DE69610294T2 - Durch energie aktivierbare salze mit fluorkohlenstoffanionen - Google Patents

Durch energie aktivierbare salze mit fluorkohlenstoffanionen

Info

Publication number
DE69610294T2
DE69610294T2 DE69610294T DE69610294T DE69610294T2 DE 69610294 T2 DE69610294 T2 DE 69610294T2 DE 69610294 T DE69610294 T DE 69610294T DE 69610294 T DE69610294 T DE 69610294T DE 69610294 T2 DE69610294 T2 DE 69610294T2
Authority
DE
Germany
Prior art keywords
fluorocanese
sales
activated
energy
sales activated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69610294T
Other languages
English (en)
Other versions
DE69610294D1 (de
Inventor
M Lamanna
C Palazzotto
S Mahoney
A Kropp
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Application granted granted Critical
Publication of DE69610294D1 publication Critical patent/DE69610294D1/de
Publication of DE69610294T2 publication Critical patent/DE69610294T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C317/00—Sulfones; Sulfoxides
    • C07C317/02—Sulfones; Sulfoxides having sulfone or sulfoxide groups bound to acyclic carbon atoms
    • C07C317/04—Sulfones; Sulfoxides having sulfone or sulfoxide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C25/00—Compounds containing at least one halogen atom bound to a six-membered aromatic ring
    • C07C25/18—Polycyclic aromatic halogenated hydrocarbons
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F17/00—Metallocenes
    • C07F17/02—Metallocenes of metals of Groups 8, 9 or 10 of the Periodic System
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/321—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
DE69610294T 1995-03-06 1996-02-05 Durch energie aktivierbare salze mit fluorkohlenstoffanionen Expired - Lifetime DE69610294T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US39860695A 1995-03-06 1995-03-06
US08/558,245 US5554664A (en) 1995-03-06 1995-11-17 Energy-activatable salts with fluorocarbon anions
PCT/US1996/001634 WO1996027584A1 (en) 1995-03-06 1996-02-05 Energy-activatable salts with fluorocarbon anions

Publications (2)

Publication Number Publication Date
DE69610294D1 DE69610294D1 (de) 2000-10-19
DE69610294T2 true DE69610294T2 (de) 2001-04-12

Family

ID=27016295

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69610294T Expired - Lifetime DE69610294T2 (de) 1995-03-06 1996-02-05 Durch energie aktivierbare salze mit fluorkohlenstoffanionen

Country Status (9)

Country Link
US (1) US5554664A (de)
EP (1) EP0813521B1 (de)
JP (1) JP3985020B2 (de)
KR (1) KR100436804B1 (de)
CN (1) CN1177346A (de)
AU (1) AU4776696A (de)
CA (1) CA2213465A1 (de)
DE (1) DE69610294T2 (de)
WO (1) WO1996027584A1 (de)

Families Citing this family (194)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5652280A (en) * 1991-11-12 1997-07-29 University Of Georgia Research Foundation, Inc. Anionic photoinitiation
EP1020438A3 (de) * 1996-03-26 2003-02-26 Minnesota Mining And Manufacturing Company Ionische fluorinierte Sulfonamide und Sulfone
US5858545A (en) * 1996-03-26 1999-01-12 Minnesota Mining And Manufacturing Company Electrosprayable release coating
US5817376A (en) * 1996-03-26 1998-10-06 Minnesota Mining And Manufacturing Company Free-radically polymerizable compositions capable of being coated by electrostatic assistance
US5962546A (en) 1996-03-26 1999-10-05 3M Innovative Properties Company Cationically polymerizable compositions capable of being coated by electrostatic assistance
CN1195356A (zh) * 1996-06-12 1998-10-07 日本化药株式会社 光聚合引发剂和包含它的可能量射线固化的组合物
CA2187046A1 (fr) * 1996-10-03 1998-04-03 Alain Vallee Sulfonylimidures et sulfonylmethylures, leur utilisation comme photoinitiateur
AU724151B2 (en) * 1997-03-11 2000-09-14 New Japan Chemical Co. Ltd. Rare-earth complexes
AU6461998A (en) 1997-03-14 1998-09-29 Minnesota Mining And Manufacturing Company Cure-on-demand, moisture-curable compositions having reactive silane functionality
US6174932B1 (en) * 1998-05-20 2001-01-16 Denovus Llc Curable sealant composition
US6277898B1 (en) * 1997-05-21 2001-08-21 Denovus Llc Curable sealant composition
US6858260B2 (en) 1997-05-21 2005-02-22 Denovus Llc Curable sealant composition
EP1388546B1 (de) * 1997-07-25 2010-09-08 ACEP Inc. Verwendung von ionenischen Verbindungen mit einer delokalisierten anionischen Ladung als Katalysatoren
DE19743985A1 (de) * 1997-10-06 1999-04-08 Merck Patent Gmbh Verwendung von Tris(trifluoromethylsulfonyl)methan und dessen Alkali- und Erdalkalimetallsalzen als Katalysatoren bei C-C verknüpfenden Synthesen und das neue Mg-Salz von Tris(trifluoromethylsulfonyl)methan
US5973020A (en) * 1998-01-06 1999-10-26 Rhodia Inc. Photoinitiator composition including hindered amine stabilizer
US6518362B1 (en) * 1998-02-18 2003-02-11 3M Innovative Properties Company Melt blending polyphenylene ether, polystyrene and curable epoxy
US6046368A (en) * 1998-03-17 2000-04-04 3M Innovative Properties Company Catalytic process for making hydrofluoroethers
US6437090B1 (en) * 1998-06-17 2002-08-20 Kabushiki Kaisha Toshiba Curing catalyst, resin composition, resin-sealed semiconductor device and coating material
US7005394B1 (en) 1998-07-10 2006-02-28 3M Innovative Properties Company Tackified thermoplastic-epoxy pressure sensitive adhesives
JP3737285B2 (ja) * 1998-08-28 2006-01-18 積水化学工業株式会社 光硬化性組成物、光硬化性接着シート、及び接合方法
JP3739211B2 (ja) * 1998-08-28 2006-01-25 積水化学工業株式会社 光硬化型粘接着シート、光硬化型粘接着シートの製造方法及び接合方法
US6294270B1 (en) 1998-12-23 2001-09-25 3M Innovative Properties Company Electronic circuit device comprising an epoxy-modified aromatic vinyl-conjugated diene block copolymer
US6489042B2 (en) 1998-12-23 2002-12-03 3M Innovative Properties Company Photoimageable dielectric material for circuit protection
US6265459B1 (en) 1998-12-31 2001-07-24 3M Innovative Properties Company Accelerators useful for energy polymerizable compositions
US6133335A (en) 1998-12-31 2000-10-17 3M Innovative Properties Company Photo-polymerizable compositions and articles made therefrom
US6482868B1 (en) 1998-12-31 2002-11-19 3M Innovative Properties Company Accelerators useful for energy polymerizable compositions
DE19919346A1 (de) * 1999-04-28 2000-11-02 Merck Patent Gmbh Verfahren zur Aufreinigung von Methanid-Elektrolyten (I)
US6664380B1 (en) * 1999-08-18 2003-12-16 The Institute Of Applied Catalysis Perfluorosulfonylmethide compounds; use thereof for carbon-carbon bond formation
US6372829B1 (en) * 1999-10-06 2002-04-16 3M Innovative Properties Company Antistatic composition
US6461419B1 (en) 1999-11-01 2002-10-08 3M Innovative Properties Company Curable inkjet printable ink compositions
US6587628B1 (en) 1999-11-22 2003-07-01 3M Innovative Properties Company Optical fiber with improved strength in high humidity/high temperature environments
US6592988B1 (en) * 1999-12-29 2003-07-15 3M Innovative Properties Company Water-and oil-repellent, antistatic composition
US6369242B2 (en) 2000-03-17 2002-04-09 Roche Vitamins Inc. Tocopherol manufacture by tris(perfluorohydrocarbylsulphonyl) methane or metal methides thereof
US6706403B1 (en) * 2000-05-12 2004-03-16 3M Innovative Properties Company Rigid substrate lamination adhesive
US6635689B1 (en) 2000-06-26 2003-10-21 3M Innovative Properties Company Accelerators for cationic polymerization catalyzed by iron-based catalysts
EP1307287A2 (de) * 2000-07-12 2003-05-07 MERCK PATENT GmbH An funktionalisierte plastikkugeln oder sio2 angelagerter katalysator für die zweiphasenkatalyse mit fluorhaltigem lösungsmittel
DK1180517T3 (da) 2000-08-18 2003-11-17 Roche Vitamins Ag Fremgangsmåde til fremstilling af (all-rac)-alfa-tocopherol
US6518347B1 (en) * 2000-12-27 2003-02-11 3M Innovative Properties Company Flame retardant carbonate polymers and use thereof
US6777160B2 (en) 2001-03-12 2004-08-17 Fuji Photo Film Co., Ltd. Positive-working resist composition
JP4067284B2 (ja) * 2001-03-12 2008-03-26 富士フイルム株式会社 ポジ型レジスト組成物
JP4102032B2 (ja) * 2001-03-12 2008-06-18 富士フイルム株式会社 ポジ型レジスト組成物
US20030054172A1 (en) * 2001-05-10 2003-03-20 3M Innovative Properties Company Polyoxyalkylene ammonium salts and their use as antistatic agents
US6895156B2 (en) * 2001-10-09 2005-05-17 3M Innovative Properties Company Small diameter, high strength optical fiber
US6924329B2 (en) * 2001-11-05 2005-08-02 3M Innovative Properties Company Water- and oil-repellent, antistatic compositions
US6740413B2 (en) 2001-11-05 2004-05-25 3M Innovative Properties Company Antistatic compositions
US6818379B2 (en) * 2001-12-03 2004-11-16 Sumitomo Chemical Company, Limited Sulfonium salt and use thereof
JP2003215791A (ja) * 2002-01-18 2003-07-30 Central Glass Co Ltd 超強酸オニウム塩化合物および感放射線性樹脂組成物
US6808657B2 (en) * 2002-02-12 2004-10-26 3M Innovative Properties Company Process for preparing a K-type polarizer
AU2002341575A1 (en) * 2002-03-26 2003-10-13 Photon-X, Inc. Halogenated phosphinic acids and their active metal derivatives
US20050256230A1 (en) * 2002-04-01 2005-11-17 Hiroaki Yamaguchi Cationic polymerizable adhesive composition and anisotropically electroconductive adhesive composition
US6949207B2 (en) * 2002-04-04 2005-09-27 3M Innovative Properties Company K-type polarizer and preparation thereof
US7087194B2 (en) * 2002-04-04 2006-08-08 3M Innovative Properties Company K-type polarizer and preparation thereof
US6858378B1 (en) * 2002-04-17 2005-02-22 Sandia National Laboratories Photoimageable composition
US6841333B2 (en) * 2002-11-01 2005-01-11 3M Innovative Properties Company Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions
US7147767B2 (en) * 2002-12-16 2006-12-12 3M Innovative Properties Company Plating solutions for electrochemical or chemical deposition of copper interconnects and methods therefor
US6777460B2 (en) * 2002-12-23 2004-08-17 3M Innovative Properties Company Curing agents for cationically curable compositions
WO2004096790A1 (en) * 2003-04-28 2004-11-11 Dsm Ip Assets B.V. Process for the manufacture of tocyl and tocopheryl acylates
US7122294B2 (en) * 2003-05-22 2006-10-17 3M Innovative Properties Company Photoacid generators with perfluorinated multifunctional anions
US6969166B2 (en) 2003-05-29 2005-11-29 3M Innovative Properties Company Method for modifying the surface of a substrate
US20040241323A1 (en) * 2003-05-29 2004-12-02 3M Innovative Properties Company Method for applying adhesive to a substrate
JP4772288B2 (ja) * 2003-06-05 2011-09-14 東京応化工業株式会社 ホトレジスト組成物用樹脂、ホトレジスト組成物、およびレジストパターン形成方法
US7132205B2 (en) 2003-06-05 2006-11-07 Arch Specialty Chemicals, Inc. Positive photosensitive resin compositions
US20040265733A1 (en) * 2003-06-30 2004-12-30 Houlihan Francis M. Photoacid generators
JP4188265B2 (ja) 2003-10-23 2008-11-26 東京応化工業株式会社 レジスト組成物およびレジストパターン形成方法
US7192991B2 (en) * 2003-11-26 2007-03-20 3M Innovative Properties Company Cationically curable composition
JP2005172949A (ja) * 2003-12-08 2005-06-30 Tokyo Ohka Kogyo Co Ltd ホトレジスト組成物およびレジストパターン形成方法
US20050126697A1 (en) * 2003-12-11 2005-06-16 International Business Machines Corporation Photochemically and thermally curable adhesive formulations
US7282324B2 (en) 2004-01-05 2007-10-16 Microchem Corp. Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them
JP4448705B2 (ja) * 2004-02-05 2010-04-14 富士フイルム株式会社 感光性組成物及び該感光性組成物を用いたパターン形成方法
US7393627B2 (en) * 2004-03-16 2008-07-01 Cornell Research Foundation, Inc. Environmentally friendly photoacid generators (PAGs) with no perfluorooctyl sulfonates (PFOS)
US20050250929A1 (en) * 2004-05-10 2005-11-10 3M Innovative Properties Company Ferrocenium-derived catalyst for cationically polymerizable monomers
JP4469692B2 (ja) 2004-09-14 2010-05-26 富士フイルム株式会社 感光性組成物、該感光性組成物に用いられる化合物及び該感光性組成物を用いたパターン形成方法
JP4452632B2 (ja) 2005-01-24 2010-04-21 富士フイルム株式会社 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法
JP4562537B2 (ja) 2005-01-28 2010-10-13 富士フイルム株式会社 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法
US7960087B2 (en) * 2005-03-11 2011-06-14 Fujifilm Corporation Positive photosensitive composition and pattern-forming method using the same
JP4724465B2 (ja) * 2005-05-23 2011-07-13 富士フイルム株式会社 感光性組成物及び該感光性組成物を用いたパターン形成方法
WO2006132906A2 (en) * 2005-06-03 2006-12-14 Fujifilm Electronic Materials U.S.A., Inc. Pretreatment compositions
US7785768B2 (en) * 2005-06-07 2010-08-31 Tokyo Ohka Kogyo Co. Ltd. Thermoacid generator for antireflection film formation, composition for antireflection film formation, and antireflection film made therefrom
JP2007003619A (ja) 2005-06-21 2007-01-11 Fujifilm Holdings Corp 感光性組成物、該感光性組成物を用いたパターン形成方法及び該感光性組成物に用いる化合物
US7521170B2 (en) * 2005-07-12 2009-04-21 Az Electronic Materials Usa Corp. Photoactive compounds
JPWO2007029733A1 (ja) 2005-09-08 2009-03-19 株式会社カネカ 硬化性組成物
JP4562628B2 (ja) * 2005-09-20 2010-10-13 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
US7678528B2 (en) * 2005-11-16 2010-03-16 Az Electronic Materials Usa Corp. Photoactive compounds
US7776940B2 (en) 2005-12-20 2010-08-17 3M Innovative Properties Company Methods for reducing bond strengths, dental compositions, and the use thereof
US7896650B2 (en) 2005-12-20 2011-03-01 3M Innovative Properties Company Dental compositions including radiation-to-heat converters, and the use thereof
US8026296B2 (en) 2005-12-20 2011-09-27 3M Innovative Properties Company Dental compositions including a thermally labile component, and the use thereof
US8426101B2 (en) 2005-12-21 2013-04-23 Fujifilm Corporation Photosensitive composition, pattern-forming method using the photosensitve composition and compound in the photosensitive composition
US8404427B2 (en) 2005-12-28 2013-03-26 Fujifilm Corporation Photosensitive composition, and pattern-forming method and resist film using the photosensitive composition
JP4866605B2 (ja) 2005-12-28 2012-02-01 富士フイルム株式会社 感光性組成物、該感光性組成物を用いたパターン形成方法及び該感光性組成物に用いられる化合物
JP4682057B2 (ja) 2006-02-20 2011-05-11 富士フイルム株式会社 感光性組成物、該感光性組成物を用いたパターン形成方法及び該感光性組成物に用いられる化合物
JP4682064B2 (ja) 2006-03-09 2011-05-11 富士フイルム株式会社 感光性組成物、該組成物を用いたパターン形成方法及び該組成物に用いる化合物
CN101466804B (zh) 2006-04-13 2012-02-22 西巴控股有限公司 硫鎓盐引发剂
WO2007124092A2 (en) * 2006-04-21 2007-11-01 Cornell Research Foundation, Inc. Photoacid generator compounds and compositions
US20080003420A1 (en) * 2006-06-29 2008-01-03 3M Innovative Properties Company Transfer hardcoat films for graphic substrates
GB2439734A (en) * 2006-06-30 2008-01-09 Peter Andrew Reath Bennett Coating for a lithographic precursor and use thereof
DE602007005388D1 (de) * 2006-09-08 2010-04-29 3M Innovative Properties Co Farbwechselnde cyanoacrylatkleber
US7491482B2 (en) * 2006-12-04 2009-02-17 Az Electronic Materials Usa Corp. Photoactive compounds
US7390613B1 (en) 2006-12-04 2008-06-24 Az Electronic Materials Usa Corp. Photoactive compounds
JP5186910B2 (ja) * 2006-12-20 2013-04-24 セントラル硝子株式会社 トリス（パーフルオロアルカンスルホニル）メチド酸塩の製造方法
US20080187868A1 (en) * 2007-02-07 2008-08-07 Munirathna Padmanaban Photoactive Compounds
US8182975B2 (en) 2007-03-28 2012-05-22 Fujifilm Corporation Positive resist composition and pattern forming method using the same
US7498116B2 (en) 2007-03-30 2009-03-03 Fujifilm Corporation Resist composition and pattern formation method using the same
WO2008128073A2 (en) * 2007-04-13 2008-10-23 3M Innovative Properties Company Antistatic optically clear pressure sensitive adhesive
US8399592B2 (en) 2007-04-17 2013-03-19 Kaneka Corporation Polyhedral polysiloxane modified product and composition using the modified product
US7651830B2 (en) * 2007-06-01 2010-01-26 3M Innovative Properties Company Patterned photoacid etching and articles therefrom
JP5101930B2 (ja) 2007-06-08 2012-12-19 マブチモーター株式会社 多角形状外形の小型モータ
US7884995B2 (en) * 2007-06-27 2011-02-08 Gentex Corporation Electrochromic device having an improved fill port plug
US8345345B2 (en) 2007-06-27 2013-01-01 Gentex Corporation Electrochromic device having an improved fill port plug
US20090000727A1 (en) * 2007-06-29 2009-01-01 Kanta Kumar Hardcoat layers on release liners
US20090004478A1 (en) * 2007-06-29 2009-01-01 3M Innovative Properties Company Flexible hardcoat compositions, articles, and methods
JP5449675B2 (ja) 2007-09-21 2014-03-19 富士フイルム株式会社 感光性組成物、該感光性組成物を用いたパターン形成方法及び該感光性組成物に用いられる化合物
DE602008006756D1 (de) * 2007-09-24 2011-06-16 Saint Gobain Abrasifs Sa Schleifprodukte mit aktiven füllern
JP4911469B2 (ja) 2007-09-28 2012-04-04 富士フイルム株式会社 レジスト組成物及びこれを用いたパターン形成方法
KR101599562B1 (ko) 2007-10-10 2016-03-03 바스프 에스이 술포늄 염 개시제
TW200927832A (en) * 2007-10-16 2009-07-01 Fujifilm Electronic Materials Novel photosensitive resin compositions
WO2009075233A1 (ja) 2007-12-10 2009-06-18 Kaneka Corporation アルカリ現像性を有する硬化性組成物およびそれを用いた絶縁性薄膜および薄膜トランジスタ
US9519216B2 (en) * 2008-02-04 2016-12-13 Fujifilm Electronic Materials U.S.A., Inc. Positive photosensitive resin compositions
WO2009114580A2 (en) * 2008-03-11 2009-09-17 3M Innovative Properties Company Hardcoat composition
KR101213586B1 (ko) 2008-03-13 2012-12-18 샌트랄 글래스 컴퍼니 리미티드 신규 함불소 카르바니온 구조를 가지는 염 및 그 유도체, 광산발생제 및 이것을 사용한 레지스트재료 및 패턴 형성방법
JP5216573B2 (ja) 2008-03-31 2013-06-19 富士フイルム株式会社 感活性光線または感放射線性樹脂組成物及びそれを用いたパターン形成方法
US8163461B2 (en) * 2008-04-09 2012-04-24 Cornell Research Foundation, Inc. Photoacid generator compounds and compositions
JP5137673B2 (ja) * 2008-04-26 2013-02-06 日本化薬株式会社 Ｍｅｍｓ用感光性樹脂組成物及びその硬化物
EP2280823A4 (de) * 2008-05-15 2011-05-04 3M Innovative Properties Co Erzeugung von farbbildern
WO2009140088A1 (en) * 2008-05-15 2009-11-19 3M Innovative Properties Company Multi-layer articles capable of forming color images
JP5247396B2 (ja) * 2008-07-02 2013-07-24 日本化薬株式会社 Ｍｅｍｓ用感光性樹脂組成物及びその硬化物
CN102186815B (zh) 2008-10-20 2014-07-30 巴斯夫欧洲公司 锍衍生物及其作为潜酸的用途
JP5498832B2 (ja) * 2009-03-25 2014-05-21 電気化学工業株式会社 エネルギー線硬化性樹脂組成物とそれを用いた接着剤及び硬化体
KR20100121427A (ko) * 2009-05-07 2010-11-17 제이에스알 가부시끼가이샤 감방사선성 수지 조성물
US8389758B2 (en) * 2009-06-05 2013-03-05 3M Innovative Properties Company Benzoxazine-thiol adducts
US8383706B2 (en) 2009-06-05 2013-02-26 3M Innovative Properties Company Benzoxazine-thiol adducts
US8753790B2 (en) * 2009-07-01 2014-06-17 Promerus, Llc Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom
US8920019B2 (en) * 2009-07-17 2014-12-30 Vita-Mix Corporation Method and apparatus for making food products
JP5583210B2 (ja) 2009-07-21 2014-09-03 スリーエム イノベイティブ プロパティズ カンパニー 硬化性組成物、フォトツールをコーティングする方法、及びコーティングされたフォトツール
US8420281B2 (en) * 2009-09-16 2013-04-16 3M Innovative Properties Company Epoxy-functionalized perfluoropolyether polyurethanes
EP2478033A1 (de) 2009-09-16 2012-07-25 3M Innovative Properties Company Fluorierte beschichtungen und damit hergestellte fotowerkzeuge
KR101768237B1 (ko) 2009-09-16 2017-08-14 쓰리엠 이노베이티브 프로퍼티즈 컴파니 플루오르화된 코팅 및 그로 제조된 포토툴
JP5850863B2 (ja) 2010-02-24 2016-02-03 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ 潜在性酸及びそれらの使用
CN102859740B (zh) * 2010-04-22 2016-06-15 日立化成株式会社 有机电子材料、聚合引发剂及热聚合引发剂、油墨组合物、有机薄膜及其制造方法、有机电子元件、有机电致发光元件、照明装置、显示元件以及显示装置
US20110300367A1 (en) 2010-06-07 2011-12-08 Ching-Kee Chien Optical Fiber With Photoacid Coating
NZ605399A (en) 2010-06-30 2014-10-31 3M Innovative Properties Co Multi-layer articles capable of forming color images and methods of forming color images
WO2012012118A2 (en) 2010-06-30 2012-01-26 3M Innovative Properties Company Multi-layer articles capable of forming color images and methods of forming color images
JP5802369B2 (ja) 2010-07-29 2015-10-28 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、並びに、それを用いたレジスト膜及びパターン形成方法
CN103119080B (zh) * 2010-09-24 2015-07-29 电气化学工业株式会社 能量射线固化性树脂组合物与使用该组合物的粘合剂及固化体
US20130235515A1 (en) 2010-11-22 2013-09-12 3M Innovative Properties Company Electronic display including an obscuring layer and method of making same
US8785517B2 (en) 2011-05-25 2014-07-22 3M Innovative Properties Company Pressure-sensitive adhesives with onium-epdxy crosslinking system
EP2723812B1 (de) 2011-06-23 2016-04-13 3M Innovative Properties Company Druckempfindliche kleber mit einem onium-epoxidharzvernetzersystem
JP5993626B2 (ja) * 2011-06-24 2016-09-14 住友化学株式会社 塩及び着色硬化性組成物
KR20140106618A (ko) 2011-11-30 2014-09-03 히타치가세이가부시끼가이샤 유기 일렉트로닉스 재료, 잉크 조성물 및 유기 일렉트로닉스 소자
SG11201404548QA (en) 2012-02-03 2014-08-28 3M Innovative Properties Co Primer compositions for optical films
JP5605516B2 (ja) * 2012-03-29 2014-10-15 Ｄｉｃ株式会社 導電性インキ組成物、導電性パターンの製造方法及び導電性回路
BR112014032247A2 (pt) 2012-06-21 2018-05-02 3M Innovative Properties Co filme gravável a laser susceptível a dissipação estática:
JP5764589B2 (ja) 2012-10-31 2015-08-19 富士フイルム株式会社 化学増幅型レジスト膜のパターニング用有機系処理液の収容容器、並びに、これらを使用したパターン形成方法及び電子デバイスの製造方法
EP2938652B1 (de) 2012-12-27 2021-03-31 3M Innovative Properties Company Polymerisierbare zusammensetzung mit einem benzoxazin und einem säurebildenden peroxidkatalysator, artikel und verfahren
WO2014164000A1 (en) 2013-03-13 2014-10-09 3M Innovative Properties Company Adhesives comprising epoxy-acid crosslinked groups and methods
WO2014151083A1 (en) 2013-03-15 2014-09-25 Gentex Corporation Fill port plugs for electrochromic devices
KR20160003641A (ko) 2013-04-30 2016-01-11 쓰리엠 이노베이티브 프로퍼티즈 컴파니 폴리(벤족사진)의 제조 방법
US9322986B2 (en) 2013-06-24 2016-04-26 Corning Incorporated Optical fiber coating for short data network
US10118060B2 (en) 2013-09-18 2018-11-06 The United States Of America As Represented By The Secretary Of The Air Force Select Schiff base compounds for chemical agent detoxification
EP3058013B1 (de) 2013-10-16 2018-01-31 3M Innovative Properties Company Benzoxazinpolymerisation
US9454054B2 (en) 2013-11-18 2016-09-27 Magna Mirrors Of America, Inc. Electro-optic mirror element and process of making same
CN106459300B (zh) 2014-04-24 2020-01-10 3M创新有限公司 包含可裂解交联剂的组合物及其制备方法
WO2016036701A1 (en) 2014-09-05 2016-03-10 3M Innovative Properties Company Heat conformable curable adhesive films
EP3253735B1 (de) 2015-02-02 2021-03-31 Basf Se Latente säuren und ihre verwendung
JP6469887B2 (ja) 2015-04-16 2019-02-13 スリーエム イノベイティブ プロパティズ カンパニー チオール−アルケン−エポキシマトリックスを有する量子ドット物品
JP6422598B2 (ja) 2015-04-16 2018-11-14 スリーエム イノベイティブ プロパティズ カンパニー チオール−エポキシマトリックスを有する量子ドット物品
US10768528B2 (en) 2015-09-28 2020-09-08 3M Innovative Properties Company Patterned film article comprising cleavable crosslinker and methods
TWI619699B (zh) 2015-12-31 2018-04-01 Rohm And Haas Electronic Materials Llc 光酸產生劑
TWI662364B (zh) 2015-12-31 2019-06-11 Rohm And Haas Electronic Materials Llc 光致抗蝕劑組合物、包含光致抗蝕劑組合物的經塗佈基板及形成電子裝置的方法
WO2018005285A1 (en) 2016-06-29 2018-01-04 3M Innovative Properties Company Compound, adhesive article, and methods of making the same
CN109415603A (zh) 2016-06-29 2019-03-01 3M创新有限公司 粘合剂制品及其制备方法
EP3510115A1 (de) 2016-09-08 2019-07-17 3M Innovative Properties Company Haftartikel und verfahren zur herstellung davon
EP3714017A2 (de) 2017-11-21 2020-09-30 Nitto Denko Corporation Basische ionische flüssigkeitszusammensetzungen und elemente damit
JPWO2019123842A1 (ja) 2017-12-22 2020-12-03 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、レジスト膜付きマスクブランクス、フォトマスクの製造方法、電子デバイスの製造方法
JP7024744B2 (ja) * 2018-02-22 2022-02-24 信越化学工業株式会社 レジスト材料及びこれを用いたパターン形成方法
CN108441201A (zh) * 2018-05-11 2018-08-24 中国石油天然气股份有限公司 一种含双全氟辛基的氟硅表面活性剂以及油基泡沫驱油剂
US20210332269A1 (en) 2018-12-19 2021-10-28 3M Innovative Properties Company Release layers and articles containing them
EP3725820B1 (de) 2019-04-16 2022-04-06 Henkel AG & Co. KGaA Verwendung von funktionalisierten alpha-angelica-lactonen
EP3798246B1 (de) 2019-09-27 2024-01-31 Henkel AG & Co. KGaA Einkomponentige (1k) zusammensetzung auf basis von modifiziertem epoxidharz
EP3831862B1 (de) 2019-12-04 2023-06-28 Henkel AG & Co. KGaA Einkomponentige (1k) zusammensetzung auf basis von epoxidharz
EP3831863B1 (de) 2019-12-04 2023-07-05 Henkel AG & Co. KGaA Einkomponentige (1k) zusammensetzung auf der basis von epoxidharz
US20230014501A1 (en) 2019-12-20 2023-01-19 3M Innovative Properties Company Adhesive article comprising polymer and polymerizable cyclic olefins, adhesive compositions and methods
WO2021124156A1 (en) 2019-12-20 2021-06-24 3M Innovative Properties Company Method of pattern coating adhesive composition comprising unpolymerized cyclic olefin and latent catalyst, adhesive compositions and articles
EP3916033A1 (de) 2020-05-28 2021-12-01 Henkel AG & Co. KGaA Einkomponentige (1k) zusammensetzung auf basis von epoxidharz
WO2022081271A1 (en) 2020-10-13 2022-04-21 Cabot Corporation Conductive photo-curable compositions for additive manufacturing
EP4012000A1 (de) 2020-12-11 2022-06-15 Bostik SA Lichthärtbare klebstoffzusammensetzung
EP4050061A1 (de) 2021-02-26 2022-08-31 Henkel AG & Co. KGaA Im nahinfrarotbereich (nir) sensibilisierte kleb- und dichtstoffzusammensetzungen
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WO2023091407A1 (en) 2021-11-16 2023-05-25 3M Innovative Properties Company Release composition, articles prepared from the release composition, and related methods
EP4183807A1 (de) 2021-11-18 2023-05-24 Henkel AG & Co. KGaA Copolymer und heissschmelzzusammensetzungen mit diesem copolymer
WO2023111715A1 (en) 2021-12-16 2023-06-22 3M Innovative Properties Company Compositions comprising cleavable crosslinkers
CN115057779B (zh) * 2022-05-23 2024-01-05 苏州大学 一种y型含氟两亲性聚合物及其制备和应用
EP4332144A1 (de) 2022-09-05 2024-03-06 Henkel AG & Co. KGaA Einkomponentige (1k) härtbare klebstoffzusammensetzung
WO2024074908A1 (en) 2022-10-03 2024-04-11 3M Innovative Properties Company Adhesive composition comprising polar (meth)acrylate monomer and epoxy resin, articles and methods
WO2024074909A1 (en) 2022-10-07 2024-04-11 3M Innovative Properties Company Articles comprising cyclic olefin, catalyst, and second polymerizable material, methods and compositions

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL127400C (de) * 1965-11-22
US4039521A (en) * 1973-04-23 1977-08-02 Minnesota Mining And Manufacturing Company Aromatic diazonium bis(fluorinated alkylsulfonyl) methides
US4049861A (en) * 1975-03-07 1977-09-20 Minnesota Mining And Manufacturing Company Abrasion resistant coatings
US4031036A (en) * 1975-06-09 1977-06-21 Minnesota Mining And Manufacturing Company Use of bis(fluoroaliphaticsulfonyl) imides in cationic polymerization
US4115295A (en) * 1976-04-26 1978-09-19 Minnesota Mining And Manufacturing Company Polymerizable compositions containing highly fluorinated aliphatic sulfonyl protonic acid catalyst
US4472479A (en) * 1979-12-10 1984-09-18 Recognition Equipment Incorporated Light barrier fluorescent ribbon
CA1323949C (en) * 1987-04-02 1993-11-02 Michael C. Palazzotto Ternary photoinitiator system for addition polymerization
US4889792A (en) * 1987-12-09 1989-12-26 Minnesota Mining And Manufacturing Company Ternary photoinitiator system for addition polymerization
US4920182A (en) * 1987-12-18 1990-04-24 Ciba-Geigy Corporation Epoxy resin compositions containing polyester flexibilizer and metallocene complex initiator
JP2552550B2 (ja) * 1989-07-24 1996-11-13 富士写真フイルム株式会社 感光性組成物
JP2632069B2 (ja) * 1990-04-17 1997-07-16 富士写真フイルム株式会社 光重合性組成物
US5273840A (en) * 1990-08-01 1993-12-28 Covalent Associates Incorporated Methide salts, formulations, electrolytes and batteries formed therefrom
FR2683524A1 (fr) * 1991-11-08 1993-05-14 Centre Nat Rech Scient Derives des bis(perfluorosulfonyl)methanes, leur procede de preparation, et leurs utilisations .

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CN1177346A (zh) 1998-03-25
KR100436804B1 (ko) 2004-09-16
WO1996027584A1 (en) 1996-09-12
JPH11501909A (ja) 1999-02-16
US5554664A (en) 1996-09-10
AU4776696A (en) 1996-09-23
CA2213465A1 (en) 1996-09-12
DE69610294D1 (de) 2000-10-19
EP0813521B1 (de) 2000-09-13
EP0813521A1 (de) 1997-12-29
JP3985020B2 (ja) 2007-10-03

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