * 1994-01-06 1997-01-14 Canon Kabushiki Kaisha Mask manufacturing method and apparatus and device manufacturing method using a mask manufactured by the method or apparatus
JPH07321024A (ja) * 1994-05-25 1995-12-08 Canon Inc 位置決め方法およびその装置ならびにこれらを用いた露光装置
JP3287725B2 (ja) * 1994-06-07 2002-06-04 キヤノン株式会社 露光方法とこれを用いたデバイス製造方法
DE69521107T2 (de) * 1994-11-29 2001-10-31 Canon Kk Ausrichtverfahren und Halbleiterbelichtungsverfahren
JP3391940B2 (ja) * 1995-06-26 2003-03-31 キヤノン株式会社 照明装置及び露光装置
JP3894509B2 (ja) * 1995-08-07 2007-03-22 キヤノン株式会社 光学装置、露光装置およびデバイス製造方法
US5740864A (en) * 1996-01-29 1998-04-21 Baker Hughes Incorporated One-trip packer setting and whipstock-orienting method and apparatus
JP3634487B2 (ja) * 1996-02-09 2005-03-30 キヤノン株式会社 位置合せ方法、位置合せ装置、および露光装置
US5920398A (en) * 1996-03-01 1999-07-06 Canon Kabushiki Kaisha Surface position detecting method and scanning exposure method using the same
US5930324A (en) * 1996-04-03 1999-07-27 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method using the same
US5739913A (en) * 1996-08-02 1998-04-14 Mrs Technology, Inc. Non-contact edge detector
US6559465B1 (en) * 1996-08-02 2003-05-06 Canon Kabushiki Kaisha Surface position detecting method having a detection timing determination
JP3337921B2 (ja) 1996-08-23 2002-10-28 キヤノン株式会社 投影露光装置および位置合せ方法
US5917580A (en) * 1996-08-29 1999-06-29 Canon Kabushiki Kaisha Scan exposure method and apparatus
JP3286184B2 (ja) * 1996-09-25 2002-05-27 キヤノン株式会社 走査露光装置および方法
JP3377165B2 (ja) * 1997-05-19 2003-02-17 キヤノン株式会社 半導体露光装置
JP3977920B2 (ja) * 1998-05-13 2007-09-19 富士通株式会社 半導体装置の製造方法
DE19853588B4 (de) * 1998-11-20 2005-04-21 Leica Microsystems Lithography Gmbh Halteeinrichtung für ein Substrat
JP2000357643A (ja) * 1999-06-14 2000-12-26 Canon Inc 露光方法及びそれを用いた露光装置
FR2818428A1 (fr) * 2000-12-19 2002-06-21 Ge Med Sys Global Tech Co Llc Collimateur ajustable
JP3559766B2 (ja) * 2001-02-21 2004-09-02 キヤノン株式会社 走査露光装置及び走査露光方法並びにデバイスの製造方法
KR100531416B1 (ko) * 2003-09-17 2005-11-29 엘지.필립스 엘시디 주식회사 Sls 장비 및 이를 이용한 실리콘 결정화 방법
US7046768B1 (en) * 2003-11-10 2006-05-16 Inspx Llc Shutter-shield for x-ray protection
CN106725587A (zh) * 2017-01-25 2017-05-31 深圳市通用激光科技有限公司 射线间隔装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6037616B2 (ja) * 1980-01-24 1985-08-27 理学電機株式会社 X線リゾグラフイ装置
DE3270459D1 (en) * 1981-12-31 1986-05-15 Ibm A method and apparatus for providing a uniform illumination of an area
JPS60198726A (ja) * 1984-03-23 1985-10-08 Hitachi Ltd X線露光装置の露光量調整方法と装置
JP2744245B2 (ja) * 1988-03-25 1998-04-28 キヤノン株式会社 露光装置と露光方法
DE68927430T2 (de) * 1988-09-02 1997-03-13 Canon Kk Belichtungseinrichtung
EP0359370B1 (de) * 1988-09-14 1996-01-03 Canon Kabushiki Kaisha Belichtungssteuerung in einem Röntgenbelichtungsapparat
EP0421746B1 (de) * 1989-10-03 1997-04-02 Canon Kabushiki Kaisha Belichtungsvorrichtung

Also Published As

Publication number Publication date
EP0446076B1 (de) 1997-07-09
EP0446076A3 (en) 1992-05-13
EP0446076A2 (de) 1991-09-11
US5377251A (en) 1994-12-27
US5172402A (en) 1992-12-15
DE69126719T2 (de) 1997-11-06

Similar Documents

Publication Publication Date Title
DE69126719D1 (de) Belichtungsvorrichtung
DE69120295T2 (de) Elektrodeionisierungsvorrichtung
DE69033499T2 (de) Belichtungsvorrichtung
DE69124438T2 (de) Positioniervorrichtung
DE69117682D1 (de) Abbildungsvorrichtung
DE69033002T2 (de) Belichtungsvorrichtung
DE69120897T2 (de) Röntgeneinrichtung
DE69128655D1 (de) Belichtungsgerät
DE69132022D1 (de) Fotografiervorrichtung
DE69115784D1 (de) Bilderzeugungsgerät
DE69126456T2 (de) Belichtungsgerät
DE69115586T2 (de) Bilderzeugungsgerät
DE69030493T2 (de) Belichtungsgerät
DE69126938T2 (de) Positionierungsvorrichtung
DE69028404T2 (de) Rückentragbares Gerät
DE69129355D1 (de) Projektionsbelichtungsvorrichtung
DE69030348T2 (de) Belichtungsvorrichtung
NO930607D0 (no) Forskalingsanordning
DE69130009D1 (de) Röntgenbelichtungsvorrichtung
DE69122125T2 (de) Photographisches entwicklungsgerät
DE69029481D1 (de) Belichtungsvorrichtung
DE69208044T2 (de) Belichtungsgerät
ES1018160Y (es) Dispositivo moja-sellos
IT222336Z2 (it) Dispositivo serra-cavo
BR9003506A (pt) Dispositivo detalonador

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee