DE69610750D1 - Verfahren zur Positionierung einer Maske bezüglich einer anderen Maske und eines Werkstücks und Vorrichtung zur Durchführung des Verfahrens - Google Patents
Verfahren zur Positionierung einer Maske bezüglich einer anderen Maske und eines Werkstücks und Vorrichtung zur Durchführung des VerfahrensInfo
- Publication number
- DE69610750D1 DE69610750D1 DE69610750T DE69610750T DE69610750D1 DE 69610750 D1 DE69610750 D1 DE 69610750D1 DE 69610750 T DE69610750 T DE 69610750T DE 69610750 T DE69610750 T DE 69610750T DE 69610750 D1 DE69610750 D1 DE 69610750D1
- Authority
- DE
- Germany
- Prior art keywords
- mask
- workpiece
- positioning
- carrying
- respect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
- G03F9/7026—Focusing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7084—Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7192947A JP2994232B2 (ja) | 1995-07-28 | 1995-07-28 | マスクとマスクまたはマスクとワークの位置合わせ方法および装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69610750D1 true DE69610750D1 (de) | 2000-11-30 |
DE69610750T2 DE69610750T2 (de) | 2001-05-10 |
Family
ID=16299665
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69610750T Expired - Lifetime DE69610750T2 (de) | 1995-07-28 | 1996-07-25 | Verfahren zur Positionierung einer Maske bezüglich einer anderen Maske und eines Werkstücks und Vorrichtung zur Durchführung des Verfahrens |
Country Status (6)
Country | Link |
---|---|
US (1) | US5940528A (de) |
EP (1) | EP0756207B1 (de) |
JP (1) | JP2994232B2 (de) |
KR (1) | KR100413035B1 (de) |
DE (1) | DE69610750T2 (de) |
TW (1) | TW442711B (de) |
Families Citing this family (46)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7907793B1 (en) | 2001-05-04 | 2011-03-15 | Legend Films Inc. | Image sequence depth enhancement system and method |
US8396328B2 (en) | 2001-05-04 | 2013-03-12 | Legend3D, Inc. | Minimal artifact image sequence depth enhancement system and method |
JP3445100B2 (ja) * | 1997-06-02 | 2003-09-08 | キヤノン株式会社 | 位置検出方法及び位置検出装置 |
JPH11312635A (ja) * | 1998-04-28 | 1999-11-09 | Ushio Inc | コンタクト露光方法 |
US8632590B2 (en) | 1999-10-20 | 2014-01-21 | Anulex Technologies, Inc. | Apparatus and methods for the treatment of the intervertebral disc |
US7004970B2 (en) | 1999-10-20 | 2006-02-28 | Anulex Technologies, Inc. | Methods and devices for spinal disc annulus reconstruction and repair |
US7615076B2 (en) | 1999-10-20 | 2009-11-10 | Anulex Technologies, Inc. | Method and apparatus for the treatment of the intervertebral disc annulus |
US6356337B1 (en) * | 2000-03-08 | 2002-03-12 | Anvik Corporation | Two-sided substrate imaging using single-approach projection optics |
US6211942B1 (en) * | 2000-03-10 | 2001-04-03 | Howa Machinery Ltd. | Double-sided exposure system |
EP1406126A1 (de) * | 2001-01-15 | 2004-04-07 | ASML Netherlands B.V. | Verfahren zur Herstellung einer Vorrichtung |
US7113258B2 (en) | 2001-01-15 | 2006-09-26 | Asml Netherlands B.V. | Lithographic apparatus |
US6768539B2 (en) | 2001-01-15 | 2004-07-27 | Asml Netherlands B.V. | Lithographic apparatus |
US8897596B1 (en) | 2001-05-04 | 2014-11-25 | Legend3D, Inc. | System and method for rapid image sequence depth enhancement with translucent elements |
MXPA03010039A (es) * | 2001-05-04 | 2004-12-06 | Legend Films Llc | Sistema y metodo para mejorar la secuencia de imagen. |
US9031383B2 (en) | 2001-05-04 | 2015-05-12 | Legend3D, Inc. | Motion picture project management system |
US9286941B2 (en) | 2001-05-04 | 2016-03-15 | Legend3D, Inc. | Image sequence enhancement and motion picture project management system |
US8401336B2 (en) | 2001-05-04 | 2013-03-19 | Legend3D, Inc. | System and method for rapid image sequence depth enhancement with augmented computer-generated elements |
TW594431B (en) | 2002-03-01 | 2004-06-21 | Asml Netherlands Bv | Calibration methods, calibration substrates, lithographic apparatus and device manufacturing methods |
EP1341046A3 (de) * | 2002-03-01 | 2004-12-15 | ASML Netherlands B.V. | Kalibrationsverfahren, Kalibrationssubstrate, lithographischer Apparat und Verfahren zur Herstellung von Artikeln |
JP3643572B2 (ja) * | 2002-05-31 | 2005-04-27 | 株式会社アドテックエンジニアリング | 投影露光装置及び位置合わせ装置 |
DE102004013886A1 (de) | 2004-03-16 | 2005-10-06 | Carl Zeiss Smt Ag | Verfahren zur Mehrfachbelichtung, Mikrolithografie-Projektionsbelichtungsanlage und Projektionssystem |
US7388663B2 (en) * | 2004-10-28 | 2008-06-17 | Asml Netherlands B.V. | Optical position assessment apparatus and method |
US7663732B2 (en) * | 2005-03-18 | 2010-02-16 | Canon Kabushiki Kaisha | Exposure apparatus, exposure method and device manufacturing method for compensating position measuring system using temperature |
US7782442B2 (en) | 2005-12-06 | 2010-08-24 | Nikon Corporation | Exposure apparatus, exposure method, projection optical system and device producing method |
JP2007318069A (ja) * | 2005-12-06 | 2007-12-06 | Nikon Corp | 露光装置及び露光方法、並びにデバイス製造方法、投影光学系 |
EP1970944A4 (de) * | 2005-12-06 | 2010-04-28 | Nikon Corp | Belichtungsvorrichtung, belichtungsverfahren, optisches projektionssystem und bauelementeherstellungsverfahren |
KR100922203B1 (ko) * | 2008-04-28 | 2009-10-20 | 주식회사 프로텍 | 레이저 디렉트 이미징 시스템용 상하부 노광 엔진의위치정렬방법 및 장치 |
KR100915452B1 (ko) * | 2008-04-28 | 2009-09-04 | 주식회사 프로텍 | Slm을 이용한 상 하부 동시 노광 방식의 빔 미러 픽셀영상 위치정렬방법 및 장치 |
US8923602B2 (en) * | 2008-07-22 | 2014-12-30 | Comau, Inc. | Automated guidance and recognition system and method of the same |
JP5523207B2 (ja) * | 2010-06-01 | 2014-06-18 | 株式会社トプコン | 露光装置 |
US8730232B2 (en) | 2011-02-01 | 2014-05-20 | Legend3D, Inc. | Director-style based 2D to 3D movie conversion system and method |
US9282321B2 (en) | 2011-02-17 | 2016-03-08 | Legend3D, Inc. | 3D model multi-reviewer system |
US9407904B2 (en) | 2013-05-01 | 2016-08-02 | Legend3D, Inc. | Method for creating 3D virtual reality from 2D images |
US9288476B2 (en) | 2011-02-17 | 2016-03-15 | Legend3D, Inc. | System and method for real-time depth modification of stereo images of a virtual reality environment |
US9241147B2 (en) | 2013-05-01 | 2016-01-19 | Legend3D, Inc. | External depth map transformation method for conversion of two-dimensional images to stereoscopic images |
US9113130B2 (en) | 2012-02-06 | 2015-08-18 | Legend3D, Inc. | Multi-stage production pipeline system |
WO2013011586A1 (ja) * | 2011-07-21 | 2013-01-24 | 株式会社ニレコ | 帯状体の端部位置検出装置及び帯状体の端部位置検出方法 |
JP5857725B2 (ja) * | 2011-12-20 | 2016-02-10 | ウシオ電機株式会社 | 露光装置 |
JP6200224B2 (ja) | 2012-09-13 | 2017-09-20 | 日本メクトロン株式会社 | フォトマスク、フォトマスク組、露光装置および露光方法 |
CN102968000A (zh) | 2012-11-21 | 2013-03-13 | 京东方科技集团股份有限公司 | 一种双面制程方法及曝光装置 |
US9007365B2 (en) | 2012-11-27 | 2015-04-14 | Legend3D, Inc. | Line depth augmentation system and method for conversion of 2D images to 3D images |
US9547937B2 (en) | 2012-11-30 | 2017-01-17 | Legend3D, Inc. | Three-dimensional annotation system and method |
US9007404B2 (en) | 2013-03-15 | 2015-04-14 | Legend3D, Inc. | Tilt-based look around effect image enhancement method |
US9438878B2 (en) | 2013-05-01 | 2016-09-06 | Legend3D, Inc. | Method of converting 2D video to 3D video using 3D object models |
US9609307B1 (en) | 2015-09-17 | 2017-03-28 | Legend3D, Inc. | Method of converting 2D video to 3D video using machine learning |
DE102017105697A1 (de) * | 2017-03-16 | 2018-09-20 | Ev Group E. Thallner Gmbh | Verfahren und Vorrichtung zur Ausrichtung zweier optischer Teilsysteme |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5636566B2 (de) * | 1973-06-18 | 1981-08-25 | ||
JPH03288112A (ja) * | 1990-04-04 | 1991-12-18 | Dainippon Screen Mfg Co Ltd | 色消しレンズ系 |
JP3109852B2 (ja) * | 1991-04-16 | 2000-11-20 | キヤノン株式会社 | 投影露光装置 |
JP3120474B2 (ja) * | 1991-06-10 | 2000-12-25 | 株式会社日立製作所 | 半導体集積回路装置の製造方法 |
JP2994968B2 (ja) * | 1994-10-06 | 1999-12-27 | ウシオ電機株式会社 | マスクとワークの位置合わせ方法および装置 |
-
1995
- 1995-07-28 JP JP7192947A patent/JP2994232B2/ja not_active Expired - Lifetime
-
1996
- 1996-06-22 TW TW085107526A patent/TW442711B/zh not_active IP Right Cessation
- 1996-07-25 EP EP96112043A patent/EP0756207B1/de not_active Expired - Lifetime
- 1996-07-25 DE DE69610750T patent/DE69610750T2/de not_active Expired - Lifetime
- 1996-07-27 KR KR1019960030838A patent/KR100413035B1/ko not_active IP Right Cessation
- 1996-07-29 US US08/688,006 patent/US5940528A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0756207A2 (de) | 1997-01-29 |
KR100413035B1 (ko) | 2004-06-12 |
US5940528A (en) | 1999-08-17 |
EP0756207A3 (de) | 1997-11-12 |
JP2994232B2 (ja) | 1999-12-27 |
EP0756207B1 (de) | 2000-10-25 |
KR970007512A (ko) | 1997-02-21 |
DE69610750T2 (de) | 2001-05-10 |
TW442711B (en) | 2001-06-23 |
JPH0945603A (ja) | 1997-02-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |