DE69329239T2 - Gleichspannungsversorgung für plasmareaktor - Google Patents

Gleichspannungsversorgung für plasmareaktor

Info

Publication number
DE69329239T2
DE69329239T2 DE69329239T DE69329239T DE69329239T2 DE 69329239 T2 DE69329239 T2 DE 69329239T2 DE 69329239 T DE69329239 T DE 69329239T DE 69329239 T DE69329239 T DE 69329239T DE 69329239 T2 DE69329239 T2 DE 69329239T2
Authority
DE
Germany
Prior art keywords
voltage supply
plasma reactor
reactor
plasma
voltage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69329239T
Other languages
English (en)
Other versions
DE69329239D1 (de
Inventor
Geoffrey N Drummond
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Energy Industries Inc
Original Assignee
Advanced Energy Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Energy Industries Inc filed Critical Advanced Energy Industries Inc
Publication of DE69329239D1 publication Critical patent/DE69329239D1/de
Application granted granted Critical
Publication of DE69329239T2 publication Critical patent/DE69329239T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/004—Charge control of objects or beams
    • H01J2237/0041—Neutralising arrangements
    • H01J2237/0044—Neutralising arrangements of objects being observed or treated
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0203—Protection arrangements
    • H01J2237/0206—Extinguishing, preventing or controlling unwanted discharges
DE69329239T 1992-12-30 1993-12-28 Gleichspannungsversorgung für plasmareaktor Expired - Lifetime DE69329239T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/998,513 US5427669A (en) 1992-12-30 1992-12-30 Thin film DC plasma processing system
PCT/US1993/012604 WO1994016458A1 (en) 1992-12-30 1993-12-28 Enhanced thin film dc plasma processing system

Publications (2)

Publication Number Publication Date
DE69329239D1 DE69329239D1 (de) 2000-09-21
DE69329239T2 true DE69329239T2 (de) 2001-01-25

Family

ID=25545314

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69329239T Expired - Lifetime DE69329239T2 (de) 1992-12-30 1993-12-28 Gleichspannungsversorgung für plasmareaktor
DE1001448T Pending DE1001448T1 (de) 1992-12-30 1993-12-28 Dünnfilm-Plasmabehandlungsvorrichtung

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE1001448T Pending DE1001448T1 (de) 1992-12-30 1993-12-28 Dünnfilm-Plasmabehandlungsvorrichtung

Country Status (5)

Country Link
US (1) US5427669A (de)
EP (2) EP1001448A3 (de)
JP (2) JP3485924B2 (de)
DE (2) DE69329239T2 (de)
WO (1) WO1994016458A1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009002684B4 (de) * 2009-04-28 2013-12-24 TRUMPF Hüttinger GmbH + Co. KG Verfahren zur Leistungsversorgung einer Plasmalast und Plasmaversorgungseinrichtung zu seiner Durchführung

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DE102009002684B4 (de) * 2009-04-28 2013-12-24 TRUMPF Hüttinger GmbH + Co. KG Verfahren zur Leistungsversorgung einer Plasmalast und Plasmaversorgungseinrichtung zu seiner Durchführung

Also Published As

Publication number Publication date
EP1001448A3 (de) 2008-01-09
EP1001448A2 (de) 2000-05-17
US5427669A (en) 1995-06-27
JPH07503577A (ja) 1995-04-13
WO1994016458A1 (en) 1994-07-21
JP3671177B2 (ja) 2005-07-13
EP0628212A1 (de) 1994-12-14
JP3485924B2 (ja) 2004-01-13
DE1001448T1 (de) 2000-10-05
DE69329239D1 (de) 2000-09-21
JP2004006230A (ja) 2004-01-08
EP0628212B1 (de) 2000-08-16

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