DE69331502T2 - Fotopolymerisierbare Bestandteile von strahlungsempfindlichen Zusammensetzungen - Google Patents

Fotopolymerisierbare Bestandteile von strahlungsempfindlichen Zusammensetzungen

Info

Publication number
DE69331502T2
DE69331502T2 DE69331502T DE69331502T DE69331502T2 DE 69331502 T2 DE69331502 T2 DE 69331502T2 DE 69331502 T DE69331502 T DE 69331502T DE 69331502 T DE69331502 T DE 69331502T DE 69331502 T2 DE69331502 T2 DE 69331502T2
Authority
DE
Germany
Prior art keywords
radiation sensitive
sensitive compositions
photopolymerizable components
photopolymerizable
components
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69331502T
Other languages
English (en)
Other versions
DE69331502D1 (de
Inventor
Michael John Pratt
Jianrong Ren
John Robert Wade
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa Gevaert NV
Original Assignee
Agfa Gevaert NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert NV filed Critical Agfa Gevaert NV
Application granted granted Critical
Publication of DE69331502D1 publication Critical patent/DE69331502D1/de
Publication of DE69331502T2 publication Critical patent/DE69331502T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
    • C07C271/06—Esters of carbamic acids
    • C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
    • C07C271/24—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a ring other than a six-membered aromatic ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
    • C07C271/06—Esters of carbamic acids
    • C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
    • C07C271/26—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring
    • C07C271/28—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring to a carbon atom of a non-condensed six-membered aromatic ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/30—Low-molecular-weight compounds
    • C08G18/32—Polyhydroxy compounds; Polyamines; Hydroxyamines
    • C08G18/3271—Hydroxyamines
    • C08G18/329—Hydroxyamines containing aromatic groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/81—Unsaturated isocyanates or isothiocyanates
    • C08G18/8141—Unsaturated isocyanates or isothiocyanates masked
    • C08G18/815—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen
    • C08G18/8158—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group
    • Y10S522/905—Benzophenone group
DE69331502T 1992-01-21 1993-01-21 Fotopolymerisierbare Bestandteile von strahlungsempfindlichen Zusammensetzungen Expired - Fee Related DE69331502T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB9201269A GB2263909B (en) 1992-01-21 1992-01-21 Improvements in or relating to photopolymerisable components of radiation sensitive compositions

Publications (2)

Publication Number Publication Date
DE69331502D1 DE69331502D1 (de) 2002-03-14
DE69331502T2 true DE69331502T2 (de) 2002-08-22

Family

ID=10708983

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69331502T Expired - Fee Related DE69331502T2 (de) 1992-01-21 1993-01-21 Fotopolymerisierbare Bestandteile von strahlungsempfindlichen Zusammensetzungen

Country Status (6)

Country Link
US (1) US5710193A (de)
EP (1) EP0554005B1 (de)
JP (1) JP3391832B2 (de)
CA (1) CA2087635A1 (de)
DE (1) DE69331502T2 (de)
GB (2) GB2263909B (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2280905A (en) * 1993-08-06 1995-02-15 Coates Brothers Plc Ethylenically unsaturated photoinitiator
US5436112A (en) * 1994-04-01 1995-07-25 Hoechst Celanese Corporation Method for producing a negative image with color proofing element containing a urethane monomer
JP2001290267A (ja) * 2000-02-01 2001-10-19 Mitsubishi Chemicals Corp 光重合性組成物、感光性平版印刷版及び印刷版の製版方法
JP2003122002A (ja) * 2001-10-18 2003-04-25 Mitsubishi Chemicals Corp 光重合性組成物、感光性平版印刷版及び印刷版の製版方法
JP2007114604A (ja) * 2005-10-21 2007-05-10 Fujifilm Electronic Materials Co Ltd 感光性組成物及びカラーフィルタ
JP5218127B2 (ja) * 2008-03-26 2013-06-26 Ｊｓｒ株式会社 硬化性組成物、硬化膜及び積層体
GB2476275A (en) 2009-12-17 2011-06-22 Dublin Inst Of Technology Photosensitive holographic recording medium comprising glycerol
JP5867654B2 (ja) * 2013-11-29 2016-02-24 Dic株式会社 重合性化合物、組成物、重合体、光学異方体、液晶表示素子及び有機ｅｌ素子
EP3242898A4 (de) * 2015-01-05 2018-10-24 IGM Group B.V. Led-härtbare migrationsarme photoinitiatoren
CN116768742A (zh) * 2022-03-07 2023-09-19 艾坚蒙(安庆)科技发展有限公司 一种二苯甲酮衍生物、制备方法及其用途
CN115558069B (zh) * 2022-09-26 2023-08-29 上海交通大学 一种pH敏感聚氨酯材料及其在构建二维表面图案及力致结构色信息储存中的应用

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2718516A (en) * 1952-11-08 1955-09-20 Rohm & Haas Isocyanato esters of acrylic, methacrylic, and crotonic acids
US2821544A (en) * 1954-04-26 1958-01-28 Bayer Ag Production of alkylisocyanate esters of 2-alkenoic acids
US2882259A (en) * 1955-12-27 1959-04-14 Rohm & Haas Segmented polymers having a linear polymeric backbone with linear polymer branches attached thereto through ureido groups and process for preparing the same
NL137857C (de) * 1963-08-31
JPS4857620A (de) * 1971-11-19 1973-08-13
GB1432202A (en) * 1972-05-05 1976-04-14 Grace W R & Co Derivatives of a styrene/thylenically unsaturated alcohol copolymer
US3825479A (en) * 1972-08-21 1974-07-23 Sun Chemical Corp Radiation curable printing ink compositions comprising an isocyanate-modified polyfunctional ester and a photoiniator
US3759809A (en) * 1972-11-14 1973-09-18 Sun Chemical Corp Radiation curable compositions comprising an isocyanate modified polyfunctional ester and a photoinitiator
DE2631030A1 (de) * 1976-07-09 1978-01-12 Bayer Ag Kationische farbstoffe
CH629520A5 (de) * 1977-08-12 1982-04-30 Sandoz Ag Verfahren zur herstellung von azofarbstoffen.
US4192762A (en) * 1978-04-20 1980-03-11 Union Carbide Corporation Radiation curable urethane compositions
FR2442257A1 (fr) * 1978-11-21 1980-06-20 Ugine Kuhlmann Composes structurellement colores reticulables, leur preparation et leur utilisation dans des compositions pour revetements
US4316949A (en) * 1979-12-14 1982-02-23 Minnesota Mining And Manufacturing Company Photoreactive oligomer composition and printing plate
BR8101674A (pt) * 1980-03-25 1981-09-29 Goodrich Co B F Processo para a preparacao de polimeros liquidos reativos terminados em vinila e polimero reativo terminado em vinila
US4358476A (en) * 1981-06-24 1982-11-09 Lord Corporation Radiation-curable compositions containing water
JPS5863760A (ja) * 1981-10-09 1983-04-15 Nippon Paint Co Ltd 光硬化性被覆組成物
US4722947A (en) * 1985-08-05 1988-02-02 Pony Industries, Inc. Production of radiation curable partial esters of anhydride-containing copolymers
US4665146A (en) * 1986-05-22 1987-05-12 Desoto, Inc. Amine-functional monoethylenic monomers, acrylic copolymers and aqueous coating compositions containing the same
DE3703130A1 (de) * 1986-07-25 1988-01-28 Bayer Ag Urethangruppen enthaltende (meth)-acrylsaeurederivate
GB8622266D0 (en) * 1986-09-16 1986-10-22 Vickers Plc Printing plate precursors
DE3710279A1 (de) * 1987-03-28 1988-10-06 Hoechst Ag Polymerisierbare verbindungen und diese enthaltendes durch strahlung polymerisierbares gemisch
GB8719730D0 (en) * 1987-08-20 1987-09-30 Vickers Plc Radiation sensitive compounds

Also Published As

Publication number Publication date
EP0554005B1 (de) 2002-01-30
GB9201269D0 (en) 1992-03-11
GB2263909A (en) 1993-08-11
JP3391832B2 (ja) 2003-03-31
GB9601268D0 (en) 1996-03-27
GB2298209B (en) 1996-11-06
GB2263909B (en) 1996-09-11
DE69331502D1 (de) 2002-03-14
JPH0693193A (ja) 1994-04-05
GB2298209A (en) 1996-08-28
US5710193A (en) 1998-01-20
EP0554005A1 (de) 1993-08-04
CA2087635A1 (en) 1993-07-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee