DE69620848T2 - Photolack-Entfernungslösung und Verfahren zur Entfernung von Photolack unter Verwendung derselben - Google Patents

Photolack-Entfernungslösung und Verfahren zur Entfernung von Photolack unter Verwendung derselben

Info

Publication number
DE69620848T2
DE69620848T2 DE69620848T DE69620848T DE69620848T2 DE 69620848 T2 DE69620848 T2 DE 69620848T2 DE 69620848 T DE69620848 T DE 69620848T DE 69620848 T DE69620848 T DE 69620848T DE 69620848 T2 DE69620848 T2 DE 69620848T2
Authority
DE
Germany
Prior art keywords
photoresist
same
removal solution
photoresist removal
removing photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69620848T
Other languages
English (en)
Other versions
DE69620848D1 (de
Inventor
Masahito Tanabe
Kazumasa Wakiya
Masakazu Kobayashi
Toshimasa Nakayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=26499593&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69620848(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Application granted granted Critical
Publication of DE69620848D1 publication Critical patent/DE69620848D1/de
Publication of DE69620848T2 publication Critical patent/DE69620848T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/423—Stripping or agents therefor using liquids only containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
DE69620848T 1995-11-13 1996-11-13 Photolack-Entfernungslösung und Verfahren zur Entfernung von Photolack unter Verwendung derselben Expired - Fee Related DE69620848T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP31703595 1995-11-13
JP17987296A JP3236220B2 (ja) 1995-11-13 1996-06-21 レジスト用剥離液組成物

Publications (2)

Publication Number Publication Date
DE69620848D1 DE69620848D1 (de) 2002-05-29
DE69620848T2 true DE69620848T2 (de) 2002-11-14

Family

ID=26499593

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69620848T Expired - Fee Related DE69620848T2 (de) 1995-11-13 1996-11-13 Photolack-Entfernungslösung und Verfahren zur Entfernung von Photolack unter Verwendung derselben

Country Status (6)

Country Link
US (2) US5792274A (de)
EP (1) EP0773480B1 (de)
JP (1) JP3236220B2 (de)
KR (1) KR100222513B1 (de)
DE (1) DE69620848T2 (de)
TW (1) TW439018B (de)

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KR100222513B1 (ko) 1999-10-01
EP0773480B1 (de) 2002-04-24
EP0773480A1 (de) 1997-05-14
US5905063A (en) 1999-05-18
JPH09197681A (ja) 1997-07-31
JP3236220B2 (ja) 2001-12-10
TW439018B (en) 2001-06-07
US5792274A (en) 1998-08-11
KR970028873A (ko) 1997-06-24
DE69620848D1 (de) 2002-05-29

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