DE69625045T2 - VERFAHREN ZUR HERSTELLUNG VON EINEM AUF GaN-AlN BASIERTEN HOCHSPANNUNGSHALBLEITERBAUELEMENT UND HERGESTELLTES HALBLEITERBAUELEMENT - Google Patents

VERFAHREN ZUR HERSTELLUNG VON EINEM AUF GaN-AlN BASIERTEN HOCHSPANNUNGSHALBLEITERBAUELEMENT UND HERGESTELLTES HALBLEITERBAUELEMENT

Info

Publication number
DE69625045T2
DE69625045T2 DE69625045T DE69625045T DE69625045T2 DE 69625045 T2 DE69625045 T2 DE 69625045T2 DE 69625045 T DE69625045 T DE 69625045T DE 69625045 T DE69625045 T DE 69625045T DE 69625045 T2 DE69625045 T2 DE 69625045T2
Authority
DE
Germany
Prior art keywords
semiconductor component
aln
gan
production
produced
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69625045T
Other languages
English (en)
Other versions
DE69625045D1 (de
Inventor
R Tasker
M Mensz
A Khan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Electronics NV filed Critical Koninklijke Philips Electronics NV
Application granted granted Critical
Publication of DE69625045D1 publication Critical patent/DE69625045D1/de
Publication of DE69625045T2 publication Critical patent/DE69625045T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
    • H01L29/51—Insulating materials associated therewith
    • H01L29/518—Insulating materials associated therewith the insulating material containing nitrogen, e.g. nitride, oxynitride, nitrogen-doped material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
    • H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
    • H01L21/28575—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising AIIIBV compounds
    • H01L21/28587—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising AIIIBV compounds characterised by the sectional shape, e.g. T, inverted T
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
    • H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
    • H01L21/28575—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising AIIIBV compounds
    • H01L21/28587—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising AIIIBV compounds characterised by the sectional shape, e.g. T, inverted T
    • H01L21/28593—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising AIIIBV compounds characterised by the sectional shape, e.g. T, inverted T asymmetrical sectional shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/107—Substrate region of field-effect devices
    • H01L29/1075—Substrate region of field-effect devices of field-effect transistors
    • H01L29/1079—Substrate region of field-effect devices of field-effect transistors with insulated gate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007—Multistep manufacturing processes
    • H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66409—Unipolar field-effect transistors
    • H01L29/66446—Unipolar field-effect transistors with an active layer made of a group 13/15 material, e.g. group 13/15 velocity modulation transistor [VMT], group 13/15 negative resistance FET [NERFET]
    • H01L29/66462—Unipolar field-effect transistors with an active layer made of a group 13/15 material, e.g. group 13/15 velocity modulation transistor [VMT], group 13/15 negative resistance FET [NERFET] with a heterojunction interface channel or gate, e.g. HFET, HIGFET, SISFET, HJFET, HEMT
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78681—Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising AIIIBV or AIIBVI or AIVBVI semiconductor materials, or Se or Te
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/80—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier
    • H01L29/802—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier with heterojunction gate, e.g. transistors with semiconductor layer acting as gate insulating layer, MIS-like transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/20—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
    • H01L29/2003—Nitride compounds
DE69625045T 1995-12-28 1996-12-06 VERFAHREN ZUR HERSTELLUNG VON EINEM AUF GaN-AlN BASIERTEN HOCHSPANNUNGSHALBLEITERBAUELEMENT UND HERGESTELLTES HALBLEITERBAUELEMENT Expired - Fee Related DE69625045T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/583,148 US5915164A (en) 1995-12-28 1995-12-28 Methods of making high voltage GaN-A1N based semiconductor devices
PCT/IB1996/001377 WO1997024752A2 (en) 1995-12-28 1996-12-06 A METHOD OF MANUFACTURING A HIGH VOLTAGE GaN-AlN BASED SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MADE

Publications (2)

Publication Number Publication Date
DE69625045D1 DE69625045D1 (de) 2003-01-09
DE69625045T2 true DE69625045T2 (de) 2003-07-24

Family

ID=24331868

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69625045T Expired - Fee Related DE69625045T2 (de) 1995-12-28 1996-12-06 VERFAHREN ZUR HERSTELLUNG VON EINEM AUF GaN-AlN BASIERTEN HOCHSPANNUNGSHALBLEITERBAUELEMENT UND HERGESTELLTES HALBLEITERBAUELEMENT

Country Status (5)

Country Link
US (2) US5915164A (de)
EP (1) EP0812468B1 (de)
JP (1) JPH11501463A (de)
DE (1) DE69625045T2 (de)
WO (1) WO1997024752A2 (de)

Families Citing this family (80)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5915164A (en) * 1995-12-28 1999-06-22 U.S. Philips Corporation Methods of making high voltage GaN-A1N based semiconductor devices
US6031263A (en) 1997-07-29 2000-02-29 Micron Technology, Inc. DEAPROM and transistor with gallium nitride or gallium aluminum nitride gate
US6965123B1 (en) 1997-07-29 2005-11-15 Micron Technology, Inc. Transistor with variable electron affinity gate and methods of fabrication and use
US7196929B1 (en) 1997-07-29 2007-03-27 Micron Technology Inc Method for operating a memory device having an amorphous silicon carbide gate insulator
US6936849B1 (en) 1997-07-29 2005-08-30 Micron Technology, Inc. Silicon carbide gate transistor
US7154153B1 (en) * 1997-07-29 2006-12-26 Micron Technology, Inc. Memory device
US6746893B1 (en) 1997-07-29 2004-06-08 Micron Technology, Inc. Transistor with variable electron affinity gate and methods of fabrication and use
US6297538B1 (en) * 1998-03-23 2001-10-02 The University Of Delaware Metal-insulator-semiconductor field effect transistor having an oxidized aluminum nitride gate insulator formed on a gallium nitride or silicon substrate
US6495409B1 (en) * 1999-01-26 2002-12-17 Agere Systems Inc. MOS transistor having aluminum nitride gate structure and method of manufacturing same
US6093952A (en) * 1999-03-31 2000-07-25 California Institute Of Technology Higher power gallium nitride schottky rectifier
TW474024B (en) * 1999-08-16 2002-01-21 Cornell Res Foundation Inc Passivation of GaN based FETs
US6265322B1 (en) 1999-09-21 2001-07-24 Agere Systems Guardian Corp. Selective growth process for group III-nitride-based semiconductors
DE10004394A1 (de) * 2000-02-02 2001-08-16 Infineon Technologies Ag Verfahren zur Grabenätzung in Halbleitermaterial
JP4667556B2 (ja) * 2000-02-18 2011-04-13 古河電気工業株式会社 縦型ＧａＮ系電界効果トランジスタ、バイポーラトランジスタと縦型ＧａＮ系電界効果トランジスタの製造方法
JP2001267555A (ja) 2000-03-22 2001-09-28 Matsushita Electric Ind Co Ltd 半導体装置及びその製造方法
US6690042B2 (en) * 2000-09-27 2004-02-10 Sensor Electronic Technology, Inc. Metal oxide semiconductor heterostructure field effect transistor
US6593193B2 (en) 2001-02-27 2003-07-15 Matsushita Electric Industrial Co., Ltd. Semiconductor device and method for fabricating the same
DE10120877A1 (de) * 2001-04-27 2002-10-31 Philips Corp Intellectual Pty Anordnung mit einem Halbleiterbauelement
US20040029365A1 (en) * 2001-05-07 2004-02-12 Linthicum Kevin J. Methods of fabricating gallium nitride microelectronic layers on silicon layers and gallium nitride microelectronic structures formed thereby
JP3866540B2 (ja) * 2001-07-06 2007-01-10 株式会社東芝 窒化物半導体素子およびその製造方法
US7030428B2 (en) * 2001-12-03 2006-04-18 Cree, Inc. Strain balanced nitride heterojunction transistors
JP4104891B2 (ja) * 2002-04-01 2008-06-18 三菱電機株式会社 半導体装置の製造方法
US7473947B2 (en) * 2002-07-12 2009-01-06 Intel Corporation Process for ultra-thin body SOI devices that incorporate EPI silicon tips and article made thereby
US6830945B2 (en) * 2002-09-16 2004-12-14 Hrl Laboratories, Llc Method for fabricating a non-planar nitride-based heterostructure field effect transistor
WO2004025733A1 (en) * 2002-09-16 2004-03-25 Hrl Laboratories, Llc Non-planar nitride-based semiconductor structure and metehod for fabricating the same
US6986693B2 (en) * 2003-03-26 2006-01-17 Lucent Technologies Inc. Group III-nitride layers with patterned surfaces
US6847057B1 (en) * 2003-08-01 2005-01-25 Lumileds Lighting U.S., Llc Semiconductor light emitting devices
US20050040212A1 (en) * 2003-08-23 2005-02-24 Kuang-Neng Yang Method for manufacturing nitride light-emitting device
US7071498B2 (en) * 2003-12-17 2006-07-04 Nitronex Corporation Gallium nitride material devices including an electrode-defining layer and methods of forming the same
KR20050065716A (ko) * 2003-12-23 2005-06-30 삼성전자주식회사 강유전성 액정 소자의 배향 방법 및 배향 장치
US7045404B2 (en) * 2004-01-16 2006-05-16 Cree, Inc. Nitride-based transistors with a protective layer and a low-damage recess and methods of fabrication thereof
US7901994B2 (en) * 2004-01-16 2011-03-08 Cree, Inc. Methods of manufacturing group III nitride semiconductor devices with silicon nitride layers
US7612390B2 (en) 2004-02-05 2009-11-03 Cree, Inc. Heterojunction transistors including energy barriers
US7170111B2 (en) * 2004-02-05 2007-01-30 Cree, Inc. Nitride heterojunction transistors having charge-transfer induced energy barriers and methods of fabricating the same
US7084441B2 (en) * 2004-05-20 2006-08-01 Cree, Inc. Semiconductor devices having a hybrid channel layer, current aperture transistors and methods of fabricating same
US7432142B2 (en) * 2004-05-20 2008-10-07 Cree, Inc. Methods of fabricating nitride-based transistors having regrown ohmic contact regions
KR100609542B1 (ko) * 2004-06-08 2006-08-08 주식회사 하이닉스반도체 알루미늄 질화막을 게이트 절연막으로 하는 반도체 소자의게이트 전극 제조 방법
US7361946B2 (en) * 2004-06-28 2008-04-22 Nitronex Corporation Semiconductor device-based sensors
US20060017064A1 (en) * 2004-07-26 2006-01-26 Saxler Adam W Nitride-based transistors having laterally grown active region and methods of fabricating same
US7456443B2 (en) * 2004-11-23 2008-11-25 Cree, Inc. Transistors having buried n-type and p-type regions beneath the source region
US7709859B2 (en) * 2004-11-23 2010-05-04 Cree, Inc. Cap layers including aluminum nitride for nitride-based transistors
US7161194B2 (en) * 2004-12-06 2007-01-09 Cree, Inc. High power density and/or linearity transistors
US7465967B2 (en) * 2005-03-15 2008-12-16 Cree, Inc. Group III nitride field effect transistors (FETS) capable of withstanding high temperature reverse bias test conditions
US8575651B2 (en) 2005-04-11 2013-11-05 Cree, Inc. Devices having thick semi-insulating epitaxial gallium nitride layer
US7626217B2 (en) * 2005-04-11 2009-12-01 Cree, Inc. Composite substrates of conductive and insulating or semi-insulating group III-nitrides for group III-nitride devices
US7544963B2 (en) * 2005-04-29 2009-06-09 Cree, Inc. Binary group III-nitride based high electron mobility transistors
US7615774B2 (en) * 2005-04-29 2009-11-10 Cree.Inc. Aluminum free group III-nitride based high electron mobility transistors
US9331192B2 (en) 2005-06-29 2016-05-03 Cree, Inc. Low dislocation density group III nitride layers on silicon carbide substrates and methods of making the same
US20070018198A1 (en) * 2005-07-20 2007-01-25 Brandes George R High electron mobility electronic device structures comprising native substrates and methods for making the same
US7994632B2 (en) * 2006-01-10 2011-08-09 International Rectifier Corporation Interdigitated conductive lead frame or laminate lead frame for GaN die
US7952109B2 (en) * 2006-07-10 2011-05-31 Alcatel-Lucent Usa Inc. Light-emitting crystal structures
US7266257B1 (en) 2006-07-12 2007-09-04 Lucent Technologies Inc. Reducing crosstalk in free-space optical communications
US8823057B2 (en) 2006-11-06 2014-09-02 Cree, Inc. Semiconductor devices including implanted regions for providing low-resistance contact to buried layers and related devices
US8878245B2 (en) * 2006-11-30 2014-11-04 Cree, Inc. Transistors and method for making ohmic contact to transistors
JP2008159631A (ja) * 2006-12-20 2008-07-10 Furukawa Electric Co Ltd:The Ｉｉｉ−ｖ族窒化物化合物半導体電界効果トランジスタおよびその製造方法
JP4653124B2 (ja) * 2007-01-12 2011-03-16 古河電気工業株式会社 半導体素子製造方法
US9484499B2 (en) * 2007-04-20 2016-11-01 Cree, Inc. Transparent ohmic contacts on light emitting diodes with carrier substrates
JP2008311392A (ja) * 2007-06-14 2008-12-25 Furukawa Electric Co Ltd:The Ｉｉｉ族窒化物半導体を用いた電界効果トランジスタ
JP2009076673A (ja) * 2007-09-20 2009-04-09 Furukawa Electric Co Ltd:The Ｉｉｉ族窒化物半導体を用いた電界効果トランジスタ
JP2009088081A (ja) * 2007-09-28 2009-04-23 Furukawa Electric Co Ltd:The Ｉｉｉ族窒化物半導体を用いた電界効果トランジスタ
US8368100B2 (en) 2007-11-14 2013-02-05 Cree, Inc. Semiconductor light emitting diodes having reflective structures and methods of fabricating same
US8304809B2 (en) * 2007-11-16 2012-11-06 Furukawa Electric Co., Ltd. GaN-based semiconductor device and method of manufacturing the same
JP5463529B2 (ja) * 2008-06-11 2014-04-09 古河電気工業株式会社 電界効果トランジスタの製造方法
JP5355959B2 (ja) * 2008-08-08 2013-11-27 古河電気工業株式会社 電界効果トランジスタおよび電界効果トランジスタの製造方法
US8741715B2 (en) * 2009-04-29 2014-06-03 Cree, Inc. Gate electrodes for millimeter-wave operation and methods of fabrication
CN102484067A (zh) * 2009-06-26 2012-05-30 康奈尔大学 包括铝-硅氮化物钝化的用于形成iii-v半导体结构的方法
US8270131B2 (en) * 2009-07-31 2012-09-18 Infineon Technologies Ag Electrostatic discharge protection element and electrostatic discharge protection chip and method of producing the same
KR101774933B1 (ko) * 2010-03-02 2017-09-06 삼성전자 주식회사 듀얼 디플리션을 나타내는 고 전자 이동도 트랜지스터 및 그 제조방법
US20130099284A1 (en) * 2011-10-20 2013-04-25 Triquint Semiconductor, Inc. Group iii-nitride metal-insulator-semiconductor heterostructure field-effect transistors
US20130105817A1 (en) 2011-10-26 2013-05-02 Triquint Semiconductor, Inc. High electron mobility transistor structure and method
JP5306438B2 (ja) * 2011-11-14 2013-10-02 シャープ株式会社 電界効果トランジスタおよびその製造方法
US8975664B2 (en) 2012-06-27 2015-03-10 Triquint Semiconductor, Inc. Group III-nitride transistor using a regrown structure
JP6150322B2 (ja) * 2012-08-03 2017-06-21 ローム株式会社 窒化物半導体素子
US9123533B2 (en) * 2012-08-10 2015-09-01 Avogy, Inc. Method and system for in-situ etch and regrowth in gallium nitride based devices
US9099490B2 (en) * 2012-09-28 2015-08-04 Intel Corporation Self-aligned structures and methods for asymmetric GaN transistors and enhancement mode operation
US9552979B2 (en) * 2013-05-31 2017-01-24 Asm Ip Holding B.V. Cyclic aluminum nitride deposition in a batch reactor
US9093532B2 (en) 2013-06-21 2015-07-28 International Business Machines Corporation Overlapped III-V finFET with doped semiconductor extensions
USD826871S1 (en) 2014-12-11 2018-08-28 Cree, Inc. Light emitting diode device
CN112242441A (zh) * 2019-07-16 2021-01-19 联华电子股份有限公司 高电子迁移率晶体管
DE102020004758A1 (de) * 2019-08-30 2021-03-04 Semiconductor Components Industries, Llc Siliciumcarbid-feldeffekttransistoren

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8701497A (nl) * 1987-06-26 1989-01-16 Philips Nv Halfgeleiderinrichting voor het opwekken van electromagnetische straling.
JP3026087B2 (ja) * 1989-03-01 2000-03-27 豊田合成株式会社 窒化ガリウム系化合物半導体の気相成長方法
US5210051A (en) * 1990-03-27 1993-05-11 Cree Research, Inc. High efficiency light emitting diodes from bipolar gallium nitride
JP3078821B2 (ja) * 1990-05-30 2000-08-21 豊田合成株式会社 半導体のドライエッチング方法
US5192987A (en) * 1991-05-17 1993-03-09 Apa Optics, Inc. High electron mobility transistor with GaN/Alx Ga1-x N heterojunctions
JP2666228B2 (ja) * 1991-10-30 1997-10-22 豊田合成株式会社 窒化ガリウム系化合物半導体発光素子
DE4323814A1 (de) * 1992-09-25 1994-03-31 Siemens Ag MIS-Feldeffekttransistor
US5393993A (en) * 1993-12-13 1995-02-28 Cree Research, Inc. Buffer structure between silicon carbide and gallium nitride and resulting semiconductor devices
JPH07273366A (ja) * 1994-03-28 1995-10-20 Pioneer Electron Corp Ｉｉｉ族窒化物発光素子の製造方法
SE9404452D0 (sv) * 1994-12-22 1994-12-22 Abb Research Ltd Semiconductor device having an insulated gate
US5650361A (en) * 1995-11-21 1997-07-22 The Aerospace Corporation Low temperature photolytic deposition of aluminum nitride thin films
US5915164A (en) * 1995-12-28 1999-06-22 U.S. Philips Corporation Methods of making high voltage GaN-A1N based semiconductor devices

Also Published As

Publication number Publication date
EP0812468B1 (de) 2002-11-27
US5915164A (en) 1999-06-22
WO1997024752A2 (en) 1997-07-10
JPH11501463A (ja) 1999-02-02
EP0812468A2 (de) 1997-12-17
DE69625045D1 (de) 2003-01-09
US5990531A (en) 1999-11-23
WO1997024752A3 (en) 1997-08-28

Similar Documents

Publication Publication Date Title
DE69625045D1 (de) VERFAHREN ZUR HERSTELLUNG VON EINEM AUF GaN-AlN BASIERTEN HOCHSPANNUNGSHALBLEITERBAUELEMENT UND HERGESTELLTES HALBLEITERBAUELEMENT
DE69332285D1 (de) Vorrichtung und Verfahren zur Herstellung von mehrschichtigen Formteilen
DE69502273T2 (de) Vorrichtung und verfahren zur herstellung und reparatur von farbfiltern
DE69221283T2 (de) Verfahren zur Herstellung von Polysilanen
DE69408551T2 (de) Verfahren zur Herstellung von bemaltem Silikon-Elastomer
DE69429718T2 (de) Verfahren und vorrichtung zur herstellung von formkörpern
DE69511571T2 (de) Verfahren zur herstellung von essbaren hüllen und daraus hergestellten zusammensetzungen
DE69216596T2 (de) Verfahren zur herstellung von einem alkanon und/oder alkanol
DE59609854D1 (de) Verfahren zur herstellung von verkappten polyarylenethern
ATE200961T1 (de) Verfahren und vorrichtung zur herstellung von borstenwaren und danach hergestellte borstenware
DE69429243D1 (de) Elektrode zur herstellung von plasma und verfahren zur herstellung der elektrode
DE69531196D1 (de) Vorrichtung und verfahren zur herstellung von transmissionshologrammen
DE69918954D1 (de) Verfahren und Vorrichtung zur Herstellung von Faltenbalgen
DE69315091T2 (de) Verfahren und vorrichtung zur elektrolytischen herstellung von kupferdraht
DE69422367T2 (de) Verfahren und Vorrichtung zur elektrolytischen Herstellung von Arsin
DE69605384D1 (de) Verfahren zur Herstellung von einem alpha-Alkylcinnamaldehyd
DE69634116D1 (de) Vorrichtung und verfahren zur herstellung von hochabriebfester kolbenring
DE69631272D1 (de) Verfahren und Vorrichtung zur Herstellung von Draht
DE69431396D1 (de) Verfahren zur herstellung von n-tert-butyl-2-pyrazincarboxamid und n-tert-butyl-2-piperazincarboxamid
DE69419516T2 (de) Verfahren zur herstellung von hexafluorocyclobuten und verfahren zur herstellung von hexafluorocyclobutan
DE59305081D1 (de) Verfahren zur herstellung von hexafluorchlorbutenen
ATA7895A (de) Verfahren und vorrichtung zur herstellung von beschichtungen
DE69500394T2 (de) Vorrichtung und Verfahren zur Herstellung von Halbleitern
DE69617643D1 (de) Verfahren zur herstellung von difluormethan und difluorchlormethan
DE59307087D1 (de) Verfahren zur herstellung von aminoalkylhydantoin und aminoalkyl-alpha-aminosäuren

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee