DE69201695D1 - Verfahren und Effusionszelle zur Erzeugung von Molekularstrahlen. - Google Patents

Verfahren und Effusionszelle zur Erzeugung von Molekularstrahlen.

Info

Publication number
DE69201695D1
DE69201695D1 DE69201695T DE69201695T DE69201695D1 DE 69201695 D1 DE69201695 D1 DE 69201695D1 DE 69201695 T DE69201695 T DE 69201695T DE 69201695 T DE69201695 T DE 69201695T DE 69201695 D1 DE69201695 D1 DE 69201695D1
Authority
DE
Germany
Prior art keywords
flow rate
sublimation
effusion cell
molecular beams
generating molecular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69201695T
Other languages
English (en)
Other versions
DE69201695T2 (de
Inventor
Leon Goldstein
Rene Vergnaud
Jean-Pierre Chardon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alcatel Lucent SAS
Original Assignee
Alcatel Alsthom Compagnie Generale dElectricite
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alcatel Alsthom Compagnie Generale dElectricite filed Critical Alcatel Alsthom Compagnie Generale dElectricite
Application granted granted Critical
Publication of DE69201695D1 publication Critical patent/DE69201695D1/de
Publication of DE69201695T2 publication Critical patent/DE69201695T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02—Epitaxial-layer growth
    • C30B23/06—Heating of the deposition chamber, the substrate or the materials to be evaporated
    • C30B23/066—Heating of the material to be evaporated
DE69201695T 1991-08-01 1992-07-23 Verfahren und Effusionszelle zur Erzeugung von Molekularstrahlen. Expired - Fee Related DE69201695T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9109812A FR2679929B1 (fr) 1991-08-01 1991-08-01 Procede et cellule d'effusion pour la formation de jets moleculaires.

Publications (2)

Publication Number Publication Date
DE69201695D1 true DE69201695D1 (de) 1995-04-20
DE69201695T2 DE69201695T2 (de) 1995-08-17

Family

ID=9415830

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69201695T Expired - Fee Related DE69201695T2 (de) 1991-08-01 1992-07-23 Verfahren und Effusionszelle zur Erzeugung von Molekularstrahlen.

Country Status (8)

Country Link
US (1) US5321260A (de)
EP (1) EP0526312B1 (de)
JP (1) JP3124775B2 (de)
AT (1) ATE119953T1 (de)
DE (1) DE69201695T2 (de)
ES (1) ES2070607T3 (de)
FR (1) FR2679929B1 (de)
WO (1) WO1993003209A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08167575A (ja) * 1994-10-14 1996-06-25 Mitsubishi Electric Corp Ｍｂｅ結晶成長装置，及びｍｂｅ結晶成長方法
US6030458A (en) * 1997-02-14 2000-02-29 Chorus Corporation Phosphorus effusion source
US6447734B1 (en) 1999-02-02 2002-09-10 The University Of Utah Research Foundation Vaporization and cracker cell apparatus
FR2823228B1 (fr) * 2001-04-04 2003-06-13 Addon Reservoir pour installation d'epitaxie et installation comprenant un tel reservoir
US6915592B2 (en) * 2002-07-29 2005-07-12 Applied Materials, Inc. Method and apparatus for generating gas to a processing chamber
DE10256038A1 (de) * 2002-11-30 2004-06-17 Applied Films Gmbh & Co. Kg Bedampfungsvorrichtung
US7502229B2 (en) * 2004-10-15 2009-03-10 Alcatel Lucent Heat dissipation system for multiple integrated circuits mounted on a printed circuit board

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE55678C (de) * 1973-01-11 W. LeFELDT & LENTSCH in Schöningen Neuerung an Dampfmaschinen
US4330360A (en) * 1980-07-21 1982-05-18 Bell Telephone Laboratories, Incorporated Molecular beam deposition technique using gaseous sources of group V elements
FR2572099B1 (fr) * 1984-10-24 1987-03-20 Comp Generale Electricite Generateur de jets moleculaires par craquage thermique pour la fabrication de semi-conducteurs par depot epitaxial
JPS61280610A (ja) * 1985-06-06 1986-12-11 Toshiba Corp 分子線エピタキシヤル成長装置
FR2598721B1 (fr) * 1986-05-15 1988-09-30 Commissariat Energie Atomique Cellule pour epitaxie par jets moleculaires et procede associe
US5025751A (en) * 1988-02-08 1991-06-25 Hitachi, Ltd. Solid film growth apparatus
US5034604A (en) * 1989-08-29 1991-07-23 Board Of Regents, The University Of Texas System Refractory effusion cell to generate a reproducible, uniform and ultra-pure molecular beam of elemental molecules, utilizing reduced thermal gradient filament construction
JPH0633231B2 (ja) * 1990-01-12 1994-05-02 松下電器産業株式会社 分子線エピタキシャル成長方法
IT1240199B (it) * 1990-04-19 1993-11-27 Cselt Centro Studi Lab Telecom Effusore di vapori per impianti di deposizione epitassiale.

Also Published As

Publication number Publication date
ES2070607T3 (es) 1995-06-01
US5321260A (en) 1994-06-14
ATE119953T1 (de) 1995-04-15
WO1993003209A1 (fr) 1993-02-18
DE69201695T2 (de) 1995-08-17
JPH06502745A (ja) 1994-03-24
EP0526312A1 (de) 1993-02-03
FR2679929B1 (fr) 1993-10-22
FR2679929A1 (fr) 1993-02-05
EP0526312B1 (de) 1995-03-15
JP3124775B2 (ja) 2001-01-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: ALCATEL, PARIS, FR

8339 Ceased/non-payment of the annual fee