DE69425316D1 - Verfahren zur Bestimmung der Rekombinationslebendauer von Minoritäts-Ladungsträgern einer Probe aus Halbleitermaterial - Google Patents

Verfahren zur Bestimmung der Rekombinationslebendauer von Minoritäts-Ladungsträgern einer Probe aus Halbleitermaterial

Info

Publication number
DE69425316D1
DE69425316D1 DE69425316T DE69425316T DE69425316D1 DE 69425316 D1 DE69425316 D1 DE 69425316D1 DE 69425316 T DE69425316 T DE 69425316T DE 69425316 T DE69425316 T DE 69425316T DE 69425316 D1 DE69425316 D1 DE 69425316D1
Authority
DE
Germany
Prior art keywords
determining
semiconductor material
charge carriers
sample made
minority charge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69425316T
Other languages
English (en)
Other versions
DE69425316T2 (de
Inventor
William C Goldfarb
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semitest Inc
Original Assignee
Semitest Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semitest Inc filed Critical Semitest Inc
Application granted granted Critical
Publication of DE69425316D1 publication Critical patent/DE69425316D1/de
Publication of DE69425316T2 publication Critical patent/DE69425316T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26Testing of individual semiconductor devices
    • G01R31/265Contactless testing
    • G01R31/2656Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation
DE69425316T 1993-11-29 1994-11-29 Verfahren zur Bestimmung der Rekombinationslebendauer von Minoritäts-Ladungsträgern einer Probe aus Halbleitermaterial Expired - Fee Related DE69425316T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/159,334 US5453703A (en) 1993-11-29 1993-11-29 Method for determining the minority carrier surface recombination lifetime constant (ts of a specimen of semiconductor material

Publications (2)

Publication Number Publication Date
DE69425316D1 true DE69425316D1 (de) 2000-08-24
DE69425316T2 DE69425316T2 (de) 2001-02-22

Family

ID=22572129

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69425316T Expired - Fee Related DE69425316T2 (de) 1993-11-29 1994-11-29 Verfahren zur Bestimmung der Rekombinationslebendauer von Minoritäts-Ladungsträgern einer Probe aus Halbleitermaterial

Country Status (4)

Country Link
US (1) US5453703A (de)
EP (1) EP0656643B1 (de)
JP (1) JP2954492B2 (de)
DE (1) DE69425316T2 (de)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08191091A (ja) * 1995-01-10 1996-07-23 Komatsu Electron Metals Co Ltd シリコンウェーハの酸化膜耐圧強度の簡便評価法
US5661408A (en) 1995-03-01 1997-08-26 Qc Solutions, Inc. Real-time in-line testing of semiconductor wafers
US5767693A (en) * 1996-09-04 1998-06-16 Smithley Instruments, Inc. Method and apparatus for measurement of mobile charges with a corona screen gun
US6034535A (en) * 1997-02-14 2000-03-07 Semitest Inc. Method utilizing a modulated light beam for determining characteristics such as the doping concentration profile of a specimen of semiconductor material
US5977788A (en) * 1997-07-11 1999-11-02 Lagowski; Jacek Elevated temperature measurement of the minority carrier lifetime in the depletion layer of a semiconductor wafer
JP3568741B2 (ja) * 1997-07-31 2004-09-22 株式会社東芝 半導体評価装置および半導体製造システム
US5929652A (en) * 1997-09-02 1999-07-27 Midwest Research Institute Apparatus for measuring minority carrier lifetimes in semiconductor materials
US6275060B1 (en) * 1997-09-02 2001-08-14 Midwest Research Institute Apparatus and method for measuring minority carrier lifetimes in semiconductor materials
US6066952A (en) * 1997-09-25 2000-05-23 International Business Machnies Corporation Method for polysilicon crystalline line width measurement post etch in undoped-poly process
US6060709A (en) * 1997-12-31 2000-05-09 Verkuil; Roger L. Apparatus and method for depositing uniform charge on a thin oxide semiconductor wafer
US6430022B2 (en) * 1999-04-19 2002-08-06 Applied Materials, Inc. Method and apparatus for controlling chucking force in an electrostatic
US6329800B1 (en) 2000-10-17 2001-12-11 Sigmatel Method and apparatus for reducing power consumption in driver circuits
US6680621B2 (en) * 2001-01-26 2004-01-20 Semiconductor Diagnostics, Inc. Steady state method for measuring the thickness and the capacitance of ultra thin dielectric in the presence of substantial leakage current
US6894519B2 (en) * 2002-04-11 2005-05-17 Solid State Measurements, Inc. Apparatus and method for determining electrical properties of a semiconductor wafer
US6836139B2 (en) * 2002-10-22 2004-12-28 Solid State Measurments, Inc. Method and apparatus for determining defect and impurity concentration in semiconducting material of a semiconductor wafer
US7663385B2 (en) 2002-12-13 2010-02-16 Nanometrics Incorporated Apparatus and method for electrical characterization by selecting and adjusting the light for a target depth of a semiconductor
US6972582B2 (en) * 2003-02-10 2005-12-06 Solid State Measurements, Inc. Apparatus and method for measuring semiconductor wafer electrical properties
JP2004285444A (ja) * 2003-03-24 2004-10-14 Daido Steel Co Ltd 安定した靭性を示す低合金高速度工具鋼
US6911350B2 (en) * 2003-03-28 2005-06-28 Qc Solutions, Inc. Real-time in-line testing of semiconductor wafers
US7323888B1 (en) * 2003-11-01 2008-01-29 Colvin James B System and method for use in functional failure analysis by induced stimulus
US7872485B2 (en) * 2004-10-18 2011-01-18 Colvin James B System and method for use in functional failure analysis by induced stimulus
US7119569B2 (en) * 2004-03-05 2006-10-10 Qc Solutions, Inc. Real-time in-line testing of semiconductor wafers
JP4416566B2 (ja) * 2004-04-26 2010-02-17 Sumco Techxiv株式会社 不純物金属濃度測定の方法
US7034563B1 (en) * 2005-01-26 2006-04-25 Ahbee 2, L.P., A California Limited Partnership Apparatus for measuring of thin dielectric layer properties on semiconductor wafers with contact self aligning electrodes
US7521946B1 (en) * 2005-04-06 2009-04-21 Kla-Tencor Technologies Corporation Electrical measurements on semiconductors using corona and microwave techniques
US20130341581A1 (en) * 2012-06-13 2013-12-26 Dan Ritter Device, a method for measuring temperature and a programmable insulator-semiconductor bipolar transistor
US10564215B2 (en) 2014-07-01 2020-02-18 Raja Technologies Inc. System and method of semiconductor characterization
US10352989B2 (en) * 2014-07-01 2019-07-16 Raja Technologies Inc. System and method of semiconductor characterization
US9002677B1 (en) * 2014-07-01 2015-04-07 Raja Technologies System and method of semiconductor characterization
CN110470965B (zh) * 2019-07-09 2020-07-28 同济大学 一种半导体表面态载流子寿命测试方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0325453B1 (de) * 1988-01-20 1994-12-07 Semitest, Inc. Verfahren für nichtinvasive Charakterisierung von Halbleitern
US4827212A (en) * 1988-01-20 1989-05-02 Semitest, Inc. Noninvasive method and apparatus for characterization of semiconductors
DE59006874D1 (de) * 1989-05-31 1994-09-29 Siemens Ag Verfahren zur Bestimmung der Rekombinationsgeschwindigkeit von Minoritätsträgern an Grenzflächen zwischen Halbleitern und anderen Substanzen.
US5087876A (en) * 1990-07-16 1992-02-11 Semitest, Inc. Apparatus and method for making surface photovoltage measurements of a semiconductor

Also Published As

Publication number Publication date
US5453703A (en) 1995-09-26
DE69425316T2 (de) 2001-02-22
JP2954492B2 (ja) 1999-09-27
JPH07302823A (ja) 1995-11-14
EP0656643A1 (de) 1995-06-07
EP0656643B1 (de) 2000-07-19

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee