DE69223186D1 - Zusammensetzung zur Verwendung in einem transparenten elektrisch leitenden Film sowie Verfahren zur Herstellung dieses Films - Google Patents
Zusammensetzung zur Verwendung in einem transparenten elektrisch leitenden Film sowie Verfahren zur Herstellung dieses FilmsInfo
- Publication number
- DE69223186D1 DE69223186D1 DE69223186T DE69223186T DE69223186D1 DE 69223186 D1 DE69223186 D1 DE 69223186D1 DE 69223186 T DE69223186 T DE 69223186T DE 69223186 T DE69223186 T DE 69223186T DE 69223186 D1 DE69223186 D1 DE 69223186D1
- Authority
- DE
- Germany
- Prior art keywords
- producing
- composition
- same
- electroconductive film
- transparent electroconductive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
- C03C17/253—Coating containing SnO2
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1283—Control of temperature, e.g. gradual temperature increase, modulation of temperature
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/23—Mixtures
- C03C2217/231—In2O3/SnO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/252—Glass or ceramic [i.e., fired or glazed clay, cement, etc.] [porcelain, quartz, etc.]
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18442291A JP3208794B2 (ja) | 1991-07-24 | 1991-07-24 | 透明導電膜形成用組成物と透明導電膜の形成方法 |
JP27229291A JPH05114314A (ja) | 1991-10-21 | 1991-10-21 | 透明導電膜の形成方法 |
JP28445791A JPH05116941A (ja) | 1991-10-30 | 1991-10-30 | 透明導電膜の製造方法 |
JP28445691A JPH05120933A (ja) | 1991-10-30 | 1991-10-30 | 透明導電膜の形成方法 |
JP3327309A JP3049890B2 (ja) | 1991-12-11 | 1991-12-11 | 透明導電膜の形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69223186D1 true DE69223186D1 (de) | 1998-01-02 |
DE69223186T2 DE69223186T2 (de) | 1998-03-12 |
Family
ID=27528865
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69223186T Expired - Fee Related DE69223186T2 (de) | 1991-07-24 | 1992-07-23 | Zusammensetzung zur Verwendung in einem transparenten elektrisch leitenden Film sowie Verfahren zur Herstellung dieses Films |
Country Status (3)
Country | Link |
---|---|
US (2) | US5578248A (de) |
EP (1) | EP0524630B1 (de) |
DE (1) | DE69223186T2 (de) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5643369A (en) * | 1993-06-24 | 1997-07-01 | Fuji Xerox Co., Ltd. | Photoelectric conversion element having an infrared transmissive indium-tin oxide film |
JP3444655B2 (ja) * | 1994-06-14 | 2003-09-08 | 三井金属鉱業株式会社 | 複合導電性粉末及び導電膜 |
WO1998053841A1 (en) * | 1997-05-27 | 1998-12-03 | The State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of The University Of Oregon | Scaffold-organized metal, alloy, semiconductor and/or magnetic clusters and electronic devices made using such clusters |
US7626192B2 (en) | 1997-05-27 | 2009-12-01 | State of Oregon Acting by the Through the State Board of Higher Education on Behalf of the University of Oregon | Scaffold-organized clusters and electronic devices made using such clusters |
US20030077625A1 (en) * | 1997-05-27 | 2003-04-24 | Hutchison James E. | Particles by facile ligand exchange reactions |
US6664103B2 (en) | 1998-05-20 | 2003-12-16 | Integrated Nano-Technologies, Llc | Chemically assembled nano-scale circuit elements |
WO1999060165A1 (en) | 1998-05-20 | 1999-11-25 | Dennis Michael Connolly | Chemically assembled nano-scale devices |
US6416818B1 (en) | 1998-08-17 | 2002-07-09 | Nanophase Technologies Corporation | Compositions for forming transparent conductive nanoparticle coatings and process of preparation therefor |
WO2001073150A1 (en) * | 2000-03-24 | 2001-10-04 | The State Of Oregon, Acting By And Through The State Board Of Higher Education On Behalf Of The University Of Oregon | Scaffold-organized clusters and electronic devices made using such clusters |
US6787240B2 (en) * | 2000-06-23 | 2004-09-07 | Donnelly Corporation | Enhanced light transmission conductive coated transparent substrate |
US6748264B2 (en) | 2002-02-04 | 2004-06-08 | Fook Tin Technologies Limited | Body fat analyzer with integral analog measurement electrodes |
US7601406B2 (en) | 2002-06-13 | 2009-10-13 | Cima Nanotech Israel Ltd. | Nano-powder-based coating and ink compositions |
US7566360B2 (en) * | 2002-06-13 | 2009-07-28 | Cima Nanotech Israel Ltd. | Nano-powder-based coating and ink compositions |
US7736693B2 (en) * | 2002-06-13 | 2010-06-15 | Cima Nanotech Israel Ltd. | Nano-powder-based coating and ink compositions |
JP4320564B2 (ja) * | 2002-06-28 | 2009-08-26 | 日亜化学工業株式会社 | 透明導電膜形成用組成物、透明導電膜形成用溶液および透明導電膜の形成方法 |
CN100336136C (zh) * | 2003-12-12 | 2007-09-05 | 日本曹达株式会社 | 透明导电膜形成液和包含该形成液的透明导电膜附着基体的制造方法 |
US7985869B2 (en) * | 2005-05-20 | 2011-07-26 | State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of The University Of Oregon | Compositions of AU-11 nanoparticles and their optical properties |
CN101522947A (zh) * | 2005-06-10 | 2009-09-02 | 西玛耐诺技术以色列有限公司 | 增强的透明导电涂料及其制备方法 |
US8247312B2 (en) * | 2008-04-24 | 2012-08-21 | Innovalight, Inc. | Methods for printing an ink on a textured wafer surface |
EP3184206A1 (de) | 2015-12-23 | 2017-06-28 | Solvay SA | Dispersionen von metallen und/oder metallverbindungen |
CN111769166B (zh) * | 2020-07-10 | 2022-02-08 | 浩物电子科技(苏州)有限公司 | 一种电极及其制备方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5473818A (en) * | 1977-11-24 | 1979-06-13 | Tokyo Denshi Kagaku Kk | Coating solution for forming transparent electric conductive layer and method of coating same |
JPS54150417A (en) * | 1978-05-19 | 1979-11-26 | Hitachi Ltd | Production of transparent conductive layer |
JPS5854089B2 (ja) * | 1979-06-22 | 1983-12-02 | 株式会社日立製作所 | 透明導電膜の形成方法 |
JPS6019610B2 (ja) * | 1979-12-14 | 1985-05-17 | 株式会社日立製作所 | 透明導電膜形成法 |
GB2093422B (en) * | 1981-02-19 | 1984-08-15 | Jsk Materials Handling Ltd | Vertical conveyor |
JPS57138708A (en) * | 1981-02-20 | 1982-08-27 | Hitachi Ltd | Composition for forming transparent conductive film and method of forming transparent conductive film |
US4391743A (en) * | 1981-11-30 | 1983-07-05 | Nippon Soda Company Limited | Composition for depositing metallic oxide film coatings |
DE3324647A1 (de) * | 1983-07-08 | 1985-01-17 | Schott Glaswerke, 6500 Mainz | Tauchverfahren zur herstellung transparenter, elektrisch leitfaehiger, dotierter indiumoxidschichten |
US4937148A (en) * | 1986-03-06 | 1990-06-26 | Catalysts & Chemicals Industries Co., Ltd. | Process for preparing conductive fine particles |
JP2708120B2 (ja) * | 1987-10-29 | 1998-02-04 | 触媒化成工業株式会社 | 透明酸化物薄膜用塗布液の製造方法および透明酸化物薄膜付基材 |
US4977013A (en) * | 1988-06-03 | 1990-12-11 | Andus Corporation | Tranparent conductive coatings |
DE19723645B4 (de) * | 1997-06-05 | 2006-04-13 | Endress + Hauser Gmbh + Co. Kg | Anordnung zur Signalübertragung zwischen einer Geberstelle und einer Empfangsstelle |
-
1992
- 1992-07-23 DE DE69223186T patent/DE69223186T2/de not_active Expired - Fee Related
- 1992-07-23 EP EP92112620A patent/EP0524630B1/de not_active Expired - Lifetime
-
1995
- 1995-06-07 US US08/478,342 patent/US5578248A/en not_active Expired - Lifetime
-
1996
- 1996-08-26 US US08/697,512 patent/US5998011A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0524630A2 (de) | 1993-01-27 |
EP0524630B1 (de) | 1997-11-19 |
EP0524630A3 (en) | 1993-07-14 |
DE69223186T2 (de) | 1998-03-12 |
US5998011A (en) | 1999-12-07 |
US5578248A (en) | 1996-11-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |