DE69334253D1 - Halbleitervorrichtung - Google Patents
HalbleitervorrichtungInfo
- Publication number
- DE69334253D1 DE69334253D1 DE69334253T DE69334253T DE69334253D1 DE 69334253 D1 DE69334253 D1 DE 69334253D1 DE 69334253 T DE69334253 T DE 69334253T DE 69334253 T DE69334253 T DE 69334253T DE 69334253 D1 DE69334253 D1 DE 69334253D1
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor device
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1345—Conductors connecting electrodes to cell terminals
- G02F1/13454—Drivers integrated on the active matrix substrate
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06E—OPTICAL COMPUTING DEVICES; COMPUTING DEVICES USING OTHER RADIATIONS WITH SIMILAR PROPERTIES
- G06E3/00—Devices not provided for in group G06E1/00, e.g. for processing analogue or hybrid data
- G06E3/001—Analogue devices in which mathematical operations are carried out with the aid of optical or electro-optical elements
- G06E3/003—Analogue devices in which mathematical operations are carried out with the aid of optical or electro-optical elements forming integrals of products, e.g. Fourier integrals, Laplace integrals, correlation integrals; for analysis or synthesis of functions using orthogonal functions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
- H01L21/2003—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy characterised by the substrate
- H01L21/2007—Bonding of semiconductor wafers to insulating substrates or to semiconducting substrates using an intermediate insulating layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1203—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body the substrate comprising an insulating body on a semiconductor body, e.g. SOI
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2202/00—Materials and properties
- G02F2202/10—Materials and properties semiconductor
- G02F2202/105—Materials and properties semiconductor single crystal Si
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/05001—Internal layers
- H01L2224/0501—Shape
- H01L2224/05016—Shape in side view
- H01L2224/05017—Shape in side view comprising protrusions or indentations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/0555—Shape
- H01L2224/05556—Shape in side view
- H01L2224/05559—Shape in side view non conformal layer on a patterned surface
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12202492A JP2821830B2 (ja) | 1992-05-14 | 1992-05-14 | 半導体薄膜素子その応用装置および半導体薄膜素子の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE69334253D1 true DE69334253D1 (de) | 2009-02-12 |
Family
ID=14825703
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69334253T Expired - Lifetime DE69334253D1 (de) | 1992-05-14 | 1993-05-13 | Halbleitervorrichtung |
Country Status (4)
Country | Link |
---|---|
US (1) | US5646432A (de) |
EP (1) | EP0570224B1 (de) |
JP (1) | JP2821830B2 (de) |
DE (1) | DE69334253D1 (de) |
Families Citing this family (103)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5206749A (en) | 1990-12-31 | 1993-04-27 | Kopin Corporation | Liquid crystal display having essentially single crystal transistors pixels and driving circuits |
US5528397A (en) * | 1991-12-03 | 1996-06-18 | Kopin Corporation | Single crystal silicon transistors for display panels |
US5475514A (en) | 1990-12-31 | 1995-12-12 | Kopin Corporation | Transferred single crystal arrayed devices including a light shield for projection displays |
US7310072B2 (en) | 1993-10-22 | 2007-12-18 | Kopin Corporation | Portable communication display device |
US20010054989A1 (en) * | 1993-10-22 | 2001-12-27 | Matthew Zavracky | Color sequential display panels |
EP0746875B1 (de) * | 1994-12-23 | 2002-03-06 | Koninklijke Philips Electronics N.V. | Verfahren zur herstellung von halbleiterbauteilen mit halbleiterelementen, die in einer halbleiterschicht gebildet wurden, welche auf einen trägerwafer geklebt sind |
JP2900229B2 (ja) * | 1994-12-27 | 1999-06-02 | 株式会社半導体エネルギー研究所 | 半導体装置およびその作製方法および電気光学装置 |
JP3364081B2 (ja) * | 1995-02-16 | 2003-01-08 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
US5757456A (en) * | 1995-03-10 | 1998-05-26 | Semiconductor Energy Laboratory Co., Ltd. | Display device and method of fabricating involving peeling circuits from one substrate and mounting on other |
US5834327A (en) * | 1995-03-18 | 1998-11-10 | Semiconductor Energy Laboratory Co., Ltd. | Method for producing display device |
DE69622339T2 (de) * | 1995-05-10 | 2003-03-06 | Koninkl Philips Electronics Nv | Verfahren zum herstellen einer einrichtung, bei der ein substrat mit halbleiterelement und leiterbahnen auf ein trägersubstrat mit metallisierung aufgeklebt wird |
JP3315834B2 (ja) * | 1995-05-31 | 2002-08-19 | 富士通株式会社 | 薄膜トランジスタマトリクス装置及びその製造方法 |
EP0826238B1 (de) * | 1996-03-12 | 2001-10-04 | Koninklijke Philips Electronics N.V. | Halbleiterkörper mit einem substrat auf einen trägerkörper geklebt |
US6027958A (en) * | 1996-07-11 | 2000-02-22 | Kopin Corporation | Transferred flexible integrated circuit |
JP2910696B2 (ja) * | 1996-09-20 | 1999-06-23 | 日本電気株式会社 | 半導体光検出器 |
US6486862B1 (en) * | 1996-10-31 | 2002-11-26 | Kopin Corporation | Card reader display system |
US6677936B2 (en) | 1996-10-31 | 2004-01-13 | Kopin Corporation | Color display system for a camera |
KR100232679B1 (ko) * | 1996-11-27 | 1999-12-01 | 구본준 | 액정표시장치의 제조방법 및 그 구조 |
EP0886306A1 (de) * | 1997-06-16 | 1998-12-23 | IMEC vzw | Verfahren zum Verbinden von Substraten bei niedriger Temperatur |
US6552704B2 (en) | 1997-10-31 | 2003-04-22 | Kopin Corporation | Color display with thin gap liquid crystal |
US6476784B2 (en) | 1997-10-31 | 2002-11-05 | Kopin Corporation | Portable display system with memory card reader |
US6909419B2 (en) * | 1997-10-31 | 2005-06-21 | Kopin Corporation | Portable microdisplay system |
JP2002504675A (ja) * | 1998-02-18 | 2002-02-12 | ハネウエル・データ インスツルメンツ インコーポレイテッド | 電気絶縁された歪測定器 |
EP0985228A1 (de) | 1998-03-02 | 2000-03-15 | Koninklijke Philips Electronics N.V. | Halbleiterbauelement mit stützkörper aus glas, auf dem ein substrat mit halbleiterelementen und einer metallisierung mit hilfe eines adhäsiven mittels aufgebracht ist |
US6159385A (en) * | 1998-05-08 | 2000-12-12 | Rockwell Technologies, Llc | Process for manufacture of micro electromechanical devices having high electrical isolation |
DE19838430C2 (de) * | 1998-08-24 | 2002-02-28 | Fraunhofer Ges Forschung | Verfahren zur Herstellung eines Arrays von Photodetektoren |
DE19838373C2 (de) * | 1998-08-24 | 2002-01-31 | Fraunhofer Ges Forschung | Verfahren zur Herstellung eines Arrays von Dünnfilmphotodioden |
DE19838442C1 (de) * | 1998-08-24 | 2000-03-02 | Fraunhofer Ges Forschung | Verfahren zur Herstellung von Photodetektoren |
US6521947B1 (en) | 1999-01-28 | 2003-02-18 | International Business Machines Corporation | Method of integrating substrate contact on SOI wafers with STI process |
US6265243B1 (en) * | 1999-03-29 | 2001-07-24 | Lucent Technologies Inc. | Process for fabricating organic circuits |
JP2001056403A (ja) | 1999-06-10 | 2001-02-27 | Canon Inc | ロッドレンズアレイ及びそれを用いた画像形成装置 |
KR100654473B1 (ko) | 1999-06-29 | 2006-12-05 | 코닌클리즈케 필립스 일렉트로닉스 엔.브이. | 반도체 디바이스 |
US6803755B2 (en) | 1999-09-21 | 2004-10-12 | Rockwell Automation Technologies, Inc. | Microelectromechanical system (MEMS) with improved beam suspension |
US6798312B1 (en) | 1999-09-21 | 2004-09-28 | Rockwell Automation Technologies, Inc. | Microelectromechanical system (MEMS) analog electrical isolator |
US6477685B1 (en) * | 1999-09-22 | 2002-11-05 | Texas Instruments Incorporated | Method and apparatus for yield and failure analysis in the manufacturing of semiconductors |
TW495854B (en) * | 2000-03-06 | 2002-07-21 | Semiconductor Energy Lab | Semiconductor device and manufacturing method thereof |
JP2001267592A (ja) | 2000-03-14 | 2001-09-28 | Nikon Corp | 半導体装置の製造方法、背面入射型受光装置の製造方法、半導体装置、及び背面入射型受光装置 |
JP2001267578A (ja) * | 2000-03-17 | 2001-09-28 | Sony Corp | 薄膜半導体装置及びその製造方法 |
US6794271B2 (en) * | 2001-09-28 | 2004-09-21 | Rockwell Automation Technologies, Inc. | Method for fabricating a microelectromechanical system (MEMS) device using a pre-patterned bridge |
US6761829B2 (en) | 2001-04-26 | 2004-07-13 | Rockwell Automation Technologies, Inc. | Method for fabricating an isolated microelectromechanical system (MEMS) device using an internal void |
US6815243B2 (en) | 2001-04-26 | 2004-11-09 | Rockwell Automation Technologies, Inc. | Method of fabricating a microelectromechanical system (MEMS) device using a pre-patterned substrate |
US6756310B2 (en) | 2001-09-26 | 2004-06-29 | Rockwell Automation Technologies, Inc. | Method for constructing an isolate microelectromechanical system (MEMS) device using surface fabrication techniques |
US6768628B2 (en) | 2001-04-26 | 2004-07-27 | Rockwell Automation Technologies, Inc. | Method for fabricating an isolated microelectromechanical system (MEMS) device incorporating a wafer level cap |
JP2002368224A (ja) * | 2001-06-04 | 2002-12-20 | Sony Corp | 機能性デバイスおよびその製造方法 |
US6664786B2 (en) | 2001-07-30 | 2003-12-16 | Rockwell Automation Technologies, Inc. | Magnetic field sensor using microelectromechanical system |
TW554398B (en) * | 2001-08-10 | 2003-09-21 | Semiconductor Energy Lab | Method of peeling off and method of manufacturing semiconductor device |
US6690178B2 (en) | 2001-10-26 | 2004-02-10 | Rockwell Automation Technologies, Inc. | On-board microelectromechanical system (MEMS) sensing device for power semiconductors |
KR20050043754A (ko) | 2001-11-05 | 2005-05-11 | 미츠마사 코야나기 | 고체 영상센서 및 그 제조방법 |
JP4472340B2 (ja) | 2001-11-05 | 2010-06-02 | 株式会社ザイキューブ | 低誘電率材料膜を用いた半導体装置およびその製造方法 |
US6835974B2 (en) * | 2002-03-14 | 2004-12-28 | Jeng-Jye Shau | Three dimensional integrated circuits using sub-micron thin-film diodes |
US6975193B2 (en) * | 2003-03-25 | 2005-12-13 | Rockwell Automation Technologies, Inc. | Microelectromechanical isolating circuit |
JP4130158B2 (ja) | 2003-06-09 | 2008-08-06 | 三洋電機株式会社 | 半導体装置の製造方法、半導体装置 |
JP4389626B2 (ja) | 2004-03-29 | 2009-12-24 | ソニー株式会社 | 固体撮像素子の製造方法 |
US20070065964A1 (en) * | 2005-09-22 | 2007-03-22 | Yinon Degani | Integrated passive devices |
JP2008112848A (ja) * | 2006-10-30 | 2008-05-15 | Shin Etsu Chem Co Ltd | 単結晶シリコン太陽電池の製造方法及び単結晶シリコン太陽電池 |
JP2008112847A (ja) * | 2006-10-30 | 2008-05-15 | Shin Etsu Chem Co Ltd | 単結晶シリコン太陽電池の製造方法及び単結晶シリコン太陽電池 |
JP2008112843A (ja) * | 2006-10-30 | 2008-05-15 | Shin Etsu Chem Co Ltd | 単結晶シリコン太陽電池の製造方法及び単結晶シリコン太陽電池 |
JP2008112840A (ja) | 2006-10-30 | 2008-05-15 | Shin Etsu Chem Co Ltd | 単結晶シリコン太陽電池の製造方法及び単結晶シリコン太陽電池 |
JP5090716B2 (ja) * | 2006-11-24 | 2012-12-05 | 信越化学工業株式会社 | 単結晶シリコン太陽電池の製造方法 |
JP5166745B2 (ja) * | 2007-03-07 | 2013-03-21 | 信越化学工業株式会社 | 単結晶シリコン太陽電池の製造方法 |
JP5048380B2 (ja) * | 2007-04-09 | 2012-10-17 | 信越化学工業株式会社 | 単結晶シリコン太陽電池の製造方法 |
JP2008113018A (ja) * | 2007-12-03 | 2008-05-15 | Sony Corp | 固体撮像素子とその製造方法、及び半導体集積回路装置とその製造方法 |
JP4769926B2 (ja) * | 2008-01-23 | 2011-09-07 | オンセミコンダクター・トレーディング・リミテッド | 半導体装置及びその製造方法 |
US8614495B2 (en) * | 2010-04-23 | 2013-12-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Back side defect reduction for back side illuminated image sensor |
US9583414B2 (en) | 2013-10-31 | 2017-02-28 | Qorvo Us, Inc. | Silicon-on-plastic semiconductor device and method of making the same |
US9812350B2 (en) | 2013-03-06 | 2017-11-07 | Qorvo Us, Inc. | Method of manufacture for a silicon-on-plastic semiconductor device with interfacial adhesion layer |
TWI582847B (zh) | 2014-09-12 | 2017-05-11 | Rf微型儀器公司 | 包含具有聚合物基板之半導體裝置的印刷電路模組及其製造方法 |
US10085352B2 (en) | 2014-10-01 | 2018-09-25 | Qorvo Us, Inc. | Method for manufacturing an integrated circuit package |
US9530709B2 (en) | 2014-11-03 | 2016-12-27 | Qorvo Us, Inc. | Methods of manufacturing a printed circuit module having a semiconductor device with a protective layer in place of a low-resistivity handle layer |
US9613831B2 (en) | 2015-03-25 | 2017-04-04 | Qorvo Us, Inc. | Encapsulated dies with enhanced thermal performance |
US9960145B2 (en) | 2015-03-25 | 2018-05-01 | Qorvo Us, Inc. | Flip chip module with enhanced properties |
US20160343604A1 (en) | 2015-05-22 | 2016-11-24 | Rf Micro Devices, Inc. | Substrate structure with embedded layer for post-processing silicon handle elimination |
US10276495B2 (en) | 2015-09-11 | 2019-04-30 | Qorvo Us, Inc. | Backside semiconductor die trimming |
US10020405B2 (en) | 2016-01-19 | 2018-07-10 | Qorvo Us, Inc. | Microelectronics package with integrated sensors |
US10090262B2 (en) | 2016-05-09 | 2018-10-02 | Qorvo Us, Inc. | Microelectronics package with inductive element and magnetically enhanced mold compound component |
US10773952B2 (en) | 2016-05-20 | 2020-09-15 | Qorvo Us, Inc. | Wafer-level package with enhanced performance |
US10784149B2 (en) | 2016-05-20 | 2020-09-22 | Qorvo Us, Inc. | Air-cavity module with enhanced device isolation |
US10468329B2 (en) | 2016-07-18 | 2019-11-05 | Qorvo Us, Inc. | Thermally enhanced semiconductor package having field effect transistors with back-gate feature |
US10103080B2 (en) | 2016-06-10 | 2018-10-16 | Qorvo Us, Inc. | Thermally enhanced semiconductor package with thermal additive and process for making the same |
CN109844937B (zh) | 2016-08-12 | 2023-06-27 | Qorvo美国公司 | 具有增强性能的晶片级封装 |
EP3497717A1 (de) | 2016-08-12 | 2019-06-19 | Qorvo Us, Inc. | Verpackung auf waferebene mit verbesserter leistung |
WO2018031999A1 (en) | 2016-08-12 | 2018-02-15 | Qorvo Us, Inc. | Wafer-level package with enhanced performance |
US10109502B2 (en) | 2016-09-12 | 2018-10-23 | Qorvo Us, Inc. | Semiconductor package with reduced parasitic coupling effects and process for making the same |
US10090339B2 (en) | 2016-10-21 | 2018-10-02 | Qorvo Us, Inc. | Radio frequency (RF) switch |
US10749518B2 (en) | 2016-11-18 | 2020-08-18 | Qorvo Us, Inc. | Stacked field-effect transistor switch |
US10068831B2 (en) | 2016-12-09 | 2018-09-04 | Qorvo Us, Inc. | Thermally enhanced semiconductor package and process for making the same |
DE102017205268A1 (de) * | 2017-03-29 | 2018-10-04 | Robert Bosch Gmbh | Verfahren zum Fertigen einer Kristallkörpereinheit für eine Sensorvorrichtung, Verfahren zum Herstellen einer Sensorvorrichtung, System und Verfahren zum Erfassen einer Messgröße sowie Sensorvorrichtung |
US11569192B2 (en) | 2017-05-25 | 2023-01-31 | Shinkawa Ltd. | Method for producing structure, and structure |
US10755992B2 (en) | 2017-07-06 | 2020-08-25 | Qorvo Us, Inc. | Wafer-level packaging for enhanced performance |
US10784233B2 (en) | 2017-09-05 | 2020-09-22 | Qorvo Us, Inc. | Microelectronics package with self-aligned stacked-die assembly |
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US10804246B2 (en) | 2018-06-11 | 2020-10-13 | Qorvo Us, Inc. | Microelectronics package with vertically stacked dies |
US11069590B2 (en) | 2018-10-10 | 2021-07-20 | Qorvo Us, Inc. | Wafer-level fan-out package with enhanced performance |
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US11646242B2 (en) | 2018-11-29 | 2023-05-09 | Qorvo Us, Inc. | Thermally enhanced semiconductor package with at least one heat extractor and process for making the same |
JP2020112603A (ja) * | 2019-01-08 | 2020-07-27 | 信越化学工業株式会社 | マイクロディスプレイ基板の製造方法 |
US11387157B2 (en) | 2019-01-23 | 2022-07-12 | Qorvo Us, Inc. | RF devices with enhanced performance and methods of forming the same |
US11705428B2 (en) | 2019-01-23 | 2023-07-18 | Qorvo Us, Inc. | RF devices with enhanced performance and methods of forming the same |
US20200235040A1 (en) | 2019-01-23 | 2020-07-23 | Qorvo Us, Inc. | Rf devices with enhanced performance and methods of forming the same |
KR20210129656A (ko) | 2019-01-23 | 2021-10-28 | 코르보 유에스, 인크. | Rf 반도체 디바이스 및 이를 형성하는 방법 |
US11646289B2 (en) | 2019-12-02 | 2023-05-09 | Qorvo Us, Inc. | RF devices with enhanced performance and methods of forming the same |
US11923238B2 (en) | 2019-12-12 | 2024-03-05 | Qorvo Us, Inc. | Method of forming RF devices with enhanced performance including attaching a wafer to a support carrier by a bonding technique without any polymer adhesive |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6173345A (ja) * | 1984-09-19 | 1986-04-15 | Toshiba Corp | 半導体装置 |
US4806504A (en) * | 1986-09-11 | 1989-02-21 | Fairchild Semiconductor Corporation | Planarization method |
US4890156A (en) * | 1987-03-13 | 1989-12-26 | Motorola Inc. | Multichip IC module having coplanar dice and substrate |
US4875086A (en) * | 1987-05-22 | 1989-10-17 | Texas Instruments Incorporated | Silicon-on-insulator integrated circuits and method |
US5173753A (en) * | 1989-08-10 | 1992-12-22 | Industrial Technology Research Institute | Inverted coplanar amorphous silicon thin film transistor which provides small contact capacitance and resistance |
JPH0824193B2 (ja) * | 1990-10-16 | 1996-03-06 | 工業技術院長 | 平板型光弁駆動用半導体装置の製造方法 |
US5347154A (en) * | 1990-11-15 | 1994-09-13 | Seiko Instruments Inc. | Light valve device using semiconductive composite substrate |
US5206749A (en) * | 1990-12-31 | 1993-04-27 | Kopin Corporation | Liquid crystal display having essentially single crystal transistors pixels and driving circuits |
US5091330A (en) * | 1990-12-28 | 1992-02-25 | Motorola, Inc. | Method of fabricating a dielectric isolated area |
US5334859A (en) * | 1991-09-05 | 1994-08-02 | Casio Computer Co., Ltd. | Thin-film transistor having source and drain electrodes insulated by an anodically oxidized film |
-
1992
- 1992-05-14 JP JP12202492A patent/JP2821830B2/ja not_active Expired - Lifetime
-
1993
- 1993-05-05 US US08/057,987 patent/US5646432A/en not_active Expired - Lifetime
- 1993-05-13 DE DE69334253T patent/DE69334253D1/de not_active Expired - Lifetime
- 1993-05-13 EP EP93303709A patent/EP0570224B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP2821830B2 (ja) | 1998-11-05 |
JPH05313201A (ja) | 1993-11-26 |
US5646432A (en) | 1997-07-08 |
EP0570224A3 (de) | 1998-03-11 |
EP0570224A2 (de) | 1993-11-18 |
EP0570224B1 (de) | 2008-12-31 |
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