DE69225180T2 - Lichtempfindlicher Gegenstand, der einen migrationsresistenten Halomethyl-1,3,5-Triazin-Photoinitiator enthält - Google Patents

Lichtempfindlicher Gegenstand, der einen migrationsresistenten Halomethyl-1,3,5-Triazin-Photoinitiator enthält

Info

Publication number
DE69225180T2
DE69225180T2 DE69225180T DE69225180T DE69225180T2 DE 69225180 T2 DE69225180 T2 DE 69225180T2 DE 69225180 T DE69225180 T DE 69225180T DE 69225180 T DE69225180 T DE 69225180T DE 69225180 T2 DE69225180 T2 DE 69225180T2
Authority
DE
Germany
Prior art keywords
halomethyl
migration
resistant
article containing
photosensitive article
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69225180T
Other languages
English (en)
Other versions
DE69225180D1 (de
Inventor
James A Bonham
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Application granted granted Critical
Publication of DE69225180D1 publication Critical patent/DE69225180D1/de
Publication of DE69225180T2 publication Critical patent/DE69225180T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
    • C07D251/24—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to three ring carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/26—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with only hetero atoms directly attached to ring carbon atoms
    • C07D251/30—Only oxygen atoms
    • C07D251/34—Cyanuric or isocyanuric esters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group
DE69225180T 1991-08-30 1992-08-14 Lichtempfindlicher Gegenstand, der einen migrationsresistenten Halomethyl-1,3,5-Triazin-Photoinitiator enthält Expired - Fee Related DE69225180T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/752,775 US5298361A (en) 1991-08-30 1991-08-30 Light-sensitive article containing migration-resistant halomethyl-1,3,5-triazine photoinitiator

Publications (2)

Publication Number Publication Date
DE69225180D1 DE69225180D1 (de) 1998-05-28
DE69225180T2 true DE69225180T2 (de) 1998-11-19

Family

ID=25027790

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69225180T Expired - Fee Related DE69225180T2 (de) 1991-08-30 1992-08-14 Lichtempfindlicher Gegenstand, der einen migrationsresistenten Halomethyl-1,3,5-Triazin-Photoinitiator enthält

Country Status (4)

Country Link
US (2) US5298361A (de)
EP (1) EP0529896B1 (de)
JP (1) JPH05249671A (de)
DE (1) DE69225180T2 (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0503674B1 (de) * 1991-03-15 1998-06-24 Fuji Photo Film Co., Ltd. Lichtempfindliche Bistrihalomethyl-s-triazin-Verbindung und photopolymerisierbare Zusammensetzung, dieselbe enthaltend
CA2087421A1 (en) * 1992-01-22 1993-07-23 Hisao Hachisuka Composite reverse osmosis membrane and novel acid chloride
DE4204949A1 (de) * 1992-02-19 1993-09-09 Hoechst Ag Verfahren zur herstellung eines mehrfarbenbilds und lichtempfindliches material zur durchfuehrung dieses verfahrens
JP3362797B2 (ja) * 1993-04-30 2003-01-07 東洋紡績株式会社 印刷原版用感光性樹脂積層体
US6153309A (en) * 1994-07-01 2000-11-28 Razavi; Homaune A. UV-protected vinyl laminates
US5460918A (en) * 1994-10-11 1995-10-24 Minnesota Mining And Manufacturing Company Thermal transfer donor and receptor with silicated surface for lithographic printing applications
US5597677A (en) * 1994-11-02 1997-01-28 Minnesota Mining And Manufacturing Company Photoimageable elements
US5563023A (en) * 1994-11-02 1996-10-08 Minnesota Mining And Manufacturing Co. Photoimageable elements
US5633117A (en) * 1995-04-27 1997-05-27 Imation Corp. Providing imagewise variation in glossiness to a receptor
US5561029A (en) * 1995-04-28 1996-10-01 Polaroid Corporation Low-volatility, substituted 2-phenyl-4,6-bis (halomethyl)-1,3,5-triazine for lithographic printing plates
JPH09185161A (ja) 1995-10-31 1997-07-15 Minnesota Mining & Mfg Co <3M> 低光学ドットゲインカラー校正複合材料
US5645963A (en) * 1995-11-20 1997-07-08 Minnesota Mining And Manufacturing Company Method for making color filter elements using laminable colored photosensitive materials
US5776651A (en) 1996-01-31 1998-07-07 Minnesota Mining & Manufacturing Company Laminable proofing elements
US5837586A (en) * 1997-02-14 1998-11-17 Kodak Polychrome Graphics Company, Ltd. 4-(alkoxyhydroxy)styryl triazine photinitiators and photo sensitive composition
JPH10312055A (ja) * 1997-05-14 1998-11-24 Mitsubishi Chem Corp 感光性平版印刷版
US6010821A (en) 1997-05-23 2000-01-04 Minnesota Mining And Manufacturing Company Aqueous developable color proofing elements
US5847133A (en) * 1997-05-23 1998-12-08 Minnesota Mining And Manufacturing Company Ionic halomethyl-1,3,5-triazine photoinitiators
US6436484B1 (en) 1997-12-09 2002-08-20 Coats American, Inc. Processes for coating sewing thread
US6797739B1 (en) * 2000-06-12 2004-09-28 Lg Chemical Co., Ltd. Triazene-based compound comprising functionalized alkylthio groups, and photopolymerization initiator
KR100396377B1 (ko) * 2001-03-05 2003-09-03 주식회사 엘지화학 기능성 알킬티오 관능기를 가지는 트리아진계 화합물 및이를 포함하는 감광성 조성물
MXPA04002065A (es) 2001-09-04 2005-02-17 Kodak Polychrome Graphics Llc Metodo de prueba hibrido.
US7087194B2 (en) * 2002-04-04 2006-08-08 3M Innovative Properties Company K-type polarizer and preparation thereof
US6949207B2 (en) * 2002-04-04 2005-09-27 3M Innovative Properties Company K-type polarizer and preparation thereof
US6794117B2 (en) 2002-10-28 2004-09-21 Kodak Polychrome Graphics Process to produce a custom-color overlay
US20070077498A1 (en) * 2005-09-30 2007-04-05 Fuji Photo Film Co., Ltd. Optical recording composition, optical recording medium and production method thereof, optical recording method and optical recording apparatus
KR100763744B1 (ko) * 2005-11-07 2007-10-04 주식회사 엘지화학 옥심 에스테르를 포함하는 트리아진계 광활성 화합물

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3376136A (en) * 1964-01-27 1968-04-02 Du Pont Photographic elements and processes
US3671236A (en) * 1968-03-18 1972-06-20 Minnesota Mining & Mfg Presensitized color-proofing sheet
US3617288A (en) * 1969-09-12 1971-11-02 Minnesota Mining & Mfg Propenone sensitizers for the photolysis of organic halogen compounds
DE2123702B2 (de) * 1971-05-13 1979-11-08 Hoechst Ag, 6000 Frankfurt Verfahren zur Herstellung eines Reliefbildes
US3987037A (en) * 1971-09-03 1976-10-19 Minnesota Mining And Manufacturing Company Chromophore-substituted vinyl-halomethyl-s-triazines
US3954475A (en) * 1971-09-03 1976-05-04 Minnesota Mining And Manufacturing Company Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines
US4174216A (en) * 1975-06-03 1979-11-13 E. I. Du Pont De Nemours And Company Process for image reproduction using multilayer photosensitive tonable element
US4200762A (en) * 1976-10-29 1980-04-29 Thiokol Corporation Actinic radiation curable polymers
US4189323A (en) * 1977-04-25 1980-02-19 Hoechst Aktiengesellschaft Radiation-sensitive copying composition
US4304923A (en) * 1979-02-27 1981-12-08 Minnesota Mining And Manufacturing Company Photopolymerizable oligomer
US4408532A (en) * 1980-04-30 1983-10-11 Minnesota Mining And Manufacturing Company Lithographic printing plate with oleophilic area of radiation exposed adduct of diazo resin and sulfonated polymer
DE3337024A1 (de) * 1983-10-12 1985-04-25 Hoechst Ag, 6230 Frankfurt Lichtempfindliche, trichlormethylgruppen aufweisende verbindungen, verfahren zu ihrer herstellung und diese verbindungen enthaltendes lichtempfindliches gemisch
US4476215A (en) * 1983-11-25 1984-10-09 Minnesota Mining And Manufacturing Company Negative-acting photoresist composition
US4553307A (en) * 1984-01-17 1985-11-19 Asc Incorporated Method for installing a sliding roof panel assembly
US4596757A (en) * 1985-04-05 1986-06-24 American Hoechst Corporation Photopolymerizable dual transfer negative working color proofing system
JPH067263B2 (ja) * 1985-08-19 1994-01-26 富士写真フイルム株式会社 光可溶化組成物
JPH0766185B2 (ja) * 1985-09-09 1995-07-19 富士写真フイルム株式会社 感光性組成物
DE3625014C1 (de) * 1986-07-24 1987-10-29 Du Pont Deutschland Verfahren zur Herstellung von Bildern auf tonbaren lichtempfindlichen Schichten
US4837128A (en) * 1986-08-08 1989-06-06 Fuji Photo Film Co., Ltd. Light-sensitive composition
JPH0642074B2 (ja) * 1986-09-10 1994-06-01 富士写真フイルム株式会社 感光性組成物
US4855384A (en) * 1987-01-22 1989-08-08 Minnesota Mining And Manufacturing Company Sulfonate-containing photopolymer systems
GB8719730D0 (en) * 1987-08-20 1987-09-30 Vickers Plc Radiation sensitive compounds
US4950795A (en) * 1987-08-27 1990-08-21 Ciba-Geigy Corporation Oligomeric benzil ketals and their use as photoinitiators
JPH0820734B2 (ja) * 1988-08-11 1996-03-04 富士写真フイルム株式会社 感光性組成物及びそれを用いた光重合性組成物
US4985562A (en) * 1988-09-07 1991-01-15 Minnesota Mining And Manufacturing Company Halomethyl-1,3,5-triazines containing an amine-containing moiety
EP0359430B1 (de) * 1988-09-07 1995-05-10 Minnesota Mining And Manufacturing Company Eine Monomergruppe enthaltende Halogenmethyl-1,3,5-Triazine
US4923780A (en) * 1988-12-12 1990-05-08 E. I. Du Pont De Nemours And Company Process for making a reverse image using a pigmented peel-apart photosensitive element containing a photoinhibitor
CA2034274A1 (en) * 1990-02-07 1991-08-08 James A. Bonham Polymers containing halomethyl-1,3,5-triazine moieties
US5248583A (en) * 1991-08-30 1993-09-28 Minnesota Mining And Manufacturing Company Negative single sheet color proofing system based on aqueous developable photo-oligomers

Also Published As

Publication number Publication date
JPH05249671A (ja) 1993-09-28
US5484919A (en) 1996-01-16
DE69225180D1 (de) 1998-05-28
US5298361A (en) 1994-03-29
EP0529896A1 (de) 1993-03-03
EP0529896B1 (de) 1998-04-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee