DE69605840T2 - Magnetron Zerstäubungssystem - Google Patents

Magnetron Zerstäubungssystem

Info

Publication number
DE69605840T2
DE69605840T2 DE69605840T DE69605840T DE69605840T2 DE 69605840 T2 DE69605840 T2 DE 69605840T2 DE 69605840 T DE69605840 T DE 69605840T DE 69605840 T DE69605840 T DE 69605840T DE 69605840 T2 DE69605840 T2 DE 69605840T2
Authority
DE
Germany
Prior art keywords
atomization system
magnetron atomization
magnetron
atomization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69605840T
Other languages
English (en)
Other versions
DE69605840D1 (de
Inventor
Jeroen Franciscus Landsbergen
Jan Visser
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OTB Group BV
Original Assignee
OD&ME BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OD&ME BV filed Critical OD&ME BV
Publication of DE69605840D1 publication Critical patent/DE69605840D1/de
Application granted granted Critical
Publication of DE69605840T2 publication Critical patent/DE69605840T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3438—Electrodes other than cathode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3464—Operating strategies
    • H01J37/347—Thickness uniformity of coated layers or desired profile of target erosion
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
DE69605840T 1995-04-13 1996-04-04 Magnetron Zerstäubungssystem Expired - Fee Related DE69605840T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL1000139A NL1000139C2 (nl) 1995-04-13 1995-04-13 Magnetronsputtersysteem.

Publications (2)

Publication Number Publication Date
DE69605840D1 DE69605840D1 (de) 2000-02-03
DE69605840T2 true DE69605840T2 (de) 2000-05-18

Family

ID=19760879

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69605840T Expired - Fee Related DE69605840T2 (de) 1995-04-13 1996-04-04 Magnetron Zerstäubungssystem

Country Status (5)

Country Link
US (1) US5868914A (de)
EP (1) EP0737999B1 (de)
JP (1) JPH08296040A (de)
DE (1) DE69605840T2 (de)
NL (1) NL1000139C2 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19757353C1 (de) * 1997-12-22 1999-07-29 Fraunhofer Ges Forschung Einrichtung zum Betreiben einer Niederdruckentladung
US6500321B1 (en) 1999-05-26 2002-12-31 Novellus Systems, Inc. Control of erosion profile and process characteristics in magnetron sputtering by geometrical shaping of the sputtering target
EP1328982B1 (de) 2000-03-24 2005-07-20 Cymbet Corporation Gehäuse für die anordnung und anordnungen mit integrierter batterie
US6663754B2 (en) 2001-04-13 2003-12-16 Applied Materials, Inc. Tubular magnet as center pole in unbalanced sputtering magnetron
US7294209B2 (en) * 2003-01-02 2007-11-13 Cymbet Corporation Apparatus and method for depositing material onto a substrate using a roll-to-roll mask
US20040131760A1 (en) * 2003-01-02 2004-07-08 Stuart Shakespeare Apparatus and method for depositing material onto multiple independently moving substrates in a chamber
US7603144B2 (en) * 2003-01-02 2009-10-13 Cymbet Corporation Active wireless tagging system on peel and stick substrate
US6906436B2 (en) * 2003-01-02 2005-06-14 Cymbet Corporation Solid state activity-activated battery device and method
US7211351B2 (en) 2003-10-16 2007-05-01 Cymbet Corporation Lithium/air batteries with LiPON as separator and protective barrier and method
KR20070024473A (ko) * 2004-01-06 2007-03-02 사임베트 코퍼레이션 층상 배리어구조와 그 형성방법
US7776478B2 (en) * 2005-07-15 2010-08-17 Cymbet Corporation Thin-film batteries with polymer and LiPON electrolyte layers and method
US20070012244A1 (en) * 2005-07-15 2007-01-18 Cymbet Corporation Apparatus and method for making thin-film batteries with soft and hard electrolyte layers
CA2615479A1 (en) * 2005-07-15 2007-01-25 Cymbet Corporation Thin-film batteries with polymer and lipon electrolyte layers and methods
WO2011009105A1 (en) * 2009-07-16 2011-01-20 Woodward Bewley Technology Development Llc Novel alloy and method of making and using same
WO2011077653A1 (ja) * 2009-12-25 2011-06-30 キヤノンアネルバ株式会社 電子デバイスの製造方法、およびスパッタリング装置
US11527774B2 (en) 2011-06-29 2022-12-13 Space Charge, LLC Electrochemical energy storage devices
US10601074B2 (en) 2011-06-29 2020-03-24 Space Charge, LLC Rugged, gel-free, lithium-free, high energy density solid-state electrochemical energy storage devices
US9853325B2 (en) 2011-06-29 2017-12-26 Space Charge, LLC Rugged, gel-free, lithium-free, high energy density solid-state electrochemical energy storage devices
WO2019173626A1 (en) 2018-03-07 2019-09-12 Space Charge, LLC Thin-film solid-state energy-storage devices
CN116752112B (zh) * 2023-08-17 2023-11-10 上海陛通半导体能源科技股份有限公司 射频磁控溅射设备

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4461688A (en) * 1980-06-23 1984-07-24 Vac-Tec Systems, Inc. Magnetically enhanced sputtering device having a plurality of magnetic field sources including improved plasma trapping device and method
NL8202092A (nl) * 1982-05-21 1983-12-16 Philips Nv Magnetronkathodesputtersysteem.
JPS61204371A (ja) * 1985-03-06 1986-09-10 Ulvac Corp 陰極スパツタリング用磁気回路装置
US4892633A (en) * 1988-11-14 1990-01-09 Vac-Tec Systems, Inc. Magnetron sputtering cathode
JPH0774439B2 (ja) * 1989-01-30 1995-08-09 三菱化学株式会社 マグネトロンスパッタ装置
DE3912295C2 (de) * 1989-04-14 1997-05-28 Leybold Ag Katodenzerstäubungsanlage
US5174880A (en) * 1991-08-05 1992-12-29 Hmt Technology Corporation Magnetron sputter gun target assembly with distributed magnetic field

Also Published As

Publication number Publication date
EP0737999A1 (de) 1996-10-16
JPH08296040A (ja) 1996-11-12
NL1000139C2 (nl) 1996-10-15
DE69605840D1 (de) 2000-02-03
EP0737999B1 (de) 1999-12-29
US5868914A (en) 1999-02-09

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: DERZEIT KEIN VERTRETER BESTELLT

Free format text: DERZEIT KEIN VERTRETER BESTELLT

8327 Change in the person/name/address of the patent owner

Owner name: OTB GROUP B.V., EINDHOVEN, NL

8339 Ceased/non-payment of the annual fee