DE69408388D1 - Verfahren zur Trennung eines Silans mit Hilfe einer Membran - Google Patents
Verfahren zur Trennung eines Silans mit Hilfe einer MembranInfo
- Publication number
- DE69408388D1 DE69408388D1 DE69408388T DE69408388T DE69408388D1 DE 69408388 D1 DE69408388 D1 DE 69408388D1 DE 69408388 T DE69408388 T DE 69408388T DE 69408388 T DE69408388 T DE 69408388T DE 69408388 D1 DE69408388 D1 DE 69408388D1
- Authority
- DE
- Germany
- Prior art keywords
- silane
- membrane
- separating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B6/00—Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
- C01B6/34—Purification; Stabilisation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
- C01B33/046—Purification
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02373—Group 14 semiconducting materials
- H01L21/02381—Silicon, silicon germanium, germanium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02524—Group 14 semiconducting materials
- H01L21/02532—Silicon, silicon germanium, germanium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02538—Group 13/15 materials
- H01L21/02546—Arsenides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9311083A FR2710044B1 (fr) | 1993-09-17 | 1993-09-17 | Procédé de séparation d'un hydrure gazeux ou d'un mélange d'hydrures gazeux à l'aide d'une membrane. |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69408388D1 true DE69408388D1 (de) | 1998-03-12 |
DE69408388T2 DE69408388T2 (de) | 1998-07-02 |
Family
ID=9450960
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69401631T Expired - Fee Related DE69401631T2 (de) | 1993-09-17 | 1994-09-09 | Verfahren zur Trennung eines gasförmigen Hydrids oder einer Mischung von gasförmigen Hydriden mit Hilfe einer Membran |
DE69408388T Expired - Fee Related DE69408388T2 (de) | 1993-09-17 | 1994-09-09 | Verfahren zur Trennung eines Silans mit Hilfe einer Membran |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69401631T Expired - Fee Related DE69401631T2 (de) | 1993-09-17 | 1994-09-09 | Verfahren zur Trennung eines gasförmigen Hydrids oder einer Mischung von gasförmigen Hydriden mit Hilfe einer Membran |
Country Status (6)
Country | Link |
---|---|
US (1) | US5503657A (de) |
EP (2) | EP0644153B1 (de) |
JP (1) | JPH07171330A (de) |
DE (2) | DE69401631T2 (de) |
FR (1) | FR2710044B1 (de) |
TW (1) | TW350787B (de) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2743554B1 (fr) * | 1996-01-15 | 1998-02-27 | Air Liquide | Procede et installation pour la production en continu de disilane |
JPH10203803A (ja) * | 1997-01-20 | 1998-08-04 | Ngk Insulators Ltd | 水素ガスの回収・精製・貯蔵装置 |
US5855647A (en) * | 1997-05-15 | 1999-01-05 | American Air Liquide, Inc. | Process for recovering SF6 from a gas |
US6174349B1 (en) | 1999-04-06 | 2001-01-16 | Seh America, Inc. | Continuous effluent gas scrubber system and method |
US6365108B1 (en) * | 1999-10-12 | 2002-04-02 | Caterpillar Inc. | Siloxane filter for O2 sensor for bio-gas engine |
JP4769350B2 (ja) * | 2000-09-22 | 2011-09-07 | 大陽日酸株式会社 | 希ガスの回収方法及び装置 |
JP4828038B2 (ja) * | 2001-04-10 | 2011-11-30 | 日本化学工業株式会社 | 高濃度ホスフィンガスの製造方法 |
DE10164385C1 (de) | 2001-12-28 | 2003-03-06 | Kettenbach Gmbh & Co Kg | Vorrichtung zum Vermischen zweier pastöser Massen, insbesondere zum Vermischen einer Dental-Abformmasse mit einer Katalysatormasse |
WO2006119252A2 (en) * | 2005-04-29 | 2006-11-09 | University Of Rochester | Ultrathin nanoscale membranes, methods of making, and uses thereof |
JP2008540070A (ja) | 2005-04-29 | 2008-11-20 | ユニバーシティー オブ ロチェスター | 超薄多孔質ナノスケール膜、その製造方法および使用 |
US7365220B2 (en) * | 2005-09-29 | 2008-04-29 | Momentive Performance Materials Inc. | Process for the recovery of alkoxysilanes obtained from the direct reaction of silicon with alkanols |
WO2007106868A2 (en) * | 2006-03-14 | 2007-09-20 | University Of Rochester | Cell culture devices having ultrathin porous membrane and uses thereof |
JP5516951B2 (ja) | 2007-10-12 | 2014-06-11 | 大陽日酸株式会社 | ガス精製方法 |
FR2933714B1 (fr) * | 2008-07-11 | 2011-05-06 | Air Liquide | Procede de recyclage de silane (sih4) |
DE102008043422B3 (de) * | 2008-11-03 | 2010-01-07 | Evonik Degussa Gmbh | Verfahren zur Aufreinigung niedermolekularer Hydridosilane |
EP2239353A1 (de) | 2009-04-07 | 2010-10-13 | L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Ablagerung photovoltaischer Zellen mit minimiertem Gasaufwand |
US8187361B2 (en) * | 2009-07-02 | 2012-05-29 | America Air Liquide, Inc. | Effluent gas recovery system in polysilicon and silane plants |
EP2599537A4 (de) * | 2010-07-30 | 2014-09-17 | Jx Nippon Oil & Energy Corp | Abgasverarbeitungssystem |
US8361199B2 (en) * | 2011-05-27 | 2013-01-29 | Air Liquide Electronics U.S. Lp | Purification of H2Se |
US10077197B2 (en) * | 2015-05-20 | 2018-09-18 | The United States Of America As Represented By The Secretary Of The Army | High concentration bleach generator apparatus, system and method of use |
JP2017104832A (ja) * | 2015-12-11 | 2017-06-15 | 三菱重工環境・化学エンジニアリング株式会社 | 膜分離装置 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3455817A (en) * | 1968-07-31 | 1969-07-15 | Abcor Inc | Method of and apparatus for the recovery of fractions from chromatographic fractions |
FR2193634A1 (en) * | 1972-07-20 | 1974-02-22 | Du Pont | Polyimide semi-permeable membranes |
US4178224A (en) * | 1978-01-19 | 1979-12-11 | Texas Instruments Incorporated | Apparatus for generation and control of dopant and reactive gases |
DE3121125C2 (de) * | 1981-05-27 | 1986-04-10 | Kernforschungsanlage Jülich GmbH, 5170 Jülich | Verfahren zum Abtrennen von Wasserstoff und/oder Deuterium und Tritium aus einem Inertgasstrom sowie Vorrichtung zur Durchführung des Verfahrens im Kühlgaskreislauf eines gasgekühlten Kernreaktors |
US4424067A (en) * | 1982-07-29 | 1984-01-03 | Allied Corporation | Purification of anhydrous hydrogen fluoride |
JPS6022902A (ja) * | 1983-07-15 | 1985-02-05 | Mitsubishi Chem Ind Ltd | 分離膜 |
JPS6071040A (ja) * | 1983-09-27 | 1985-04-22 | Takeda Chem Ind Ltd | 有害ガス吸着剤 |
EP0239190A2 (de) * | 1986-01-23 | 1987-09-30 | Sensidyne Inc. | Verfahren und elektrochemische Zelle zum Nachweis von Hydriden und Hydriddämpfen |
US4717394A (en) * | 1986-10-27 | 1988-01-05 | E. I. Du Pont De Nemours And Company | Polyimide gas separation membranes |
ATE73118T1 (de) * | 1987-09-24 | 1992-03-15 | Fina Research | Verfahren zur entfernung von arsin aus leichte olefine enthaltenden kohlenwasserstoffbeschickungen. |
FR2625690B1 (fr) * | 1988-01-11 | 1993-04-23 | Inst Francais Du Petrole | Procede de separation des constituants d'un melange en phase gazeuse au moyen d'une membrane composite |
US4869732A (en) * | 1988-12-23 | 1989-09-26 | Texaco Inc. | Deoxygenation of aqueous polymer solutions used in enhanced oil recovery processes |
US4957513A (en) * | 1989-05-10 | 1990-09-18 | Raytheon Company | Method of purifying a mixed H2 /H2 Se vapor stream |
US4941893B1 (en) * | 1989-09-19 | 1996-07-30 | Advanced Silicon Materials Inc | Gas separation by semi-permeable membranes |
FR2652346B1 (fr) * | 1989-09-22 | 1991-11-29 | Air Liquide | Procede de preparation de disilane. |
US5076817A (en) * | 1990-11-30 | 1991-12-31 | E. I. Du Pont De Nemours And Company | Polyamide gas separation membranes and process of using same |
US5226932A (en) * | 1991-10-07 | 1993-07-13 | Praxair Technology, Inc. | Enhanced meambrane gas separations |
-
1993
- 1993-09-17 FR FR9311083A patent/FR2710044B1/fr not_active Expired - Fee Related
-
1994
- 1994-09-09 EP EP94402014A patent/EP0644153B1/de not_active Expired - Lifetime
- 1994-09-09 EP EP94402015A patent/EP0645345B1/de not_active Expired - Lifetime
- 1994-09-09 DE DE69401631T patent/DE69401631T2/de not_active Expired - Fee Related
- 1994-09-09 TW TW083108319A patent/TW350787B/zh active
- 1994-09-09 DE DE69408388T patent/DE69408388T2/de not_active Expired - Fee Related
- 1994-09-14 US US08/305,725 patent/US5503657A/en not_active Expired - Fee Related
- 1994-09-16 JP JP6221908A patent/JPH07171330A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
DE69401631T2 (de) | 1997-05-28 |
EP0645345B1 (de) | 1997-01-29 |
EP0644153B1 (de) | 1998-02-04 |
EP0645345A1 (de) | 1995-03-29 |
DE69408388T2 (de) | 1998-07-02 |
FR2710044B1 (fr) | 1995-10-13 |
TW350787B (en) | 1999-01-21 |
EP0644153A1 (de) | 1995-03-22 |
US5503657A (en) | 1996-04-02 |
DE69401631D1 (de) | 1997-03-13 |
JPH07171330A (ja) | 1995-07-11 |
FR2710044A1 (fr) | 1995-03-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |