DE69208675T2 - Kupferaluminat enthalterde paste auf kupferbasis für mikrostrukturelle und schrumpfungs-beherrschung von kupfergefüllten kontaktlöchern - Google Patents

Kupferaluminat enthalterde paste auf kupferbasis für mikrostrukturelle und schrumpfungs-beherrschung von kupfergefüllten kontaktlöchern

Info

Publication number
DE69208675T2
DE69208675T2 DE1992608675 DE69208675T DE69208675T2 DE 69208675 T2 DE69208675 T2 DE 69208675T2 DE 1992608675 DE1992608675 DE 1992608675 DE 69208675 T DE69208675 T DE 69208675T DE 69208675 T2 DE69208675 T2 DE 69208675T2
Authority
DE
Germany
Prior art keywords
copper
shrinkling
microstructural
control
contact holes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE1992608675
Other languages
English (en)
Other versions
DE69208675D1 (de
Inventor
Farid Aoude
Lawrence David
Renuka Shastri Divakaruni
Shaji Farooq
Lester Herron
Hal Lasky
Anthony Mastreani
Govindarajan Natarajan
Srinivasa Reddy
Vivek Madan Sura
Rao Vallabhaneni
Donald Rene Wall
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of DE69208675D1 publication Critical patent/DE69208675D1/de
Application granted granted Critical
Publication of DE69208675T2 publication Critical patent/DE69208675T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/09—Use of materials for the conductive, e.g. metallic pattern
    • H05K1/092—Dispersed materials, e.g. conductive pastes or inks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4814—Conductive parts
    • H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
    • H01L21/486—Via connections through the substrate with or without pins
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49866—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers characterised by the materials
    • H01L23/49883—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers characterised by the materials the conductive materials containing organic materials or pastes, e.g. for thick films
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/095—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
    • H01L2924/097—Glass-ceramics, e.g. devitrified glass
    • H01L2924/09701—Low temperature co-fired ceramic [LTCC]
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/901—Printed circuit
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
    • Y10T428/252—Glass or ceramic [i.e., fired or glazed clay, cement, etc.] [porcelain, quartz, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
DE1992608675 1991-09-10 1992-06-23 Kupferaluminat enthalterde paste auf kupferbasis für mikrostrukturelle und schrumpfungs-beherrschung von kupfergefüllten kontaktlöchern Expired - Fee Related DE69208675T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/758,991 US5925443A (en) 1991-09-10 1991-09-10 Copper-based paste containing copper aluminate for microstructural and shrinkage control of copper-filled vias
PCT/EP1992/001414 WO1993005632A1 (en) 1991-09-10 1992-06-23 Copper-based paste containing copper aluminate for microstructural and shrinkage control of copper-filled vias

Publications (2)

Publication Number Publication Date
DE69208675D1 DE69208675D1 (de) 1996-04-04
DE69208675T2 true DE69208675T2 (de) 1996-09-26

Family

ID=25053958

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1992608675 Expired - Fee Related DE69208675T2 (de) 1991-09-10 1992-06-23 Kupferaluminat enthalterde paste auf kupferbasis für mikrostrukturelle und schrumpfungs-beherrschung von kupfergefüllten kontaktlöchern

Country Status (7)

Country Link
US (3) US5925443A (de)
EP (1) EP0606216B1 (de)
JP (1) JPH0817217B2 (de)
BR (1) BR9203415A (de)
CA (1) CA2072727A1 (de)
DE (1) DE69208675T2 (de)
WO (1) WO1993005632A1 (de)

Families Citing this family (22)

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Publication number Priority date Publication date Assignee Title
EP0569799B1 (de) * 1992-05-14 2000-09-06 Matsushita Electric Industrial Co., Ltd. Verfahren zur Herstellung von Leitern in Kontaktlöcher in vielschichtigen Keramiksubstraten
US5858193A (en) * 1995-06-06 1999-01-12 Sarnoff Corporation Electrokinetic pumping
US5698015A (en) * 1995-05-19 1997-12-16 Nikko Company Conductor paste for plugging through-holes in ceramic circuit boards and a ceramic circuit board having this conductor paste
US20030148024A1 (en) * 2001-10-05 2003-08-07 Kodas Toivo T. Low viscosity precursor compositons and methods for the depositon of conductive electronic features
US6376054B1 (en) * 1999-02-10 2002-04-23 International Business Machines Corporation Surface metallization structure for multiple chip test and burn-in
US6171988B1 (en) 1999-07-30 2001-01-09 International Business Machines Corporation Low loss glass ceramic composition with modifiable dielectric constant
US20070163641A1 (en) * 2004-02-19 2007-07-19 Nanosolar, Inc. High-throughput printing of semiconductor precursor layer from inter-metallic nanoflake particles
US7604843B1 (en) 2005-03-16 2009-10-20 Nanosolar, Inc. Metallic dispersion
US8623448B2 (en) * 2004-02-19 2014-01-07 Nanosolar, Inc. High-throughput printing of semiconductor precursor layer from chalcogenide microflake particles
US8048477B2 (en) * 2004-02-19 2011-11-01 Nanosolar, Inc. Chalcogenide solar cells
US7700464B2 (en) * 2004-02-19 2010-04-20 Nanosolar, Inc. High-throughput printing of semiconductor precursor layer from nanoflake particles
US8309163B2 (en) * 2004-02-19 2012-11-13 Nanosolar, Inc. High-throughput printing of semiconductor precursor layer by use of chalcogen-containing vapor and inter-metallic material
US8372734B2 (en) 2004-02-19 2013-02-12 Nanosolar, Inc High-throughput printing of semiconductor precursor layer from chalcogenide nanoflake particles
US7605328B2 (en) * 2004-02-19 2009-10-20 Nanosolar, Inc. Photovoltaic thin-film cell produced from metallic blend using high-temperature printing
US8329501B1 (en) 2004-02-19 2012-12-11 Nanosolar, Inc. High-throughput printing of semiconductor precursor layer from inter-metallic microflake particles
US20070163639A1 (en) * 2004-02-19 2007-07-19 Nanosolar, Inc. High-throughput printing of semiconductor precursor layer from microflake particles
US20070169809A1 (en) * 2004-02-19 2007-07-26 Nanosolar, Inc. High-throughput printing of semiconductor precursor layer by use of low-melting chalcogenides
US8846141B1 (en) 2004-02-19 2014-09-30 Aeris Capital Sustainable Ip Ltd. High-throughput printing of semiconductor precursor layer from microflake particles
US20070163642A1 (en) * 2004-02-19 2007-07-19 Nanosolar, Inc. High-throughput printing of semiconductor precursor layer from inter-metallic microflake articles
US7663057B2 (en) * 2004-02-19 2010-02-16 Nanosolar, Inc. Solution-based fabrication of photovoltaic cell
TWI422485B (zh) * 2010-12-31 2014-01-11 Tong Hsing Electronic Ind Ltd 一種具有反射膜之陶瓷基板及其製造方法
JP2022521578A (ja) 2019-02-21 2022-04-11 コーニング インコーポレイテッド 銅金属化貫通孔を有するガラスまたはガラスセラミック物品およびその製造方法

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US3838071A (en) * 1972-06-30 1974-09-24 Du Pont High adhesion silver-based metallizations
US4072771A (en) * 1975-11-28 1978-02-07 Bala Electronics Corporation Copper thick film conductor
US4090009A (en) * 1977-03-11 1978-05-16 E. I. Du Pont De Nemours And Company Novel silver compositions
US4301324A (en) * 1978-02-06 1981-11-17 International Business Machines Corporation Glass-ceramic structures and sintered multilayer substrates thereof with circuit patterns of gold, silver or copper
US4234367A (en) * 1979-03-23 1980-11-18 International Business Machines Corporation Method of making multilayered glass-ceramic structures having an internal distribution of copper-based conductors
FR2508054A1 (fr) * 1981-06-19 1982-12-24 Labo Electronique Physique Melange de depart pour une encre serigraphiable contenant un verre au plomb a cuire en atmosphere non oxydante et encre serigraphiable obtenue
US4584181A (en) * 1982-12-27 1986-04-22 Sri International Process and apparatus for obtaining silicon from fluosilicic acid
US4503090A (en) * 1983-02-23 1985-03-05 At&T Bell Laboratories Thick film resistor circuits
US4776978A (en) * 1984-04-26 1988-10-11 International Business Machines Corporation Method of controlling the sintering of metal particles
JPS61183807A (ja) * 1985-02-08 1986-08-16 松下電器産業株式会社 メタライズ組成物
US4594181A (en) * 1984-09-17 1986-06-10 E. I. Du Pont De Nemours And Company Metal oxide-coated copper powder
US4599277A (en) * 1984-10-09 1986-07-08 International Business Machines Corp. Control of the sintering of powdered metals
US5100714A (en) * 1986-07-24 1992-03-31 Ceramic Packaging, Inc. Metallized ceramic substrate and method therefor
JPH0246553B2 (ja) * 1986-10-03 1990-10-16 Goei Seisakusho Kk Metaraizukashitaseramitsukusuoyobisonoseizohoho
CA1273853C (en) * 1986-12-17 1990-09-11 METHOD OF PRODUCTION OF A CERAMIC CIRCUIT BOARD
US4906405A (en) * 1987-05-19 1990-03-06 Matsushita Electric Industrial Co., Ltd. Conductor composition and method of manufacturing a multilayered ceramic body using the composition
JPS63291304A (ja) * 1987-05-22 1988-11-29 Matsushita Electric Ind Co Ltd メタライズ組成物
JPS63292504A (ja) * 1987-05-26 1988-11-29 Matsushita Electric Works Ltd 導体ペ−スト
US4865722A (en) 1987-09-01 1989-09-12 Max Ririe Method and apparatus for separation using fluidized bed
JPH01192781A (ja) * 1988-01-26 1989-08-02 Dai Ichi Kogyo Seiyaku Co Ltd 銅厚膜導体組成物
JPH0728128B2 (ja) * 1988-03-11 1995-03-29 松下電器産業株式会社 セラミック多層配線基板とその製造方法
JPH01260712A (ja) * 1988-04-08 1989-10-18 Tdk Corp ペースト組成物および導体
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Also Published As

Publication number Publication date
CA2072727A1 (en) 1993-03-11
EP0606216A1 (de) 1994-07-20
US5925443A (en) 1999-07-20
JPH05198698A (ja) 1993-08-06
EP0606216B1 (de) 1996-02-28
JPH0817217B2 (ja) 1996-02-21
WO1993005632A1 (en) 1993-03-18
BR9203415A (pt) 1993-04-13
US6358439B1 (en) 2002-03-19
DE69208675D1 (de) 1996-04-04
US6124041A (en) 2000-09-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee