DE69525609D1 - Eine eine squariliumverbindung enthaltende photopolymerisierbare zusammensetzung - Google Patents

Eine eine squariliumverbindung enthaltende photopolymerisierbare zusammensetzung

Info

Publication number
DE69525609D1
DE69525609D1 DE69525609T DE69525609T DE69525609D1 DE 69525609 D1 DE69525609 D1 DE 69525609D1 DE 69525609 T DE69525609 T DE 69525609T DE 69525609 T DE69525609 T DE 69525609T DE 69525609 D1 DE69525609 D1 DE 69525609D1
Authority
DE
Germany
Prior art keywords
composition
squarilium
containing photopolymerizable
composition containing
photopolymerizable composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69525609T
Other languages
English (en)
Other versions
DE69525609T2 (de
Inventor
Tsuguo Yamaoka
Kenichi Koseki
Ikuo Shimizu
Hiroshi Toyoda
Hirotaka Kinoshita
Shoshiro Matsushita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KH Neochem Co Ltd
Original Assignee
Kyowa Hakko Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyowa Hakko Kogyo Co Ltd filed Critical Kyowa Hakko Kogyo Co Ltd
Publication of DE69525609D1 publication Critical patent/DE69525609D1/de
Application granted granted Critical
Publication of DE69525609T2 publication Critical patent/DE69525609T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/58—[b]- or [c]-condensed
    • C07D209/60—Naphtho [b] pyrroles; Hydrogenated naphtho [b] pyrroles
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00—Other synthetic dyes of known constitution
    • C09B57/007—Squaraine dyes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
DE69525609T 1994-09-21 1995-09-20 Eine eine squariliumverbindung enthaltende photopolymerisierbare zusammensetzung Expired - Fee Related DE69525609T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP22656894 1994-09-21
PCT/JP1995/001894 WO1996009289A1 (en) 1994-09-21 1995-09-20 Photopolymerizable composition containing squarylium compound

Publications (2)

Publication Number Publication Date
DE69525609D1 true DE69525609D1 (de) 2002-04-04
DE69525609T2 DE69525609T2 (de) 2002-09-19

Family

ID=16847207

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69525609T Expired - Fee Related DE69525609T2 (de) 1994-09-21 1995-09-20 Eine eine squariliumverbindung enthaltende photopolymerisierbare zusammensetzung

Country Status (6)

Country Link
US (1) US5681685A (de)
EP (1) EP0729945B1 (de)
JP (1) JP3404046B2 (de)
CA (1) CA2176931A1 (de)
DE (1) DE69525609T2 (de)
WO (1) WO1996009289A1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6232038B1 (en) * 1998-10-07 2001-05-15 Mitsubishi Chemical Corporation Photosensitive composition, image-forming material and image-forming method employing it
US6596364B2 (en) * 1999-12-16 2003-07-22 Kyowa Hakko Kogyo Co., Ltd. Squarylium compounds and optical recording medium containing the same
JP4512281B2 (ja) * 2001-02-22 2010-07-28 富士フイルム株式会社 ネガ型平版印刷版原版
WO2003085005A1 (fr) * 2002-04-08 2003-10-16 Kyowa Hakko Chemical Co., Ltd. Composition photopolymerisable
US20050058911A1 (en) * 2003-09-17 2005-03-17 Konica Minolta Medical & Graphic, Inc. Holographic recording medium, holographic recording method and holographic information medium
TW200720842A (en) * 2005-10-24 2007-06-01 Kyowa Hakko Chemical Co Ltd A squarilium compound and the short-wave length source photo polymerization composition using thereof
JP5270114B2 (ja) * 2007-06-15 2013-08-21 富士フイルム株式会社 固体撮像素子
KR101413075B1 (ko) * 2011-12-26 2014-06-30 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한　컬러필터

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60224674A (ja) * 1984-04-23 1985-11-09 Mitsubishi Chem Ind Ltd ２，４−ビス（１’，３’，３’−トリアルキル−２’−メチレンインドリノ）シクロブテンジイリウム−１，３−ジオレ−ト類
US4743530A (en) * 1986-11-21 1988-05-10 Eastman Kodak Company Negative working photoresists responsive to longer wavelengths and novel coated articles
US4743531A (en) * 1986-11-21 1988-05-10 Eastman Kodak Company Dye sensitized photographic imaging system
JP2567238B2 (ja) * 1987-03-25 1996-12-25 日本化薬株式会社 集光用樹脂板
JPH01178493A (ja) * 1988-01-07 1989-07-14 Ricoh Co Ltd 光情報記録媒体
JPH0820734B2 (ja) * 1988-08-11 1996-03-04 富士写真フイルム株式会社 感光性組成物及びそれを用いた光重合性組成物
CA2000855A1 (en) * 1988-11-17 1990-05-17 Mohammad Z. Ali Triazine photoinitiators in a ternary system for addition polymerization
EP0379200A3 (de) * 1989-01-19 1991-11-13 Mitsubishi Kasei Corporation Photopolymerisierbare Zusammensetzung
JPH03505005A (ja) * 1989-03-27 1991-10-31 ユナイテッド　テクノロジーズ　コーポレーション アクティブ集積光学装置および光学集積装置の製作方法
JP3015053B2 (ja) * 1989-10-12 2000-02-28 キヤノン株式会社 光学記録媒体
CA2033821A1 (en) * 1990-01-12 1991-07-13 Evan D. Laganis Photopolymerizable compositions sensitive to longer wavelength visible actinic radiation
US5147758A (en) * 1991-02-19 1992-09-15 E. I. Du Pont De Nemours And Company Red sensitive photopolymerizable compositions
JP2988756B2 (ja) * 1991-04-26 1999-12-13 協和醗酵工業株式会社 光重合開始剤およびこれを含有する光重合性組成物
JP2871181B2 (ja) * 1991-07-09 1999-03-17 ブラザー工業株式会社 光硬化型組成物
JPH06263732A (ja) * 1993-03-12 1994-09-20 Mitsubishi Kasei Corp シクロブテン系化合物，その製法並びにスクアリリウム系化合物の製造法

Also Published As

Publication number Publication date
US5681685A (en) 1997-10-28
WO1996009289A1 (en) 1996-03-28
EP0729945A1 (de) 1996-09-04
EP0729945A4 (de) 1998-10-14
DE69525609T2 (de) 2002-09-19
EP0729945B1 (de) 2002-02-27
JP3404046B2 (ja) 2003-05-06
CA2176931A1 (en) 1996-03-28

Similar Documents

Publication Publication Date Title
DE69327741D1 (de) Photopolymerisierbare Zusammensetzung
DE69618854T2 (de) Fotopolymerisierbare Zusammensetzung
DE69222234D1 (de) Photopolymerisierbare Zusammensetzung
ATE170464T1 (de) Stempelgerät
DE69400062T2 (de) Photopolymerisierbare Zusammensetzung
DE69905968T2 (de) Eine Fotoresistzusammensetzung
DE69222987T2 (de) Photopolymerisierbare zusammensetzung
DE69503738D1 (de) Fotopolymerisierbare Zusammensetzung
DE69509183T2 (de) Photoresistzusammensetzung enthaltend eine polyfunktionelle Vinyletherverbindung
DE69604601D1 (de) Fotopolymerisierbare Zusammensetzung
DE69320397D1 (de) Photopolymerisierbare Zusammensetzung
DE69417023D1 (de) Grubenstempel
DE69525609D1 (de) Eine eine squariliumverbindung enthaltende photopolymerisierbare zusammensetzung
DE69711898D1 (de) Sumpf für eine zapfsäule
DE69208580T2 (de) Photopolymerisierbare Zusammensetzung
DE69735777D1 (de) Eine waschmittelzusammensetzung
DE69522740T2 (de) Tragwerk für eine Schlitzauftragedüse
DE69332687T2 (de) Photopolymerisierbare zusammensetzung
DE69423504D1 (de) Photopolymerisierbare zusammensetzung
FR2727897B1 (fr) Mecanisme numeroteur
DE69605584T2 (de) Fotopolymerisierbare Zusammensetzung
DE69504837T2 (de) Eine magazinanordnung
DE69703274D1 (de) Photopolymerisierbare Zusammensetzung
DE69711802T2 (de) Eine Dipyridylverbindung enthaltender positiver Photolack
DE9407331U1 (de) Unterlage für eine Tastatur

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee