DE69131063D1 - Filmstruktur aus superharten Werkstoffen, ihr Herstellungsverfahren und ihre Verwendung - Google Patents

Filmstruktur aus superharten Werkstoffen, ihr Herstellungsverfahren und ihre Verwendung

Info

Publication number
DE69131063D1
DE69131063D1 DE69131063T DE69131063T DE69131063D1 DE 69131063 D1 DE69131063 D1 DE 69131063D1 DE 69131063 T DE69131063 T DE 69131063T DE 69131063 T DE69131063 T DE 69131063T DE 69131063 D1 DE69131063 D1 DE 69131063D1
Authority
DE
Germany
Prior art keywords
manufacturing process
hard material
material film
film structure
super hard
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69131063T
Other languages
English (en)
Other versions
DE69131063T2 (de
Inventor
Louis K Bigelow
Robert M Frey
Gordon L Cann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saint Gobain Abrasives Inc
Original Assignee
Norton Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Norton Co filed Critical Norton Co
Publication of DE69131063D1 publication Critical patent/DE69131063D1/de
Application granted granted Critical
Publication of DE69131063T2 publication Critical patent/DE69131063T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/272—Diamond only using DC, AC or RF discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/279—Diamond only control of diamond crystallography
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer
DE69131063T 1990-08-10 1991-08-09 Filmstruktur aus superharten Werkstoffen, ihr Herstellungsverfahren und ihre Verwendung Expired - Fee Related DE69131063T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US56530490A 1990-08-10 1990-08-10

Publications (2)

Publication Number Publication Date
DE69131063D1 true DE69131063D1 (de) 1999-05-06
DE69131063T2 DE69131063T2 (de) 1999-11-18

Family

ID=24258022

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69131063T Expired - Fee Related DE69131063T2 (de) 1990-08-10 1991-08-09 Filmstruktur aus superharten Werkstoffen, ihr Herstellungsverfahren und ihre Verwendung

Country Status (5)

Country Link
US (2) US5310596A (de)
EP (2) EP0909835A1 (de)
JP (1) JPH04232273A (de)
CA (1) CA2044543C (de)
DE (1) DE69131063T2 (de)

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EP0596619A1 (de) * 1992-11-03 1994-05-11 Crystallume Diamantbeschichteter Gegenstand mit integriertem Verschleissanzeiger
US5635254A (en) * 1993-01-12 1997-06-03 Martin Marietta Energy Systems, Inc. Plasma spraying method for forming diamond and diamond-like coatings
CA2112308C (en) * 1993-01-22 2000-08-15 Louis K. Bigelow Method of making white diamond film
US6835523B1 (en) * 1993-05-09 2004-12-28 Semiconductor Energy Laboratory Co., Ltd. Apparatus for fabricating coating and method of fabricating the coating
US5932302A (en) * 1993-07-20 1999-08-03 Semiconductor Energy Laboratory Co., Ltd. Method for fabricating with ultrasonic vibration a carbon coating
JP3774904B2 (ja) * 1994-01-27 2006-05-17 住友電気工業株式会社 平坦なダイヤモンド膜の合成法とダイヤモンド自立膜及びダイヤモンド膜の研磨方法
US5453303A (en) * 1994-07-22 1995-09-26 The United States Of America As Represented By The United States Department Of Energy Low substrate temperature deposition of diamond coatings derived from glassy carbon
US5551959A (en) * 1994-08-24 1996-09-03 Minnesota Mining And Manufacturing Company Abrasive article having a diamond-like coating layer and method for making same
US5525815A (en) * 1994-10-03 1996-06-11 General Electric Company Diamond film structure with high thermal conductivity
US5445106A (en) * 1994-10-03 1995-08-29 General Electric Company Method for making high thermal conducting diamond
JP3675577B2 (ja) * 1995-07-05 2005-07-27 日本特殊陶業株式会社 ダイヤモンド被覆物品の製造方法
US5672054A (en) * 1995-12-07 1997-09-30 Carrier Corporation Rotary compressor with reduced lubrication sensitivity
US5952102A (en) * 1996-05-13 1999-09-14 Ceramatec, Inc. Diamond coated WC and WC-based composites with high apparent toughness
US6080470A (en) * 1996-06-17 2000-06-27 Dorfman; Benjamin F. Hard graphite-like material bonded by diamond-like framework
BR9711680A (pt) 1996-09-03 1999-08-24 Balzers Hochvakuum Pe-a revestida para antidesgaste
US5804259A (en) * 1996-11-07 1998-09-08 Applied Materials, Inc. Method and apparatus for depositing a multilayered low dielectric constant film
US6344149B1 (en) 1998-11-10 2002-02-05 Kennametal Pc Inc. Polycrystalline diamond member and method of making the same
FR2812665B1 (fr) * 2000-08-01 2003-08-08 Sidel Sa Procede de depot de revetement par plasma, dispositif de mise en oeuvre du procede et revetement obtenu par un tel procede
EP1182274A1 (de) * 2000-08-26 2002-02-27 PlasmOTec GmbH & Co. KG Diamantbeschichtetes Hartmetall-Schneidwerkzeug und Verfahren zu seiner Herstellung
DE10056242A1 (de) 2000-11-14 2002-05-23 Alstom Switzerland Ltd Kondensationswärmeübertrager
DE10342397B4 (de) 2003-09-13 2008-04-03 Schott Ag Transparente Schutzschicht für einen Körper und deren Verwendung
JP4813040B2 (ja) * 2004-10-13 2011-11-09 独立行政法人科学技術振興機構 ダイヤモンド層の形成方法と、それを利用する多層硬質炭素膜の形成方法
DE102004061464B4 (de) * 2004-12-17 2008-12-11 Schott Ag Substrat mit feinlaminarer Barriereschutzschicht und Verfahren zu dessen Herstellung
US7373997B2 (en) * 2005-02-18 2008-05-20 Smith International, Inc. Layered hardfacing, durable hardfacing for drill bits
US8946674B2 (en) * 2005-08-31 2015-02-03 University Of Florida Research Foundation, Inc. Group III-nitrides on Si substrates using a nanostructured interlayer
JP5161450B2 (ja) * 2005-09-30 2013-03-13 財団法人高知県産業振興センター プラズマｃｖｄ装置及びプラズマ表面処理方法
US8222057B2 (en) * 2006-08-29 2012-07-17 University Of Florida Research Foundation, Inc. Crack free multilayered devices, methods of manufacture thereof and articles comprising the same
US20080226838A1 (en) * 2007-03-12 2008-09-18 Kochi Industrial Promotion Center Plasma CVD apparatus and film deposition method
JP4533926B2 (ja) * 2007-12-26 2010-09-01 財団法人高知県産業振興センター 成膜装置及び成膜方法
CN102549266B (zh) * 2009-09-18 2015-05-13 东芝开利株式会社 制冷剂压缩机及制冷循环装置
JP2011080130A (ja) * 2009-10-09 2011-04-21 Osg Corp ダイヤモンド被覆電極、およびダイヤモンド被覆電極の製造方法
US9382625B2 (en) * 2014-05-01 2016-07-05 Applied Materials, Inc. Remote plasma source based cyclic CVD process for nanocrystalline diamond deposition
CN107250481A (zh) * 2015-03-10 2017-10-13 哈利伯顿能源服务公司 聚晶金刚石复合片及制造方法
JP6036948B2 (ja) * 2015-09-14 2016-11-30 住友電気工業株式会社 導電層付き単結晶ダイヤモンドおよびそれを用いた工具、ならびに導電層付き単結晶ダイヤモンドの製造方法
US10612132B2 (en) 2015-11-27 2020-04-07 Cemecon Ag Coating a body with a diamond layer and a hard material layer

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Also Published As

Publication number Publication date
CA2044543A1 (en) 1992-02-11
CA2044543C (en) 1999-12-14
EP0470644A3 (de) 1992-02-26
EP0909835A1 (de) 1999-04-21
EP0470644A2 (de) 1992-02-12
JPH04232273A (ja) 1992-08-20
US5518766A (en) 1996-05-21
US5310596A (en) 1994-05-10
DE69131063T2 (de) 1999-11-18
EP0470644B1 (de) 1999-03-31

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: SAINT-GOBAIN ABRASIVES, INC., WORCESTER, MASS., US

8339 Ceased/non-payment of the annual fee