DE69223186D1 - Zusammensetzung zur Verwendung in einem transparenten elektrisch leitenden Film sowie Verfahren zur Herstellung dieses Films - Google Patents

Zusammensetzung zur Verwendung in einem transparenten elektrisch leitenden Film sowie Verfahren zur Herstellung dieses Films

Info

Publication number
DE69223186D1
DE69223186D1 DE69223186T DE69223186T DE69223186D1 DE 69223186 D1 DE69223186 D1 DE 69223186D1 DE 69223186 T DE69223186 T DE 69223186T DE 69223186 T DE69223186 T DE 69223186T DE 69223186 D1 DE69223186 D1 DE 69223186D1
Authority
DE
Germany
Prior art keywords
producing
composition
same
electroconductive film
transparent electroconductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69223186T
Other languages
English (en)
Other versions
DE69223186T2 (de
Inventor
Akiyoshi Hattori
Akihiko Yoshida
Atsushi Nishino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP18442291A external-priority patent/JP3208794B2/ja
Priority claimed from JP27229291A external-priority patent/JPH05114314A/ja
Priority claimed from JP28445791A external-priority patent/JPH05116941A/ja
Priority claimed from JP28445691A external-priority patent/JPH05120933A/ja
Priority claimed from JP3327309A external-priority patent/JP3049890B2/ja
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Publication of DE69223186D1 publication Critical patent/DE69223186D1/de
Application granted granted Critical
Publication of DE69223186T2 publication Critical patent/DE69223186T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23Oxides
    • C03C17/25Oxides by deposition from the liquid phase
    • C03C17/253Coating containing SnO2
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208Oxides, e.g. ceramics
    • C23C18/1216Metal oxides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125Process of deposition of the inorganic material
    • C23C18/1283Control of temperature, e.g. gradual temperature increase, modulation of temperature
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/21Oxides
    • C03C2217/23Mixtures
    • C03C2217/231In2O3/SnO2
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/11Deposition methods from solutions or suspensions
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/25Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
    • Y10T428/252Glass or ceramic [i.e., fired or glazed clay, cement, etc.] [porcelain, quartz, etc.]
DE69223186T 1991-07-24 1992-07-23 Zusammensetzung zur Verwendung in einem transparenten elektrisch leitenden Film sowie Verfahren zur Herstellung dieses Films Expired - Fee Related DE69223186T2 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP18442291A JP3208794B2 (ja) 1991-07-24 1991-07-24 透明導電膜形成用組成物と透明導電膜の形成方法
JP27229291A JPH05114314A (ja) 1991-10-21 1991-10-21 透明導電膜の形成方法
JP28445791A JPH05116941A (ja) 1991-10-30 1991-10-30 透明導電膜の製造方法
JP28445691A JPH05120933A (ja) 1991-10-30 1991-10-30 透明導電膜の形成方法
JP3327309A JP3049890B2 (ja) 1991-12-11 1991-12-11 透明導電膜の形成方法

Publications (2)

Publication Number Publication Date
DE69223186D1 true DE69223186D1 (de) 1998-01-02
DE69223186T2 DE69223186T2 (de) 1998-03-12

Family

ID=27528865

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69223186T Expired - Fee Related DE69223186T2 (de) 1991-07-24 1992-07-23 Zusammensetzung zur Verwendung in einem transparenten elektrisch leitenden Film sowie Verfahren zur Herstellung dieses Films

Country Status (3)

Country Link
US (2) US5578248A (de)
EP (1) EP0524630B1 (de)
DE (1) DE69223186T2 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5643369A (en) * 1993-06-24 1997-07-01 Fuji Xerox Co., Ltd. Photoelectric conversion element having an infrared transmissive indium-tin oxide film
JP3444655B2 (ja) * 1994-06-14 2003-09-08 三井金属鉱業株式会社 複合導電性粉末及び導電膜
WO1998053841A1 (en) * 1997-05-27 1998-12-03 The State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of The University Of Oregon Scaffold-organized metal, alloy, semiconductor and/or magnetic clusters and electronic devices made using such clusters
US7626192B2 (en) 1997-05-27 2009-12-01 State of Oregon Acting by the Through the State Board of Higher Education on Behalf of the University of Oregon Scaffold-organized clusters and electronic devices made using such clusters
US20030077625A1 (en) * 1997-05-27 2003-04-24 Hutchison James E. Particles by facile ligand exchange reactions
US6664103B2 (en) 1998-05-20 2003-12-16 Integrated Nano-Technologies, Llc Chemically assembled nano-scale circuit elements
WO1999060165A1 (en) 1998-05-20 1999-11-25 Dennis Michael Connolly Chemically assembled nano-scale devices
US6416818B1 (en) 1998-08-17 2002-07-09 Nanophase Technologies Corporation Compositions for forming transparent conductive nanoparticle coatings and process of preparation therefor
WO2001073150A1 (en) * 2000-03-24 2001-10-04 The State Of Oregon, Acting By And Through The State Board Of Higher Education On Behalf Of The University Of Oregon Scaffold-organized clusters and electronic devices made using such clusters
US6787240B2 (en) * 2000-06-23 2004-09-07 Donnelly Corporation Enhanced light transmission conductive coated transparent substrate
US6748264B2 (en) 2002-02-04 2004-06-08 Fook Tin Technologies Limited Body fat analyzer with integral analog measurement electrodes
US7601406B2 (en) 2002-06-13 2009-10-13 Cima Nanotech Israel Ltd. Nano-powder-based coating and ink compositions
US7566360B2 (en) * 2002-06-13 2009-07-28 Cima Nanotech Israel Ltd. Nano-powder-based coating and ink compositions
US7736693B2 (en) * 2002-06-13 2010-06-15 Cima Nanotech Israel Ltd. Nano-powder-based coating and ink compositions
JP4320564B2 (ja) * 2002-06-28 2009-08-26 日亜化学工業株式会社 透明導電膜形成用組成物、透明導電膜形成用溶液および透明導電膜の形成方法
CN100336136C (zh) * 2003-12-12 2007-09-05 日本曹达株式会社 透明导电膜形成液和包含该形成液的透明导电膜附着基体的制造方法
US7985869B2 (en) * 2005-05-20 2011-07-26 State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of The University Of Oregon Compositions of AU-11 nanoparticles and their optical properties
CN101522947A (zh) * 2005-06-10 2009-09-02 西玛耐诺技术以色列有限公司 增强的透明导电涂料及其制备方法
US8247312B2 (en) * 2008-04-24 2012-08-21 Innovalight, Inc. Methods for printing an ink on a textured wafer surface
EP3184206A1 (de) 2015-12-23 2017-06-28 Solvay SA Dispersionen von metallen und/oder metallverbindungen
CN111769166B (zh) * 2020-07-10 2022-02-08 浩物电子科技(苏州)有限公司 一种电极及其制备方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5473818A (en) * 1977-11-24 1979-06-13 Tokyo Denshi Kagaku Kk Coating solution for forming transparent electric conductive layer and method of coating same
JPS54150417A (en) * 1978-05-19 1979-11-26 Hitachi Ltd Production of transparent conductive layer
JPS5854089B2 (ja) * 1979-06-22 1983-12-02 株式会社日立製作所 透明導電膜の形成方法
JPS6019610B2 (ja) * 1979-12-14 1985-05-17 株式会社日立製作所 透明導電膜形成法
GB2093422B (en) * 1981-02-19 1984-08-15 Jsk Materials Handling Ltd Vertical conveyor
JPS57138708A (en) * 1981-02-20 1982-08-27 Hitachi Ltd Composition for forming transparent conductive film and method of forming transparent conductive film
US4391743A (en) * 1981-11-30 1983-07-05 Nippon Soda Company Limited Composition for depositing metallic oxide film coatings
DE3324647A1 (de) * 1983-07-08 1985-01-17 Schott Glaswerke, 6500 Mainz Tauchverfahren zur herstellung transparenter, elektrisch leitfaehiger, dotierter indiumoxidschichten
US4937148A (en) * 1986-03-06 1990-06-26 Catalysts & Chemicals Industries Co., Ltd. Process for preparing conductive fine particles
JP2708120B2 (ja) * 1987-10-29 1998-02-04 触媒化成工業株式会社 透明酸化物薄膜用塗布液の製造方法および透明酸化物薄膜付基材
US4977013A (en) * 1988-06-03 1990-12-11 Andus Corporation Tranparent conductive coatings
DE19723645B4 (de) * 1997-06-05 2006-04-13 Endress + Hauser Gmbh + Co. Kg Anordnung zur Signalübertragung zwischen einer Geberstelle und einer Empfangsstelle

Also Published As

Publication number Publication date
EP0524630A2 (de) 1993-01-27
EP0524630B1 (de) 1997-11-19
EP0524630A3 (en) 1993-07-14
DE69223186T2 (de) 1998-03-12
US5998011A (en) 1999-12-07
US5578248A (en) 1996-11-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee