DE69216079T2 - Infrarotsensitive, photopolymerisierbare zusammensetzungen - Google Patents

Infrarotsensitive, photopolymerisierbare zusammensetzungen

Info

Publication number
DE69216079T2
DE69216079T2 DE69216079T DE69216079T DE69216079T2 DE 69216079 T2 DE69216079 T2 DE 69216079T2 DE 69216079 T DE69216079 T DE 69216079T DE 69216079 T DE69216079 T DE 69216079T DE 69216079 T2 DE69216079 T2 DE 69216079T2
Authority
DE
Germany
Prior art keywords
infrared sensitive
photopolymerizable compositions
photopolymerizable
infrared
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69216079T
Other languages
English (en)
Other versions
DE69216079D1 (de
Inventor
Evan Laganis
George Lalka
William Smothers
Gregory Weed
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Application granted granted Critical
Publication of DE69216079D1 publication Critical patent/DE69216079D1/de
Publication of DE69216079T2 publication Critical patent/DE69216079T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/124—Carbonyl compound containing
DE69216079T 1991-02-19 1992-02-14 Infrarotsensitive, photopolymerisierbare zusammensetzungen Expired - Fee Related DE69216079T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/657,736 US5147758A (en) 1991-02-19 1991-02-19 Red sensitive photopolymerizable compositions
PCT/US1992/000957 WO1992014765A1 (en) 1991-02-19 1992-02-14 Red sensitive photopolymerizable compositions

Publications (2)

Publication Number Publication Date
DE69216079D1 DE69216079D1 (de) 1997-01-30
DE69216079T2 true DE69216079T2 (de) 1997-05-22

Family

ID=24638462

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69216079T Expired - Fee Related DE69216079T2 (de) 1991-02-19 1992-02-14 Infrarotsensitive, photopolymerisierbare zusammensetzungen

Country Status (5)

Country Link
US (1) US5147758A (de)
EP (1) EP0572524B1 (de)
JP (1) JP2620026B2 (de)
DE (1) DE69216079T2 (de)
WO (1) WO1992014765A1 (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5401607A (en) * 1991-04-17 1995-03-28 Polaroid Corporation Processes and compositions for photogeneration of acid
JP2871181B2 (ja) * 1991-07-09 1999-03-17 ブラザー工業株式会社 光硬化型組成物
JPH07146551A (ja) * 1991-10-31 1995-06-06 Sony Corp フォトレジスト組成物及びフォトレジストの露光方法
US5219709A (en) * 1992-02-26 1993-06-15 Mitsubishi Kasei Corporation Photopolymerizable composition
JP3141517B2 (ja) * 1992-05-14 2001-03-05 ブラザー工業株式会社 光硬化型組成物
US5512418A (en) * 1993-03-10 1996-04-30 E. I. Du Pont De Nemours And Company Infra-red sensitive aqueous wash-off photoimaging element
WO1996009289A1 (en) * 1994-09-21 1996-03-28 Kyowa Hakko Kogyo Co., Ltd. Photopolymerizable composition containing squarylium compound
US5552256A (en) * 1994-09-29 1996-09-03 International Business Machines Corporation Positive resist composition containing naphthoquinonediazide compound having non-metallic atom directly bonded to the naphthalene ring
TW467933B (en) * 1995-11-24 2001-12-11 Ciba Sc Holding Ag Photopolymerizable compositions comprising borate photoinitiators from monoboranes and the use thereof
US5723617A (en) * 1995-12-21 1998-03-03 Minnesota Mining And Manufacturing Company Pyrrolo 2,1-a!isoquinoline dyes
US6218076B1 (en) 1997-08-26 2001-04-17 Showa Denko K.K. Stabilizer for organic borate salts and photosensitive composition containing the same
US6110653A (en) * 1999-07-26 2000-08-29 International Business Machines Corporation Acid sensitive ARC and method of use
US7056639B2 (en) * 2001-08-21 2006-06-06 Eastman Kodak Company Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid
US20030083753A1 (en) * 2001-10-22 2003-05-01 Rajdeep Kalgutkar Photocuring system database
JP4125669B2 (ja) * 2003-12-22 2008-07-30 大日本印刷株式会社 体積型ホログラム製造方法
KR101125678B1 (ko) * 2004-02-06 2012-03-28 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨. 개선된 이미지화 조성물 및 방법
US7144676B2 (en) * 2004-02-06 2006-12-05 Rohm And Haas Electronic Materials Llc Imaging compositions and methods
US7977026B2 (en) * 2004-02-06 2011-07-12 Rohm And Haas Electronic Materials Llc Imaging methods
US7270932B2 (en) * 2004-02-06 2007-09-18 Rohm And Haas Electronic Materials Llc Imaging composition and method
US20050175941A1 (en) * 2004-02-06 2005-08-11 Rohm And Hass Electronic Materials, L.L.C. Imaging composition and method
TW200720842A (en) * 2005-10-24 2007-06-01 Kyowa Hakko Chemical Co Ltd A squarilium compound and the short-wave length source photo polymerization composition using thereof
US20070117042A1 (en) * 2005-11-23 2007-05-24 Rohm And Haas Electronic Materials Llc Imaging methods
JP5535664B2 (ja) * 2010-01-15 2014-07-02 株式会社Ａｄｅｋａ 色調補正剤、スクアリリウム化合物及び光学フィルター
JP2012083409A (ja) * 2010-10-07 2012-04-26 Tdk Corp カラーホログラム画像記録用フォトポリマー媒体及びカラーホログラム画像記録方法
KR20180019200A (ko) * 2015-06-23 2018-02-23 코베스트로 도이칠란트 아게 치환된 트리아진 및 그의 제조 방법
JP6596246B2 (ja) * 2015-06-26 2019-10-23 セーレン株式会社 意匠性を有する物品の製造方法および意匠性を有する物品
KR102457447B1 (ko) * 2018-07-06 2022-10-21 후지필름 가부시키가이샤 경화성 조성물, 막, 근적외선 차단 필터, 고체 촬상 소자, 화상 표시 장치, 적외선 센서 및 카메라 모듈

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8300155A (nl) * 1983-01-17 1984-08-16 Philips Nv Registratie-element met een pyrylium- of thiopyrylium-squarylium kleurstoflaag en nieuwe pyrylium- of thiopyrylium-squarylium verbindingen.
US4772541A (en) * 1985-11-20 1988-09-20 The Mead Corporation Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same
US4950581A (en) * 1987-07-06 1990-08-21 Fuji Photo Film Co., Ltd. Photopolymerizable composition
JPH07120036B2 (ja) * 1987-07-06 1995-12-20 富士写真フイルム株式会社 光重合性組成物
JPH0820732B2 (ja) * 1987-10-13 1996-03-04 富士写真フイルム株式会社 光重合性組成物
JPH0820734B2 (ja) * 1988-08-11 1996-03-04 富士写真フイルム株式会社 感光性組成物及びそれを用いた光重合性組成物
US4939206A (en) * 1988-11-14 1990-07-03 General Electric Company Flame retardant polyorganosiloxane-based graft polymers
EP0379200A3 (de) * 1989-01-19 1991-11-13 Mitsubishi Kasei Corporation Photopolymerisierbare Zusammensetzung
CA2033821A1 (en) * 1990-01-12 1991-07-13 Evan D. Laganis Photopolymerizable compositions sensitive to longer wavelength visible actinic radiation
US5055372A (en) * 1990-04-23 1991-10-08 The Mead Corporation Photohardenable composition containing borate salts and ketone initiators
CA2053761A1 (en) * 1990-10-25 1992-04-26 Gregory C. Weed Borate coinitiators for photopolymerizable compositions

Also Published As

Publication number Publication date
EP0572524B1 (de) 1996-12-18
JPH06506492A (ja) 1994-07-21
US5147758A (en) 1992-09-15
DE69216079D1 (de) 1997-01-30
EP0572524A1 (de) 1993-12-08
JP2620026B2 (ja) 1997-06-11
WO1992014765A1 (en) 1992-09-03

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee